公开(公告)号：US20240029991A1

公开(公告)日：2024-01-25

申请号：US17871090

申请日：2022-07-22

Applicant: Plansee USA LLC

Inventor： Nam Ngo ,  Gerhard Duerrhammer ,  Jacob Boyer ,  Florian Schaper ,  Dustin Hacker ,  Mason Payne ,  Surf Johnson ,  Andrew Dalager

IPC: H01J37/08 ,  H01J37/317 ,  H01J1/88

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J1/88 ,  H01J2237/061

Abstract: A repeller assembly mounts in an arc chamber of an ion implanter. The repeller assembly contains a repeller, a tubular insert, first and second insulators, a contact member, and a lock member. The repeller has a knob-shaped body placed on an inner side of the arc chamber opposite to a cathode assembly. A repeller shaft is arranged extending through an opening of a wall of the arc chamber to an outer side. The repeller shaft has a step narrowing down the repeller shaft. The tubular insert is mounted concentrically to the repeller shaft. The first insulator has a collar shape and is attached to the tubular insert so that an inner shoulder of the first insulator is pressed against an outer side of the wall of the arc chamber. The second insulator is cap-nut shaped and is attached to the first insulator with an outer flange thereof.

公开(公告)号：US20230402247A1

公开(公告)日：2023-12-14

申请号：US17835107

申请日：2022-06-08

Applicant: Applied Materials, Inc.

Inventor： Craig R. Chaney ,  Graham Wright

IPC: H01J37/08 ,  H01J27/08 ,  H01J37/34

CPC classification number: H01J37/08 ,  H01J27/08 ,  H01J37/3435

Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible contains a solid dopant material, such as a metal. A porous wicking tip is disposed in the crucible in contact with the solid dopant material. The porous wicking tip may be a tube with one or more interior conduits. Alternatively, the porous tip may be two concentric cylinders with a plurality of rods disposed in the annular ring between the two cylinders. Alternatively, the porous tip may be one or more foil layers wound together. In each of these embodiments, the wicking tip can be used to control the flow rate of molten dopant material to the arc chamber.

公开(公告)号：US11798775B2

公开(公告)日：2023-10-24

申请号：US17491084

申请日：2021-09-30

Applicant: Axcelis Technologies, Inc.

Inventor： Wilhelm Platow ,  Neil Bassom ,  Jonathan David

IPC: H01J27/00 ,  H01J37/08 ,  H01J37/075 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/075 ,  H01J37/3171

Abstract: An ion source has an arc chamber with a first end and a second end. A first cathode at the first end of the arc chamber has a first cathode body and a first filament disposed within the first cathode body. A second cathode at the second end of the arc chamber has a second cathode body and a second filament disposed within the second cathode body. A filament switch selectively electrically couples a filament power supply to each of the first filament and the second filament, respectively, based on a position of the filament switch. A controller controls the position of the filament switch to alternate the electrical coupling of the filament power supply between the first filament and the second filament for a plurality of switching cycles based on predetermined criteria. The predetermined criteria can be a duration of operation of the first filament and second filament.

公开(公告)号：US11784025B1

公开(公告)日：2023-10-10

申请号：US17740733

申请日：2022-05-10

Applicant: Plasma-Therm NES LLC

Inventor： Sarpangala Hariharakeshava Hegde ,  Armin Baur ,  Wei-Hua Hsiao

IPC: H01J37/08 ,  H01J37/305

CPC classification number: H01J37/3056 ,  H01J37/08 ,  H01J2237/20214

Abstract: The present disclosure provides a method of achieving an integral number of sweeps within an ion beam. A substrate having a fiducial is placed on a wafer stage within the ion beam system. An energetic particle beam is generated within the ion beam system. The substrate is exposed to the energetic particle beam while the wafer stage with the substrate is rotated clockwise so that the fiducial of the substrate travels a sweep distance in a clockwise direction at a first speed and the fiducial of the substrate travels the same sweep distance in a counterclockwise direction at a second speed. The exposure of the substrate to the energetic particle beam is discontinued when the number of complete/full sweeps in the clockwise direction equals the number of complete/full sweeps in the counterclockwise direction.

公开(公告)号：US11756772B2

公开(公告)日：2023-09-12

申请号：US16887571

申请日：2020-05-29

Applicant: Axcelis Technologies, Inc.

Inventor： David Sporleder ,  Neil Bassom ,  Neil K. Colvin ,  Mike Ameen ,  Xiao Xu

IPC: H01J37/32 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J37/32504 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/3244 ,  H01J2237/006

Abstract: An ion source assembly and method has a source gas supply to provide a molecular carbon source gas to an ion source chamber. A source gas flow controller controls flow of the molecular carbon source gas to the ion source chamber. An excitation source excites the molecular carbon source gas to form carbon ions and radicals. An extraction electrode extracts the carbon ions from the ion source chamber, forming an ion beam. An oxidizing co-gas supply provides oxidizing co-gas to chamber. An oxidizing co-gas flow controller controls flow of the oxidizing co-gas to the chamber. The oxidizing co-gas decomposes and reacts with carbonaceous residues and atomic carbon forming carbon monoxide and carbon dioxide within the ion source chamber. A vacuum pump system removes the carbon monoxide and carbon dioxide, where deposition of atomic carbon within the ion source chamber is reduced and a lifetime of the ion source is increased.

公开(公告)号：US20230245859A1

公开(公告)日：2023-08-03

申请号：US17588999

申请日：2022-01-31

Applicant: Axcelis Technologies, Inc.

Inventor： Neil J. Bassom ,  Joshua Abeshaus ,  David Sporleder ,  Neil Colvin ,  Joseph Valinski ,  Michael Cristoforo ,  Vladimir Romanov ,  Pradeepa Kowrikan Subrahmnya

IPC: H01J37/32 ,  H01J37/08

CPC classification number: H01J37/32412 ,  H01J37/08

Abstract: An ion source has an arc chamber defining an arc chamber volume. A reservoir is coupled to the arc chamber, defining a reservoir volume. The reservoir receives a source species to define a liquid within the reservoir volume. A conduit fluidly couples the reservoir volume to the arc chamber volume. First and second openings of the conduit are open to the respective reservoir and arc chamber volume. A heat source selectively heats the reservoir to melt the source species at a predetermined temperature. A liquid control apparatus controls a first volume of the liquid within the reservoir volume to define a predetermined supply of the liquid to the arc chamber volume. The liquid control apparatus is a pressurized gas source fluidly coupled to the reservoir to supply a gas to the reservoir and provide a predetermined amount of liquid to the arc chamber.

公开(公告)号：US20230162941A1

公开(公告)日：2023-05-25

申请号：US17532358

申请日：2021-11-22

Applicant: Applied Materials, Inc.

Inventor： Klaus Becker ,  Luigi G. Amato ,  Elvis Gomez ,  David Burgdorf ,  Victor Theriault ,  Thomas Stewart

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/09

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J37/09

Abstract: A Bernas ion source having a shield is disclosed. The shield is disposed between the distal portion of the filament and the first end of the chamber and serves to confine the plasma to the region between the shield and the second end of the chamber. The shield may be electrically connected to the negative leg of the filament so as to be the most negatively biased component in the chamber. In other embodiments, the shield may be electrically floating. In this embodiment, the shield may self-bias. The shield is typically made of a refractory metal. The use of the shield may reduce back heating of the filament by the plasma and reduce the possibility for thermal runaway. This may allow denser plasmas to be generated within the chamber.

公开(公告)号：US20230154721A1

公开(公告)日：2023-05-18

申请号：US18155177

申请日：2023-01-17

Applicant: CANON ANELVA CORPORATION

Inventor： Tsutomu Hiroishi ,  Reiji Sakamoto ,  Hiroshi Yakushiji

IPC: H01J37/08 ,  H01J37/305

CPC classification number: H01J37/08 ,  H01J37/3053 ,  H01J2237/152 ,  H01J2237/022

Abstract: An ion gun according to one embodiment of the present invention has an anode, a cathode having a first portion and a second portion that face the anode, and a magnet that creates a spatial magnetic field between the first portion and the second portion. An annular gap including a curved portion is provided between the first portion and the second portion of the cathode. The magnet creates lines of magnetic field having the bottom inside with respect to the sectional center line of the gap between the first portion and the second portion of the curved portion.

公开(公告)号：US20230131410A1

公开(公告)日：2023-04-27

申请号：US17510996

申请日：2021-10-26

Applicant: Applied Materials, Inc.

Inventor： Alexandre Likhanskii ,  Jay T. Scheuer ,  Sudhakar Mahalingam ,  Nevin Clay

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/05

Abstract: An ion source capable of extracting a ribbon ion beam with improved vertical angular uniformity is disclosed. The extraction plate and extraction optics are designed such that there is at least one non-uniform gap between adjacent components. A non-uniform gap may be effective in reducing angular spread non-uniformity of the extracted ribbon ion beam. Specifically, for a given gap in the Z direction, ions extracted from regions with lower plasma density may have more vertical angular spread. A larger gap in the Z direction between components in this region may make the vertical angular spread closer to the vertical angular spread of ions extracted from regions with higher plasma density. The non-uniform gap may be created by having an extraction plate that is flat or curved and electrodes that are flat, convex or concave. In certain embodiments, the non-uniform gap is located between the extraction plate and the suppression electrode.

公开(公告)号：US20230048299A1

公开(公告)日：2023-02-16

申请号：US17788556

申请日：2019-12-24

Applicant: Hitachi High-Tech Corporation

Inventor： Shota AIDA ,  Hisayuki TAKASU ,  Atsushi KAMINO ,  Hitoshi KAMOSHIDA

IPC: H01J37/244 ,  H01J37/08 ,  H01J37/305

Abstract: There is provided an ion milling apparatus that can enhance reproducibility of ion distribution.
The ion milling apparatus includes an ion source 101, a sample stage 102 on which a sample processed by radiating a non-convergent ion beam from the ion source 101 is placed, a drive unit 107 that moves a measurement member holding section 106 holding an ion beam current measurement member 105 along a track located between the ion source and the sample stage, and an electrode 112 that is disposed near the track, in which a predetermined positive voltage is applied to the electrode 112, the ion beam current measurement member 105 is moved within a radiation range of the ion beam by the drive unit 107, in a state in which the ion beam is output from the ion source 101 under a first radiation condition, and an ion beam current that flows when the ion beam is radiated to the ion beam current measurement member 105 is measured.