公开(公告)号：US09824879B2

公开(公告)日：2017-11-21

申请号：US15478306

申请日：2017-04-04

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Akinori Asai ,  Kenshi Fukumitsu

IPC: H01J65/04 ,  G03F7/20 ,  H01J61/073

CPC classification number: H01J65/04 ,  G03F7/70025 ,  H01J61/025 ,  H01J61/0737 ,  H01J61/26 ,  H01J65/042

Abstract: In a light source device, a control unit causes an energy density of a laser light in a lighting start region RS when a laser support light is maintained to be lower than an energy density of the laser light in the lighting start region RS when the laser support light is put on. For this reason, when the laser support light is maintained, a laser light L is radiated to the lighting start region RS at an energy density of a degree where sputtering does not occur. Therefore, in the light source device, because sputtering in a light emission sealing body can be suppressed, a sufficiently long life can be realized.

公开(公告)号：US09814126B2

公开(公告)日：2017-11-07

申请号：US15029285

申请日：2014-09-23

Applicant: ASML Netherlands B.V.

Inventor： Martijn Petrus Christianus Van Heumen

IPC: G03F7/20 ,  H05H1/24 ,  H01J61/34 ,  H01J61/40 ,  H01J65/04 ,  G01N21/71 ,  G01N21/956

CPC classification number: H05H1/24 ,  G01B2210/56 ,  G01N21/71 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/068 ,  G03F7/70016 ,  G03F7/70575 ,  G03F7/70616 ,  G03F7/70916 ,  H01J61/34 ,  H01J61/40 ,  H01J65/04

Abstract: A radiation driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a first container containing a gas (e.g. Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. First container is enclosed within a hermetically sealed second container. Any ozone generated within the second container as a result of ultraviolet components of the output radiation is completely contained within the second container. Second container further filters out the ultraviolet components. Microwave radiation may be used instead of laser radiation to form the plasma.

公开(公告)号：US09780252B2

公开(公告)日：2017-10-03

申请号：US14882737

申请日：2015-10-14

Applicant: Luis Alejandro Rey-Garcia ,  Peter G. Ragay

Inventor： Luis Alejandro Rey-Garcia ,  Peter G. Ragay

IPC: H01L31/028 ,  H01L31/18 ,  H01L21/67 ,  H01L21/677 ,  H05B3/00

CPC classification number: H01L31/1868 ,  H01J65/04 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/677 ,  H01L21/6776 ,  H01L31/028 ,  H01L31/0288 ,  H01L31/186 ,  H01L31/1864 ,  H01L31/1876 ,  H05B1/0233 ,  H05B3/0047

Abstract: Reduction of solar wafer LID by exposure to continuous or intermittent High-Intensity full-spectrum Light Radiation, HILR, by an Enhanced Light Source, ELS, producing 3-10 Sols, optionally in the presence of forming gas or/and heating to within the range of from 100° C.-300° C. HILR is provided by ELS modules for stand-alone bulk/continuous processing, or integrated in wafer processing lines in a High-Intensity Light Zone, HILZ, downstream of a wafer firing furnace. A finger drive wafer transport provides continuous shadowless processing speeds of 200-400 inches/minute in the integrated furnace/HILZ. Wafer dwell time in the peak-firing zone is 1-2 seconds. Wafers are immediately cooled from peak firing temperature of 850° C.-1050° C. in a quench zone ahead of the HILZ-ELS modules. Dwell in the HILZ is from about 10 sec to 5 minutes, preferably 10-180 seconds. Intermittent HILR exposure is produced by electronic control, a mask, rotating slotted plate or moving belt.

公开(公告)号：US20170263433A1

公开(公告)日：2017-09-14

申请号：US15604925

申请日：2017-05-25

Applicant: Excelitas Technologies Corp.

Inventor： Rudi Blondia

IPC: H01J61/02 ,  H01J65/04 ,  H01J61/30 ,  H01J61/33 ,  H01J61/35 ,  H01J61/54 ,  H01J61/16 ,  H01J61/24

CPC classification number: H01J61/025 ,  H01J61/16 ,  H01J61/24 ,  H01J61/30 ,  H01J61/33 ,  H01J61/35 ,  H01J61/54 ,  H01J65/04 ,  H01J65/042

Abstract: The invention is directed to a sealed high intensity illumination device configured to receive a laser beam from a laser light source. A sealed chamber is configured to contain an ionizable medium. The chamber includes a reflective chamber interior surface having a first parabolic contour and parabolic focal region, a second parabolic contour and parabolic focal region, and an interface surface. An ingress surface is disposed within the interface surface configured to admit the laser beam into the chamber, and an egress surface disposed within the interface surface configured to emit high intensity light from the chamber. The first parabolic contour is configured to reflect light from the first parabolic focal region to the second parabolic contour, and the second parabolic contour is configured to reflect light from the first parabolic contour to the second parabolic focal region.

公开(公告)号：US20170146399A1

公开(公告)日：2017-05-25

申请号：US15369560

申请日：2016-12-05

Applicant: KLA-Tencor Corporation

Inventor： Gregory R. Brady ,  Andrei V. Shchegrov ,  Lawrence D. Rotter ,  Derrick A. Shaughnessy ,  Anatoly Shchemelinin ,  Ilya Bezel ,  Muzammil A. Arain ,  Anatoly A. Vasiliev ,  James Andrew Allen ,  Oleg Shulepov ,  Andrew V. Hill ,  Ohad Bachar ,  Moshe Markowitz ,  Yaron Ish-Shalom ,  Ilan Sela ,  Amnon Manassen ,  Alexander Svizher ,  Maxim Khokhlov ,  Avi Abramov ,  Oleg Tsibulevsky ,  Daniel Kandel ,  Mark Ghinovker

IPC: G01J3/10 ,  H01J65/04 ,  G01J3/02 ,  G02B6/293 ,  G01J3/12

CPC classification number: G01J3/10 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G01J3/0218 ,  G01J3/12 ,  G02B6/29332 ,  G02B6/29362 ,  G02B6/29388 ,  G02B6/29395 ,  G02B6/3508 ,  G02B6/353 ,  H01J65/04

Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

公开(公告)号：US09512985B2

公开(公告)日：2016-12-06

申请号：US13774025

申请日：2013-02-22

Applicant: KLA-Tencor Corporation

Inventor： Gregory R. Brady ,  Andrei V. Shchegrov ,  Lawrence D. Rotter ,  Derrick Shaughnessy ,  Anatoly Shchemelinin ,  Ilya Bezel ,  Muzammil A. Arain ,  Anatoly A. Vasiliev ,  James Andrew Allen ,  Oleg Shulepov ,  Andrew V. Hill ,  Ohad Bachar ,  Moshe Markowitz ,  Yaron Ish-Shalom ,  Ilan Sela ,  Amnon Manassen ,  Alexander Svizher ,  Maxim Khokhlov ,  Avi Abramov ,  Oleg Tsibulevsky ,  Daniel Kandel ,  Mark Ghinovker

IPC: F21S8/10 ,  F21V13/08 ,  F21V13/00 ,  F21V13/12 ,  G02B6/35 ,  G02B6/293

CPC classification number: G01J3/10 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G01J3/0218 ,  G01J3/12 ,  G02B6/29332 ,  G02B6/29362 ,  G02B6/29388 ,  G02B6/29395 ,  G02B6/3508 ,  G02B6/353 ,  H01J65/04

Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

Abstract translation: 本公开涉及用于向用于光学测量的测量头提供照明的系统。 在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。 在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。 在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。

公开(公告)号：US09433070B2

公开(公告)日：2016-08-30

申请号：US14567546

申请日：2014-12-11

Applicant: KLA-Tencor Corporation

Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Amir Torkaman

IPC: H05H1/24 ,  H01J61/30 ,  H01J61/52 ,  H01J65/04

CPC classification number: H05H1/24 ,  H01J61/30 ,  H01J61/52 ,  H01J65/04

Abstract: A plasma cell for forming light-sustained plasma includes a transmission element configured to contain a volume of gas, a first terminal flange disposed at or near an opening of the transmission element, a second terminal flange disposed at or near another opening of the transmission element, a floating flange disposed between the first or second terminal flange and the transmission element. The floating flange is movable to compensate for thermal expansion of the transmission element. Further, the floating flange is configured to enclose the internal volume of the transmission element to contain a volume of gas within the transmission element. The transmission element is configured to receive illumination from an illumination source in order to generate plasma within the volume of gas. The transmission element is transparent to a portion of the illumination from the illumination source and a portion of broadband radiation emitted by the plasma.

Abstract translation: 用于形成光持久等离子体的等离子体单元包括被配置为容纳一定体积的气体的传输元件，设置在传动元件的开口处或附近的第一端子凸缘，设置在传输元件的另一个开口处或附近的第二端子凸缘 设置在第一或第二端子凸缘与传动元件之间的浮动凸缘。 浮动凸缘可移动以补偿传动元件的热膨胀。 此外，浮动凸缘构造成包围传动元件的内部容积以容纳传动元件内的一定体积的气体。 传输元件被配置为从照明源接收照明，以在气体体积内产生等离子体。 传输元件对于来自照明源的照明的一部分和由等离子体发射的宽带辐射的一部分是透明的。

公开(公告)号：US09357626B2

公开(公告)日：2016-05-31

申请号：US14548734

申请日：2014-11-20

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria Pellemans ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Johannes Matheus Marie De Wit ,  Ralph Jozef Johannes Gerardus Anna Maria Smeets ,  Gerbrand Van Der Zouw

IPC: G21K5/04 ,  H01J65/04 ,  H05H1/24 ,  G03F7/20 ,  G01N21/956 ,  H05G2/00 ,  H01J61/54 ,  H01J61/02 ,  H05B41/38

CPC classification number: H05H1/24 ,  G01N21/956 ,  G01N2201/061 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70483 ,  G03F7/70616 ,  G03F7/70641 ,  H01J61/02 ,  H01J61/54 ,  H01J61/545 ,  H01J65/04 ,  H05B41/38 ,  H05G2/003 ,  H05G2/008

Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.

Abstract translation: 激光驱动光源包括激光和聚焦光学元件。 这些产生聚焦在容纳气体（例如Xe）的容器内的等离子体形成区域上的辐射束。 收集光学器件收集由激光辐射维持的等离子体发射的光子以形成输出辐射束。 等离子体具有细长形式（L> d），并且收集光学器件被配置为收集从等离子体沿纵向出现的光子。 与收集从等离子体横向辐射的辐射的源相比，等离子体的亮度增加。 使用光源的计量装置可以由于亮度的增加而获得更高的精度和/或吞吐量。 可以提供背反射器。 可以使用微波辐射代替激光辐射以形成等离子体。

公开(公告)号：US09305764B2

公开(公告)日：2016-04-05

申请号：US14613988

申请日：2015-02-04

Applicant: Young-kyu Park ,  Wook-rae Kim ,  Kwang-soo Kim ,  Tae-joong Kim ,  Byeong-hwan Jeon

Inventor： Young-kyu Park ,  Wook-rae Kim ,  Kwang-soo Kim ,  Tae-joong Kim ,  Byeong-hwan Jeon

IPC: H01J61/28 ,  H01J65/04 ,  G02B27/14

CPC classification number: G02B27/141 ,  G02B17/0856 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  H01J65/04

Abstract: A plasma light source includes a chamber having an ionizable medium therein, an ignition source configured to provide first electromagnetic radiation to the chamber, a sustaining source configured to separately provide second electromagnetic radiation to the chamber, a first curved mirror positioned adjacent the chamber, and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. The second electromagnetic radiation may be different than the first electromagnetic radiation. Related devices and methods of operation are also discussed.

Abstract translation: 等离子体光源包括其中具有可电离介质的腔室，被配置为向腔室提供第一电磁辐射的点火源，被配置为向腔室单独提供第二电磁辐射的维持源，邻近腔室定位的第一弯曲镜，以及 第二弯曲镜，其与第一反射镜相对设置，并布置成将第一电磁辐射引向腔室。 第二电磁辐射可以不同于第一电磁辐射。 还讨论了相关设备和操作方法。

公开(公告)号：US20150289353A1

公开(公告)日：2015-10-08

申请号：US14448258

申请日：2014-07-31

Applicant: Energetiq Technology, Inc.

Inventor： Donald K. Smith

IPC: H05G2/00

CPC classification number: H05G2/008 ,  B82Y10/00 ,  G03F7/70033 ,  G21K5/00 ,  G21K5/04 ,  H01J61/16 ,  H01J65/04 ,  H05B41/382 ,  H05G2/001 ,  H05G2/003 ,  H05G2/005 ,  Y02B20/204 ,  Y10T29/49002

Abstract: An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.