PROCESS FOR COATING A SUBSTRATE WITH POLYIMIDE

    公开(公告)号:DE3461935D1

    公开(公告)日:1987-02-12

    申请号:DE3461935

    申请日:1984-02-08

    Applicant: IBM

    Abstract: A substrate is provided with a polyimide coating having good planarisation and good mechanical and thermal stability, by applying to the substrate an amino-terminated oligomer and an ester, with the oligomer being formed from an aromatic diamine and from an aromatic dianhydride, and by reacting the oligomer and the ester in situ. The ester is formed from an aromatic tetracarboxylic acid and an alcohol, and the ester is such that it reacts with an amine group of the oligomer to form a high molecular weight polyamide at a temperature between 40 DEG C and 140 DEG C, and continues to react to form a cyclic imide.

    5.
    发明专利
    未知

    公开(公告)号:DE68917417T2

    公开(公告)日:1995-03-16

    申请号:DE68917417

    申请日:1989-10-12

    Applicant: IBM

    Abstract: Thin films of polyimide having electrical insulation, low thermal expansion, high glass transition temperature, and good ahesion are made by dispersing fine domains of relatively flexible polyimide which is fluorinated in a matrix of relatively rigid polyimide.

    6.
    发明专利
    未知

    公开(公告)号:DE68917417D1

    公开(公告)日:1994-09-15

    申请号:DE68917417

    申请日:1989-10-12

    Applicant: IBM

    Abstract: Thin films of polyimide having electrical insulation, low thermal expansion, high glass transition temperature, and good ahesion are made by dispersing fine domains of relatively flexible polyimide which is fluorinated in a matrix of relatively rigid polyimide.

    PROCESS FOR PLANARIZING A SUBSTRATE

    公开(公告)号:CA1223782A

    公开(公告)日:1987-07-07

    申请号:CA508355

    申请日:1986-05-05

    Applicant: IBM

    Abstract: PROCESS FOR PLANARIZING A SUBSTRATE A surface coating of high glass temperature and superior mechanical properties along with excellent planarization and gap filling is used to coat substrates. The coating comprises a polyamide alkyl ester from a pyromellitic alkyl diester and a para-linked aromatic diamine dissolved in a solvent containing at least 10% of a co-solvent boiling above 220.degree.C.

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