公开(公告)号：AT464654T

公开(公告)日：2010-04-15

申请号：AT01972244

申请日：2001-09-27

Applicant: IBM

Inventor： CANAPERI DONALD ,  CHU JACK ,  D EMIC CHRISTOPHER ,  HUANG LIJUAN ,  OTT JOHN ,  WONG HON-SUM

IPC: H01L21/762 ,  H01L21/02 ,  H01L21/20 ,  H01L21/336 ,  H01L21/338 ,  H01L21/76 ,  H01L27/12 ,  H01L29/778 ,  H01L29/786 ,  H01L29/812

Abstract: A method for forming strained Si or SiGe on relaxed SiGe on insulator (SGOI) is described incorporating growing epitaxial Si1-yGey layers on a semiconductor substrate, implanting hydrogen into a selected Si1-yGey layer to form a hydrogen-rich defective layer, smoothing surfaces by Chemo-Mechanical Polishing, bonding two substrates together via thermal treatments and separating two substrates at the hydrogen-rich defective layer. The separated substrates may have its upper surface smoothed by CMP for epitaxial deposition of relaxed Si1-yGey, and strained Si1-yGey depending upon composition, strained Si, strained SiC, strained Ge, strained GeC, and strained Si1-yGeyC.

公开(公告)号：AT516600T

公开(公告)日：2011-07-15

申请号：AT06120727

申请日：2003-02-19

Applicant: IBM

Inventor： APPENZELLER JOERG ,  AVOURIS PHAEDON ,  CHAN KEVIN K ,  COLLINS PHILIP G ,  MARTEL RICHARD ,  WONG HON-SUM

IPC: H01L51/10 ,  H01L51/00 ,  H01L51/05 ,  H01L51/30

Abstract: A carbon-nanotube field transistor semiconductor device, comprising: a vertical carbon-nanotube (508) wrapped in a dielectric material (511); a source formed at a first side of the carbon-nanotube; a drain (515) formed on a second side of the carbon-nanotube; a bilayer nitride complex through which a band strap of each of the source and the drain is formed connecting the carbon-nanotube wrapped in the dielectric material to the source and the drain; and a gate (512) formed substantially over a portion of the carbon-nanotube. Further disclosed are methods for forming the following self-aligned carbon-nanotube field effect transistor: A self-aligned carbon-nanotube field effect transistor semiconductor device comprises a carbon-nanotube deposited on a substrate, a source and a drain formed at a first end and a second end of the carbon-nanotube, respectively, and a gate formed substantially over a portion of the carbon-nanotube, separated from the carbon-nanotube by a dielectric film.