公开(公告)号：US07863583B2

公开(公告)日：2011-01-04

申请号：US11629195

申请日：2005-06-17

Applicant: Andreas Daiss ,  Erich Beck ,  Manfred Biehler

Inventor： Andreas Daiss ,  Erich Beck ,  Manfred Biehler

IPC: G21K5/02 ,  G21K5/10

CPC classification number: G21K5/02 ,  B05D3/0254 ,  B05D3/0486 ,  B05D3/066 ,  B05D3/067 ,  B05D3/068

Abstract: The invention relates to an apparatus and a method of producing molding materials and coatings on substrates by curing radiation-curable materials under an inert gas atmosphere by exposure to high-energy radiation.

Abstract translation: 本发明涉及通过暴露于高能量辐射下在惰性气体气氛下固化可辐射固化材料的方法来在基底上生产模塑材料和涂层的装置和方法。

公开(公告)号：US20080087215A1

公开(公告)日：2008-04-17

申请号：US11973100

申请日：2007-10-05

Applicant: Andrew Nguyen

Inventor： Andrew Nguyen

IPC: B05C11/02 ,  B05B1/28 ,  B05C11/00

CPC classification number: H01L21/6715 ,  B05D1/005 ,  B05D3/0486 ,  G03F7/162

Abstract: A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solution over the substrate extends into the coating chamber. A vapor distributor having a solvent vapor generator communicable with the coating chamber is included to cause a solvent to be transformed into a solvent vapor. A carrier gas is mixed with the solvent vapor to form a carrier-solvent vapor mixture. The carrier-solvent vapor mixture is flown into the coating chamber to saturate the coating chamber. A solvent remover communicable with the coating chamber is included to remove excess solvent that does not get transformed into the solvent vapor to prevent the excess solvent from dropping on the substrate.

Abstract translation: 一种在诸如半导体晶片的衬底上涂覆聚合物溶液的方法和设备。 该设备包括具有可旋转卡盘的涂覆室，以支撑待涂覆聚合物溶液的基材。 将聚合物溶液分配在基材上的分配器延伸到涂布室中。 包括具有与涂覆室可连通的溶剂蒸汽发生器的蒸气分配器，以使溶剂转化为溶剂蒸气。 将载气与溶剂蒸气混合以形成载体 - 溶剂蒸气混合物。 载体 - 溶剂蒸气混合物流入涂覆室以使涂覆室饱和。 包括可与涂布室通信的溶剂去除剂以除去不被转化为溶剂蒸气的多余溶剂，以防止过量的溶剂滴落在基材上。

公开(公告)号：US20080003372A1

公开(公告)日：2008-01-03

申请号：US11569213

申请日：2005-05-24

Applicant: Martin Kamps ,  Fatmir Raka ,  Hubert Baumgart ,  Berthold Austrup

Inventor： Martin Kamps ,  Fatmir Raka ,  Hubert Baumgart ,  Berthold Austrup

IPC: B05D1/18 ,  B05C3/02

CPC classification number: F26B21/14 ,  B05D3/0466 ,  B05D3/0486 ,  B05D3/067 ,  F26B3/28

Abstract: A method of curing free-radically curable compositions under an inert gas atmosphere, where the curing, which proceeds in accordance with a free-radical mechanism, is initiated, or initiated and maintained, in the free-radically curable compositions by radiation and the lateral escape of the inert gas atmosphere is prevented, which involves (1) immersing the free-radically curable compositions in an inert gas atmosphere below a depth from which the inert gas atmosphere constantly exhibits its lowest oxygen concentration, and (2) irradiating the free-radically curable compositions below this depth in the inert gas atmosphere, at least one of the radiation sources being arranged beneath the inert gas/air interface, and then (3) emersing the resultant cured compositions again from the inert gas atmosphere, and apparatus (1) according to FIG. 1 for its implementation.

Abstract translation: 一种在惰性气体气氛下固化可自由基固化的组合物的方法，其中根据自由基机理进行的固化通过辐射和侧向起始或启动并保持在可自由基固化的组合物中 防止惰性气体气体的逸出，其包括（1）将自由基可固化组合物浸入惰性气体气氛中低于惰性气体气氛持续显示其最低氧浓度的深度，以及（2） 在惰性气体气氛中低于该深度的可自由基固化的组合物，至少一个辐射源设置在惰性气体/空气界面的下方，然后（3）再次从惰性气体气氛中排出所得的固化组合物，以及装置（1 ）。 1执行。

公开(公告)号：US20070298167A1

公开(公告)日：2007-12-27

申请号：US11556787

申请日：2006-11-06

Applicant: DUSTIN W. HO ,  Juan Carlos Rocha-Alvarez ,  Dale R. Du Bois ,  Scott A. Hendrickson ,  Sanjeev Baluja ,  Ndanka O. Mukuti

Inventor： DUSTIN W. HO ,  Juan Carlos Rocha-Alvarez ,  Dale R. Du Bois ,  Scott A. Hendrickson ,  Sanjeev Baluja ,  Ndanka O. Mukuti

IPC: B05D7/22

CPC classification number: B05D3/067 ,  B01D53/8675 ,  B01D2255/1023 ,  B01D2255/2073 ,  B01D2255/20761 ,  B05D3/0486

Abstract: A re-circulating cooling system can be used with a curing system in order to reduce the exhaust requirements for the system. Further, using a cooling fluid such as nitrogen reduces the production of ozone and the sealing requirements for the system. A simple heat exchanger can be used between return and supply reservoirs in order to remove heat added to the re-circulating fluid during circulation past the curing radiation source. The nitrogen can come from a nitrogen source, or from a membrane or other device operable to split feed gas into its molecular components to provide a source of gas rich in nitrogen. An ozone destruction unit can be used with such a cooling system to reduce the amount of ozone to acceptable levels, and to minimize consumption of the nitrogen. A catalyst can be used to deplete the ozone that does not get consumed during the reaction.

Abstract translation: 再循环冷却系统可以与固化系统一起使用，以减少系统的排气要求。 此外，使用诸如氮气的冷却流体减少臭氧的产生和系统的密封要求。 在回流和供应储存器之间可以使用简单的热交换器，以便在循环通过固化辐射源之前除去添加到再循环流体中的热量。 氮气可以来自氮源，或者来自可以将进料气体分解成其分子组分以提供富含氮的气体源的膜或其它装置。 臭氧破坏装置可与这种冷却系统一起使用，以将臭氧的量减少至可接受的水平，并最大限度地减少氮的消耗。 可以使用催化剂来消耗在反应期间不消耗的臭氧。

公开(公告)号：US20070247711A1

公开(公告)日：2007-10-25

申请号：US11659709

申请日：2005-08-30

Applicant: Shigeaki Ohtani ,  Yuuichi Fukushige

Inventor： Shigeaki Ohtani ,  Yuuichi Fukushige

IPC: G02B1/11 ,  B05D7/24 ,  G02B5/30

CPC classification number: B05D1/38 ,  B05D3/0486 ,  B05D3/067 ,  B05D7/536 ,  G02B1/105 ,  G02B1/111 ,  G02B1/14 ,  G02B1/16 ,  G02B5/3033 ,  Y10T428/31

Abstract: A method of producing an optical film comprising at least two ionizing radiation-curing layers on a transparent substrate, the method comprising: Step 1 of irradiating a layer A, which comprises two or more kinds of polymerization initiators having different absorption ends at a longer wavelength side in wavelength range of sensitivity to which they are sensitive, with an ionizing radiation having a wavelength to which at least one kind (a) of the polymerization initiators is not substantially sensitive and at least one kind (b) of the polymerization initiators is sensitive; and Step 2 of spreading a coating solution for layer B comprising at least one polymerization initiator (c) over the layer A after Step A and then irradiating the coating solution for layer B with an ionizing radiation having a wavelength to which the polymerization initiators (a) and (c) are sensitive.

Abstract translation: 一种在透明基板上制造包括至少两个电离辐射固化层的光学膜的方法，所述方法包括：步骤1，其中，在较长波长处照射具有不同吸收端的两种或更多种聚合引发剂的层A 具有其至少一种（a）聚合引发剂基本上不敏感的波长的电离辐射和聚合引发剂的至少一种（b）是敏感的）的敏感度的波长范围 ; 和步骤2，在步骤A之后，将包含至少一种聚合引发剂（c）的层B的涂布溶液涂布在层A上，然后用具有波长的电离辐射照射聚合引发剂（a ）和（c）是敏感的。

公开(公告)号：US20070199506A1

公开(公告)日：2007-08-30

申请号：US11362905

申请日：2006-02-28

Applicant: Farooq Ahmed ,  Faisal Huda ,  Seraj ul Huda ,  John Barr ,  Steve Moss

Inventor： Farooq Ahmed ,  Faisal Huda ,  Seraj ul Huda ,  John Barr ,  Steve Moss

IPC: B05C11/00 ,  B05B3/00 ,  B05C5/00

CPC classification number: B05D1/02 ,  B05B13/0228 ,  B05B13/0278 ,  B05C9/14 ,  B05D1/002 ,  B05D3/0218 ,  B05D3/0254 ,  B05D3/0413 ,  B05D3/0486 ,  B05D2518/10 ,  B05D2530/00 ,  C08L83/04

Abstract: The present invention provides an automated continuous coating apparatus for coating industrial components such as porcelain, glass, and polymeric insulators. The apparatus consists of a several stage continuous inline operation. The stages are a cleaning operation, followed by drying and heating, coating, and curing.

Abstract translation: 本发明提供一种用于涂覆诸如瓷，玻璃和聚合物绝缘体的工业组分的自动连续涂布装置。 该装置由几段连续的在线操作组成。 这些阶段是清洁操作，然后干燥和加热，涂覆和固化。

公开(公告)号：US20060292298A1

公开(公告)日：2006-12-28

申请号：US11512127

申请日：2006-08-30

Applicant: Kazuhiro Takeshita ,  Shinji Nagashima ,  Makoto Muramatsu ,  Yoji Mizutani ,  Kazutoshi Yano ,  Kyoshige Katayama

Inventor： Kazuhiro Takeshita ,  Shinji Nagashima ,  Makoto Muramatsu ,  Yoji Mizutani ,  Kazutoshi Yano ,  Kyoshige Katayama

IPC: B05D1/12 ,  B05D3/00 ,  B05C11/02

CPC classification number: H01L21/6708 ,  B05D1/005 ,  B05D3/0486 ,  B05D3/107 ,  H01L21/6715 ,  Y10S134/902

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

公开(公告)号：US07032324B2

公开(公告)日：2006-04-25

申请号：US10810069

申请日：2004-03-26

Applicant: William Blake Kolb ,  Gary L. Huelsman

Inventor： William Blake Kolb ,  Gary L. Huelsman

IPC: F26B13/00

CPC classification number: B05D3/0486 ,  B05C5/0254 ,  B05C9/06 ,  B05C9/10 ,  B05C9/12 ,  B05C9/14 ,  B05C11/115 ,  B05C15/00 ,  F26B13/005 ,  F26B13/10 ,  F26B25/006 ,  G03C1/74 ,  G11B5/842

Abstract: A web coating process and apparatus employing a coating applicator, dryer or curing station and web-handling equipment for conveying the web past the coating applicator and through the dryer. The web is enclosed from at least the coating applicator to the dryer or curing station in a close-coupled enclosure or series of close-coupled enclosures supplied with one or more streams of conditioned gas flowing at a rate sufficient to reduce materially the particle count or change materially a physical property of interest in a close-coupled enclosure.

Abstract translation: 一种幅材涂布方法和装置，其使用涂布施加器，干燥器或固化站以及用于将纸幅传送通过涂布器并通过干燥器的卷筒纸处理设备。 纤维网从至少涂层施用器封闭到紧密耦合的外壳或一系列紧密耦合的外壳中的干燥器或固化站，该外壳或一系列紧密耦合的外壳提供有一个或多个调节气体流，其流速足以实质地减少粒子数，或 在一个紧密耦合的外壳中实质上改变了一个感兴趣的物理属性。

公开(公告)号：US07030039B2

公开(公告)日：2006-04-18

申请号：US09895787

申请日：2001-06-30

Applicant: Emir Gurer ,  Tom Zhong ,  John Lewellen ,  Edward C. Lee ,  Robert P. Mandal ,  James C. Grambow ,  Ted C. Bettes ,  Donald R. Sauer ,  Edmond R. Ward ,  Jung-Hoon Chun ,  Sangjun Han

Inventor： Emir Gurer ,  Tom Zhong ,  John Lewellen ,  Edward C. Lee ,  Robert P. Mandal ,  James C. Grambow ,  Ted C. Bettes ,  Donald R. Sauer ,  Edmond R. Ward ,  Jung-Hoon Chun ,  Sangjun Han

IPC: H01L21/312

CPC classification number: H01L21/6715 ,  B05C5/0208 ,  B05C5/0245 ,  B05C5/0254 ,  B05D1/005 ,  B05D1/265 ,  B05D3/0486 ,  G03F7/162

Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.

公开(公告)号：US07018943B2

公开(公告)日：2006-03-28

申请号：US09895786

申请日：2001-06-30

Applicant: Gurer Emir ,  Tom Zhong ,  John Lewellen ,  Edward C. Lee ,  Robert P. Mandal ,  James C. Grambow ,  Ted C. Bettes ,  Donald R. Sauer ,  Edmond R. Ward

Inventor： Gurer Emir ,  Tom Zhong ,  John Lewellen ,  Edward C. Lee ,  Robert P. Mandal ,  James C. Grambow ,  Ted C. Bettes ,  Donald R. Sauer ,  Edmond R. Ward

IPC: H01L21/31

CPC classification number: H01L21/6715 ,  B05C5/0208 ,  B05C5/0245 ,  B05C5/0254 ,  B05D1/005 ,  B05D1/265 ,  B05D3/0486 ,  G03F7/162

Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.