公开(公告)号：US20030085355A1

公开(公告)日：2003-05-08

申请号：US10329409

申请日：2002-12-27

Applicant: NIKON CORPORATION

Inventor： Yoshiaki Kohama

IPC: H01J037/26

CPC classification number: H01J37/045 ,  G01N23/2251 ,  H01J37/26 ,  H01J37/265 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/0203 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/221 ,  H01J2237/2817

Abstract: An electron beam apparatus prevents a rapid increase of dosage caused by stoppage or deceleration of movement and protects the specimen when the specimen is irradiated with the electron beam while the specimen and the electron beam are being relatively moved. An electron beam source outputs the electron beam. The dosage of electron beam irradiated per unit area of the specimen is measured. A storage section stores a predetermined dosage per unit area in memory for the specimen. A detector detects over exposure of the electron beam when the measured dosage per unit area is greater than the dosage per unit area stored in the storage section. A controller controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the storage section.

Abstract translation: 电子束装置防止运动停止或减速引起的剂量快速增加，并且当样本和电子束相对移动时，在用电子束照射样本时保护样本。 电子束源输出电子束。 测量每单位面积照射的电子束的剂量。 存储部分将每单位面积的预定剂量存储在样品的存储器中。 当每单位面积的测量剂量大于存储部分中存储的每单位面积的剂量时，检测器检测电子束的过度曝光。 控制器控制电子束源以减少电子束单位面积的剂量低于存储部分中存储的每单位面积的剂量。

公开(公告)号：US06486471B1

公开(公告)日：2002-11-26

申请号：US09313116

申请日：1999-05-17

Applicant: Masamichi Oi

Inventor： Masamichi Oi

IPC: H01J3700

CPC classification number: H01J37/30 ,  H01J37/09 ,  H01J2237/0203

Abstract: A charged particle beam apparatus has a plurality of charged particle beam generating systems disposed in a chamber and a neutralizing coil for neutralizing a first charged particle beam generating system to control the magnetic field in the path of a charged particle beam generated by a second charged particle beam system. The first charged particle beam generating system comprises one or more electron beam lens barrels, and the second charged particle beam generating system comprises one or more focused ion beam lens barrels. The neutralizing coil controls an excitation current of the objective lens of a first electron beam lens barrel.

Abstract translation: 带电粒子束装置具有设置在腔室中的多个带电粒子束产生系统和用于中和第一带电粒子束产生系统的中和线圈，以控制由第二带电粒子产生的带电粒子束的路径中的磁场 梁系统。 第一带电粒子束产生系统包括一个或多个电子束透镜筒，第二带电粒子束产生系统包括一个或多个聚焦离子束透镜筒。 中和线圈控制第一电子束透镜筒的物镜的激励电流。

公开(公告)号：US20020117969A1

公开(公告)日：2002-08-29

申请号：US10002908

申请日：2001-11-13

Applicant: Nikon Corporation

Inventor： Shohei Suzuki ,  Motofusa Kageyama

IPC: H01J005/02

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J5/02 ,  H01J37/09 ,  H01J2237/0203 ,  H01J2237/28 ,  H01J2237/3175

Abstract: Shielding devices and methods are disclosed for canceling the effects of external magnetic fields that otherwise would interfere with proper functioning of a charged-particle-beam (CPB) optical system inside a column. In one embodiment, openings and other disruptions in the continuity of the column are flanked by respective coil sets. Each coil set includes multiple coils that are individually electrically energized. The coils can be inside the column, outside the column, or both inside and outside. The magnitude and direction of the respective composite magnetic fields generated by the coil sets can be changed by adjusting the respective electrical currents flowing through the individual coils. Thus, the magnitude and direction of the composite magnetic field can be manipulated as required to cancel the effects of the interfering magnetic field. In addition, the column can be situated within a shield of an anisotropic magnetic material in which the magnetic flux most readily flows in selected directions. Thus, the flux of an external magnetic field that otherwise would leak into a column is caused to become aligned, in a respective portion of the shield, in the axial direction, thereby reducing its horizontal component.

Abstract translation: 公开了用于消除外部磁场的影响的屏蔽装置和方法，否则会妨碍柱内的带电粒子束（CPB）光学系统的正常功能。 在一个实施例中，柱的连续性中的开口和其他中断侧面是相应的线圈组。 每个线圈组包括单独电通电的多个线圈。 线圈可以在柱内，柱外，或内部和外部。 可以通过调节流过各个线圈的各自的电流来改变由线圈组产生的各个复合磁场的大小和方向。 因此，可以根据需要操纵复合磁场的大小和方向以消除干扰磁场的影响。 此外，该列可以位于各向异性磁性材料的屏蔽内，其中磁通最容易沿选择的方向流动。 因此，导致另外将泄漏到柱中的外部磁场的磁通在屏蔽件的相应部分中沿轴向方向对齐，从而减小其水平分量。

公开(公告)号：US5458687A

公开(公告)日：1995-10-17

申请号：US154078

申请日：1993-11-18

Applicant: Hiroyuki Shichida ,  Naoyuki Tamura ,  Akitaka Makino

Inventor： Hiroyuki Shichida ,  Naoyuki Tamura ,  Akitaka Makino

IPC: C23C16/50 ,  C23C16/458 ,  C23C16/511 ,  C23F4/00 ,  H01J37/02 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/683 ,  C23C16/00

CPC classification number: H01J37/3244 ,  C23C16/4586 ,  H01J37/026 ,  H01L21/6831 ,  H01J2237/0203 ,  H01J2237/2001

Abstract: A wafer processing apparatus comprises a vacuum processing chamber, and a wafer holder disposed within the vacuum processing chamber to hold a wafer to be processed fixedly thereon by electrostatic attraction. A cooling or heating gas is supplied into the space between the surface of the wafer holder and the backside of a wafer set on the wafer holder to cool or heat the wafer. In case the electrostatic attraction disappears accidentally due to, for example, power failure, the cooling or heating gas in the space between the surface of the wafer holder and the backside of the wafer set on the wafer holder is discharged quickly upon the disappearance of the electrostatic attraction between the wafer holder and the wafer to prevent the wafer being caused to float and being dislocated by the pressure of the cooling or heating gas existing in the space between the surface of the wafer holder and the backside of the wafer.

Abstract translation: 晶片处理装置包括真空处理室和设置在真空处理室内的晶片保持器，以通过静电吸引将待固化的晶片保持在其上。 将冷却或加热气体供应到晶片保持器的表面和晶片保持器上设置的晶片的背面之间的空间中以冷却或加热晶片。 在静电吸引由于例如电源故障而意外地消失的情况下，在晶片保持器的表面和晶片保持器上设置的晶片的背面之间的空间中的冷却或加热气体在消失时被快速放电 晶片保持器和晶片之间的静电吸引，以防止晶片由于存在于晶片保持器的表面和晶片的背面之间的空间中的冷却或加热气体的压力而浮起而脱位。

公开(公告)号：US20240234101A1

公开(公告)日：2024-07-11

申请号：US18613512

申请日：2024-03-22

Applicant: INNOVATION FOR CREATIVE DEVICES CO., LTD.

Inventor： Buil JEON ,  Taeho SHIN ,  Dooho LIM ,  Jungsu PARK ,  Bumsoo ON ,  Seungho LEE

IPC: H01J37/32

CPC classification number: H01J37/32633 ,  H01J37/321 ,  H01J37/32146 ,  H01J37/32357 ,  H01J2237/0203 ,  H01J2237/3343

Abstract: A plasma substrate treatment apparatus according to one embodiment of the present invention comprises: a remote plasma generator for generating plasma and an active species; an upper chamber having an opening connected to an output port of the remote plasma generator and receiving and diffusing the active species of the remote plasma generator; a first baffle disposed on the opening of the upper chamber; a lower chamber receiving the diffused active species from the upper chamber; a second baffle partitioning the upper chamber and the lower chamber and transmitting the active species; a substrate holder for supporting a substrate disposed in the lower chamber; and an RF power source applying RF power to the substrate holder.

公开(公告)号：US20230343551A1

公开(公告)日：2023-10-26

申请号：US18137779

申请日：2023-04-21

Applicant: ASM IP Holding B.V.

Inventor： Shinya Yamada

IPC: C23C16/36 ,  C23C16/40 ,  C23C16/34 ,  C23C16/04 ,  C23C16/455 ,  C23C16/505 ,  H01J37/32

CPC classification number: H01J37/32082 ,  C23C16/042 ,  C23C16/345 ,  C23C16/36 ,  C23C16/401 ,  C23C16/45536 ,  C23C16/505 ,  H01J2237/0203 ,  H01J2237/332

Abstract: Provided is a substrate processing method in which a liner layer is formed on the photo resist underlayer, followed by forming SiO2 patterning layer thereon. According to the embodiment, the liner layer is formed by providing a silicon-containing layer, followed by inert gas activated by providing a high frequency RF power and a low frequency RF power together simultaneously. Thus, a loss of photo resist underlayer may be minimized within the range that does not affect the device performance and the wet etch properties and the width between fine patterns may be kept constant while the thickness of the liner layer is thin.

公开(公告)号：US20230230810A1

公开(公告)日：2023-07-20

申请号：US17923931

申请日：2020-10-05

Applicant: SPP Technologies Co., Ltd.

Inventor： Kazuyuki SUEDA ,  Masahiro SASAKURA ,  Ryoto YAMAMOTO ,  Mai SUMIKAWA

IPC: H01J37/32 ,  C23C16/02 ,  C23C16/50 ,  C23C16/56

CPC classification number: H01J37/3244 ,  C23C16/0245 ,  C23C16/50 ,  C23C16/56 ,  H01J2237/334 ,  H01J2237/332 ,  H01J2237/0203

Abstract: A plasma processing apparatus 100, which has an impact on global warming and allows for high-throughput plasma processing, includes a chamber 1 in which plasma is generated, a mounting table 2 disposed in the chamber, wherein a substrate S is mounted on the mounting table 2, and a gas supply source 3 (3a to 3d) for supplying gas for generating plasma in the chamber, wherein the substrate is subjected to deep etching by executing alternately and repeatedly an etching process S2 of etching the substrate by using plasma and a protective film deposition process S3 of depositing a protective film in a recess formed through the etching process by using plasma. It is characterized in that, in the protective film deposition process S3, a mixed gas of C4F8 and 2,3,3,3-tetrafluoropropene is supplied from the gas supply sources 3b, 3c into the chamber as gas supplied for generating plasma.

公开(公告)号：US20180061612A1

公开(公告)日：2018-03-01

申请号：US15253680

申请日：2016-08-31

Applicant: FEI Company

Inventor： Yoav Neuman

IPC: H01J37/26 ,  G01V1/00

CPC classification number: H01J37/261 ,  G01H9/00 ,  G01V1/001 ,  H01J2237/0203 ,  H01J2237/20292

Abstract: Probe landing is detected by detecting a change in a vibration of the probe in a plane substantially parallel to the work piece surface as the probe is lowered toward the work piece. The vibration may be observed, for example, by acquiring multiple electron microscope images of the probe as it moves and analyzing the images the determine a characteristic, such as the amplitude of the vibration. When the probe contacts the work piece surface, the friction between the probe tip and the work piece surface will change the characteristic of the vibration, which can be detected to indicate that the probe has landed.

公开(公告)号：US20160365228A1

公开(公告)日：2016-12-15

申请号：US15245711

申请日：2016-08-24

Applicant: Lam Research Corporation

Inventor： Harmeet Singh ,  Thorsten Lill

IPC: H01J37/32 ,  H01L21/3065 ,  C23C16/44 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01J37/32495 ,  C23C16/4404 ,  H01J37/32477 ,  H01J37/32715 ,  H01J37/32724 ,  H01J2237/0203 ,  H01J2237/332 ,  H01J2237/334 ,  H01J2237/3344 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/6715 ,  H01L21/68735

Abstract: A component of a plasma processing chamber having a protective liquid layer on a plasma exposed surface of the component The protective liquid layer can be replenished by supplying a liquid to a liquid channel and delivering the liquid through liquid feed passages in the component. The component can be an edge ring which surrounds a semiconductor substrate supported on a substrate support in a plasma processing apparatus wherein plasma is generated and used to process the semiconductor substrate. Alternatively, the protective liquid layer can be cured or cooled sufficiently to form a solid protective layer.

Abstract translation: 等离子体处理室的部件，其具有在部件的等离子体暴露表面上的保护液层。可以通过向液体通道供应液体并将液体输送到部件中的液体进料通道来补充保护液体层。 该组件可以是围绕在等离子体处理装置中的支撑在基板支撑件上的半导体衬底的边缘环，其中产生等离子体并用于处理半导体衬底。 或者，可以将保护液层充分固化或冷却以形成固体保护层。

公开(公告)号：US09194839B2

公开(公告)日：2015-11-24

申请号：US14679259

申请日：2015-04-06

Applicant: HONDA MOTOR CO., LTD.

Inventor： Nariaki Kuriyama ,  Yoshiya Fujiwara

IPC: G01F23/00 ,  G01N27/404

CPC classification number: G01N27/404 ,  H01J37/22 ,  H01J37/26 ,  H01J2237/0203 ,  H01J2237/2003 ,  H01J2237/2008

Abstract: An analytical cell includes first and second holders. The first and second holders each contain a substrate having a through-hole and a transmission membrane with an electron beam permeability so as to cover the through-hole. The first and second holders are stacked to form an overlapping portion such that the transmission membranes face each other and that an inner space therein containing the electrolytic solution is sealed. The through-holes face each other across the transmission membranes to form an observation window. Negative and positive electrode active materials are separated from each other and contact the electrolytic solution in the observation window. A transmission body containing an electron beam permeable solid is formed between at least one of the negative and positive electrode active materials and the transmission membrane.

Abstract translation: 分析单元包括第一和第二支架。 第一和第二支架各自包含具有通孔的基板和具有电子束透过性的透光膜以覆盖通孔。 第一和第二保持器堆叠形成重叠部分，使得透膜彼此面对，并且其中包含电解液的内部空间被密封。 通孔在透过膜上面对面形成观察窗。 负极和正极活性物质彼此分离并与观察窗中的电解液接触。 在负极和正极活性物质和透射膜中的至少一个之间形成含有电子束透过性固体的透射体。