公开(公告)号：US09376336B2

公开(公告)日：2016-06-28

申请号：US13824874

申请日：2011-09-26

Applicant: Akihiro Kimura ,  Suguru Matsumoto ,  Izumi Fusegawa ,  Katsuhiko Miki

Inventor： Akihiro Kimura ,  Suguru Matsumoto ,  Izumi Fusegawa ,  Katsuhiko Miki

IPC: C30B15/02 ,  C03B20/00 ,  C30B15/08 ,  C03B19/09 ,  C03B19/14 ,  C03B23/20 ,  C30B15/10 ,  C30B29/06

CPC classification number: C03B20/00 ,  C03B19/095 ,  C03B19/14 ,  C03B23/20 ,  C03B2201/23 ,  C30B15/02 ,  C30B15/08 ,  C30B15/10 ,  C30B29/06 ,  Y02P40/57 ,  Y10T117/1032

Abstract: Described herein is a method for producing a quartz glass crucible, including the steps of: preparing a crucible base material that is made of quartz glass and has a crucible shape; producing a synthetic quartz glass material by the direct process or the soot process; processing the synthetic quartz glass material into a crucible shape without pulverizing the synthetic quartz glass material; and welding the synthetic quartz glass material processed into the crucible shape to the inner surface of the crucible base material. As a result, there are provided a quartz glass crucible that avoids generation of dislocation in a silicon single crystal, the generation of dislocation caused by the crucible itself, at the time of production of a silicon single crystal and has high heat resistance, a method for producing the quartz glass crucible, and a method for producing a silicon single crystal, the method using such a quartz glass crucible.

Abstract translation: 本文描述了一种生产石英玻璃坩埚的方法，包括以下步骤：制备由石英玻璃制成并具有坩埚形状的坩埚基材; 通过直接工艺或烟灰工艺生产合成石英玻璃材料; 将合成石英玻璃材料加工成坩埚形状而不粉碎合成石英玻璃材料; 并将加工成坩埚形状的合成石英玻璃材料焊接到坩埚基材的内表面。 结果，提供了一种石英玻璃坩埚，其在硅单晶制造时避免了硅单晶中的位错产生，坩埚本身产生位错，并且具有高耐热性，方法 用于制造石英玻璃坩埚的方法和使用这种石英玻璃坩埚的方法。

公开(公告)号：US20160137545A1

公开(公告)日：2016-05-19

申请号：US14921487

申请日：2015-10-23

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/12 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/10 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/076 ,  C03C10/0009 ,  C03C2201/10 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2201/50 ,  C03C2201/54 ,  C03C2201/58 ,  C03C2203/54

Abstract: Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (Tf), and low expansivity slope.

Abstract translation: 超低膨胀二氧化钛 - 二氧化硅玻璃。 玻璃具有高羟基含量，并且任选地包括一种或多种掺杂剂。 代表性的可选掺杂剂包括硼，碱元素，碱土金属元素或诸如Nb，Ta，Al，Mn，Sn Cu和Sn的金属。 玻璃通过包括蒸汽固结以增加羟基含量的方法制备。 高羟基含量或掺杂剂和高羟基含量的组合降低了玻璃的假想温度，以提供具有非常低的热膨胀系数（CTE），低假想温度（Tf）和低膨胀斜率的玻璃。

公开(公告)号：US20140182510A1

公开(公告)日：2014-07-03

申请号：US14122509

申请日：2013-02-19

Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： Shigeru Yamagata

IPC: C30B15/10 ,  C03B19/02

CPC classification number: C03B19/02 ,  C03B19/095 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/54 ,  C03C3/06 ,  C03C8/02 ,  C03C10/0009 ,  C03C21/008 ,  C03C23/007 ,  C03C2201/02 ,  C03C2201/54 ,  C03C2201/80 ,  C03C2203/10 ,  C30B15/10 ,  C30B29/06 ,  Y02P40/57 ,  Y10T117/1032

Abstract: A single-crystal silicon pulling silica container including: a transparent silica glass layer in the inner side of the silica container; and an opaque silica glass layer containing gaseous bubbles in the outer side of the silica container, wherein the transparent layer constitutes of a high-OH group layer placed on an inner surface side of the silica container containing the OH group at a concentration of 200 to 2000 ppm by mass and a low-OH group layer having the OH group concentration lower than the high-OH group layer containing Ba at a concentration of 50 to 2000 ppm by mass. Resulting in the silica container used for pulling single-crystal silicon, providing the silica container improves etching corrosion resistance of the container inner surface to silicon melt when the entire inner surface of transparent silica glass of the container is crystallized short after using the container and method for such silica container.

Abstract translation: 一种单晶硅拉硅石容器，其包括：二氧化硅容器的内侧的透明石英玻璃层; 以及在二氧化硅容器的外侧含有气泡的不透明二氧化硅玻璃层，其中，所述透明层构成高OH基层，所述高OH基层位于含有浓度为200〜200的OH基团的二氧化硅容器的内表面侧 2000质量ppm，OH基浓度低于含有浓度为50〜2000质量ppm的Ba的高OH基层的低-OH基层。 导致用于拉拔单晶硅的二氧化硅容器，当容器内透明石英玻璃的整个内表面在使用容器之后结晶短时，提供二氧化硅容器提高容器内表面对硅熔体的耐蚀刻腐蚀性和方法 用于这种二氧化硅容器。

公开(公告)号：US20130160496A1

公开(公告)日：2013-06-27

申请号：US13721609

申请日：2012-12-20

Applicant: j-plasma GmbH

Inventor： Lothar Brehm ,  Frank Coriand ,  Wolfgang Schmidt ,  Ulrich Strobel

IPC: C03B37/018

CPC classification number: C03B19/14 ,  C03B19/1407 ,  C03B19/1415 ,  C03B37/01884 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/66

Abstract: A method for producing rod lenses with an enveloping diameter of the rod lens face of up to 200 mm and an edge length of at least 800 mm. The method is characterized in that fabrication is performed from a cylindrical rod lens element made from synthetic quartz glass material configured as a fused silica ingot. This is performed using a flame hydrolysis method with a direct one stage deposition process of SIOx particles from a flame stream onto die that rotates and is moveable in a linear manner with respect to the flame stream.

Abstract translation: 一种用于制造杆透镜面的包络直径高达200mm并且边缘长度至少为800mm的棒状透镜的方法。 该方法的特征在于，从由合成石英玻璃材料制成的圆柱形棒状透镜元件进行制造，所述石英玻璃材料被构造为熔融石英锭。 这是使用火焰水解方法进行的，其中SIOx颗粒从火焰流直接一步沉积过程转移到模具上，并且可相对于火焰流线性地移动。

公开(公告)号：US20130116108A1

公开(公告)日：2013-05-09

申请号：US13540204

申请日：2012-07-02

Applicant: Nathan J. Cassingham ,  Ben Matthew Gauthier ,  Martin Panchula ,  Robert Stephen Pavlik ,  Yan Zhou ,  Konstantin S. Zuyev

Inventor： Nathan J. Cassingham ,  Ben Matthew Gauthier ,  Martin Panchula ,  Robert Stephen Pavlik ,  Yan Zhou ,  Konstantin S. Zuyev

IPC: C03C3/06

CPC classification number: C03C1/02 ,  C03B1/00 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/23 ,  C03B2201/24 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/06 ,  C03C2201/08 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/31 ,  C03C2201/32 ,  C03C2201/34 ,  C03C2201/40 ,  C03C2201/50

Abstract: The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.

Abstract translation: 本发明涉及具有改善的物理和化学性质的二氧化硅玻璃化合物。 在一个实施方案中，本发明涉及具有期望的脆性以及所需密度的二氧化硅玻璃，同时仍然产生相对于其它玻璃具有所需硬度和所需强度的玻璃组合物。 在另一个实施方案中，本发明涉及二氧化硅玻璃组合物，其含有至少约85摩尔％的二氧化硅和至多约15摩尔％的选自F，B，N，Al，Ge的一种或多种掺杂剂，一种或多种 碱金属（如Li，Na，K等），一种或多种碱土金属（如Mg，Ca，Sr，Ba等），一种或多种过渡金属（如Ti，Zn，Y， Zr，Hf等），一种或多种镧系元素（例如Ce等），或其任何两种或多种的组合。

公开(公告)号：US08402786B2

公开(公告)日：2013-03-26

申请号：US10283055

申请日：2002-10-30

Applicant: Yoshiaki Ikuta ,  Shinya Kikugawa ,  Akio Masui ,  Noriaki Shimodaira ,  Shuhei Yoshizawa

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Akio Masui ,  Noriaki Shimodaira ,  Shuhei Yoshizawa

IPC: C03B25/00

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C23/00 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54 ,  Y02P40/57

Abstract: A process for producing a synthetic silica glass optical component which contains at least 1×1017 molecules/cm3 and has an OH concentration of at most 200 ppm and substantially no reduction type defects, by treating a synthetic silica glass having a hydrogen molecule content of less than 1×1017 molecules/cm3 at a temperature of from 300 to 600° C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.

Abstract translation: 一种合成石英玻璃光学部件的制造方法，其通过处理氢分子含量少的合成二氧化硅玻璃，其含有至少1×10 17分子/ cm 3，OH浓度为200ppm以下，基本上无还原型缺陷 在含有氢气的气氛中，在2-30atms的压力下，在300-600℃的温度下，比1×1017分子/ cm 3。

公开(公告)号：US20120058419A1

公开(公告)日：2012-03-08

申请号：US13223808

申请日：2011-09-01

Applicant: Shigeru Maida ,  Hisatoshi Otsuka ,  Osamu Sekizawa ,  Naoki Yanagisawa

Inventor： Shigeru Maida ,  Hisatoshi Otsuka ,  Osamu Sekizawa ,  Naoki Yanagisawa

IPC: C03C14/00 ,  G03F1/00 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/23 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/62 ,  C03B2207/64 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/42

Abstract: A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip.

Abstract translation: 通过将供氧反应气体和提供钛的反应气体与氢气和氧气一起通过燃烧器进行供给，使反应物气体进行氧化或火焰水解以形成合成物，制备适合作为EUV光刻元件的二氧化钛掺杂石英玻璃 二氧化硅 - 二氧化钛细颗粒，将颗粒沉积在旋转靶上，并同时熔化和玻璃化沉积的颗粒以生长掺杂二氧化钛的石英玻璃的锭。 目标被缩回，使得锭的生长前部可以与燃烧器尖端间隔至少250mm的距离。

公开(公告)号：US07989378B2

公开(公告)日：2011-08-02

申请号：US12824923

申请日：2010-06-28

Applicant: Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/06 ,  C03C3/11 ,  C03C3/112

CPC classification number: C03B19/1453 ,  C03B19/1461 ,  C03B32/00 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/46 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.

Abstract translation: 本发明提供具有合适的热膨胀性能的TiO 2 -SiO 2玻璃作为EUVL用曝光工具的光学部件。 本发明涉及热膨胀系数为0ppb /℃的温度为23±4℃的温度范围的含TiO2的二氧化硅玻璃，其温度范围为 的热膨胀为0±5ppb /℃，为5℃以上。

公开(公告)号：US20110177333A1

公开(公告)日：2011-07-21

申请号：US12998234

申请日：2009-09-29

Applicant: Gerhard Schoetz ,  Karsten Braeuer ,  Andreas Langner

Inventor： Gerhard Schoetz ,  Karsten Braeuer ,  Andreas Langner

IPC: G02B6/02 ,  C03B37/018

CPC classification number: C03B37/01426 ,  C03B37/01211 ,  C03B37/027 ,  C03B2201/12 ,  C03B2201/23 ,  Y02P40/57 ,  Y10T428/2935

Abstract: The aim of the invention is to improve a generally known method for producing quartz glass doped with fluorine, wherein SiO2 particles are formed in the presence of fluorine by means of a plasma deposition process, deposited in layers on an outer envelope of a cylindrical quartz glass substrate body rotating about its longitudinal axis, and vitrified to form a layer of quartz glass with a fluorine content of at least 1.5 wt. %, in such a way that a quartz glass semifinished product with a high fluorine content, characterised by a high basic transmission in the UV wavelength range, is obtained. To this end, the substrate body has at least one reservoir layer of quartz glass at least in the region of the outer envelope thereof, having a minimum hydroxyl group content of 200 wt. ppm and/or a minimum hydrogen content of 1×1017 molecules/cm3, and the substrate body is either fully or partially removed following the deposition of the quartz glass layer doped with fluorine.

Abstract translation: 本发明的目的是改进用于生产掺杂有氟的石英玻璃的通常已知的方法，其中通过等离子体沉积工艺在氟存在下形成SiO 2颗粒，其沉积在圆柱形石英玻璃的外包层上 衬底体围绕其纵向轴线旋转，并且玻璃化以形成氟含量为至少1.5重量％的石英玻璃层。 以这样的方式获得具有高氟含量的石英玻璃半成品，其特征在于在UV波长范围内具有高的基本透射率。 为此，衬底主体至少在其外壳的区域中具有至少一个石英玻璃储存层，其最小羟基含量为200重量％。 ppm和/或1×1017分子/ cm 3的最小氢含量，并且在掺杂了氟的石英玻璃层沉积之后，基板主体被完全或部分地去除。

公开(公告)号：US20110159413A1

公开(公告)日：2011-06-30

申请号：US12967175

申请日：2010-12-14

Applicant: Shigeru Maida ,  Hisatoshi Otsuka ,  Tetsuji Ueda ,  Masanobu Ezaki

Inventor： Shigeru Maida ,  Hisatoshi Otsuka ,  Tetsuji Ueda ,  Masanobu Ezaki

IPC: G03F1/00 ,  C03B19/00 ,  C03C3/04

CPC classification number: G03F7/2008 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/06 ,  G03F1/24

Abstract: A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV lithography member.

Abstract translation: 在900℃热处理100小时时，OH基浓度小于或等于100ppm的二氧化钛掺杂石英玻璃适合作为EUV光刻元件。