公开(公告)号：EP1841558A4

公开(公告)日：2012-04-04

申请号：EP05852628

申请日：2005-12-02

Applicant: IBM

Inventor： ANDRICACOS PANAYOTIS C ,  CANAPERI DONALD F ,  COOPER ENAMUEL I ,  COTTE JOHN M ,  DELIGIANNI HARIKLIA ,  ECONOMIKOS LAERTIS ,  EDELSTEIN DANIEL C ,  FRANZ SILVIA ,  PRANATHARTHIHARAN BALASUBRAMANIAN ,  KRISHNAN MAHADEVAIYER ,  MANSSON ANDREW P ,  WALTON ERICK G ,  WEST ALAN C

IPC: B23H3/00 ,  B23H5/08

CPC classification number: C25F3/02 ,  B23H5/08 ,  C09G1/04 ,  H01L21/32125

公开(公告)号：WO2006088533A3

公开(公告)日：2007-09-27

申请号：PCT/US2005043464

申请日：2005-12-02

Applicant: IBM ,  ANDRICACOS PANAYOTIS C ,  CANAPERI DONALD F ,  COOPER EMANUEL I ,  COTTE JOHN M ,  DELIGIANNI HARIKLIA ,  ECONOMIKOS LAERTIS ,  EDELSTEIN DANIEL C ,  FRANZ SILVIA ,  PRANATHARTHIHARAN BALASUBRAMAN ,  KRISHNAN MAHADEVAIYER ,  MANSSON ANDREW P ,  WALTON ERICK G ,  WEST ALAN C

Inventor： ANDRICACOS PANAYOTIS C ,  CANAPERI DONALD F ,  COOPER EMANUEL I ,  COTTE JOHN M ,  DELIGIANNI HARIKLIA ,  ECONOMIKOS LAERTIS ,  EDELSTEIN DANIEL C ,  FRANZ SILVIA ,  PRANATHARTHIHARAN BALASUBRAMAN ,  KRISHNAN MAHADEVAIYER ,  MANSSON ANDREW P ,  WALTON ERICK G ,  WEST ALAN C

IPC: B23H3/00

CPC classification number: C25F3/02 ,  B23H5/08 ,  C09G1/04 ,  H01L21/32125

Abstract: Methods and compositions for electro-chemical-mechanical polishing (e-CMP) of silicon chip interconnect materials, such as copper, are provided. The methods include the use of compositions according to the invention in combination with pads having various configurations.

Abstract translation: 提供了诸如铜之类的硅芯片互连材料的电化学机械抛光（e-CMP）的方法和组合物。 所述方法包括使用根据本发明的组合物与具有各种构型的垫组合。