公开(公告)号：US20190285472A1

公开(公告)日：2019-09-19

申请号：US16348728

申请日：2017-09-08

Applicant: Korea Institute of Ocean Science & Technology

Inventor： Sang Woo OH ,  Moon Jin LEE

IPC: G01J3/10 ,  G01J3/02 ,  G01J3/443

Abstract: The present invention relates to an optical analysis device using a multi-light source structure, which allows acquisition of an optimized measurement result by adjusting the number of light sources depending on a concentration of an object to be measured, such as ocean spilled oil, etc., and a method therefor. The optical analysis device using a multi-light source structure may comprise: a multi-light source unit including multiple light source units each having a light source which is selectively illuminated, in order to adjust an amount of light depending on a concentration of an object to be measured; a cuvette unit including a cuvette in which an object to be measured is disposed, wherein the cuvette has a prism shape and has as many faces as the number of the light source units plus one, the light source units faces the faces, respectively, and reactive light generated from the object to be measured is emitted through the remaining one face; a light sensor unit for detecting the reactive light emitted through the cuvette; and a control unit for controlling illumination of the light source units configuring the multi-light source unit.

公开(公告)号：US10393587B1

公开(公告)日：2019-08-27

申请号：US15201494

申请日：2016-07-03

Applicant: Applied Spectra, Inc.

Inventor： Jong Hyun Yoo ,  Randolph S. Tribe ,  Chunyi Liu

IPC: G01J3/30 ,  G01J3/443 ,  G01N21/71 ,  G01J3/10 ,  H01J49/04 ,  B23K26/03 ,  B23K26/04 ,  B23K26/08

Abstract: Methods for laser induced ablation spectroscopy are disclosed. A sample site position sensor, and stage position motors can move the stage in three independent spatial coordinate directions, and a stage position control circuit is used to move an analysis sample site to selected coordinate positions for laser ablation. Light emitted from a plasma plume produced with laser ablation can be gathered into a lightguide fiber bundle that is subdivided into branches. One branch can convey a first portion of the light to a broadband spectrometer operable to analyze a relatively wide spectral segment, and a different branch can convey a second portion of the light to a high dispersion spectrometer operable to measure minor concentrations and/or trace elements. Emissions from a plasma plume can be simultaneously analyzed in various ways using a plurality of spectrometers having distinct and/or complementary capabilities.

公开(公告)号：US20190246908A1

公开(公告)日：2019-08-15

申请号：US16101928

申请日：2018-08-13

Applicant: Speclipse, Inc.

Inventor： Sung Hyun PYUN ,  Wanki MIN

IPC: A61B5/00 ,  G01J3/443 ,  G01J3/02 ,  G01N21/71 ,  G16H50/20

CPC classification number: A61B5/0084 ,  A61B5/0075 ,  A61B5/414 ,  A61B5/444 ,  G01J3/0218 ,  G01J3/443 ,  G01N21/718 ,  G16H50/20

Abstract: According to an embodiment of the present disclosure, there is provided a laser spectroscopy-based independent device, including: a spectrometer configured to measure a spectrum of generated light which is generated by a laser projected onto a sample; and a disease analysis module configured to determine whether there is lesion tissue by applying a lesion tissue detection learning model to a result of non-discrete spectrum measurement, which is measured by the spectrometer, wherein the spectrometer is configured to measure spectra of all generated light that is generated from a time when the laser is projected onto the sample.

公开(公告)号：US10379054B2

公开(公告)日：2019-08-13

申请号：US15555620

申请日：2016-03-02

Applicant: Mecanique Analytique Inc.

Inventor： Yves Gamache

IPC: G01J3/30 ,  G01N21/67 ,  G01N21/01 ,  G01J3/443

Abstract: A plasma-based detector using optical spectroscopic techniques for analyzing the constituents of gas samples are provided. The detector includes a plasma-generating mechanism and a plasma-localizing mechanism. Electron-injecting electrodes may be provided in the plasma chamber of the detector. A Pressure control mechanism as well as a doping module may optionally be included. In accordance with some implementations, the collection, detection and analysis of light extracted from the plasma may enable one or more of various operation modes, such as an emission mode, an absorption mode, and indirect detection mode or a constant emission mode.

公开(公告)号：US20190221407A1

公开(公告)日：2019-07-18

申请号：US16123208

申请日：2018-09-06

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shota UMEDA ,  Keita NOGI ,  Akira KAGOSHIMA ,  Daisuke SHIRAISHI

IPC: H01J37/32 ,  G01J3/443 ,  H01L21/67

CPC classification number: H01J37/32926 ,  G01J3/443 ,  H01J37/32972 ,  H01L21/67253

Abstract: Provided is a plasma processing apparatus including a processing unit in which a sample is plasma processed and which includes a monitor (optical emission spectroscopy) that monitors light emission of plasma, wherein the processing unit includes a prediction model storage unit that stores a prediction model predicting a plasma processing result, and a control device in which the plasma processing result is predicted by using a prediction model selected based on light emission data and device data as an indicator of state change of the processing unit.

公开(公告)号：US10345150B2

公开(公告)日：2019-07-09

申请号：US15497181

申请日：2017-04-25

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Seiji Fujihara ,  Yasuyuki Naito ,  Morio Tomiyama

IPC: G01J3/42 ,  G01J3/433 ,  G01N21/3581 ,  G01J3/443 ,  G01N21/3563 ,  G01N21/35 ,  G01N21/49 ,  G01J3/28

Abstract: A terahertz wave spectrometry system that is capable of identifying analyzing target molecules contained in an analyte even if the analyte contains water, by activating a water remover to remove water according a comparison of absorption spectrums so that water in the analyte is easily removed without causing the analyzing target molecules to disappear due to decomposition or denaturation.

公开(公告)号：US20190206663A1

公开(公告)日：2019-07-04

申请号：US16234935

申请日：2018-12-28

Applicant: Elemental Scientific, Inc.

Inventor： Daniel R. Wiederin ,  Kyle W. Uhlmeyer ,  Michael P. Field ,  Jae Seok Lee

IPC: H01J49/00 ,  G01J3/443 ,  H01J49/10

CPC classification number: H01J49/0009 ,  G01J3/443 ,  G01J2003/2866 ,  H01J49/0031 ,  H01J49/105 ,  H01J49/26

Abstract: Systems and methods are described for calibrating an analytical instrument analyzing a plurality of sample matrices in series. A system embodiment can include, but is not limited to, a sample analysis device configured to receive a plurality of samples from a plurality of remote sampling systems and to determine an intensity of one or more species of interest contained in each of the plurality of samples; and a controller configured to generate a primary calibration curve based on analysis of a first standard solution having a first sample matrix by the sample analysis device and generate at least one secondary calibration curve based on analysis of a second standard solution having a second sample matrix by the sample analysis device, the controller configured to associate the at least one secondary calibration curve with the primary calibration curve according to a matrix correction factor.

公开(公告)号：US20190094072A1

公开(公告)日：2019-03-28

申请号：US15867981

申请日：2018-01-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sang-gil PARK ,  Byeong-hwan JEON ,  Tae-heung AHN

IPC: G01J3/18 ,  G01J3/443 ,  G01J3/36

Abstract: Provided are an atomic emission spectrometer (AES), which may be downscaled with high detection intensity, a semiconductor manufacturing facility including the AES, and a method of manufacturing a semiconductor device using the AES. The AES includes: at least one laser generator configured to generate laser beams; a chamber including an elliptical or spherical mirror disposed inside the chamber and configured to reflect the laser beams transmitted into the chamber so that the laser beams are condensed and irradiated on an analyte contained in the chamber to generate plasma and emit plasma light; a supplier connected to the chamber to supply the analyte into the chamber; and a spectrometer configured to receive and analyze the plasma light, and obtain data regarding the plasma light to detect elements in the analyte.

公开(公告)号：US10222262B2

公开(公告)日：2019-03-05

申请号：US15692339

申请日：2017-08-31

Applicant: University of Virginia Patent Foundation

Inventor： Brooks Hart Pate ,  Justin L. Neill

IPC: G01J3/44 ,  G01J3/443 ,  G01J3/28 ,  G01J3/433 ,  G01J3/453 ,  G01N21/35 ,  G01N21/3586

Abstract: An emission can be obtained from a sample in response to excitation using a specified range of excitation frequencies. Such excitation can include generating a specified chirped waveform and a specified downconversion local oscillator (LO) frequency using a digital-to-analog converter (DAC), upconverting the chirped waveform via mixing the chirped waveform with a specified upconversion LO frequency, frequency multiplying the upconverted chirped waveform to provide a chirped excitation signal for exciting the sample, receiving an emission from sample, the emission elicited at least in part by the chirped excitation signal, and downconverting the received emission via mixing the received emission with a signal based on the specified downconversion LO signal to provide a downconverted emission signal within the bandwidth of an analog-to-digital converter (ADC). The specified chirped waveform can include a first chirped waveform during a first duration, and a second chirped waveform during a second duration.

公开(公告)号：US10215704B2

公开(公告)日：2019-02-26

申请号：US15448069

申请日：2017-03-02

Applicant: Tokyo Electron Limited

Inventor： Taejoon Han ,  Daniel Morvay ,  Mirko Vukovic

IPC: G01J3/30 ,  G01N21/73 ,  H01J37/32 ,  G06T11/00 ,  G01J3/443 ,  H01L21/3065 ,  H01L21/67 ,  G01N21/68 ,  G01N21/17

Abstract: Described herein are technologies to facilitate computed tomographic techniques to help identifying chemical species during plasma processing of a substrate (e.g., semiconductor wafer) using optical emission spectroscopy (OES). More particularly, the technology described herein uses topographic techniques to spatially resolves emissions and absorptions in at least two-dimension space above the substrate during the plasma processing (e.g., etching) of the substrate. With some implementations utilize optical detectors positioned along multiple axes (e.g., two or more) to receive incident incoming optical spectra from the plasma chamber during the plasma processing (e.g., etching) of the substrate. Because of the multi-axes arrangement, the incident incoming optical spectra form an intersecting grid.