公开(公告)号：JP2009111349A

公开(公告)日：2009-05-21

申请号：JP2008227986

申请日：2008-09-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JO ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES ,  VERSTRAETE JORIS JOHAN ANNE-MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus in which a barrier member is combined with a shutter member so as to keep a final element of the projection system wet during substrate swap. SOLUTION: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种装置，其中阻挡构件与挡板构件组合，以便在衬底互换期间使投影系统的最终元件保持湿润。 解决方案：公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011014901A

公开(公告)日：2011-01-20

申请号：JP2010142155

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERKVENS PAUL PETRUS JOANNES ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure that reduces a change in refractive index and a focusing error resulting from a temperature change in a space by reducing a temperature change while in the fluid handling structure of immersion liquid provided to the space by the fluid handling structure.SOLUTION: The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and a contacting surface facing to the fluid handling structure. The fluid handling structure includes a supply passage formed therein for passing fluid through the fluid handling structure from the outside to the space, and a heat insulator positioned at least partly adjacent to the supply passage in order to thermally insulate fluid in the supply passage from a heat load induced in the fluid handling structure.

Abstract translation: 要解决的问题：提供一种流体处理结构，其通过降低温度变化而在空间中的温度变化引起的折射率变化和聚焦误差减小，同时在由 流体处理结构。解决方案：流体处理结构被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的接触表面之间的空间中。 流体处理结构包括形成在其中的供应通道，用于将流体从外部传递到空间;以及绝热体，其至少部分地邻近供应通道定位，以将供应通道中的流体与 在流体处理结构中引起的热负荷。

公开(公告)号：JP2012156556A

公开(公告)日：2012-08-16

申请号：JP2012113069

申请日：2012-05-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  RIEPEN MICHAEL ,  VAN DEN HEUVEL MARTINUS WILHELMUS ,  BERKVENS PAUL PETRUS JOANNES ,  METSENAERE CHRISTOPHE DE ,  VAN DE WINKEL JIMMY MATHEUS WILHELMUS ,  ROPS CORNELIUS MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  F01N1/023 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling system in which vibrations generated by two-phase extraction are reduced or eliminated.SOLUTION: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

Abstract translation: 要解决的问题：提供一种流体处理系统，其中减少或消除由两相萃取产生的振动。 解决方案：浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010267961A

公开(公告)日：2010-11-25

申请号：JP2010106827

申请日：2010-05-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： METSENAERE CHRISTOPHE DE ,  KUNST RONALD C ,  BERKVENS PAUL PETRUS JOANNES ,  SCHNEIDERS MAURITIUS GERARDUS ELISABETH ,  VAN DE WINKEL JIMMY MATHEUS WILHELMUS ,  CORCORAN GREGORY MARTIN MASON

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide an improved apparatus for predicting force exerted to a substrate by immersion liquid and controlling canceling force such as disturbance force exerted by a positioner. SOLUTION: The immersion lithographic apparatus has a pressure sensor configured to measure the pressure of the immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls the positioner to exert force on a substrate table to compensate for the force exerted on the substrate table by the immersion liquid. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于通过浸没液体预测施加到基板的力并且控制诸如由定位器施加的干扰力的抵抗力的改进的装置。 解决方案：浸没式光刻设备具有压力传感器，该压力传感器被配置为测量浸没液体在基板和投影系统之间的空间中的压力。 控制系统响应于由压力传感器产生的压力信号，并且控制定位器在衬底台上施加力以补偿由浸没液体施加在衬底台上的力。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011171760A

公开(公告)日：2011-09-01

申请号：JP2011101629

申请日：2011-04-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus that combines a barrier member with a shutter member to keep the final element of a projection system wet during the replacement of a substrate.
SOLUTION: A liquid immersion lithographic apparatus includes a fluid confinement system for confining a fluid in a space between the projection system and a substrate. The liquid confinement system includes an inlet port to supply liquid, and a fluid entrance connected to an outlet port. The liquid immersion lithographic apparatus further includes a fluid supply system to control the fluid flow passing through the fluid entrance by changing a flow rate of fluid supplied to the entrance port and a flow rate of fluid removed from the outlet port.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种将阻挡构件与闸板构件组合的装置，以在更换基板期间使投影系统的最终元件保持湿润。 解决方案：液浸式光刻设备包括用于将流体限制在投影系统和基底之间的空间中的流体限制系统。 液体限制系统包括用于供应液体的入口端口和连接到出口端口的流体入口。 液浸光刻设备还包括流体供应系统，用于通过改变供应到入口的流体的流量和从出口移除的流体的流量来控制流过流体入口的流体流。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010141325A

公开(公告)日：2010-06-24

申请号：JP2009277243

申请日：2009-12-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  RIEPEN MICHEL ,  VAN DEN HEUVEL MARTINUS WILHELMUS ,  BERKVENS PAUL PETRUS JOANNES ,  METSENAERE CHRISTOPHE DE ,  VAN DE WINKEL JIMMY MATHEUS WILHELMUS ,  ROPS CORNELIUS MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  F01N1/023 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling system in which a vibration produced by two phase extraction is reduced or eliminated. SOLUTION: A liquid-immersion lithography usually is equipped with a fluid handling system. The handling system generally has a two phase fluid extraction system which removes a mixture of a gas and a liquid from a predetermined place. Since the extract fluid contains two phases, the pressure in the extract system varies sometimes. It is likely that the pressure variation passes through the liquid-immersion liquid to cause an incorrect exposing light. A buffer chamber can be used to reduce the pressure variation in the extract system. The buffer chamber may be connected to the fluid extract system in order to provide a fixed volume of gas to reduce the pressure variation. Substitutively or additionally, a flexible wall portion may be provided to somewhere in the fluid extract system. The flexible wall portion may respond to the pressure variation in the fluid extract system to change its shape. The change of the shape may be a help when the flexible wall portion reduces or eliminates the pressure variation. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种流体处理系统，其中减少或消除由两相萃取产生的振动。

解决方案：液浸光刻通常配备有流体处理系统。 处理系统通常具有从预定位置去除气体和液体的混合物的两相流体萃取系统。 由于萃取液含有两相，萃取系统中的压力有时会变化。 压力变化很可能通过液浸液体导致不正确的曝光。 可以使用缓冲室来减少提取系统中的压力变化。 缓冲室可以连接到流体提取系统，以提供固定体积的气体以减小压力变化。 替代地或另外地，柔性壁部分可以设置在流体提取系统的某处。 柔性壁部分可以响应于流体提取系统中的压力变化以改变其形状。 当柔性壁部分减小或消除压力变化时，形状的变化可能是有帮助的。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：NL1035816A1

公开(公告)日：2009-03-16

申请号：NL1035816

申请日：2008-08-12

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  GRAAF ROELOF FREDERIK DE ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: G03F7/20 ,  H01L21/027