公开(公告)号：US20110204490A1

公开(公告)日：2011-08-25

申请号：US13048612

申请日：2011-03-15

Applicant: Tsuyoshi SATO ,  Hiroyasu Kondo ,  Naoaki Sakurai ,  Katsuyuki Soeda ,  Kenichi Ooshiro ,  Shuichi Kimura

Inventor： Tsuyoshi SATO ,  Hiroyasu Kondo ,  Naoaki Sakurai ,  Katsuyuki Soeda ,  Kenichi Ooshiro ,  Shuichi Kimura

IPC: H01L29/02 ,  B05C11/00 ,  H01L21/31

CPC classification number: H01L21/6715 ,  B05D1/005 ,  B05D3/0486 ,  G03F7/162 ,  H01L21/67253

Abstract: According one embodiment, a film forming apparatus includes a stage, a coating section, a vapor supply section, a blower section, and a controller. On the stage, an coating target is placed. The coating section applies a material to a predetermined region on the coating target placed on the stage to form a coating film. The vapor supply section generates solvent vapor capable of dissolving the coating film. The blower section blows the solvent vapor generated by the vapor supply section onto the coating film on the coating target placed on the stage. The controller controls an amount of the solvent vapor to be blown by the blower section so that: the coating film is dissolved; viscosity in a part of the coating film on a surface layer side is lower than that in a part thereof on the coating target side; and the viscosity in the part on the surface layer side and the viscosity of the coating target side take such values that prevent the coating film on the coating target from spreading.

Abstract translation: 根据一个实施例，一种成膜装置包括载物台，涂布部分，蒸气供应部分，鼓风机部分和控制器。 在舞台上放置涂层目标。 涂布部分将材料施加到放置在载物台上的涂布靶上的预定区域，形成涂膜。 蒸气供给部产生能够溶解涂膜的溶剂蒸气。 鼓风机部分将由蒸汽供应部分产生的溶剂蒸气吹到放置在载物台上的涂覆靶上的涂膜上。 控制器控制由鼓风机部分吹送的溶剂蒸气的量，使得涂膜溶解; 表面层侧的一部分涂膜的粘度比涂布目标侧的一部分的粘度低; 并且表面层侧的部分中的粘度和涂布目标侧的粘度取得防止涂布靶上的涂膜扩散的值。

公开(公告)号：US20100285262A1

公开(公告)日：2010-11-11

申请号：US12665555

申请日：2008-06-11

Applicant: Kazuaki IKEDA ,  Nobutaka MATSUSHITA ,  Yoshimasa SUZUKI

Inventor： Kazuaki IKEDA ,  Nobutaka MATSUSHITA ,  Yoshimasa SUZUKI

IPC: B32B15/085 ,  C08L27/12 ,  B32B3/02 ,  C08F2/46 ,  C08L27/18 ,  B29C35/00

CPC classification number: B23P13/00 ,  A47J36/02 ,  A47J36/025 ,  B05D3/0486 ,  B05D3/068 ,  B05D5/083 ,  B05D2701/10 ,  B29C71/04 ,  B32B1/00 ,  B32B15/08 ,  B32B15/18 ,  B32B15/20 ,  B32B27/08 ,  B32B27/281 ,  B32B27/30 ,  B32B27/304 ,  B32B27/322 ,  B32B27/34 ,  B32B2307/306 ,  B32B2307/554 ,  B32B2307/714 ,  B32B2413/00 ,  B32B2439/00 ,  B32B2509/00 ,  C09D127/18 ,  C09D129/10 ,  G03G15/0233 ,  G03G15/0808 ,  G03G2215/16 ,  G03G2215/2048 ,  Y10T428/21 ,  Y10T428/265 ,  Y10T428/3154

Abstract: [Object] There are provided a fluorocarbon resin composite having improved abrasion resistance while nonadhesiveness, which is a feature of a fluorocarbon resin, is maintained, cookware, and a roller and a belt for use in office automation equipment.[Solving Means] A fluorocarbon resin composite includes a fluorocarbon resin layer on a base, in which a fluorocarbon resin constituting the fluorocarbon resin layer is crosslinked by electron beam irradiation, and the base has a desired shape obtained by machining. The fluorocarbon resin is composed of a tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer, polytetrafluoroethylene, or a mixture of the tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer and polytetrafluoroethylene. A fluorocarbon resin composite, cookware, and a roller and a belt for use in office automation equipment are each produced by applying an uncrosslinked fluorocarbon resin on a base, subjecting the fluorocarbon resin to electron beam irradiation in a low-oxygen atmosphere to crosslink the fluorocarbon resin while the temperature of the fluorocarbon resin is maintained at a temperature equal to or higher than the melting point of the fluorocarbon resin, and machining the base into a desired shape. There is also provided methods for producing them.

Abstract translation: 提供了一种氟树脂复合材料，其具有改善的耐磨性，而不粘附性，这是维持氟碳树脂的特征，炊具，以及用于办公自动化设备的辊和带。 [解决方案]氟碳树脂复合材料包括基底上的碳氟树脂层，其中构成氟碳树脂层的氟烃树脂通过电子束照射而交联，并且基底具有通过机加工获得的期望形状。 氟碳树脂由四氟乙烯 - 全氟（烷基乙烯基醚）共聚物，聚四氟乙烯或四氟乙烯 - 全氟（烷基乙烯基醚）共聚物和聚四氟乙烯的混合物组成。 通过在基底上涂布未交联的氟碳树脂，在低氧气氛中对氟碳树脂进行电子束照射，将碳氟化合物，炊具以及用于办公室自动化设备的辊和带 树脂，同时氟碳树脂的温度保持在等于或高于氟碳树脂的熔点的温度，并将基底加工成所需的形状。 还提供了生产它们的方法。

公开(公告)号：US07829148B2

公开(公告)日：2010-11-09

申请号：US11669748

申请日：2007-01-31

Applicant: Jian-Xin Li ,  Brian A. C. Carlin

Inventor： Jian-Xin Li ,  Brian A. C. Carlin

IPC: B05D3/02

CPC classification number: B05D3/0486 ,  A61K9/2813 ,  A61K9/282 ,  A61K9/284 ,  A61K9/2846 ,  A61K9/2866 ,  A61K9/2893 ,  A61K9/5026 ,  A61K9/5042 ,  A61K9/5047 ,  A61K9/5089 ,  B01J2/006 ,  B01J2/30 ,  B05D3/0254 ,  B05D2401/20

Abstract: An aqueous polymer coating composition containing at least one latex or pseudolatex is coated on a substrate in a high humidity coating process followed by heat treatment of the coated substrate above the film forming temperature of the coating at low humidity. The coated substrate gives a stable reproducible dissolution profile substantially insensitive to temperature or humidity conditions upon storage. The high humidity coating process is achieved by addition of water to the coating chamber through dilution of the coating formulation or humidification of inlet air. Contrary to the conventional low humidity coating process, residual water is retained in the coating layer of the coated substrates in the coating step. When the coated substrates are heat treated at a temperature greater than the minimum film forming temperature, the residual water in the coating layer will ensure adequate capillary force for the completion of film coalescence. High humidity heat treatment is not needed.

Abstract translation: 含有至少一种乳胶或假胶体的含水聚合物涂料组合物在高湿度涂覆过程中涂覆在基材上，随后将涂覆的基材在低湿度下在涂层的成膜温度之上进行热处理。 涂覆的基材在储存时提供基本上对温度或湿度条件不敏感的稳定的可再现溶出曲线。 高湿度涂覆方法是通过稀释涂料配方或加入入口空气将水添加到涂层室来实现的。 与传统的低湿度涂覆方法相反，在涂布步骤中残留的水保留在涂覆的基材的涂层中。 当涂覆的基材在大于最低成膜温度的温度下进行热处理时，涂层中的残留水将确保用于完成膜聚结的足够的毛细作用力。 不需要高湿度热处理。

公开(公告)号：US07763310B2

公开(公告)日：2010-07-27

申请号：US12352150

申请日：2009-01-12

Applicant: Juan Schneider

Inventor： Juan Schneider

IPC: B05D5/00

CPC classification number: B05D1/20 ,  B05D3/0486 ,  B82Y30/00

Abstract: A method and apparatus for controlling the thickness of a thin film or thin layer of discrete particles or of a heterogeneous mixture characterized in that the interfacial tension forces between the solution or suspension and its environment are used as the driving forces to evenly spread the solution, suspension or mixture while the solvent evaporates and/or dilutes.

Abstract translation: 用于控制离散颗粒或不均匀混合物的薄膜或薄层的厚度的方法和装置，其特征在于，所述溶液或悬浮液与其环境之间的界面张力用作均匀分散溶液的驱动力， 悬浮液或混合物，同时溶剂蒸发和/或稀释。

公开(公告)号：US20100062176A1

公开(公告)日：2010-03-11

申请号：US12283114

申请日：2008-09-09

Applicant: Xin Dai ,  Richard Ellwanger ,  Angelo Yializis

Inventor： Xin Dai ,  Richard Ellwanger ,  Angelo Yializis

IPC: B05D3/14 ,  B05C9/08

CPC classification number: B29C59/14 ,  B05D3/0486 ,  B05D3/144 ,  B29C2059/145 ,  B41M5/0011 ,  H05H1/48 ,  H05H2001/485

Abstract: The boundary layer of a substrate is exposed to a low-energy inert-gas atmospheric plasma that disrupts the layer's bonds, thereby permitting the removal of most oxygen from the surface of the substrate. The substrate is then passed through an exhaust section to remove the disrupted boundary layer prior to conventional plasma treatment. The subsequent plasma treatment is carried out in conventional manner in a substantially oxygen-free environment. As a result of the invention, the high surface-energy levels provided by plasma treatment are more lasting and plasma applications requiring a substantially oxygen-free environment are more efficient.

Abstract translation: 衬底的边界层暴露于破坏层的键的低能惰性气体大气等离子体，从而允许从衬底的表面去除大部分氧。 然后在常规等离子体处理之前，将衬底通过排气部分以去除破裂的边界层。 随后的等离子体处理在常规方式中在基本上无氧的环境中进行。 作为本发明的结果，通过等离子体处理提供的高表面能级更持久，并且需要基本上无氧环境的等离子体应用更有效。

公开(公告)号：US20100062174A1

公开(公告)日：2010-03-11

申请号：US12585032

申请日：2009-09-01

Applicant: Kazuhiro Shiojiri ,  Kazuhiro Oki

Inventor： Kazuhiro Shiojiri ,  Kazuhiro Oki

IPC: C08F2/48

CPC classification number: C08F2/48 ,  B05D3/0486 ,  B05D3/067 ,  B05D5/061 ,  G02B5/02

Abstract: A method for producing with high productivity a resin structure which can be used in an optical control film is provided. The method for producing a resin structure includes: applying with a coating applicator, a coating liquid in which at least one polyfunctional monomer or polyfunctional oligomer and a polymerization initiator are dissolved to a traveling support; and irradiating the coating liquid with ultraviolet rays, with an ultraviolet irradiation apparatus, to cure the coating liquid by polymerization to form a columnar structure.

Abstract translation: 提供了可以用于光学控制膜的树脂结构体的高生产率的制造方法。 树脂结构体的制造方法包括：向涂布用涂布器涂布至少一种多官能单体或多官能低聚物和聚合引发剂溶解于行进支撑体的涂布液; 用紫外线照射装置用紫外线照射涂布液，通过聚合固化涂布液，形成柱状结构。

公开(公告)号：US20090074947A1

公开(公告)日：2009-03-19

申请号：US11719136

申请日：2005-11-18

Applicant: Tohru Takeuchi

Inventor： Tohru Takeuchi

IPC: C23C16/52

CPC classification number: B05D1/02 ,  B05B12/082 ,  B05B12/084 ,  B05D3/0486

Abstract: The present invention provides a method for forming coated films and equipment for forming coating films which can effectively form coated films having substantially the same qualities as those formed under coating conditions in an actual coating operation, and a method for effectively reproduce color-toning coating materials having a desired color-toning.The method for forming a coated film, which aims to reproduce finished qualities of a coated film to be obtained in an actual coating operation by spraying a coating material onto an object to be coated, includes: an air conditioning step of controlling the temperature and humidity in a coating booth (22) in accordance with the spraybooth conditions in the actual coating operation; and a coating step of forming a coated film on an object to be coated in the coating booth (22) using an atomizer (30) for spraying a coating material; the coating step comprising: a coating condition determination step of controlling particle diameter, concentration and velocity of the atomized particles in a spray pattern of a coating material sprayed from the coating material atomizer (30) in accordance with those in the actual coating operation; and a coated film formation step of controlling the relative movement of the coating material atomizer (30) and the object to be coated (50) based on a coated film formation profile determined by the relation between changes in the coated film formation time in the actual coating operation and the resulting coated film thickness.

Abstract translation: 本发明提供一种形成涂膜的方法和用于形成涂膜的设备，其能够有效地形成具有与在实际涂布操作中的涂布条件下形成的质量基本相同的质量的涂膜，以及用于有效再现色调涂料的方法 具有所需的色调。 为了在实际的涂布操作中通过将涂布材料喷涂到待涂覆物体上而获得的涂膜的成品质量的形成方法包括：控制温度和湿度的空调步骤 根据实际涂装操作中的喷雾条件在涂装室（22）中; 以及使用用于喷涂涂料的雾化器（30）在被涂物体（22）上形成涂膜的涂布步骤; 所述涂布步骤包括：涂覆条件确定步骤，根据实际涂布操作中的那些，从涂料喷雾器（30）喷射的涂料喷射图案中控制雾化颗粒的粒径，浓度和速度; 以及涂膜形成步骤，其基于由实际的涂膜形成时间的变化之间的关系确定的涂膜形成轮廓来控制涂料原料雾化器（30）和被涂物（50）的相对运动 涂覆操作和所得涂膜厚度。

公开(公告)号：US20090004401A1

公开(公告)日：2009-01-01

申请号：US11909044

申请日：2006-03-15

Applicant: Kazuhiko Nojo ,  Shuichi Endo ,  Daisuke Sano

Inventor： Kazuhiko Nojo ,  Shuichi Endo ,  Daisuke Sano

IPC: B05D3/06 ,  C08F2/48 ,  B05C9/12

CPC classification number: B05C9/14 ,  B05D3/0486 ,  B05D3/067 ,  B05D3/12 ,  B05D2252/02

Abstract: According to the method and the apparatus for curing a coated film of the present invention, since an ionization radiation is applied after the O2 concentration in the near-surface layer within 1 mm above the surface of the coated film is adjusted to 1000 ppm or lower, the coated film can be sufficiently cured by irradiation of the ionization radiation. In other words, according to the method and the apparatus for curing a coated film of the present invention, since the O2 concentration in a thin near-surface layer on the surface of a coated film is decreased, the coated film can be sufficiently cured by irradiation of an ionization radiation. As a result, the amount of inert gas supplied upon irradiation of an ionization radiation can be reduced, and downsizing and cost reduction of equipment can be achieved.

Abstract translation: 根据本发明的涂膜固化方法和固化装置，由于在涂膜表面以上1mm以内的近表面层中的O2浓度调整为1000ppm以上，因此施加电离辐射 ，通过电离辐射的照射可以充分固化涂膜。 换句话说，根据本发明的涂膜固化方法和装置，由于涂膜表面的薄的近表面层中的O 2浓度降低，所以涂膜可以通过 照射电离辐射。 结果，可以减少在照射电离辐射时供应的惰性气体的量，并且可以实现设备的小型化和成本降低。

公开(公告)号：US20090000543A1

公开(公告)日：2009-01-01

申请号：US12163951

申请日：2008-06-27

Applicant: Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

Inventor： Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC: B05C11/00 ,  B05C13/00

CPC classification number: H01L21/67178 ,  B05B14/43 ,  B05B14/44 ,  B05C13/00 ,  B05C13/02 ,  B05D3/0486 ,  G03F7/26 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225 ,  H01L23/34 ,  H01L2924/0002 ,  Y10S414/135 ,  H01L2924/00

Abstract: A substrate treating apparatus includes a plurality of substrate treatment lines arranged vertically. Each substrate treatment line has a plurality of main transport mechanisms arranged horizontally, and a plurality of treating units provided for each main transport mechanism for treating substrates. A series of treatments is carried out for the substrates, with each main transport mechanism transporting the substrates to the treating units associated therewith, and transferring the substrates to the other main transport mechanism horizontally adjacent thereto. The substrate treating apparatus realizes increased processing capabilities by treating the substrates in parallel through the substrate treatment lines.

Abstract translation: 基板处理装置包括垂直布置的多个基板处理线。 每个基板处理线具有水平布置的多个主传送机构，以及为每个用于处理基板的主传送机构设置的多个处理单元。 对于基板进行一系列处理，每个主传送机构将基板传送到与其相关联的处理单元，并将基板传送到与其水平相邻的另一主传送机构。 基板处理装置通过基板处理线平行地处理基板来实现增加的处理能力。

公开(公告)号：US20080311309A1

公开(公告)日：2008-12-18

申请号：US11629195

申请日：2005-06-17

Applicant: Andreas Daiss ,  Erich Beck ,  Manfred Biehler

Inventor： Andreas Daiss ,  Erich Beck ,  Manfred Biehler

IPC: B05D3/06 ,  B01J19/12

CPC classification number: G21K5/02 ,  B05D3/0254 ,  B05D3/0486 ,  B05D3/066 ,  B05D3/067 ,  B05D3/068

Abstract: The invention relates to an apparatus and a method of producing molding materials and coatings on substrates by curing radiation-curable materials under an inert gas atmosphere by exposure to high-energy radiation.

Abstract translation: 本发明涉及通过暴露于高能量辐射下在惰性气体气氛下固化可辐射固化材料的方法来在基底上生产模塑材料和涂层的装置和方法。