公开(公告)号：US09767985B2

公开(公告)日：2017-09-19

申请号：US14895708

申请日：2014-10-17

Applicant: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

Inventor： Jiang Huang ,  Mingwu Fan ,  Tiaoqin Yu ,  Lige Zhang ,  Chen Zuo ,  Jun Yang ,  Yongqian Xiong ,  Kaifeng Liu ,  Gerald F. Wu ,  Lei Cao

IPC: H01J37/143 ,  H01J3/12 ,  G21K1/093 ,  G21K5/04

CPC classification number: H01J37/143 ,  G21K1/093 ,  G21K5/04 ,  H01J3/12 ,  H01J33/00 ,  H01J37/3178 ,  H01J2237/0835 ,  H01J2237/1405 ,  H01J2237/152

Abstract: Provided is a device for optimizing a diffusion section of an electron beam, comprising two groups of permanent magnets, a magnetic field formed by the four magnetic poles extending the electron beam in a longitudinal direction, and compressing the electron beam in a transverse direction, so that the electron beam becomes an approximate ellipse; another magnetic field formed by the eight magnetic poles optimizing an edge of a dispersed electron-beam bunch into an approximate rectangle; by controlling the four longitudinal connection mechanisms so that the upper magnetic yoke and the lower magnetic yoke of the first group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate ellipse, and the upper magnetic yoke and the lower magnetic yoke of the second group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate rectangle, and the process of longitudinal compression is repeated until a longitudinal size of the electron-beam bunch is reduced to 80 mm. The invention is capable of reasonably compressing a longitudinal size of an electron-beam bunch after diffusion to approximately 80 mm, which ensures optimum irradiation uniformity and efficiency, and enables the longitudinal size to be within the range of a conventional titanium window.

公开(公告)号：US20140212815A1

公开(公告)日：2014-07-31

申请号：US13756178

申请日：2013-01-31

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

IPC: H01J29/60 ,  H01J29/62

CPC classification number: H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

Abstract: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the minor array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

Abstract translation: 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接小阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。

公开(公告)号：US08791423B2

公开(公告)日：2014-07-29

申请号：US13806057

申请日：2011-07-26

Applicant: Yoichi Hirayama

Inventor： Yoichi Hirayama

IPC: H01J37/153 ,  H01J3/12 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/0492 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2802

Abstract: An aberration correction device includes, between a TEM objective lens and an STEM objective lens, a transfer lens group for transferring a coma-free surface of the TEM objective lens to a multipolar lens, a transfer lens group for transferring the coma-free surface of the TEM objective lens to a multipolar lens, and a transfer lens for correcting fifth-order spherical aberration of the STEM objective lens.

Abstract translation: 一种像差校正装置，在TEM物镜和STEM物镜之间包括用于将TEM物镜的无彗形面传递到多极透镜的转印透镜组，用于将无偏转表面转印的转印透镜组 TEM物镜到多极透镜以及用于校正STEM物镜的五阶球面像差的转印透镜。

公开(公告)号：US20130264477A1

公开(公告)日：2013-10-10

申请号：US13849496

申请日：2013-03-23

Applicant: Frederick Wight Martin

Inventor： Frederick Wight Martin

IPC: H01J3/22 ,  H01J37/141

CPC classification number: H01J3/22 ,  H01J3/12 ,  H01J37/141 ,  H01J37/145 ,  H01J37/153 ,  H01J2237/04926 ,  H01J2237/1534 ,  H01J2237/31749

Abstract: An objective lens for use in probe-forming particle-optical columns such as focused ion beam equipment, scanning electron microscopes, and helium microscopes is described. It comprises two interleaved (quadrupole/octopole) lenses and two or three ancillary octopole lenses, and is capable of simultaneous compensation of spherical (Cs) and chromatic (Cc) aberrations of the objective lens alone or of the complete particle-optical column. Additional apparatus comprising a gridded aperture and position-sensitive detector is specified, together with a method to measure and minimize all of the five independent third-order aberration coefficients of the objective lens.

Abstract translation: 描述了用于探针形成颗粒光学柱的物镜，例如聚焦离子束设备，扫描电子显微镜和氦显微镜。 它包括两个交错（四极/八极）透镜和两个或三个辅助八极透镜，并且能够同时补偿单独的物镜或完整的粒子 - 光学柱的球面（Cs）和彩色（Cc）像差。 规定包括网格孔径和位置敏感检测器的附加装置，以及用于测量和最小化物镜的所有五个独立三阶像差系数的方法。

公开(公告)号：US20130112873A1

公开(公告)日：2013-05-09

申请号：US13806057

申请日：2011-07-26

Applicant: Yoichi Hirayama

Inventor： Yoichi Hirayama

IPC: H01J3/12 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/0492 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2802

Abstract: To provide an aberration correction device and a charged particle beam device employing same that are jointly usable with a tunneling electron microscope (TEM) and a scanning tunneling electron microscope (SEM), an aberration correction device (1) comprises, between a TEM objective lens (6a) and an STEM objective lens (6b): a transfer lens group (4, 5), for transferring a coma-free surface (11) of the TEM objective lens (6a) to a multipolar lens (3); a transfer lens group (7, 8) for transferring the coma-free surface of the TEM objective lens to a multipolar lens (2); and a transfer lens (13) for correcting fifth-order spherical aberration of the STEM objective lens (6b).

Abstract translation: 为了提供与隧道电子显微镜（TEM）和扫描隧道电子显微镜（SEM）共同使用的使用其的像差校正装置和带电粒子束装置，像差校正装置（1）包括在TEM物镜 （6a）和STEM物镜（6b）：用于将TEM物镜（6a）的无消耗表面（11）传送到多极透镜（3）的转印透镜组（4,5）; 用于将TEM物镜的无彗形面传递到多极透镜（2）的转印透镜组（7,8）; 以及用于校正STEM物镜（6b）的五阶球面像差的转印透镜（13）。

公开(公告)号：US20100079053A1

公开(公告)日：2010-04-01

申请号：US12239541

申请日：2008-09-26

Applicant: Gregory C. ANDREWS ,  Scott M. CLARK

Inventor： Gregory C. ANDREWS ,  Scott M. CLARK

IPC: H01J1/02

CPC classification number: H01J3/12 ,  H01J3/027 ,  H01J35/06 ,  H01J2235/068

Abstract: A cathode shield comprising a shield body and tabs for defining a focal spot length. The tabs can be integral with the shield body and spaced a distance apart from each other. The tabs can at least partially define the focal spot length of an electron source associated with a cathode shield. The cathode shield can further comprise means for positioning the cathode shield relative to a component in a cathode assembly.

Abstract translation: 一种阴极屏蔽，其包括屏蔽体和用于限定焦斑长度的突片。 翼片可以与屏蔽体成一体并且彼此隔开一段距离。 突片可以至少部分地限定与阴极屏蔽相关联的电子源的焦点长度。 阴极屏蔽件还可以包括用于将阴极屏蔽件相对于阴极组件中的部件定位的装置。

公开(公告)号：US5336891A

公开(公告)日：1994-08-09

申请号：US899433

申请日：1992-06-16

Applicant: Albert V. Crewe

Inventor： Albert V. Crewe

IPC: H01J3/12 ,  H01J37/153 ,  H01J37/10

CPC classification number: H01J3/12 ,  H01J37/153

Abstract: A system for reducing aberration effects in a charged particle beam. The system includes a source of charged particles, such as electrons or ions, and various building blocks for operating on the charged particle beam to generate a desired particle beam pattern. These building blocks can include at least one of a uniform magnetic field component and a uniform electrostatic field component arrangeable in different combinations, enabling coefficients of spherical and chromatic aberration to be canceled out thereby providing a charged particle beam having greatly diminished aberration.

Abstract translation: 一种用于减少带电粒子束中的像差效应的系统。 该系统包括带电粒子的源，例如电子或离子，以及用于在带电粒子束上操作以产生期望的粒子束图案的各种构建块。 这些构造块可以包括均匀的磁场分量和可以以不同组合布置的均匀静电场分量中的至少一个，从而能够抵消球面和色差的系数，从而提供具有大大减小的像差的带电粒子束。

公开(公告)号：US09653256B2

公开(公告)日：2017-05-16

申请号：US15035265

申请日：2014-11-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira Ikegami ,  Hideto Dohi ,  Hideyuki Kazumi ,  Yoichi Ose ,  Naomasa Suzuki ,  Momoyo Enyama ,  Ryuji Nishi ,  Akio Takaoka

IPC: H01J3/26 ,  H01J37/28 ,  H01J37/147 ,  H01J37/153 ,  H01J3/12 ,  H01J37/14

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/15 ,  H01J2237/2611 ,  H01J2237/2814

Abstract: Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.

公开(公告)号：US20160189914A1

公开(公告)日：2016-06-30

申请号：US14895708

申请日：2014-10-17

Applicant: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

Inventor： Jiang HUANG ,  Mingwu FAN ,  Tiaoqin YU ,  Lige ZHANG ,  Chen ZUO ,  Jun YANG ,  Yongqian XIONG ,  Kaifeng LIU ,  Gerald F. WU ,  Lei CAO

IPC: H01J37/143

CPC classification number: H01J37/143 ,  G21K1/093 ,  G21K5/04 ,  H01J3/12 ,  H01J33/00 ,  H01J37/3178 ,  H01J2237/0835 ,  H01J2237/1405 ,  H01J2237/152

Abstract: Provided is a device for optimizing a diffusion section of an electron beam, comprising two groups of permanent magnets, a magnetic field formed by the four magnetic poles extending the electron beam in a longitudinal direction, and compressing the electron beam in a transverse direction, so that the electron beam becomes an approximate ellipse; another magnetic field formed by the eight magnetic poles optimizing an edge of a dispersed electron-beam bunch into an approximate rectangle; by controlling the four longitudinal connection mechanisms so that the upper magnetic yoke and the lower magnetic yoke of the first group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate ellipse, and the upper magnetic yoke and the lower magnetic yoke of the second group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate rectangle, and the process of longitudinal compression is repeated until a longitudinal size of the electron-beam bunch is reduced to 80 mm. The invention is capable of reasonably compressing a longitudinal size of an electron-beam bunch after diffusion to approximately 80 mm, which ensures optimum irradiation uniformity and efficiency, and enables the longitudinal size to be within the range of a conventional titanium window,

Abstract translation: 本发明提供一种用于优化电子束的扩散部分的装置，包括两组永久磁体，由四个磁极形成的磁场，该四个磁极沿纵向方向延伸电子束，并且沿横向压缩电子束，因此 电子束变成近似椭圆; 由八个磁极形成的另一个磁场将分散的电子束束的边缘优化成近似矩形; 通过控制四个纵向连接机构，使得第一组永磁体的上磁轭和下磁轭同步向其中心移动，从而纵向压缩近似椭圆形的电子束，并且上磁轭 并且第二组永磁体的下磁轭朝向其中心同步移动，从而纵向压缩大致矩形的电子束，并且重复纵向压缩的过程，直到电子束束的纵向尺寸 减至80毫米。 本发明能够将扩散后的电子束束的纵向尺寸合理地压缩至大约80mm，这确保了最佳的照射均匀性和效率，并且使纵向尺寸在常规的钛合金窗口的范围内，

公开(公告)号：US09202662B2

公开(公告)日：2015-12-01

申请号：US13756178

申请日：2013-01-31

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

IPC: G21K5/04 ,  H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

Abstract: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the mirror array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

Abstract translation: 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接镜阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。