公开(公告)号：US12176179B2

公开(公告)日：2024-12-24

申请号：US18474982

申请日：2023-09-26

Applicant: FEI Company

Inventor： Maarten Bischoff ,  Peter Christiaan Tiemeijer ,  Tjerk Gerrit Spanjer ,  Stan Johan Pieter Konings

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/28

Abstract: A method for reducing throughput time in a sample image acquisition session in transmission electron microscopy comprises: providing an electron microscope comprising a sample component, a beam generator, an adjusting component, and a filtering component; securing a sample by using the sample component; generating an electron beam by using the beam generator; generating an image beam by directing the beam to the sample component; adjusting at least one of the beam and the image beam by using the adjusting component to obtain at least one modified image beam, wherein the adjusting is performed in such a way, that off-axial aberration of the modified image beam is minimized; and filtering the modified image beam via the filtering component to reduce resolution-deteriorating effect of chromatic aberration on the modified image beam resulting from the adjusting of the at least one of the beam and the image beam.

公开(公告)号：US12175648B2

公开(公告)日：2024-12-24

申请号：US18524603

申请日：2023-11-30

Applicant: FEI Company

Inventor： Remco Schoenmakers ,  Maurice Peemen ,  Pavel Potoček

IPC: G06T7/00 ,  G06V20/69 ,  H01J37/28

Abstract: The invention relates to a method implemented by a data processing apparatus, comprising the steps of receiving an image; providing a set-point for a desired image quality parameter of said image; and processing said image using an image analysis technique for determining a current image quality parameter of said image. In the method, the current image quality parameter is compared with said desired set-point. Based on said comparison, a modified image is generated by using an image modification technique. The generating comprises a step of deteriorating said image in terms of said image quality parameter in case said current image quality parameter exceeds said set-point. The modified image is then output and may be further analysed.

公开(公告)号：US20240404784A1

公开(公告)日：2024-12-05

申请号：US18203034

申请日：2023-05-29

Applicant: Applied Materials Israel Ltd.

Inventor： Itamar Shani ,  Konstantin Chirko ,  Lior Yaron ,  Guy Eytan ,  Guy Shwartz

IPC: H01J37/28 ,  G06T11/00 ,  G06T11/20

Abstract: Disclosed herein is a system for non-destructive tomography of specimens. The system includes a scanning electron microscope (SEM) and a processor(s). The SEM is configured to obtain a sinogram of a tested specimen, parameterized by a vector {right arrow over (s)}, by projecting e-beams on the tested specimen, at each of a plurality of projection directions and offsets, and. for each e-beam, measuring a respective intensity of electrons returned from the tested specimen, The processor(s) is configured to obtain a tomographic map, pertaining to the tested specimen, by determining values indicative of components of a vector {right arrow over (t)} defined by an equation W{right arrow over (t)}={right arrow over (s)}. W is a matrix with components wij specifying a contribution of a j-th voxel in a nominal specimen to an i-th element of a nominal sinogram of the nominal specimen. The matrix W accounts for e-beam expansion and attenuation with depth within the nominal specimen.

公开(公告)号：US12158372B2

公开(公告)日：2024-12-03

申请号：US17833670

申请日：2022-06-06

Applicant: FEI Company

Inventor： Joseph Christian ,  Jorge Filevich

IPC: G01J3/44 ,  G01J3/02 ,  G01N21/65 ,  G01N21/94 ,  H01J37/28

Abstract: Methods and apparatus are disclosed for concurrent cleaning and cleanliness monitoring of a sample such as a substrate for electron point projection microscopy. A graphene sample is illuminated by a laser. Raman scattering from contaminants generates secondary light which is analyzed by spectrometer. Based on Raman scattering analysis, sample cleanliness is determined. Cleaning can be dynamically terminated based on achieving a target cleanliness level or based on prediction thereof. Variations and additional applications are disclosed.

公开(公告)号：US12142451B2

公开(公告)日：2024-11-12

申请号：US17778579

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Tianming Chen ,  Chiyan Kuan ,  Yixiang Wang ,  Zhi Po Wang

IPC: H01J37/02 ,  G03F7/00 ,  H01J37/28

Abstract: A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.

公开(公告)号：US20240369356A1

公开(公告)日：2024-11-07

申请号：US18776207

申请日：2024-07-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan WANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G01B15/08 ,  H01J37/20 ,  H01J37/21 ,  H01J37/22 ,  H01J37/28

Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.

公开(公告)号：US12131881B2

公开(公告)日：2024-10-29

申请号：US17718976

申请日：2022-04-12

Applicant: JEOL Ltd.

Inventor： Takeshi Kaneko ,  Norihiro Okoshi ,  Yu Jimbo ,  Sang Tae Park

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/2802

Abstract: A contamination prevention irradiation device includes a generation unit and a mirror unit. The generation unit generates a laser beam. The mirror unit has a mirror surface for reflecting a laser beam. The laser beam reflected on the mirror surface is applied to a specimen disposed inside an objective lens. The laser beam is composed of a pulse train. Once a laser beam is applied to the specimen before observation of the specimen, deposition of contaminants on the specimen can be prevented for a predetermined subsequent period.

公开(公告)号：US20240355578A1

公开(公告)日：2024-10-24

申请号：US18761319

申请日：2024-07-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Te-Sheng WANG ,  Szu-Po WANG ,  Kai-Yuan CHI

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/28

Abstract: Disclosed are non-transitory computer-readable media, systems, and computer-implemented methods that describe obtaining hot spot (HS) location information with respect to a printed pattern; obtaining LFP search criteria for searching the printed pattern to determine a local focus point (LFP) for an imaging device; selecting a HS area in the printed pattern that contains a HS; and determining the LFP proximate to the HS area based on the LFP search criteria, the LFP not containing the HS.

公开(公告)号：US12125667B2

公开(公告)日：2024-10-22

申请号：US17638275

申请日：2019-09-20

Applicant: Hitachi High-Tech Corporation

Inventor： Yasuhiro Shirasaki ,  Makoto Sakakibara ,  Momoyo Enyama ,  Hajime Kawano ,  Akira Ikegami

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24514 ,  H01J2237/2803

Abstract: A charged particle beam device includes a plurality of detectors configured to detect one or more signal charged particle beams caused by irradiation on a sample with one or more primary charged particle beams, and a control system. The control system is configured to measure an intensity distribution of the one or more signal charged particle beams detected by the plurality of detectors, and correct the intensity distribution by using a correction function. The control system is configured to generate an image based on the corrected intensity distribution.

公开(公告)号：US20240347315A1

公开(公告)日：2024-10-17

申请号：US18582608

申请日：2024-02-20

Applicant: FUJI ELECTRIC CO., LTD.

Inventor： Yusuke SHIMIZU

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/265 ,  H01J2237/2814

Abstract: Provided is an analysis method for generating, by acquiring for a plurality of set ranges a distribution representative value representing a representative value of a first characteristic and a second characteristic of a plurality of measurement groups included in the same set range, and by approximating a relationship between the distribution representative value and a concentration of a first impurity with a first approximate line including a curved line part, a relationship information indicating a relationship between a value of the set range and the distribution representative value, generating a virtual distribution in which samples of the first characteristic and the second characteristic are distributed in a range that is wider than a measurement distribution by simulating, based on the measurement distribution and the relationship information, the first characteristic and the second characteristic of a plurality of virtual semiconductor devices, and calculating a defect rate in the virtual distribution.