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    2 챔버 가스 방전 레이저를 위한 제어 시스템
    4.
    发明公开
    2 챔버 가스 방전 레이저를 위한 제어 시스템 有权
    两台气体放电激光器的控制系统

    公开(公告)号：KR1020050062519A

    公开(公告)日：2005-06-23

    申请号：KR1020057001756

    申请日：2003-07-30

    Applicant: 사이머 엘엘씨

    Inventor： 팔론존피. ,  룰존에이. ,  자끄로버트엔. ,  립콘자콥피. ,  샌드스트롬리차드엘. ,  파르틀로윌리암엔. ,  어쇼프알렉산더아이. ,  이시하라도시히코 ,  마이스너존 ,  네스리차드엠. ,  멜처폴씨.

    IPC: H01S3/22

    CPC classification number: H01S3/2333 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2366

    Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

    Abstract translation: 本发明提供了一种用于模块化高重复率两放电室紫外线的控制系统。 在优选实施例中，激光器是具有主振荡器（10）的生产线机器，其产生非常窄的带子种子束，其在第二放电室中被放大（12）。 特别适用于双室气体放电激光系统的新型控制特征包括（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度 控制和（4）F2注射控制与新的学习算法。

    펄스 스트레처를 가진 고출력 엑시머 레이저
    6.
    发明公开
    펄스 스트레처를 가진 고출력 엑시머 레이저 有权
    高功率激光器与脉冲拉伸器

    公开(公告)号：KR1020090020649A

    公开(公告)日：2009-02-26

    申请号：KR1020087031844

    申请日：2007-05-31

    Applicant: 사이머 엘엘씨

    Inventor： 어쇼프알렉산더아이. ,  펠렐제임스제이. ,  호프만토마스 ,  레일리다니엘제이. ,  레멘크리스알.

    IPC: H01S3/223

    CPC classification number: H01S3/225 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/034

    Abstract: An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.

    Abstract translation: 公开了一种装置和方法，其可以包括高功率准分子或分子氟气体放电激光DUV光源系统，其可以包括：脉冲展宽器，其可以包括：光学延迟路径反射镜，光学延迟路径镜气体清洗组件，其可以 包括：吹扫气体供应系统，其引导净化气体穿过光学延迟线反射镜的表面。 光学延迟路径镜可以包括多个光学延迟路径镜; 净化气体供应系统可以引导净化气体穿过多个光学延迟线反射镜中的每一个的表面。 净化气体供应系统可以包括：净化气体供应管线; 吹扫气体分配和引导机构，其可以将吹扫气体引导通过相应的光学延迟路径反射镜的表面。

    2챔버를 갖는 가스 방전 레이저 시스템을 위한 타이밍 제어방법
    7.
    发明公开
    2챔버를 갖는 가스 방전 레이저 시스템을 위한 타이밍 제어방법 有权
    两台气体放电激光系统的时序控制

    公开(公告)号：KR1020060025234A

    公开(公告)日：2006-03-20

    申请号：KR1020067003552

    申请日：2002-10-23

    Applicant: 사이머 엘엘씨

    Inventor： 어쇼프알렉산더아이. ,  네스리차드엠.

    IPC: H01S3/22

    CPC classification number: H01S3/0385 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2333 ,  H01S3/2366

    Abstract: Feedback timing control equipment and process for an injection seeded modular gas discharge laser (11). A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. The feedback timing control is programmed to permit in some circumstances discharges timed so that no significant laser energy is output from the system. Use of this technique permits burst mode operation in which the first discharge of a burst is a no- output discharge so that timing parameters for each of the two chambers can be monitored before the first laser output pulse of the burst. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber.

    Abstract translation: 反馈定时控制设备和注射种子模块化气体放电激光器的工艺（11）。 优选的实施方案是能够以大约4,000Hz或更大的脉冲速率产生高质量脉冲激光束并且在约20至40瓦或更大的集成输出的脉冲能量为约5至10mJ或更大的系统。 反馈定时控制被编程为允许在某些情况下放电定时，使得不会从系统输出显着的激光能量。 使用这种技术允许突发模式操作，其中突发的第一次放电是无输出放电，使得可以在突发的第一激光输出脉冲之前监视两个室中的每一个的定时参数。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室，允许在主振荡器中优化波长参数并优化放大室中的脉冲能量参数。

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