公开(公告)号：US08723135B2

公开(公告)日：2014-05-13

申请号：US13438424

申请日：2012-04-03

Applicant: Hilton Frank Glavish ,  Shojiro Dohi ,  Benjamin Thomas King

Inventor： Hilton Frank Glavish ,  Shojiro Dohi ,  Benjamin Thomas King

IPC: H01J3/20

CPC classification number: H01J37/05 ,  H01J37/1475 ,  H01J2237/055 ,  H01J2237/1523 ,  H01J2237/31701

Abstract: An ion beam bending magnet provides a curved path through the magnet for bending a ribbon-shaped ion beam having its major cross-sectional dimension normal to the bending plane of the magnet. The magnet comprises a ferromagnetic yoke surrounding the beam path and having an internal profile in cross-section formed of four angled sides. These sides are angled to the major dimension of the ribbon beam passing through the magnet, so that the internal profile of the yoke is relatively wide in the center of the ribbon beam and relatively narrow near the top and bottom edges of the ribbon beam. Electrical conductors against the internal surfaces of the yoke provide a uniform distribution of electrical current per unit length along the angled sides of the profile, providing a substantially uniform magnetic bending field within the magnet yoke.

Abstract translation: 离子束弯曲磁体提供穿过磁体的弯曲路径，用于弯曲具有垂直于磁体的弯曲平面的主横截面尺寸的带状离子束。 磁体包括铁磁磁轭，其围绕光束路径并且具有由四个成角度的侧面形成的横截面的内部轮廓。 这些侧面与通过磁体的带状束的主要尺寸成角度，使得轭的内部轮廓在带状束的中心处相对较宽，并且在带状束的顶部和底部边缘附近相对较窄。 抵靠轭的内表面的电导体沿着轮廓的成角度的侧面提供均匀分布的单位长度的电流，从而在磁轭内提供基本上均匀的磁弯曲场。

公开(公告)号：US20130134322A1

公开(公告)日：2013-05-30

申请号：US13814190

申请日：2011-10-25

Applicant: Hiroshi Yasuda

Inventor： Hiroshi Yasuda

IPC: H01J3/20

CPC classification number: H01J3/24 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/20 ,  H01J37/143 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/1405

Abstract: There provided a device for effectively drawing a fine pattern using a permanent magnet. The device has an outer cylinder 201 composed of a cylindrical ferromagnet with a Z axis as a central axis, a cylindrical permanent magnet 202 located inside the outer cylinder and polarized along the Z axis direction, a correction coil 204 located inside the cylindrical permanent magnet with a gap from the cylindrical permanent magnet, for adjusting a magnetic field strength generated by the cylindrical permanent magnet along the Z axis direction, and a coolant passage 203 located in the gap between the cylindrical permanent magnet and the correction coil, for allowing a coolant to flow therethrough and controlling temperature changes in the cylindrical permanent magnet.

Abstract translation: 提供了一种用于使用永磁体有效地绘制精细图案的装置。 该装置具有由Z轴作为中心轴的圆柱形铁磁体构成的外筒201，位于外筒内部并沿着Z轴方向极化的圆柱形永磁体202，位于筒状永久磁铁内部的校正线圈204， 用于调整由圆柱形永磁体沿Z轴方向产生的磁场强度的圆柱形永磁体的间隙和位于圆柱形永磁体和校正线圈之间的间隙中的冷却剂通道203，用于允许冷却剂 流过其中并控制圆筒形永磁体的温度变化。

公开(公告)号：US20120316378A1

公开(公告)日：2012-12-13

申请号：US13519811

申请日：2010-08-05

Applicant: Kota Torikai ,  Satoru Yamada

Inventor： Kota Torikai ,  Satoru Yamada

IPC: H01J3/22 ,  A61N5/10 ,  H01J3/20

CPC classification number: G21K1/093 ,  A61N5/1043 ,  A61N5/1077 ,  A61N2005/1087 ,  A61N2005/1095

Abstract: The beam irradiation apparatus is featured by including a transport pipe which is vacuum-evacuated to be used as a transport channel of a beam taken out from an accelerator, a quadrupole magnet which modulates the beam diameter of the beam so that the beam is incident on an irradiation target existing in the atmosphere while maintaining the focusing angle of the beam, and one or more longitudinally movable range shifters which are provided to be capable of changing the distance to the irradiation target of the beam, and which modulate the beam range by reducing the energy of the beam by allowing the beam to pass through the movable range shifter, and is featured in that the beam is irradiated onto the irradiation target by modulating the beam diameter and the beam range.

Abstract translation: 光束照射装置的特征在于包括真空抽真空的输送管，用作从加速器取出的光束的输送通道，四极磁体，其调制光束的光束直径以使光束入射到 存在于大气中的照射目标，同时保持光束的聚焦角度;以及一个或多个纵向移动范围移动器，其被设置为能够改变到光束的照射目标的距离，并且通过减小来调制光束范围 通过允许光束通过可移动范围移位器的光束的能量，其特征在于通过调制光束直径和光束范围将光束照射到照射目标上。

公开(公告)号：US20120153147A1

公开(公告)日：2012-06-21

申请号：US12973984

申请日：2010-12-21

Applicant: Joachim Zach ,  Stephan Uhlemann

Inventor： Joachim Zach ,  Stephan Uhlemann

IPC: H01J3/20 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2802

Abstract: A corrector (10) for an electron microscope is proposed which is less sensitive to fluctuations of the electrical power supply if a stigmatic intermediate image (9) of the axial fundamental rays (xα, yβ) is produced in the quadrupole field (1′) of a first quadrupole element (1) and this quadrupole field (1′) is set such that astigmatic intermediate images (12, 13) of the off-axial fundamental rays (xγ, yδ) are produced in the region of the center of the quadrupole fields (3′, 4′) of a third (3) and fourth multipole element (4) and there also, due to the setting of the quadrupole field (2′) of a second quadrupole element (2), the axial fundamental rays (xα, yβ) of the same section (x, y) as that, in which the intermediate images (12, 13) of the off-axial fundamental rays (xγ, yδ) are located, each exhibit a maximum.

Abstract translation: 提出了一种用于电子显微镜的校正器（10），如果在四极场（1'）中产生轴向基本射线（xα，y＆bgr）的眩目中间图像（9），对于电源的波动较不敏感， ），并且该四极场（1'）被设置为使得在轴向中心的区域中产生离轴基波（xγ，yδ）的像散中间图像（12,13） 第三（3）和第四多极元件（4）的四极场（3'，4'），并且由于第二四极元件（2）的四极场（2'）的设定， 与偏轴基波（xγ，yδ）的中间图像（12,13）相同的部分（x，y）的基波（xα，y＆bgr）各自呈现最大值。

公开(公告)号：US20110284758A1

公开(公告)日：2011-11-24

申请号：US13108207

申请日：2011-05-16

Applicant: Hidetaka Sawada

Inventor： Hidetaka Sawada

IPC: H01J3/20 ,  H01J3/14

CPC classification number: H01J37/153 ,  H01J2237/1534

Abstract: A spherical aberration corrector and method is offered, which is easy to design and which can correct spherical aberration and even six-fold astigmatism in a charged particle beam instrument. The corrector has a first pair of multipole elements for producing a first pair of three-fold symmetric fields in which three-fold astigmatisms produced mutually are canceled out and a second pair of multipole elements for producing a second pair of three-fold symmetric fields in which three-fold astigmatisms produced mutually are canceled out. The second pair of multipole elements produce six-fold astigmatisms angularly spaced by 30° about an optical axis from six-fold astigmatisms produced by the first pair of multipole elements.

Abstract translation: 提供了一种球面像差校正器和方法，其易于设计，并且可以校正带电粒子束仪器中的球面像差甚至六折像散。 校正器具有第一对多极元件，用于产生第一对三对称场，其中相互产生的三折像散被抵消，第二对多极元件用于产生第二对三对称场， 相互产生的三折散光被取消。 第二对多极元件产生六角像散，其与由第一对多极元件产生的六倍散光相关的光轴成角度地间隔30°。

公开(公告)号：US20080302972A1

公开(公告)日：2008-12-11

申请号：US12228473

申请日：2008-08-13

Applicant: Kenneth H. Purser ,  Norman L. Turner

Inventor： Kenneth H. Purser ,  Norman L. Turner

IPC: H01J3/20

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/152 ,  H01J2237/31701

Abstract: A method and apparatus satisfying growing demands for improving the intensity of implanting ions that impact a semiconductor wafer as it passes under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes for combating the disruptive effects of ion-beam induced space-charge forces. The design of the novel optical elements makes possible: (1) Focusing of a ribbon ion beam as the beam passes through uniform or non-uniform magnetic fields; (2) Reduction of the losses of ions comprising a d.c. ribbon beam to the magnetic poles when a ribbon beam is deflected by a magnetic field.

Abstract translation: 一种满足日益增长的要求的方法和装置，其用于提高在半导体晶片通过离子束时冲击半导体晶片的注入离子的强度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合在一起，以抵抗离子束诱导的空间电荷力的破坏性影响。 新型光学元件的设计成为可能：（1）当光束通过均匀或不均匀的磁场时，对带状离子束进行聚焦; （2）减少包含直流电的离子的损失。 当带状光束被磁场偏转时，带状光束到达磁极。

公开(公告)号：US20080179536A1

公开(公告)日：2008-07-31

申请号：US12076786

申请日：2008-03-24

Applicant: Mitsugu Sato ,  Makoto Ezumi ,  Satoru Yamaguchi

Inventor： Mitsugu Sato ,  Makoto Ezumi ,  Satoru Yamaguchi

IPC: H01J3/20 ,  H01J1/50

CPC classification number: H01J37/265 ,  H01J2237/1501 ,  H01J2237/28 ,  H01J2237/304

Abstract: A charged-particle beam emitting device which includes the following configuration devices so that a lowering in the image resolution will be suppressed even if a primary beam is tilted relative to a sample: A device for causing orbit of the primary beam to pass through off-axes of a plurality of lenses, and controlling off-axis orbit of the primary beam. This device allows the aberration which occurs in the objective lens at the time of beam tilt to be cancelled out by the aberration which occurs in the other lens. Also, there is provided a device for simultaneously modulating excitations of the plurality of lenses including the objective lens.

Abstract translation: 一种带电粒子束发射装置，其包括以下配置装置，使得即使主光束相对于样本倾斜，图像分辨率的降低也将被抑制：用于使一次光束的轨道穿过关闭的装置， 多个透镜的轴，并且控制主光束的离轴轨道。 该装置允许在光束倾斜时在物镜中发生的像差由在另一个透镜中出现的像差抵消。 此外，提供了一种用于同时调制包括物镜的多个透镜的激励的装置。

公开(公告)号：US4745281A

公开(公告)日：1988-05-17

申请号：US899966

申请日：1986-08-25

Applicant: Harald A. Enge

Inventor： Harald A. Enge

IPC: H01J37/141 ,  G21K1/00 ,  H01J3/14 ,  H01J3/20 ,  H01J37/00 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/147

Abstract: An ion source provides ions that pass through an analyzing magnet, image slit, and magnetic quadrupole lenses before entering a beam deflector. The deflected ion beam enters a magnetic field established by a dipole magnetic lens of rectangular cross section in planes parallel to the beam plane including the scanned ion beam, and having a variable width gap in a plane perpendicular to the beam plane that provides a parallel scanned ion beam. The parallel scanned ion beam enters a slot-shaped acceleration columnn and then scans a target.

Abstract translation: 离子源提供在进入光束偏转器之前通过分析磁体，图像狭缝和磁性四极透镜的离子。 偏转的离子束进入由与包括扫描离子束在内的平面平行的平面中的矩形横截面的偶极磁性透镜建立的磁场，并且在垂直于光束平面的平面中具有可变的宽度间隙，该平面提供平行扫描 离子束。 并行扫描离子束进入槽形加速度列，然后扫描目标。

公开(公告)号：US4400622A

公开(公告)日：1983-08-23

申请号：US225269

申请日：1981-01-15

Applicant: Yoshinobu Takeuchi ,  Katsuhiro Kuroda ,  Susumu Ozasa

Inventor： Yoshinobu Takeuchi ,  Katsuhiro Kuroda ,  Susumu Ozasa

IPC: H01J37/141 ,  H01J37/21 ,  H01J37/305 ,  H01L21/027 ,  H01J3/20

CPC classification number: H01J37/141

Abstract: An electron lens system wherein at least two coils are arranged in the vicinity of an electron-optical lens and are excited in directions opposite to each other, thereby making it possible to adjust the focal distance of the lens without including a rotation attributed to the electron-optical lens in an electron beam which passes through the lens.

Abstract translation: 一种电子透镜系统，其中至少两个线圈布置在电子 - 光学透镜附近并且在彼此相反的方向上被激励，从而使得可以调节透镜的焦距而不包括归因于电子的旋转 - 透过透镜的电子束中的光学透镜。

公开(公告)号：US3483417A

公开(公告)日：1969-12-09

申请号：US3483417D

申请日：1967-07-26

Applicant: AIR REDUCTION

Inventor： HANKS CHARLES W

IPC: H01J37/305 ,  H01J3/20 ,  H01J3/32 ,  H01J23/10

CPC classification number: H01J37/305