公开(公告)号：US20230384582A1

公开(公告)日：2023-11-30

申请号：US17827413

申请日：2022-05-27

Applicant: Microsoft Technology Licensing, LLC

Inventor： Wenjun LIAO ,  Algird Michael GUDAITIS ,  Ruipeng SUN

IPC: G02B26/08 ,  H03H21/00 ,  B81B7/00

CPC classification number: G02B26/0833 ,  H03H21/0021 ,  B81B7/008 ,  B81B2201/042

Abstract: The configuring of a micromirror to suppress a resonance of the micromirror. As part of the configuring process, the micromirror is subjected to multiple actuation frequencies, and the micromirror response is measured in response to at least some of these actuation frequencies. A resonant frequency of the micromirror is then determined using at least some of the measured mechanical responses. Then, depending on this determined resonant frequency of the micromirror, notch filter parameters are selected. There is more than one possibility for notch filter parameters, where the selected possibility depends on the determined resonant frequency. The notch filter is then configured with the selected notch filter parameters.

公开(公告)号：US11760627B2

公开(公告)日：2023-09-19

申请号：US17343919

申请日：2021-06-10

Applicant: InvenSense, Inc.

Inventor： Roberto Brioschi ,  Benyamin Gholami Bazehhour ,  Milena Vujosevic ,  Kazunori Hayata

IPC: B81B7/00 ,  B81C1/00

CPC classification number: B81B7/0048 ,  B81C1/00325 ,  B81B2201/0235 ,  B81B2201/0242 ,  B81B2201/0257 ,  B81B2201/0264 ,  B81B2201/0271 ,  B81B2201/042 ,  B81B2207/012

Abstract: A microelectromechanical system (MEMS) sensor package includes a laminate that provides physical support and electrical connection to a MEMS sensor. A resin layer is embedded within an opening of the laminate and a MEMS support layer is embedded within the opening by the resin layer. A MEMS structure of the MEMS sensor is located on the upper surface of the MEMS support layer.

公开(公告)号：US20230273424A1

公开(公告)日：2023-08-31

申请号：US17682800

申请日：2022-02-28

Applicant: META PLATFORMS TECHNOLOGIES, LLC

Inventor： Kenneth Alexander Diest ,  Katherine Marie Smyth ,  Daniel Guenther Greif

IPC: G02B26/08 ,  G02B26/10 ,  B81B3/00 ,  B81C1/00

CPC classification number: G02B26/0833 ,  G02B26/101 ,  B81B3/007 ,  B81C1/00658 ,  B81B2201/042

Abstract: An apparatus, system, and method for micro-electro-mechanical system (MEMS) micromirror including a plurality of stiffening structures is described. The MEMS micromirror includes a mirror surface to reflect light, a support platform coupled along a mirror surface, and a plurality of stiffening structures formed from or coupled to the support platform. In some examples, a dimensionality or density of the stiffening structures scale across an area of the support platform in a manner to assist in keeping the mirror surface flat under torsional force.

公开(公告)号：US20230185081A1

公开(公告)日：2023-06-15

申请号：US18163611

申请日：2023-02-02

Applicant: FUJIFILM Corporation

Inventor： Keisuke AOSHIMA

IPC: G02B26/08 ,  G02B26/10 ,  B81B3/00

CPC classification number: G02B26/0858 ,  B81B3/0045 ,  G02B26/101 ,  B81B2201/042 ,  B81B2203/0154

Abstract: A micromirror device includes a first support portion that is connected to the mirror portion on a first axis located in a plane including the reflecting surface of the mirror portion in a stationary state, and that swingably supports the mirror portion around the first axis. The first support portion is composed of a main shaft stretched along the first axis and a plurality of sub-shafts symmetrically disposed on both sides of the main shaft across the first axis and stretched along the first axis, the first support portion has a folded structure having three or more folded portions formed by connecting the plurality of sub-shafts, and in a case where inner curvature radii of the folded portions are denoted by R1, R2, R3, ... , in order from the closest to the first axis, a relationship of 0.73 ≤ Rk+1/Rk ≤ 0.9 (k = 1, 2, ...) is satisfied.

公开(公告)号：US20190241427A1

公开(公告)日：2019-08-08

申请号：US16270374

申请日：2019-02-07

Applicant: The Board of Trustees of the Leland Stanford Junior University

Inventor： Sandra Manosalvas-Kjono ,  Ronald Quan ,  Olav Solgaard

IPC: B81B7/00 ,  B81B7/02 ,  B81B3/00 ,  B81C99/00

CPC classification number: B81B7/008 ,  B81B3/0021 ,  B81B7/02 ,  B81B2201/038 ,  B81B2201/042 ,  B81C99/003

Abstract: Aspects are directed to a MEMS device configurable to receive signals from a first, a second, a third, and a fourth signal source operating at a first, a second, a third, and a fourth frequency, respectively. The MEMS device may be configured to combine the first signal with the second signal generating a first combined signal, and to combine the third signal with the fourth signal generating a second combined signal. The first combined signal may be coupled to the first terminal of the MEMS device while the second combined signal may be coupled to the second terminal of the MEMS device. The first common terminal may be configured to produce an output associated with the second and fourth frequencies. The MEMS device may be further configured to derive from the produced output a signal indicative of nonlinearities or of changes in capacitance related to the MEMS device.

公开(公告)号：US20190235230A1

公开(公告)日：2019-08-01

申请号：US16259017

申请日：2019-01-28

Applicant: The Governors of the University of Alberta

Inventor： Roger ZEMP ,  Zhenhao LI ,  Afshin Kashani ILKHECHI

IPC: G02B26/08 ,  B81B3/00 ,  B81B7/02

CPC classification number: G02B26/0833 ,  B81B3/0083 ,  B81B3/0086 ,  B81B7/02 ,  B81B2201/042 ,  B81B2203/0127 ,  B81B2203/0315 ,  B81B2203/04

Abstract: An optical system has a first electrode, and an optical element suspended above the first electrode. The optical element is flexible and comprises a second electrode. An optical element support rigidly supports an outer perimeter of the optical element above the first electrode. A voltage source applies a potential difference between the first electrode and the second electrode, the potential difference causing the optical element to flex and adjust a focal zone of the optical element. An optical source generates a beam. A lens focuses the beam to a lens focal zone in which the beam has a beam width, the beam at the beam width being incident on the optical element.

公开(公告)号：US20190233276A1

公开(公告)日：2019-08-01

申请号：US16382750

申请日：2019-04-12

Applicant: Infineon Dresden GmbH & Co. KG

Inventor： Sebastian PREGL ,  Uwe RUDOLPH

IPC: B81B3/00 ,  B81C1/00

CPC classification number: B81B3/0051 ,  B81B3/0086 ,  B81B2201/0221 ,  B81B2201/0257 ,  B81B2201/042 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/0315 ,  B81B2203/04 ,  B81B2203/058 ,  B81C1/00166 ,  B81C1/00182 ,  B81C2201/013 ,  B81C2203/0136

Abstract: A method for forming a MEMS device may include performing a silicon-on-nothing process to form a cavity in a monocrystalline silicon substrate at a first depth relative to a top surface of the monocrystalline silicon substrate; forming, in an electrically conductive electrode region of the monocrystalline silicon substrate, an electrically insulated region extending to a second depth that is less than the first depth relative to the top surface of the monocrystalline silicon substrate; and etching the monocrystalline silicon substrate to expose a gap between a first electrode and a second electrode, wherein the second electrode is separated from the first electrode, within a first depth region, by a first distance defined by the electrically insulated region and the gap, and wherein the second electrode is separated from the first electrode, within a second depth region, by a second distance defined by the gap.

公开(公告)号：US20190204591A1

公开(公告)日：2019-07-04

申请号：US16206178

申请日：2018-11-30

Applicant: Ricoh Company, Ltd.

Inventor： Naoki NAKAMURA ,  Daisuke ICHII ,  Hiromichi ATSUUMI ,  Naoki MIYATAKE ,  Yuki HAYASHI

IPC: G02B26/12 ,  G02B26/10 ,  G02B27/10 ,  G02B27/01

CPC classification number: G02B26/126 ,  B81B2201/04 ,  B81B2201/042 ,  G02B26/10 ,  G02B26/101 ,  G02B26/105 ,  G02B27/01 ,  G02B27/0101 ,  G02B27/104 ,  G02B2027/011 ,  G02B2027/013 ,  G02B2027/0141 ,  G02B2027/0145 ,  G03B21/2013 ,  G03B21/2033 ,  G09G5/00

Abstract: An image display apparatus includes a light source device including a light source unit; a scanning optical system including an image forming unit on which an intermediate image is formed by light from the light source unit; and a virtual image optical system configured to guide light of the intermediate image by using a reflecting mirror and a curved transmissive reflection member. The scanning optical system includes an optical scanning unit configured to scan the light from the light source unit in a main scanning direction and a sub-scanning direction of the image forming unit. The image forming unit is a transmissive member curved with a convex surface toward the reflecting mirror.

公开(公告)号：US20190204586A1

公开(公告)日：2019-07-04

申请号：US16008442

申请日：2018-06-14

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Jose A. MARTINEZ

IPC: G02B26/08 ,  B81C1/00 ,  B81B7/02

CPC classification number: G02B26/0841 ,  B81B7/02 ,  B81B2201/042 ,  B81C1/00047 ,  B81C2201/0132 ,  B81C2201/0133 ,  G09G3/346

Abstract: A microelectromechanical system (MEMS) structure includes at least first and second metal vias. Each of the first and second metal vias includes a respective planar metal layer having a first thickness and a respective post formed from the planar metal layer. The post has a sidewall, and the sidewall has a second thickness greater than 14% of the first thickness.

公开(公告)号：US20190196181A1

公开(公告)日：2019-06-27

申请号：US16223658

申请日：2018-12-18

Applicant: Kensuke YAMADA

Inventor： Kensuke YAMADA

IPC: G02B26/10 ,  G02B26/08 ,  B81C1/00 ,  B81B3/00

CPC classification number: G02B26/101 ,  B81B3/0062 ,  B81B2201/042 ,  B81B2203/0118 ,  B81B2203/056 ,  B81B2203/058 ,  B81C1/00896 ,  G02B26/0858

Abstract: An actuator includes a first driving beam that is connected to an object to be driven and includes multiple first beams extending in a direction orthogonal to a first predetermined axis, ends of each adjacent pair of the first beams being connected to each other via one of first turnaround parts such that the first driving beam forms a zig-zag bellows structure as a whole; first driving sources formed on first surfaces of the first beams; and ribs formed on second surfaces of the first beams at positions that are closer to the first predetermined axis than the first turnaround parts. The first driving sources are configured to move the first driving beam and thereby rotate the object around the first predetermined axis.