Abstract:
A chamber, for bounding a plasma generation area in a vacuum pressure sensor, includes an electrically conductive casing element located radially on an outside relative to a central axis. The chamber includes electrically conductive wall elements arranged substantially perpendicular to the central axis and connected to the electrically conductive casing element. At least one of the wall elements has a first opening, through which the central axis extends. The electrically conductive casing element comprises at least a first and a second region. The first region is located closer to the central axis than the second region. The electrically conductive casing element is conical at least in part.
Abstract:
A substrate processing apparatus includes a chamber including a processing room for processing of a substrate using an introduced gas and an exhaust room for exhausting the gas in the processing room, a shield member provided near a side wall of the chamber to separate the processing room and the exhaust room and including a hole allowing the processing room and the exhaust room to communicate with each other, the shield member being driven in a vertical direction, and a hollow relay member connected to a pipe connected to an instrument outside the chamber and configured to be driven in a horizontal direction. When the shield member reaches an upper position, the relay member is driven inwardly of the chamber to be connected to the shield member at its inward end to allow the processing room and the pipe to communicate with each other through the hole.
Abstract:
The disclosure includes an ionization chamber, a first electron multiplier, and a second electron multiplier. The ionization chamber is configured to receive gas molecules from an environment at a pressure. The first electron multiplier is configured to receive a plurality of photons from a photon source, generate a first plurality of electrons from the plurality of photons, and discharge the first plurality of electrons into the ionization chamber to generate a plurality of gas ions from at least a portion of the gas molecules. The second electron multiplier is configured to receive the plurality of gas ions from the ionization chamber and generate a second plurality of electrons from the plurality of gas ions that is proportional to a quantity of the plurality of gas ions. A quantity of electrons of the second plurality of electrons is indicative of the pressure.
Abstract:
System (300, 400) and methods (500) for testing a reaction thruster (100) in a vacuum environment. The methods comprise: disposing the reaction thruster in a vacuum chamber which is at least partially connected to earth ground; removing at least one gas from the vacuum chamber to provide the vacuum environment; operating the reaction thruster so as to create a beam of electrons; and/or electrically isolating the electrons of the beam from at least one electrically conductive surface of the vacuum chamber. The electrical isolation can be achieved by applying an electrical bias voltage to the beam via an electrode. The electrode may comprise a conductive object disposed in the vacuum chamber and/or at least a portion of a vacuum chamber wall. In all cases, the electrode is electrically isolated from a portion of the vacuum chamber that is connected to ground.
Abstract:
An ionization gauge to measure pressure, while controlling the location of deposits resulting from sputtering when operating at high pressure, includes at least one electron source that emits electrons, and an anode that defines an ionization volume. The ionization gauge also includes a collector electrode that collects ions formed by collisions between the electrons and gas molecules and atoms in the ionization volume, to provide a gas pressure output. The electron source can be positioned at an end of the ionization volume, such that the exposure of the electron source to atom flux sputtered off the collector electrode and envelope surface is minimized. Alternatively, the ionization gauge can include a first shade outside of the ionization volume, the first shade being located between the electron source and the collector electrode, and, optionally, a second shade between the envelope and the electron source, such that atoms sputtered off the envelope are inhibited from depositing on the electron source.
Abstract:
Aspects of the present disclosure include a computer-implemented method for identifying an operating temperature of an integrated circuit (IC), the method including using a computing device for: applying a test voltage to a test circuit embedded within the IC, the test circuit including a phase shift memory (PSM) element therein, wherein the PSM element crystallizes at a crystallization temperature from an amorphous phase having a first electrical resistance into a crystalline phase having a second electrical resistance, the second electrical resistance being less than the first electrical resistance; and identifying the IC as having operated above the crystallization temperature in response to a resistance of the test circuit at the test voltage being outside of the target operating range.
Abstract:
A Long Lifetime Cold Cathode Ionization Vacuum Gauge Design with an extended anode electrode having an axially directed tip, a cathode electrode, and a baffle structure. The axially directed tip of the anode electrode can have a rounded exterior with a diameter at least 10% greater than the diameter of the anode electrode.
Abstract:
A charged particle beam instrument is offered which can easily perform an in situ observation in a gaseous atmosphere. The charged particle beam instrument (100) is used to perform an observation of a specimen (S) placed in a gaseous atmosphere and has a specimen chamber (2), a gas supply portion (6) for supplying a gas into the specimen chamber (2), a venting portion (7) for venting the specimen chamber (2), a gaseous environment adjuster (4), and a gas controller (812) for controlling the gaseous environment adjuster (4). This adjuster (4) has a gas inflow rate adjusting valve (40) for adjusting the flow rate of the gas supplied into the specimen chamber (2) and a first vacuum gauge (CG1) for measuring the pressure of the gas supplied into the specimen chamber (2). The gas controller (812) sets a target value of pressure for the gas supplied into the specimen chamber (2) based on a predetermined relational expression indicating a relationship between the reading of the first vacuum gauge (CG1) and the pressure inside the specimen chamber (2) and on a corrective coefficient for correcting the reading of the first vacuum gauge (CG1) according to the species of the gas supplied into the specimen chamber (2) and controls the gas inflow rate adjusting valve (40) such that the reading of the first vacuum gauge (CG1) reaches the target value of pressure.