Abstract:
PROBLEM TO BE SOLVED: To improve a beam radiating and/or a beam receiving semiconductor element, and to provide an simple method of depositing contacts on a semiconductor substrate. SOLUTION: In the beam radiating and/or the beam receiving semiconductor element, including the semiconductor substrate (1) having an active zone (2) provided to form or receive the beam and a main surface in the main extending direction in the lateral direction, a protective layer (6) disposed on the main surface side, and the contact (5) disposed on the main surface side, the protective layer (5) is positioned so as to be at an interval from the contact (5) in the lateral direction. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor chip suitable for high radiation output so that output efficiency of radiation generated in the semiconductor chip is improved. SOLUTION: At least one vertical surface of a semiconductor chip, which is used as an output surface, is longer than a lateral surface in an extending direction of an active zone. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical semiconductor device capable of improving quantum efficiency. SOLUTION: An indium content of at least one well layer is increased in a step of growing the well layer. In the optical semiconductor device, the well layer has a first composition based on a nitride semiconductor material with first electron energy, and a barrier layer has a second composition based on the nitride semiconductor material with second electron energy higher than the first electron energy. A beam activated quantum well layer is grown on the barrier layer. Non-radiative well layers and the barrier layers form a superlattice for the beam activated quantum well layer. The layer thickness of the beam activated quantum well layer is larger than the layer thickness of the well layer of the superlattice. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an optoelectronic device having lateral distribution for uniform current density and high ESD stability. SOLUTION: In this optoelectronic device, a first current diffusion layer and a second current diffusion layer, which interface with the semiconductor layer of a semiconductor layer array, are positioned between the semiconductor layer array and its connection contacts; the first current diffused layer has layer resistance larger than the second one and forms an ohmic contact with an adjacent semiconductor layer; and the second current diffused layer is positioned at a partial domain with a side clearance of the first current diffused layer. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
The invention relates to a radiation-emitting semiconductor component with a luminescence conversion element (8). A reflector (7) is connected downstream of a semiconductor body (3), this reflector being coated with a luminescence conversion element (8) or containing a luminescence conversion element (8). Said luminescence conversion element (8) converts part of the radiation (6) that is emitted by the semiconductor body during operation in a first wavelength range into radiation (9) in a second wavelength range. The semiconductor body (3) and the luminescence conversion element (8) are preferably tuned to each other in such a way that mixed-colour white light is emitted.
Abstract:
A light-emitting chip (3) comprises a lens-shaped output window (4), the base surface (5) of which is provided with a mirror surface (6). A sequence of layers (9) is arranged on an output surface (7) of the output window (4) with a photon-emitting p-n junction (10). The photons emitted by the p-n junction are reflected at the mirror surface (6) and can leave the output window (4) through the output surface (7).
Abstract:
The invention relates to an optical semiconductor device comprising a multip le quantum well structure, in which well layers and barrier layers consisting o f different types of semiconductor layers are stacked alternately on top of on e another. The invention is characterised in that the well layers (6a) have a first composition, based on a nitride semiconductor material with a first electron energy and the barrier layers (6b) have a second composition based on a nitride semiconductor material with a higher electron energy in relation t o the first electron energy. An active radiative quantum well layer (6c) is located downstream of said layers in the epitaxial direction and the essentially non-radiative well layers (6a) positioned upstream, together wit h the barrier layers (6b) form a superlattice for said active quantum well lay er.
Abstract:
The invention relates to an optical semiconductor device comprising a multiple quantum well structure, in which well layers and barrier layers consisting of different types of semiconductor layers are stacked alternately on top of one another. The invention is characterised in that the well layers (6a) have a first composition, based on a nitride semiconductor material with a first electron energy and the barrier layers (6b) have a second composition based on a nitride semiconductor material with a higher electron energy in relation to the first electron energy. An active radiative quantum well layer (6c) is located downstream of said layers in the epitaxial direction and the essentially non-radiative well layers (6a) positioned upstream, together with the barrier layers (6b) form a superlattice for said active quantum well layer.