公开(公告)号：US09263232B2

公开(公告)日：2016-02-16

申请号：US14395263

申请日：2013-04-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Shinsuke Kawanishi ,  Tomohisa Ohtaki ,  Masahiko Ajima ,  Sukehiro Ito

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/261 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/162 ,  H01J2237/164 ,  H01J2237/2003 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2605

Abstract: A charged particle beam device (1) includes a charged particle optical lens barrel (10), a support housing (20) equipped with the charged particle optical lens barrel (10) thereon, and an insertion housing (30) inserted in the support housing (20). A first aperture member (15) is disposed in the vicinity of the center of the magnetic field of an objective lens, and a second aperture member (15) is disposed so as to externally close an opening part provided at the upper side of the insertion housing (30). Further, when a primary charged particle beam (12) is irradiated to a sample (60) arranged under the lower side of the second aperture member (31), secondary charged particles thus emitted are detected by a detector (16).

Abstract translation: 带电粒子束装置（1）包括带电粒子光学透镜镜筒（10），在其上装有带电粒子光学透镜镜筒（10）的支撑壳体（20）和插入支撑壳体 （20）。 第一孔径构件（15）设置在物镜的磁场的中心附近，并且第二孔径构件（15）设置成外部封闭设置在插入件的上侧的开口部分 住房（30）。 此外，当将初级带电粒子束（12）照射到布置在第二孔径构件（31）的下侧下方的样品（60）时，由检测器（16）检测如此发射的二次带电粒子。

公开(公告)号：US09240306B2

公开(公告)日：2016-01-19

申请号：US14373893

申请日：2012-12-05

Applicant: Mapper Lithography IP B.V.

Inventor： Jan Andries Meijer ,  Paul IJmert Scheffers ,  Abdourahmane Ange Sarr

IPC: H01J37/00 ,  H01J37/252 ,  H01J37/09 ,  H01J37/244 ,  H01J37/30 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/252 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/244 ,  H01J37/3002 ,  H01J37/3005 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/2001 ,  H01J2237/24521 ,  H01J2237/2802 ,  H01J2237/30477 ,  H01J2237/31793

Abstract: The invention relates to a device for spot size measurement at wafer level in a multi charged particle beam lithography system. The device comprises a knife edge structure on top of a scintillating material, such a YAG material. The knife edge structure is arranged in a Si wafer which has a top plane at a sharp angle to a (1 1 0) plane of the Si. In an embodiment the angle is in the range from 2 to 4 degrees, preferably in the range from 2.9-3.1 degrees. The invention relates in addition to a method for manufacturing a device for spot size measurement at wafer level in a multi charged particle beam lithography system.

Abstract translation: 本发明涉及一种用于在多带电粒子束光刻系统中在晶片级进行点尺寸测量的装置。 该装置包括在闪烁材料的顶部上的刀刃结构，例如YAG材料。 刀刃结构布置在Si晶片中，其具有与Si的（110）平面成锐角的顶面。 在一个实施例中，角度在2至4度的范围内，优选在2.9-3.1度的范围内。 本发明还涉及一种用于在多带电粒子束光刻系统中制造用于晶片级的点尺寸测量的装置的方法。

公开(公告)号：US20160013019A1

公开(公告)日：2016-01-14

申请号：US14795535

申请日：2015-07-09

Applicant: IMS Nanofabrication AG

Inventor： Elmar Platzgummer

IPC: H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3177 ,  G06F17/5072 ,  G06F17/5081 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/043 ,  H01J2237/3175 ,  H01J2237/31764

Abstract: An exposure pattern is computed for exposing a desired pattern on a target in a charged-particle multi-beam processing apparatus to match a reference writing tool, and/or for compensating a deviation of the imaging from a pattern definition device onto the target from a desired value of critical dimension along at least one direction in the image area on the target: The desired pattern is provided as a graphical representation suitable for the reference tool, on the image area on the target. A convolution kernel is used which describes a mapping from an element of the graphical representation to a group of pixels which is centered around a nominal position of said element. A nominal exposure pattern is calculated by convolution of the graphical representation with the convolution kernel, said nominal exposure pattern being suitable to create a nominal dose distribution on the target when exposed with the processing apparatus.

Abstract translation: 计算曝光图案以在带电粒子多光束处理装置中的目标上曝光期望图案以匹配参考写入工具，和/或用于从图案定义装置将图像偏离从图案定义装置补偿到目标上 在目标图像区域中至少沿一个方向的临界尺寸的期望值：所需图案作为适合参考工具的图形表示，在目标上的图像区域上提供。 使用卷积核，其描述从图形表示的元素到以所述元素的标称位置为中心的一组像素的映射。 通过图形表示与卷积核的卷积来计算标称曝光图案，所述标称曝光图案适于在用处理装置曝光时在目标上产生标称剂量分布。

公开(公告)号：US09224576B2

公开(公告)日：2015-12-29

申请号：US14165573

申请日：2014-01-27

Applicant: Carl Zeiss Microscopy GmbH ,  Applied Materials Israel, Ltd.

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares ,  Steven Rogers

IPC: G21K5/10 ,  H01J37/08 ,  H01J37/30 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/28 ,  H01J37/317 ,  H01J37/14 ,  H01J37/10

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US09208990B2

公开(公告)日：2015-12-08

申请号：US14129261

申请日：2012-05-22

Applicant: Hirokazu Tamaki ,  Yoshio Takahashi ,  Hiroto Kasai ,  Hiroyuki Kobayashi

Inventor： Hirokazu Tamaki ,  Yoshio Takahashi ,  Hiroto Kasai ,  Hiroyuki Kobayashi

IPC: H01J37/09 ,  H01J37/295 ,  H01J37/147 ,  H01J37/26

CPC classification number: H01J37/147 ,  H01J37/09 ,  H01J37/26 ,  H01J37/263 ,  H01J37/295 ,  H01J2237/2614

Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.

Abstract translation: 提供一种用于电子显微镜的相位板，其减少了由电子束的中断引起的图像信息损失的问题，并且改善了各向异性势分布的问题。 该相板包括连接到单个开口中的开口（23）和从开口的外部部分朝向开口的中心布置在开口中的多个电极（11）。 电极（11）的横截面被构造成使得包括导体或半导体的电压施加层（24）被包括具有中间绝缘层的导体或半导体的屏蔽层覆盖。 通过这种方式，该相位板能够减少由于电极（11）引起的电子束中断，并且能够改善各向异性势分布的问题。

公开(公告)号：US09208989B2

公开(公告)日：2015-12-08

申请号：US13295243

申请日：2011-11-14

Applicant: Alexander Hendrik Vincent Van Veen ,  Yanxia Zhang ,  Gun Sari Mari Berglund ,  Pieter Kruit

Inventor： Alexander Hendrik Vincent Van Veen ,  Yanxia Zhang ,  Gun Sari Mari Berglund ,  Pieter Kruit

IPC: H01J3/26 ,  H01J37/09

CPC classification number: H01J37/09 ,  H01J2237/002 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/31774

Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.

Abstract translation: 一种用于将图案转印到诸如晶片的靶的表面上的带电粒子光刻系统，包括适于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置，所述会聚装置包括 第一电极和包括多个孔的孔阵列元件，所述孔阵列元件形成第二电极，其中所述系统适于在所述第一电极和所述第二电极之间产生电场。

公开(公告)号：US20150179394A1

公开(公告)日：2015-06-25

申请号：US14404115

申请日：2013-04-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsutomu Saito ,  Kenji Aoki

IPC: H01J37/10 ,  H01J37/26

CPC classification number: H01J37/10 ,  H01J37/09 ,  H01J37/18 ,  H01J37/26 ,  H01J2237/103

Abstract: A preferred aim of the present invention is to provide a charged particle beam device having a high differential exhaust performance while maintaining a large dynamic range of an irradiation current by effectively arranging an aperture for differential pumping (111) and an objective final aperture (110). The present invention has features that a lens barrel including therein an optical system of the charged particle beam device (100) includes a first space (106) having a first degree of vacuum and a second space (105) having a degree of vacuum higher than the first degree of vacuum, and that the objective final aperture (110) is arranged in the second space (105).

Abstract translation: 本发明的优选目的是提供一种具有高差分排气性能的带电粒子束装置，同时通过有效地布置差分泵浦（111）和目标最终孔径（110）的孔径来保持辐射电流的大动态范围， 。 本发明的特征在于，其中包括带电粒子束装置（100）的光学系统的镜筒包括具有第一真空度的第一空间（106）和具有高于 第一真空度，并且目标最终孔（110）布置在第二空间（105）中。

公开(公告)号：US20150123754A1

公开(公告)日：2015-05-07

申请号：US14389972

申请日：2012-07-07

Applicant: Guoqiang Yu ,  Peng Guo ,  Xiufeng Han ,  Chaohui Guo ,  Xiaoyu Sun ,  Xiangqian Zhou

Inventor： Guoqiang Yu ,  Peng Guo ,  Xiufeng Han ,  Chaohui Guo ,  Xiaoyu Sun ,  Xiangqian Zhou

IPC: H01F7/20

CPC classification number: H01J37/09 ,  G01R33/093 ,  G01R33/096 ,  H01F7/202 ,  H01F7/204 ,  H01F41/00 ,  H01J37/141 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/28 ,  H01J2237/31754 ,  H01L43/12

Abstract: A nano-patterned system comprises a vacuum chamber, a sample stage and a magnetic-field applying device. The magnetic-field applying device comprises a power supply, magnetic poles, and a magnetic-field generation device having a magnetic conductive soft iron core and a coil connected to the power supply and wound on the soft iron core to generate a magnetic field. The soft iron core is a semi-closed frame structure and the magnetic poles are respectively disposed at the two ends of the semi-closed frame structure. The sample stage is inside the vacuum chamber. The magnetic poles are opposite one another inside the vacuum chamber with respect to the sample stage. The coil and soft iron core are outside the vacuum chamber. The soft iron core leads the magnetic field generated by the coil into the vacuum chamber. The magnetic poles locate a sample on the sample stage and apply a local magnetic field.

Abstract translation: 纳米图案系统包括真空室，样品台和磁场施加装置。 磁场施加装置包括电源，磁极和具有导电软铁芯的磁场产生装置和连接到电源的线圈并缠绕在软铁芯上以产生磁场的磁场产生装置。 软铁芯是半封闭框架结构，磁极分别设置在半封闭框架结构的两端。 样品台位于真空室内。 磁极相对于样品台在真空室内彼此相对。 线圈和软铁芯在真空室外。 软铁芯将线圈产生的磁场引入真空室。 磁极将样品定位在样品台上并施加局部磁场。

公开(公告)号：US09006654B2

公开(公告)日：2015-04-14

申请号：US14447589

申请日：2014-07-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Soichiro Matsunaga ,  Souichi Katagiri ,  Hajime Kawano

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/304 ,  H01J37/09 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/06 ,  H01J37/09 ,  H01J37/147 ,  H01J37/3045 ,  H01J2237/0455 ,  H01J2237/06316 ,  H01J2237/065 ,  H01J2237/1501 ,  H01J2237/24465 ,  H01J2237/24535 ,  H01J2237/24542

Abstract: An embodiment is to provide a technique that continuously applies a certain amount of an electron beam to a sample by selecting a beam applied to the sample from an electron beam emitted from an electron source in a scanning electron microscope. A charged particle apparatus is configured, including: a mechanism that detects the distribution of electric current strength with respect to the emitting direction of an electron beam emitted from an electron source; a functionality that predicts a fluctuation of an electric current applied to a sample by predicting the distribution of the electric current based on the detected result; a functionality that determines a position at which a beam applied to the sample is acquired based on the predicted result; and a mechanism that controls a position at which a probe beam is acquired based on the determined result.

Abstract translation: 一个实施例是提供一种技术，其通过从扫描电子显微镜中从电子源发射的电子束中选择施加到样品的光束，将一定量的电子束连续地施加到样品。 一种带电粒子装置，包括：检测相对于从电子源发射的电子束的发射方向的电流强度分布的机构; 通过基于检测结果预测电流分布来预测施加到样本的电流的波动的功能; 基于预测结果确定施加到样本的光束的位置的功能; 以及基于所确定的结果来控制获取探测光束的位置的机构。

公开(公告)号：US08952342B2

公开(公告)日：2015-02-10

申请号：US12970842

申请日：2010-12-16

Applicant: Jerry Peijster ,  Aditya Mehendale ,  Andre Johannes Maria Hilderink

Inventor： Jerry Peijster ,  Aditya Mehendale ,  Andre Johannes Maria Hilderink

IPC: H01J37/20

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/202

Abstract: The invention relates to a charged particle system provided with a support and positioning structure for supporting and positioning a target on a table, the support and positioning structure comprising a first member and a second member and at least one motor so as to move the first member relative to the second member, wherein a shield is present to shield at least one charged particle beam from electromagnetic fields generated by said at least one motor, the support and positioning structure further comprising a spring mechanically coupling the first member and the second member for at least partially bearing the weight of the first member, table and target.

Abstract translation: 本发明涉及一种具有支撑和定位结构的带电粒子系统，用于将靶材支撑并定位在桌子上，支撑和定位结构包括第一构件和第二构件以及至少一个马达，以使第一构件 相对于第二构件，其中存在用于屏蔽来自由所述至少一个电动机产生的电磁场的至少一个带电粒子束的屏蔽，所述支撑和定位结构还包括弹簧，其将所述第一构件和所述第二构件机械地联接在一起 最少部分地承载第一构件，工作台和目标的重量。