公开(公告)号：US20230154721A1

公开(公告)日：2023-05-18

申请号：US18155177

申请日：2023-01-17

Applicant: CANON ANELVA CORPORATION

Inventor： Tsutomu Hiroishi ,  Reiji Sakamoto ,  Hiroshi Yakushiji

IPC: H01J37/08 ,  H01J37/305

CPC classification number: H01J37/08 ,  H01J37/3053 ,  H01J2237/152 ,  H01J2237/022

Abstract: An ion gun according to one embodiment of the present invention has an anode, a cathode having a first portion and a second portion that face the anode, and a magnet that creates a spatial magnetic field between the first portion and the second portion. An annular gap including a curved portion is provided between the first portion and the second portion of the cathode. The magnet creates lines of magnetic field having the bottom inside with respect to the sectional center line of the gap between the first portion and the second portion of the curved portion.

公开(公告)号：US20180330912A1

公开(公告)日：2018-11-15

申请号：US15975959

申请日：2018-05-10

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Volker Drexel ,  Bernd Hafner

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/10

CPC classification number: H01J37/1472 ,  H01J37/09 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/0653 ,  H01J2237/083 ,  H01J2237/152

Abstract: A particle source for producing a particle beam includes a particle emitter, a first plate, a first deflector and a second plate with an aperture. The first plate has a smaller aperture, downstream of which a first beam is formed, and a larger aperture, downstream of which a second beam is formed. A controller sets the deflection angle of the deflector so that in a first mode of operation that particles of the first beam pass through the aperture in the second plate and form the particle beam produced by the particle source. The controller sets the deflection angle so that in a second mode of operation that particles of the second beam pass through the aperture in the second plate and form the particle beam produced by the particle source.

公开(公告)号：US10083815B2

公开(公告)日：2018-09-25

申请号：US15136524

申请日：2016-04-22

Applicant: Glenn Lane Family Limited Liability Limited Partnership

Inventor： Glenn E. Lane

IPC: H01J37/30 ,  H01J37/08 ,  H01J37/317 ,  H01J37/09 ,  C23C14/48 ,  C23C14/54 ,  H01J49/06 ,  H01J49/26 ,  H01L21/265

CPC classification number: H01J37/3007 ,  C23C14/48 ,  C23C14/54 ,  H01J37/08 ,  H01J37/09 ,  H01J37/3171 ,  H01J49/062 ,  H01J49/26 ,  H01J2237/0213 ,  H01J2237/04 ,  H01J2237/0455 ,  H01J2237/152 ,  H01J2237/31701 ,  H01L21/265

Abstract: Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ion species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (CPC) superconductor, or boson energy transmission system.

公开(公告)号：US09852882B2

公开(公告)日：2017-12-26

申请号：US14873284

申请日：2015-10-02

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Scott Barraclough ,  James S. Buff

IPC: H01J3/14 ,  H01J37/30 ,  H01F7/20 ,  H01J37/147 ,  H01J37/317 ,  H05K7/20 ,  H01F27/10

CPC classification number: H01J37/3007 ,  H01F7/20 ,  H01F27/10 ,  H01J37/1472 ,  H01J37/1475 ,  H01J37/3171 ,  H01J2237/002 ,  H01J2237/152 ,  H01J2237/1526 ,  H01J2237/303 ,  H01J2237/31701 ,  H05K7/20

Abstract: A magnet having an annular coolant fluid passage is generally described. Various examples provide a magnet including a first magnet and a second magnet disposed around an ion beam coupler with an aperture there through. The first and second magnets each including a metal core having a cavity therein, one or more conductive wire wraps disposed around the metal core, and an annular core element configured to be inserted into the cavity, wherein an annular coolant fluid passage is formed between the cavity and the annular core element. Furthermore, the annular core element may have a first diameter and a middle section having a second diameter, the second diameter being less than the first diameter. Other embodiments are disclosed and claimed.

公开(公告)号：US09679740B2

公开(公告)日：2017-06-13

申请号：US15109230

申请日：2014-12-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Wen Li ,  Ryo Kadoi ,  Kazuki Ikeda ,  Hiroyuki Takahashi ,  Hajime Kawano

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/1472 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1504 ,  H01J2237/1508 ,  H01J2237/152 ,  H01J2237/1534 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit. In the charged particle beam device that includes an electronic optical system radiating a concentrated electron beam onto a sample placed on a stage to perform scanning and captures an image of the sample, a reference signal and a signal generation unit of a voltage-source control signal applied to the electrostatic deflector generating the electrostatic deflector and a reference signal and a signal generation unit of a current-source control signal applied to the electromagnetic deflector generating a magnetic field are made common in an overlapping-electromagnetic-deflector control unit that controls a path of the secondary electrons/reflected electrons incident on a detector, and frequency characteristics and phase characteristics of the voltage control signal are coincident with those of the current-source control signal.

公开(公告)号：US20170076908A1

公开(公告)日：2017-03-16

申请号：US14849813

申请日：2015-09-10

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： James S. Buff ,  Victor Benveniste ,  Frank Sinclair

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/317

CPC classification number: H01J37/1475 ,  H01J37/14 ,  H01J37/1471 ,  H01J37/1478 ,  H01J37/3171 ,  H01J2237/1415 ,  H01J2237/152 ,  H01J2237/31701

Abstract: A method may include: generating an ion beam from an ion source, the ion beam having an initial direction of propagation; deflecting the ion beam at an initial angle of inclination with respect to the initial direction of propagation; passing the ion beam through an aperture in a magnetic assembly; and generating in the aperture, a quadrupole field extending along a first direction perpendicular to the initial direction of propagation of the ion beam, and a dipole field extending along a second direction perpendicular to the first direction and the initial direction of propagation.

Abstract translation: 一种方法可以包括：从离子源产生离子束，离子束具有初始的传播方向; 使离子束以相对于初始传播方向的初始倾斜角偏转; 使离子束通过磁性组件中的孔; 并且在所述孔中产生垂直于离子束的初始传播方向的第一方向延伸的四极场，以及沿垂直于第一方向和初始传播方向的第二方向延伸的偶极场。

公开(公告)号：US20160314929A1

公开(公告)日：2016-10-27

申请号：US15133347

申请日：2016-04-20

Applicant: Jürgen Drees ,  Helmut Piel

Inventor： Jürgen Drees ,  Helmut Piel

IPC: H01J37/147 ,  A61N5/10 ,  H01J37/14

CPC classification number: H01J37/147 ,  A61N5/1077 ,  A61N2005/1087 ,  G21K1/093 ,  G21K5/04 ,  H01J37/14 ,  H01J2237/14 ,  H01J2237/152

Abstract: The invention relates, inter alia, to a beam guidance system for guiding a beam of charged particles with a magnetic beam deflection unit, wherein the magnetic beam deflection unit has an entry side for entry of the beam of charged particles into the magnetic beam deflection unit in a direction of entry, wherein the magnetic beam deflection unit has an exit side for exit of the beam of charged particles from the magnetic beam deflection unit in a direction of exit. A further aspect of the invention relates to an advantageous particle beam therapy system. The problem of providing improving beam properties and at the same time reducing the amount of space required is solved in that the entry side of the magnetic beam deflection unit is, at least in sections, aligned substantially parallel to the exit side of the magnetic beam deflection unit.

Abstract translation: 本发明尤其涉及用于用磁束偏转单元引导带电粒子束的光束引导系统，其中磁光束偏转单元具有入射侧，用于将带电粒子束进入磁束偏转单元 在入射方向上，其中所述磁束偏转单元具有用于沿着出射方向从所述磁束偏转单元离开所述带电粒子束的出射侧。 本发明的另一方面涉及一种有利的粒子束治疗系统。 提供改进的光束特性并同时减少所需空间量的问题被解决为，磁束偏转单元的入射侧至少部分地基本平行于磁束偏转的出射侧排列 单元。

公开(公告)号：US09472373B1

公开(公告)日：2016-10-18

申请号：US14828181

申请日：2015-08-17

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Stefan Lanio ,  John Breuer ,  Jürgen Frosien ,  Matthias Firnkes ,  Johannes Hopster

IPC: H01J37/147 ,  H01J37/12 ,  H01J37/28 ,  H01J37/153

CPC classification number: H01J37/1472 ,  H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/152 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2538

Abstract: A beam separator device (200) is described. The beam separator device (200) includes a first deflector (112) providing a first magnetic deflection field (B1) for deflecting a charged particle beam (101) propagating along a beam entrance axis (A1) by a first deflection angle (α1); a second deflector (114) arranged downstream from the first deflector (112) providing a second magnetic deflection field (B2) for deflecting the charged particle beam by a second deflection angle (α2) in the direction of an intermediate beam axis (A2), wherein the second deflector (114) is configured for deflecting the charged particle beam (102) re-entering the beam separator device (200) along the intermediate beam axis (A2) by a third deflection angle (α3); a third deflector (212) arranged downstream from the second deflector (114) providing a third magnetic deflection field (B2) for deflecting the charged particle beam (102) by a fourth deflection angle (α4) in the direction of a beam exit axis (A3); a first rotation-free lens to be arranged at a first crossover (X1) of the charged particle beam between the first deflector (112) and the second deflector (114) for at least partially compensating for a dispersion introduced by at least one of the first deflector and the second deflector; and a second rotation-free lens to be arranged at a second crossover (X2) of the charged particle beam between the second deflector (114) and the third deflector (212) for at least partially compensating for a dispersion introduced by at least one of the second deflector and the third deflector.

Abstract translation: 光束分离装置（200）被描述。 分束器装置（200）包括第一偏转器（112），其提供第一磁偏转场（B1），用于使沿着光束入射轴线（A1）传播的带电粒子束（101）偏转第一偏转角（α1）; 第二偏转器（114）布置在第一偏转器（112）的下游，提供用于使带电粒子束沿中间光束轴线（A2）的方向偏转第二偏转角（α2）的第二磁偏转场（B2） 其中所述第二偏转器（114）构造成用于使沿着所述中间光束轴线（A2）重新进入所述光束分离器装置（200）的带电粒子束（102）偏转第三偏转角（α3）; 布置在第二偏转器（114）的下游的第三偏转器（212）提供第三磁偏转场（B2），用于使带电粒子束（102）沿光束出射轴线的方向偏转第四偏转角（α4） A3）; 布置在第一偏转器（112）和第二偏转器（114）之间的带电粒子束的第一交叉（X1）处的第一无旋转透镜，用于至少部分补偿由至少一个 第一偏转器和第二偏转器; 以及第二无旋转透镜，被布置在所述带电粒子束在所述第二偏转器（114）和所述第三偏转器（212）之间的第二交叉（X2）处，用于至少部分地补偿由所述第二偏转器 第二偏转器和第三偏转器。

公开(公告)号：US20160189913A1

公开(公告)日：2016-06-30

申请号：US14978776

申请日：2015-12-22

Applicant: Axcelis Technologies, Inc.

Inventor： Edward C. Eisner

IPC: H01J37/141 ,  H01J37/317 ,  H01J37/08

CPC classification number: H01J37/141 ,  H01J37/05 ,  H01J37/08 ,  H01J37/1472 ,  H01J37/1475 ,  H01J37/3171 ,  H01J2237/04922 ,  H01J2237/1415 ,  H01J2237/152

Abstract: A combined scanning and focusing magnet for an ion implantation system is provided. The combined scanning and focusing magnet has a yoke having a high magnetic permeability. The yoke defines a hole configured to pass an ion beam therethrough. One or more scanner coils operably are coupled to the yoke and configured to generate a time-varying predominantly dipole magnetic field when electrically coupled to a power supply. One or more focusing coils are operably coupled to the yoke and configured to generate a predominantly multipole magnetic field, wherein the predominantly multipole magnetic field is one of static or time-varying.

Abstract translation: 提供了用于离子注入系统的组合扫描和聚焦磁体。 组合的扫描和聚焦磁体具有磁导率高的磁轭。 轭限定了构造成使离子束通过其中的孔。 一个或多个扫描器线圈可操作地耦合到磁轭并且被配置为当电耦合到电源时产生随时间变化的主要偶极磁场。 一个或多个聚焦线圈可操作地耦合到磁轭并且被配置为产生主要是多极磁场，其中主要是多极磁场是静态或时变之一。

公开(公告)号：US20160027610A1

公开(公告)日：2016-01-28

申请号：US14873284

申请日：2015-10-02

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Scott Barraclough ,  James S. Buff

IPC: H01J37/30 ,  H01J37/147 ,  H01J37/317 ,  H01F7/20 ,  H05K7/20

CPC classification number: H01J37/3007 ,  H01F7/20 ,  H01F27/10 ,  H01J37/1472 ,  H01J37/1475 ,  H01J37/3171 ,  H01J2237/002 ,  H01J2237/152 ,  H01J2237/1526 ,  H01J2237/303 ,  H01J2237/31701 ,  H05K7/20

Abstract: A magnet having an annular coolant fluid passage is generally described. Various examples provide a magnet including a first magnet and a second magnet disposed around an ion beam coupler with an aperture there through. The first and second magnets each including a metal core having a cavity therein, one or more conductive wire wraps disposed around the metal core, and an annular core element configured to be inserted into the cavity, wherein an annular coolant fluid passage is formed between the cavity and the annular core element. Furthermore, the annular core element may have a first diameter and a middle section having a second diameter, the second diameter being less than the first diameter. Other embodiments are disclosed and claimed.

Abstract translation: 通常描述具有环形冷却剂流体通道的磁体。 各种实施例提供一种包括第一磁体和设置在离子束耦合器周围的第二磁体的磁体，其中具有通孔。 所述第一和第二磁体各自包括在其中具有空腔的金属芯，设置在所述金属芯周围的一个或多个导电线圈，以及被构造成插入所述空腔中的环形芯体元件，其中环形冷却剂流体通道形成在 腔和环形芯元件。 此外，环形芯元件可以具有第一直径和具有第二直径的中间部分，第二直径小于第一直径。 公开和要求保护其他实施例。