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    Apparatus and methods for high-resolution electron beam imaging
    153.
    发明授权
    Apparatus and methods for high-resolution electron beam imaging 有权
    用于高分辨率电子束成像的装置和方法

    公开(公告)号：US09053900B2

    公开(公告)日：2015-06-09

    申请号：US13438543

    申请日：2012-04-03

    Applicant: Xinrong Jiang ,  Liqun Han

    Inventor： Xinrong Jiang ,  Liqun Han

    IPC: G21K5/04 ,  H01J37/153 ,  H01J37/05 ,  H01J37/28

    CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/1534

    Abstract: One embodiment relates to an apparatus for high-resolution electron beam imaging. The apparatus includes an energy filter configured to limit an energy spread of the electrons in the incident electron beam. The energy filter may be formed using a stigmatic Wien filter and a filter aperture. Another embodiment relates to a method of forming an incident electron beam for a high-resolution electron beam apparatus. Another embodiment relates to a stigmatic Wien filter that includes curved conductive electrodes. Another embodiment relates to a stigmatic Wien filter that includes a pair of magnetic yokes and a multipole deflector. Other embodiments, aspects and features are also disclosed.

    Abstract translation: 一个实施例涉及用于高分辨率电子束成像的装置。 该装置包括被配置为限制入射电子束中的电子的能量扩散的能量过滤器。 能量滤波器可以使用固定的维恩滤波器和滤波器孔来形成。 另一实施例涉及形成用于高分辨率电子束装置的入射电子束的方法。 另一实施例涉及一种包括弯曲导电电极的标准维恩滤波器。 另一实施例涉及一种包括一对磁轭和多极偏转器的标准维恩滤波器。 还公开了其它实施例，方面和特征。

    DECELERATION APPARATUS FOR RIBBON AND SPOT BEAMS
    154.
    发明申请
    DECELERATION APPARATUS FOR RIBBON AND SPOT BEAMS 有权
    RIBBON和SPOT BEA的减速装置

    公开(公告)号：US20150136967A1

    公开(公告)日：2015-05-21

    申请号：US14605985

    申请日：2015-01-26

    Applicant: Advanced Ion Beam Technology, Inc.

    Inventor： Nicholas WHITE ,  Zhimin WAN ,  Erik COLLART

    IPC: H01J37/05 ,  H01J37/147 ,  H01J37/30 ,  H01J37/317

    CPC classification number: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/151 ,  H01J2237/303 ,  H01J2237/31701

    Abstract: A deceleration apparatus capable of decelerating a short spot beam or a tall ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.

    Abstract translation: 公开了一种减速装置，能够使短点光束或高色带光束减速。 在任一种情况下，都会控制趋向于降低光束轮廓形状的效果。 提供了用于将离子束屏蔽到外部电位的盖子。 其位置和电位可调的电极设置在梁的相对两侧，以确保减速和偏转电场的形状不会显着偏离最佳形状，即使存在显着的空间电荷高 目前低能量的重离子束。

    METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT
    156.
    发明申请
    METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT 审中-公开
    等离子体沉积和处理的方法和系统

    公开(公告)号：US20150021473A1

    公开(公告)日：2015-01-22

    申请号：US14341362

    申请日：2014-07-25

    Applicant: Peter F. Vandermeulen

    Inventor： Peter F. Vandermeulen

    IPC: H01J37/05 ,  H01J37/08 ,  H01J37/32

    CPC classification number: H01J37/32229 ,  C23C16/511 ,  C23C16/513 ,  H01J37/05 ,  H01J37/08 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/3244 ,  H01J37/32669 ,  H01J2237/057 ,  H01J2237/0817 ,  H01J2237/3323 ,  H01P3/12 ,  H01P3/127 ,  H01Q21/0043

    Abstract: An apparatus for separating ions having different mass or charge includes a waveguide conduit coupled to a microwave source for transmitting microwaves through openings in the waveguide conduit. The outlet ends of pipes are positioned at the openings for transporting material from a material source to the openings. A plasma chamber is in communication with the waveguide tube through the openings. The plasma chamber receives through the openings microwaves from the waveguide tube and material from the pipes. The plasma chamber includes magnets disposed in an outer wall thereof for forming a magnetic field in the plasma chamber. The plasma chamber includes a charged cover at a side of the chamber opposite the side containing the openings. The cover includes extraction holes through which ion beams from the plasma chamber are extracted. Deflectors coupled to one of the extraction holes receive the ion beams extracted from the plasma chamber. Each deflector bends an ion beam and provides separate passages for capturing ions following different trajectories from the bending of the ion beam based on their respective mass or charge.

    Abstract translation: 用于分离具有不同质量或电荷的离子的装置包括耦合到微波源的波导导管，用于通过波导管道中的开口传输微波。 管道的出口端位于用于将材料从材料源运输到开口的开口处。 等离子体室通过开口与波导管连通。 等离子体腔室通过开口接收来自波导管的微波和来自管道的材料。 等离子体室包括设置在其外壁中的磁体，用于在等离子体室中形成磁场。 等离子体室包括在室的与包含开口的一侧相对的一侧的带电盖。 盖子包括提取来自等离子体室的离子束的抽吸孔。 与一个提取孔耦合的偏转器接收从等离子体室提取的离子束。 每个偏转器弯曲离子束，并提供单独的通道，用于根据其相应的质量或电荷离开离子束弯曲的不同轨迹之后捕获离子。

    Charged particle ray apparatus and pattern measurement method
    158.
    发明授权
    Charged particle ray apparatus and pattern measurement method 有权
    带电粒子装置和图案测量方法

    公开(公告)号：US08890068B2

    公开(公告)日：2014-11-18

    申请号：US14002275

    申请日：2012-01-27

    Applicant: Yuji Kasai ,  Makoto Suzuki ,  Hiroshi Makino

    Inventor： Yuji Kasai ,  Makoto Suzuki ,  Hiroshi Makino

    IPC: H01J37/05 ,  H01J37/244 ,  H01J37/28 ,  G01N23/225 ,  G06T1/00

    CPC classification number: H01J37/05 ,  G01N23/2251 ,  G06T1/00 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/24495

    Abstract: Provided is a technique to automatize a synthesis function of signal charged particles having different energies. A charged particle beam apparatus includes: a charged particle source configured to irradiate a sample with a primary charged particle ray; a first detector configured to detect a first signal electron having first energy from signal charged particles generated from the sample; a second detector configured to detect a second signal electron having second energy from signal charged particles generated from the sample; a first operation part configured to change a synthesis ratio of a signal intensity of the first signal electron and a signal intensity of the second signal electron and to generate a detected image corresponding to each synthesis ratio; a second operation part configured to calculate a ratio of signal intensities corresponding to predetermined two areas of the detected image generated for each synthesis ratio; and a third operation part configured to determine a mixture ratio to be used for acquisition of the detected image on a basis of a change of the ratio of signal intensities.

    Abstract translation: 提供了一种使具有不同能量的信号带电粒子的合成功能自动化的技术。 带电粒子束装置包括：带电粒子源，被配置为用一次带电粒子射线照射样品; 第一检测器，被配置为检测从所述样品产生的信号带电粒子的具有第一能量的第一信号电子; 第二检测器，被配置为检测从样品产生的信号带电粒子的具有第二能量的第二信号电子; 第一操作部，被配置为改变第一信号电子的信号强度和第二信号电子的信号强度的合成比，并且生成与每个合成比相对应的检测图像; 第二操作部，被配置为计算与针对每个合成比生成的检测图像的预定的两个区域相对应的信号强度的比率; 以及第三操作部件，被配置为基于信号强度比的变化来确定用于获取检测到的图像的混合比率。

    Method and structure for controlling magnetic field distributions in an ExB Wien filter
    160.
    发明授权
    Method and structure for controlling magnetic field distributions in an ExB Wien filter 有权
    用于控制ExB Wien滤波器中的磁场分布的方法和结构

    公开(公告)号：US08835866B2

    公开(公告)日：2014-09-16

    申请号：US13111634

    申请日：2011-05-19

    Applicant: James B. McGinn

    Inventor： James B. McGinn

    IPC: H01J1/50 ,  H01J37/05 ,  H01J49/28 ,  H01J37/15

    CPC classification number: H01J37/05 ,  H01J37/15 ,  H01J49/288 ,  H01J2237/057 ,  H01J2237/31749

    Abstract: An ExB Wien mass filter providing a method and structure for mechanically adjusting the magnetic field distributions at the mass filter entrance and exit end caps. The reluctance of the flux return path may be modified by configuring pluralities of magnetic shims within slots at the outer diameters of the entrance and exit end caps, and also by configuring pluralities of magnetic plug shims within circular flux dams surrounding the entrance and exit apertures. Advantages of purely mechanical adjustment for the magnetic fields of the present invention, compared with prior art electromagnet adjustment methods include greater reliability, simplicity, lower cost, and lack of power dissipation. The invention may employ either permanent magnets or electromagnets for generation of the mass-separation magnetic field.

    Abstract translation: 提供了一种用于机械调节质量过滤器入口和出口端盖处的磁场分布的方法和结构的ExB维恩质量过滤器。 可以通过在入口和出口端盖的外径处的槽内配置多个磁性垫片，并且还可以通过在入口和出口孔周围的圆形焊剂坝内配置多个磁性塞子垫片来修改磁通返回路径的磁阻。 与现有技术的电磁调节方法相比，本发明的磁场纯机械调整的优点包括更高的可靠性，简便性，更低的成本和功耗的缺乏。 本发明可以采用永磁体或电磁体来产生质量分离磁场。

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