公开(公告)号：JP2002268212A

公开(公告)日：2002-09-18

申请号：JP2001067307

申请日：2001-03-09

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  MIYAJIMA FUMINAO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/022 ,  C08G8/12 ,  C08K5/42 ,  C08L61/06 ,  G03F7/023 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in resolution, developability, heat resistance, pattern shape, margin for exposure and focus latitude, having good balance of these characteristics and suitable for use as a positive type resist. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- soluble novolak resin obtained by condensing specified first phenols (2,4- dimethylphenol, 2-methyl-4-ethylphenol, etc.), specified second phenols (m-cresol, p-cresol, 2,5-dimethylphenol, etc.), and an aldehyde and (B) a quinonediazidosulfonic ester compound of a phenol compound having a structure corresponding to quaternary carbon in a position adjacent to a hydroxyl group.

公开(公告)号：JP2002220471A

公开(公告)日：2002-08-09

申请号：JP2001019834

申请日：2001-01-29

Applicant: JSR CORP

Inventor： IWAZAWA HARUO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08G77/14 ,  G03F7/075

Abstract: PROBLEM TO BE SOLVED: To provide a new polysiloxane useful as a resin component for a resist material and the like, excellent in dry-etching resistance, and also excellent in basic properties as the resist such as transparency, sensibility, resolution and development to radiation. SOLUTION: The polysiloxane is composed of a structural unit (I) and/or the structural unit (II), expressed by the following general formula (1), wherein a weight-average molecular weight reduced to polystylene is 500-1,000,000. [Formula (1), each R denotes a hydrogen atom or a methyl group, independently each other, R' denotes a hydrogen atom, monovalent hydrocarbon group, monovalent hydrocarbon-halide group, halogen atom or primary to tertiary amino group, and n is an integer of 1-3].

公开(公告)号：JP2002202604A

公开(公告)日：2002-07-19

申请号：JP2000401302

申请日：2000-12-28

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  NAGAI TOMOKI ,  ISHII HIROYUKI ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F20/56 ,  C08F32/08 ,  C08F220/18 ,  C08L33/04 ,  C08L33/26 ,  C08L45/00 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation, excellent in sensitivity, resolution and pattern shape and less liable to a change in line width due to the increase and decrease of space width as a chemical amplification type resist sensitive particularly to far UV typified by ArF excimer laser beam (193 nm wavelength). SOLUTION: The radiation sensitive resin composition contains (A1) a resin containing norbornene repeating units each having a (substituted) carboxylic acid amide group typified by an N,N-dimethylnorbornene-5-carboxylic acid amide or an N,N-dimethyltetracyclo[4.4.0.12,5.17,10]dodeca-3-ene-8-carboxylic acid amide or (A2) a resin containing (substituted) (meth)acrylamide repeating units typified by N,N-dimethyl(meth)acrylamide and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2001316333A

公开(公告)日：2001-11-13

申请号：JP2000133334

申请日：2000-05-02

Applicant: JSR CORP

Inventor： O ISAMU ,  MUTSUKA YASUAKI ,  SHIMIZU SHIGEO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C07C67/317 ,  C07C69/618 ,  C07D307/20 ,  C07D309/10 ,  C07D309/12

Abstract: PROBLEM TO BE SOLVED: To provide a vinylphenylpropionic acid derivative having an acid- decomposable substituent, and to provide a method for producing the same. SOLUTION: This derivative is, for example, a compound represented by the formula. The compound is produced, for example, by reacting t-butyl bromoacetate with tri-n-butylphosphine, reacting the produced corresponding quaternary phosphonium salt with a base, reacting the produced corresponding phosphorus ylide with 2,4,6-tris(3',5'-di-t-butyl-4'-hydroxybenzyl)methylstyrene, and then hydrolyzing the obtained corresponding quaternary phosphonium salt.

公开(公告)号：JP2001261834A

公开(公告)日：2001-09-26

申请号：JP2000070553

申请日：2000-03-14

Applicant: UNIV KANAGAWA ,  JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU

IPC: C08G75/26

Abstract: PROBLEM TO BE SOLVED: To provide a sulfur atom-containing polymer which contains sulfur atoms in a high density and is composed of repeating units having many aromatic rings, and to provide a method for producing the same. SOLUTION: This polymer is composed of repeating units represented by formula (1) and is obtained by the thermal polymerization of a cyclic thioaryl ester represented by formula (2). A compound selected from among quaternary onium salts and crown ether compounds is used as a polymerization catalyst.

公开(公告)号：JP2001209181A

公开(公告)日：2001-08-03

申请号：JP2000277966

申请日：2000-09-13

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F220/18 ,  C08F222/06 ,  C08F232/00 ,  C08K5/00 ,  C08L45/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having superior dry etching resistance and high transparency to radiation, excellent in basic physical properties as a resist such as sensitivity, resolution and pattern shape, excellent also in shelf stability as a composition and retaining satisfactory adhesiveness to a substrate. SOLUTION: The radiation sensitive resin composition contains (A) a resin having repeating units derived from a derivative substituted by an oxygen- containing polar group (e.g. a hydroxyl or hydroxymethyl group) or a nitrogen- containing polar group (e.g. a cyano group), e.g. bicyclo[2.2.1]hept-2-ene or tetracyclo[4.4.0.12,5.17,10]dodec-3-ene, repeating units derived from maleic anhydride and repeating units derived from an acid dissociable ester derivative of (meth)acrylic acid typified by formula 1, 2 or 3 and (B) a radiation sensitive acid generating gent.

公开(公告)号：JP2001188346A

公开(公告)日：2001-07-10

申请号：JP2000089903

申请日：2000-03-28

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  IWAZAWA HARUO ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F20/28 ,  C08F32/02 ,  C08F32/08 ,  C08K5/00 ,  C08L101/06 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation as a chemical amplification type resist, excellent in basic physical properties as a resist such as dry etching resistance, sensitivity, resolution and pattern shape, not causing development defects in microfabrication and capable of producing a semiconductor device in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid-dissociable group-containing resin having a skeleton of formula 1 preferably as a group of formula 2-1 or 2-2 and convertible to an alkali-soluble resin when the acid-dissociable group is dissociated and (B) a radiation sensitive acid generating agent. The component A is typified by a copolymer comprising repeating units of formula 3.

公开(公告)号：JP2001139632A

公开(公告)日：2001-05-22

申请号：JP32441399

申请日：1999-11-15

Applicant: JSR CORP

Inventor： MUTSUKA YASUAKI ,  SHIMIZU SHIGEO ,  SHIMOKAWA TSUTOMU ,  KUMANO KOJI

IPC: C08F8/14 ,  C08F12/22

Abstract: PROBLEM TO BE SOLVED: To provide a styrene compound having a carboxy or ester group and its production method. SOLUTION: A compound represented by the formula (wherein R1 to R7 are each H, a 1-30C alkly, or phenyl; R8 is a 1-50C alkyl, cholesteryl, cholestaryl, a 1-20C polyfluoroalkyl, phenyl, or an alkylphenyl having a 1-50C alkyl; n is 1-30; and m is 0 or 1) is provided together with its production method.

公开(公告)号：JP2000131846A

公开(公告)日：2000-05-12

申请号：JP30404398

申请日：1998-10-26

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  BESSHO NOBUO ,  SHIMOKAWA TSUTOMU ,  NISHIMURA ISAO

IPC: G03F7/039 ,  C08F8/14 ,  C08F212/14 ,  C08F220/28 ,  C08F220/30 ,  G02B5/20 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive material superior in sensitivity, developability, etching endurance, heat resistance, and adhesion to a substrate and developable with an aqueous alkaline developing solution and usable for a positive resist for manufacturing the semiconductor integrated circuit and the like by using a copolymer composed essentially of repeating units derived from specified monomers. SOLUTION: The radiation sensitive material is composed essentially of repeating units derived from the monomers each represented by formulae I and II in which each of (a) and (b) is an integer of 0-10; each of (b) and (c) is an integer of 1-10; (d) is an integer 0-10; (e) is an integer of 0-5; R1 is an H atom or a 1-5C alkyl or phenyl group; R2 is a halogen atom or a 1-5C alkyl or such alkoxy or phenyl or 2-10 dialkylamino group, and when R2 exists by >=2, each of them may be same or different.

公开(公告)号：JP2014152192A

公开(公告)日：2014-08-25

申请号：JP2013020688

申请日：2013-02-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MISHIMA ERI ,  NISHIMURA YUKIO ,  SHIMOKAWA TSUTOMU ,  YASHIRO TAKAO

IPC: C08F220/26 ,  G03F7/004 ,  G03F7/027 ,  G03F7/031 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a resin composition for forming a cured film, which can form a cured film having excellent surface hardness and capable of fully satisfying general characteristics such as chemical resistance, heat resistance, transmittance, and dielectric constant and is excellent in storage stability.SOLUTION: The present invention is the thermosetting resin composition for forming a cured film, which contains [A] a polymer containing: a structural unit (I) containing at least one selected from the group consisting of a group represented by formula (1) and a group represented by formula (2); and a structural unit (II-1) containing a crosslinkable group (a1). In the formula (1), Rand Rare each a hydrogen atom, a C1-C4 alkyl group, or a C1-C4 fluorinated alkyl group. In the formula (2), Rand Rare each a hydrogen atom, a halogen atom, a C1-C4 alkyl group, or a C1-C4 fluorinated alkyl group. Preferably, the crosslinkable group (a1) is at least one selected from the group consisting of an oxiranyl group and an oxetanyl group.

Abstract translation: 要解决的问题：提供一种形成固化膜的树脂组合物，其可以形成具有优异的表面硬度并能够完全满足诸如耐化学性，耐热性，透射率和介电常数的一般特性的固化膜，并且在 储存稳定性。本发明是用于形成固化膜的热固性树脂组合物，其含有[A]含有下列物质的聚合物：含有选自由式（I）表示的基团的组中的至少一种的结构单元（I） 1）和由式（2）表示的基团; 和含有交联性基团（a1）的结构单元（II-1）。 在式（1）中，兰德Rare各自为氢原子，C1-C4烷基或C1-C4氟化烷基。 式（2）中，Rare Rare各自为氢原子，卤素原子，C1-C4烷基或C1-C4氟化烷基。 优选地，可交联基团（a1）为选自环氧乙烷基和氧杂环丁烷基中的至少一种。