Abstract:
PROBLEM TO BE SOLVED: To provide an optoelectronic semiconductor chip having improved efficiency.SOLUTION: An optoelectronic semiconductor chip comprises the following sequence of plural regions in a growth direction of the semiconductor chip: a p-doped barrier layer for an active region; the active region, which is suitable for generating electromagnetic radiation, the active region being based on a hexagonal compound semiconductor; and an n-doped barrier layer for the active region. The active region comprises a quantum well structure for generating radiation, and at least one further quantum well structure which is not provided for generating radiation and which is disposed upstream of the quantum well structure provided for generating radiation, as seen in the growth direction.
Abstract:
PROBLEM TO BE SOLVED: To provide an optoelectronic semiconductor chip capable of extremely effectively operating the chip, and manufacturing at an extremely economical cost. SOLUTION: The electronics semiconductor chip is formed of a growth substrate (1) equipped with a structured growing surface (2) having a lot of protrudes (4) and recesses (3), and an array of active layers (5) deposited on the growing surface (2). COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
The invention relates to a light-emitting diode chip comprising a series of layers (10) provided with at least one n-type conductivity layer. Said light-emitting diode chip comprises a reflective layer (5) that is connected in a conductive manner to the n-type conductivity layer (31). At least one transparent dielectric layer (4) is arranged between the n-type conductivity layer and the reflective layer.
Abstract:
A method for producing a light-emitting semiconductor component is specified, wherein a light-emitting semiconductor chip (2) is arranged on a mounting area (10) of a carrier (1), wherein the semiconductor chip (2) is electrically connected to electrical contact regions (11, 12) on the mounting area (10), and wherein an encapsulation layer (3) is applied to the semiconductor chip (2) by means of atomic layer deposition, wherein all surfaces of the semiconductor chip (2) which are free after mounting and electrical connection are covered with an encapsulation layer (3). Furthermore, a light-emitting semiconductor component is specified.
Abstract:
Ein optoelektronisches Bauelement umfasst einen optoelektronischen Halbleiterchip mit einer ersten Oberfläche, an der ein erster elektrischer Kontakt und ein zweiter elektrischer Kontakt angeordnet sind. Die erste Oberfläche grenzt an einen Formkörper an. Ein erster Stift und ein zweiter Stift sind in den Formkörper eingebettet und elektrisch leitend mit dem ersten Kontakt und dem zweiten Kontakt verbunden. Eine Schutzdiode ist in den Formkörper eingebettet und elektrisch leitend mit dem ersten Kontakt und dem zweiten Kontakt verbunden.
Abstract:
In mindestens einer Ausführungsform des optoelektronischen Halbleiterbauteils (1) beinhaltet dieses einen Träger (2) und mindestens eine Halbleiterschichtenfolge (3). Die Halbleiterschichtenfolge (3) weist zumindest eine aktive Schicht (30) auf. Die Halbleiterschichtenfolge (3) ist ferner an dem Träger (2) angebracht. Weiterhin beinhaltet das Halbleiterbauteil (1) einen Metallspiegel (4), der sich zwischen dem Träger (2) und der Halbleiterschichtenfolge (3) befindet. Der Träger (2) und die Halbleiterschichtenfolge (3) überragen den Metallspiegel (4) in lateraler Richtung. Außerdem ist der Metallspiegel (4) in lateraler Richtung unmittelbar von einer strahlungsdurchlässigen und elektrisch isolierenden Verkapselungsschicht (5) umgeben.
Abstract:
An optoelectronic semiconductor component comprising a semiconductor layer sequence (3) based on a nitride compound semiconductor and containing an n-doped region (4), a p-doped region (8) and an active zone (5) arranged between the n-doped region (4) and the p-doped region (8) is specified. The p-doped region (8) comprises a p-type contact layer (7) composed of InxAlyGa1-x-yN where 0≦̸x≦̸1, 0≦̸y≦̸1 and x+y≦̸1. The p-type contact layer (7) adjoins a connection layer (9) composed of a metal, a metal alloy or a transparent conductive oxide, wherein the p-type contact layer (7) has first domains (1) having a Ga-face orientation and second domains (2) having an N-face orientation at an interface with the connection layer (9).
Abstract:
A description is given of an optoelectronic semiconductor chip (1) comprising a semiconductor layer sequence (2), which has an active zone (4) for generating electromagnetic radiation, and comprising a structured current spreading layer (6), which contains a transparent conductive oxide and is arranged on a main area (12) of the semiconductor layer sequence (2), wherein the current spreading layer (6) covers at least 30% and at most 60% of the main area (12).