公开(公告)号：US20130291602A1

公开(公告)日：2013-11-07

申请号：US13868047

申请日：2013-04-22

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Dai INOUE

IPC: C03B37/014

CPC classification number: C03B37/01453 ,  C03B37/01446 ,  C03B2201/12 ,  C03B2201/31 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/31 ,  C03C2203/44 ,  C03C2203/54

Abstract: In an optical fiber preform manufacturing method including: exposing a soot-deposited object to a high temperature of 1000 to 1300° C. in a chlorine-containing atmosphere to dehydrate the soot-deposited object, the soot-deposited object being formed by deposition of silicon dioxide soot; and vitrifying the soot-deposited object into a transparent glass by exposing the soot-deposited object to a high temperature of 1300 to 1600° C. in an atmosphere containing inert gas and fluorine compound gas, but not containing oxygen, the fluorine compound gas does not contain carbon.

Abstract translation: 一种光纤预制棒的制造方法，其特征在于，包括：在含氯气氛中将烟灰沉积物暴露于1000〜1300℃的高温，使所述烟灰沉积物脱水，所述烟灰沉积物通过沉积物 二氧化硅烟灰; 并且将烟灰沉积物通过在含有惰性气体和氟化合物气体但不含氧的气氛中将烟灰沉积物暴露于1300至1600℃的高温下将烟灰沉积物玻璃化，氟化合物气体 不含碳。

公开(公告)号：US20130095255A1

公开(公告)日：2013-04-18

申请号：US13439911

申请日：2012-04-05

Applicant: Raymond Nicholas Vrtis ,  Mark Leonard O'Neill ,  Jean Louise Vincent ,  Aaron Scott Lukas ,  Mary Kathryn Haas

Inventor： Raymond Nicholas Vrtis ,  Mark Leonard O'Neill ,  Jean Louise Vincent ,  Aaron Scott Lukas ,  Mary Kathryn Haas

IPC: B05D1/00

CPC classification number: B05D1/62 ,  C03C3/045 ,  C03C11/00 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/80 ,  C23C16/30 ,  C23C16/401 ,  C23C16/56 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02208 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/02348

Abstract: A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor, wherein the porogen is a C4 to C14 cyclic hydrocarbon compound having a non-branching structure and a degree of unsaturation equal to or less than 2; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the labile organic material to provide the porous film with pores and a dielectric constant less than 2.6.

Abstract translation: 一种用于生产多孔有机硅玻璃膜的化学气相沉积方法，包括：向真空室中引入包含至少一种选自有机硅烷和有机硅氧烷的前体的气态试剂和与前体不同的致孔剂，其中 致孔剂是具有非支化结构和不饱和度等于或小于2的C 4至C 14环烃化合物; 向真空室中的气态试剂施加能量以诱导气态试剂在衬底上沉积初步膜的反应，其中预备膜含有致孔剂; 并从初步膜上去除基本上所有不稳定的有机材料，以提供具有小于2.6的孔隙和介电常数的多孔膜。

公开(公告)号：US08329604B2

公开(公告)日：2012-12-11

申请号：US12351998

申请日：2009-01-12

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/06 ,  C03C3/04

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其假想温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0〜100℃。 含有TiO 2的二氧化硅玻璃的制造方法，其包括在通过玻璃形成材料的火焰水解得到的目标石英玻璃粒子上形成多孔玻璃体的工序，得到含氟多孔玻璃体的工序， 获得含氟玻璃化玻璃体，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：US07998892B2

公开(公告)日：2011-08-16

申请号：US12870156

申请日：2010-08-27

Applicant: Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/06 ,  C03C3/11 ,  C03C3/112

CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ΔT, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.

Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其在高EUV能量光照射时的线性热膨胀系数基本上为零，这适合作为EUVL的曝光工具的光学部件。 本发明涉及卤素含量为100ppm以上的含TiO 2的二氧化硅玻璃， 假想温度为1100℃或更低; 20〜100℃范围内的平均线性热膨胀系数为30ppb /℃以下; 5℃以上的线性热膨胀系数为0±5ppb /℃的温度宽度＆amp; T; T; 以及线性热膨胀系数为0ppb /℃的温度在30〜150℃的范围内。

公开(公告)号：US07964522B2

公开(公告)日：2011-06-21

申请号：US11891984

申请日：2007-08-14

Applicant: Lisa Anne Moore ,  Charlene Marie Smith

Inventor： Lisa Anne Moore ,  Charlene Marie Smith

IPC: C03C3/06 ,  C03C3/112 ,  C03B19/06 ,  C03B15/00 ,  C03B32/00 ,  C03B17/00

CPC classification number: C03B19/1461 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/061 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/40 ,  C03C2201/50 ,  Y02P40/57

Abstract: An F-doped silica glass, a process for making the glass, an optical member comprising the glass, and an optical system comprising such optical member. The glass material comprises 0.1-5000 ppm by weight of fluorine. The glass material according to certain embodiments of the present invention has low polarization-induced birefringence, low LIWFD and low induced absorption at 193 nm.

Abstract translation: F掺杂石英玻璃，制造玻璃的方法，包括玻璃的光学构件和包括这种光学构件的光学系统。 玻璃材料包含0.1-5000ppm重量的氟。 根据本发明的某些实施方案的玻璃材料在193nm处具有低偏振诱发双折射，低LIWFD和低诱导吸收。

公开(公告)号：US07935648B2

公开(公告)日：2011-05-03

申请号：US12133007

申请日：2008-06-04

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: C03C3/06 ,  C03C3/076

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52

Abstract: In the nanoimprint lithography, a titania-doped quartz glass having a CTE of −300 to 300 ppb/° C. between 0° C. and 250° C. and a CTE distribution of up to 100 ppb/° C. at 25° C. is suited for use as nanoimprint molds.

Abstract translation: 在纳米压印光刻中，掺杂二氧化钛的石英玻璃在0℃和250℃之间具有-300至300ppb /℃的CTE，在25℃下的CTE分布高达100ppb /℃ C.适用于纳米压印模具。

公开(公告)号：US20110089612A1

公开(公告)日：2011-04-21

申请号：US12978837

申请日：2010-12-27

Applicant: YOSHIAKI IKUTA ,  Yasutomi Iwahashi ,  Kenji Okamura

Inventor： YOSHIAKI IKUTA ,  Yasutomi Iwahashi ,  Kenji Okamura

IPC: B29C35/08 ,  B29C59/02

CPC classification number: B29C33/38 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42 ,  G03F7/0002

Abstract: An object of the present invention is to provide a TiO2-containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO2-containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35° C. is within ±200 ppb/° C.; a TiO2 concentration is from 4 to 9 wt %; and a TiO2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt %.

Abstract translation: 本发明的目的是提供一种含TiO 2的石英玻璃基板，其用作纳米压印光刻用的模具基底时，可以形成尺寸变化在±10％以内的凹凸图案。 本发明涉及一种含TiO 2的石英玻璃基板，其中15至35℃范围内的热膨胀系数在±200ppb /℃以内。 TiO 2浓度为4〜9重量％。 并且在要形成转印图案的一侧的基板表面中的TiO 2浓度分布在±1重量％以内。

公开(公告)号：US07905932B2

公开(公告)日：2011-03-15

申请号：US11897406

申请日：2007-08-30

Applicant: Tatsuhiro Sato

Inventor： Tatsuhiro Sato

IPC: C03C8/02 ,  C03C8/00 ,  C03C8/14 ,  C03C8/20 ,  C03C6/06

CPC classification number: C03C1/00 ,  C03B19/063 ,  C03B32/005 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2201/36 ,  C03C3/06 ,  C03C3/112 ,  C03C4/20 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/36

Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.

Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英粉，或是玻璃状SiO 2粉末的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。

公开(公告)号：US20110026106A1

公开(公告)日：2011-02-03

申请号：US12907622

申请日：2010-10-19

Applicant: Teruno NAKAGUMA ,  Kentaro ICHII ,  Shoji TANIGAWA

Inventor： Teruno NAKAGUMA ,  Kentaro ICHII ,  Shoji TANIGAWA

IPC: H01S3/067 ,  G02B6/036 ,  H01S3/063

CPC classification number: H01S3/06716 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/10 ,  C03C2201/12 ,  C03C2201/14 ,  C03C2201/28 ,  C03C2201/31 ,  C03C2201/3488 ,  C03C2201/36 ,  G02B6/024 ,  G02B6/036 ,  G02B6/03605 ,  G02B6/03633 ,  G02B6/03638 ,  G02B6/03644 ,  G02B6/03661 ,  H01S3/06712 ,  H01S3/06729 ,  H01S3/0675 ,  H01S3/094007 ,  H01S3/1608 ,  H01S3/1618 ,  H01S3/1691 ,  H01S3/1693

Abstract: An ytterbium-doped optical fiber of the present invention includes: a core which contains ytterbium, aluminum, and phosphorus and does not contain germanium; and a cladding which surrounds this core. The ytterbium concentration in the core in terms of ytterbium oxide is 0.09 to 0.68 mole percent. The molar ratio between the phosphorus concentration in the core in terms of diphosphorus pentoxide and the above ytterbium concentration in terms of ytterbium oxide is 3 to 30. The molar ratio between the aluminum concentration in the core in terms of aluminum oxide and the above ytterbium concentration in terms of ytterbium oxide is 3 to 32. The molar ratio between the above aluminum concentration in terms of aluminum oxide and the above phosphorus concentration in terms of diphosphorus pentoxide is 1 to 2.5.

Abstract translation: 本发明的镱掺杂光纤包括：含有镱，铝和磷并且不含锗的芯; 以及围绕该芯的包层。 以镱氧化物计，核心中的镱浓度为0.09〜0.68摩尔％。 以氧化镱表示的核心中的磷浓度与上述镱的氧化镱浓度之间的摩尔比为3〜30。以氧化铝计的核心中的铝浓度与上述镱的浓度 氧化镱的数量为3〜32。以氧化铝计的上述铝浓度与上述磷浓度之间的摩尔比为1〜2.5。

公开(公告)号：US20100261597A1

公开(公告)日：2010-10-14

申请号：US12824923

申请日：2010-06-28

Applicant: Akio KOIKE ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio KOIKE ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/04

CPC classification number: C03B19/1453 ,  C03B19/1461 ,  C03B32/00 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/46 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.

Abstract translation: 本发明提供具有合适的热膨胀性能的TiO 2 -SiO 2玻璃作为EUVL用曝光工具的光学部件。 本发明涉及热膨胀系数为0ppb /℃的温度为23±4℃的温度范围的含TiO 2的二氧化硅玻璃，其温度范围为 的热膨胀为0±5ppb /℃，为5℃以上。