公开(公告)号：US09721750B2

公开(公告)日：2017-08-01

申请号：US14811097

申请日：2015-07-28

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： William Davis Lee ,  Alexandre Likhanskii

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/317

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/028

Abstract: Provided herein are approaches for controlling particle trajectory from a beam-line electrostatic element. In an exemplary approach, a beam-line electrostatic element is disposed along a beam-line of an electrostatic filter (EF), and a voltage is supplied to the beam-line electrostatic element to generate an electrostatic field surrounding the beam-line electrostatic element, agitating a layer of contamination particles formed on the beam-line electrostatic element. A trajectory of a set of particles from the layer of contamination particles is then modified to direct the set of particles to a desired location within the EF. In one approach, the trajectory is controlled by providing an additional electrode adjacent the beam-line electrostatic element, and supplying a voltage to the additional electrode to control a local electrostatic field in proximity to the beam-line electrostatic element. In another approach, the trajectory is influenced by one or more geometric features of the beam-line electrostatic element.

公开(公告)号：US09683285B2

公开(公告)日：2017-06-20

申请号：US14218434

申请日：2014-03-18

Applicant: Andre Anders ,  Jonathan Kolbeck

Inventor： Andre Anders ,  Jonathan Kolbeck

IPC: C23C14/56 ,  C23C14/35 ,  H01J37/34

CPC classification number: C23C14/564 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/3408 ,  H01J37/3447 ,  H01J2237/028

Abstract: This disclosure provides systems, methods, and apparatus related to blocking macroparticles in deposition processes utilizing plasmas. In one aspect, an apparatus includes a cathode, a substrate holder, a first magnet, a second magnet, and a structure. The cathode is configured to generate a plasma. The substrate holder is configured to hold a substrate. The first magnet is disposed proximate a first side of the cathode. The second magnet is disposed proximate a second side of the substrate holder. A magnetic field exists between the first magnet and the second magnet and a flow of the plasma substantially follows the magnetic field. The structure is disposed between the second side of the cathode and the first side of the substrate holder and is positioned proximate a region where the magnetic field between the first magnet and the second magnet is weak.

公开(公告)号：US09368319B2

公开(公告)日：2016-06-14

申请号：US14433886

申请日：2013-10-17

Applicant: Hitachi High-Technologies Corporation

Inventor： Kazuma Tanii ,  Yuji Kasai ,  Masakazu Takahashi ,  Hajime Kawano

IPC: G01N23/225 ,  G01N21/956 ,  H01J37/16 ,  H01J37/244 ,  H01J37/141 ,  H01J37/28 ,  H01J37/21

CPC classification number: H01J37/141 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/14 ,  H01J2237/2817

Abstract: Foreign substances present in a sample chamber are attached to or drawn close to an objective lens and an electrode disposed close to the objective lens by applying a higher magnetic field than when normally used to the objective lens and applying a higher electric field than when normally used to the electrode disposed close to the objective lens. A stage is moved such that the center of an optical axis is located directly above a dedicated stand capable of applying voltage, the magnetic field of the objective lens is turned off, and then the potential difference between the electrode disposed close to the objective lens and an electrode disposed close to the sage is periodically maximized and minimized to thereby forcibly drop the foreign substances onto the dedicated stand capable of applying voltage.

Abstract translation: 存在于样品室中的异物通过施加比通常用于物镜时更高的磁场并且施加比通常使用的电场高的电场而附接到或靠近物镜和靠近物镜设置的电极 到靠近物镜设置的电极。 移动台，使得光轴的中心位于能够施加电压的专用支架的正上方，物镜的磁场被关闭，然后将靠近物镜的电极之间的电位差和 靠近圣人设置的电极被周期性地最大化并最小化，从而强制将异物掉入能够施加电压的专用支架上。

公开(公告)号：US20140339424A1

公开(公告)日：2014-11-20

申请号：US14277933

申请日：2014-05-15

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Albrecht Glasmachers ,  Michel Aliman

IPC: H01J37/05 ,  H01J37/252 ,  H01J37/244

CPC classification number: H01J37/05 ,  H01J37/244 ,  H01J37/252 ,  H01J49/022 ,  H01J49/027 ,  H01J49/424 ,  H01J2237/028 ,  H01J2237/057

Abstract: A device for mass selective determination of at least one ion or of a plurality of ions is used, for example, in a measuring apparatus having an ion trap. The ion trap has a ring electrode having a first opening. A first electrode is arranged at the first opening. Furthermore, an amplifier for providing a radio-frequency storage signal for the ion trap and a first transformer are provided, said first transformer being connected to the amplifier and the first electrode in such a way that the radio-frequency storage signal is coupled into the first electrode via the first transformer.

Abstract translation: 例如，在具有离子阱的测量装置中使用用于质量选择性测定至少一种离子或多种离子的装置。 离子阱具有具有第一开口的环形电极。 第一电极布置在第一开口处。 此外，提供了一种用于提供用于离子阱的射频存储信号和第一变压器的放大器，所述第一变压器以这样的方式连接到放大器和第一电极，使得射频存储信号耦合到 第一电极经由第一变压器。

公开(公告)号：US20130256558A1

公开(公告)日：2013-10-03

申请号：US13433748

申请日：2012-03-29

Applicant: Christian DIETL ,  Gerald SCHMID ,  Bernd SCHINDLER ,  Gerd BENNER ,  Thilo MANDLER ,  Marco MATIJEVIC

Inventor： Christian DIETL ,  Gerald SCHMID ,  Bernd SCHINDLER ,  Gerd BENNER ,  Thilo MANDLER ,  Marco MATIJEVIC

IPC: B01D53/22 ,  H01J37/02

CPC classification number: H01J37/26 ,  H01J2237/002 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/0453

Abstract: An apparatus for contaminants being deposited thereon in a particle beam device, and also the particle beam device including the apparatus, are provided. This apparatus may be an anticontaminator. The apparatus according to the system described herein may include at least one cooling unit. The cooling unit may provide at least one cooled surface on which contaminants in a particle beam device are deposited. The apparatus according to the system described herein may further include at least one aperture unit. The aperture unit may be arranged at a motion device for moving the aperture unit relative to the cooling unit. Furthermore, the aperture unit may have at least one aperture opening. The cooling unit may be connected to the aperture unit by at least one first flexible thermal conductor.

Abstract translation: 提供了一种用于在粒子束装置中沉积污染物的装置，以及包括该装置的粒子束装置。 该装置可以是抗贴片机。 根据本文描述的系统的装置可以包括至少一个冷却单元。 冷却单元可以提供至少一个冷却表面，颗粒束装置中的污染物沉积在该冷却表面上。 根据本文描述的系统的装置还可以包括至少一个孔单元。 孔单元可以布置在用于相对于冷却单元移动孔单元的运动装置。 此外，孔单元可以具有至少一个孔口。 冷却单元可以由至少一个第一柔性热导体连接到孔单元。

公开(公告)号：US20130009075A1

公开(公告)日：2013-01-10

申请号：US13177621

申请日：2011-07-07

Applicant: Boon-Chau TONG

Inventor： Boon-Chau TONG

IPC: G21K5/10

CPC classification number: H01J37/3171 ,  H01J37/16 ,  H01J2237/0268 ,  H01J2237/028 ,  H01J2237/31703 ,  H01J2237/31705

Abstract: A beam line system includes a hollow tube and a plurality of protruding structures. The hollow tube has an inlet and an outlet. An ion beam emitted by the ion implanter is introduced into the hollow tube through the inlet and exited from the hollow tube through the outlet. The protruding structures are formed on an inner wall of the hollow tube. Each of the protruding structures has a reflective surface for reflecting a portion of the ion beam.

Abstract translation: 束线系统包括中空管和多个突出结构。 中空管具有入口和出口。 由离子注入机发射的离子束通过入口引入中空管，并通过出口从中空管中排出。 突出结构形成在中空管的内壁上。 每个突出结构具有用于反射离子束的一部分的反射表面。

公开(公告)号：US20120326032A1

公开(公告)日：2012-12-27

申请号：US13539291

申请日：2012-06-29

Applicant: Gerd Benner ,  Stefan Meyer ,  Steffen Niederberger ,  Dirk Preikszas

Inventor： Gerd Benner ,  Stefan Meyer ,  Steffen Niederberger ,  Dirk Preikszas

IPC: H01J37/285

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/028 ,  H01J2237/2445 ,  H01J2237/24495 ,  H01J2237/2802

Abstract: A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle β1 between a first straight line 551 extending through the point of intersection 51 and a center of the first substrate 351 and the object plane 19 differs from a second elevation angle β2 between a second straight line 552 extending through the point of intersection 51 and a center of the second substrate 352 and the object plane 19 by more than 14°.

Abstract translation: 粒子束显微镜包括具有光轴53和极片21的磁透镜3.被检查物5安装在光轴53与物面19之间的交点51处。第一和第二X射线 射线检测器33具有第一和第二辐射敏感基板35，其布置成使得延伸穿过交点51的第一直线551与第一基板351的中心与物平面19之间的第一仰角＆ 在相交点51延伸的第二直线552和第二基板352的中心与物平面19之间的第二仰角＆amp; bgr2大于14°。

公开(公告)号：US20120326030A1

公开(公告)日：2012-12-27

申请号：US13337268

申请日：2011-12-26

Applicant: Gerd Benner ,  Stefan Meyer ,  Steffen Niederberger ,  Dirk Preikszas

Inventor： Gerd Benner ,  Stefan Meyer ,  Steffen Niederberger ,  Dirk Preikszas

IPC: H01J37/26

CPC classification number: H01J37/244 ,  G01N23/2252 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/028 ,  H01J2237/2445 ,  H01J2237/24495 ,  H01J2237/2802

Abstract: A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle β1 between a first straight line 551 extending through the point of intersection 51 and a centre of the first substrate 351 and the object plane 19 differs from a second elevation angle β2 between a second straight line 552 extending through the point of intersection 51 and a centre of the second substrate 352 and the object plane 19 by more than 14°.

Abstract translation: 粒子束显微镜包括具有光轴53和极片21的磁透镜3.被检查物5安装在光轴53与物面19之间的交点51处。第一和第二X射线 射线检测器33具有第一和第二辐射敏感基板35，其布置成使得延伸穿过交点51的第一直线551与第一基板351的中心与物平面19之间的第一仰角＆ 在相交点51延伸的第二直线552和第二基板352的中心与物平面19之间的第二仰角＆amp; bgr2大于14°。

公开(公告)号：US08049182B2

公开(公告)日：2011-11-01

申请号：US12685953

申请日：2010-01-12

Applicant: Angus Bewick

Inventor： Angus Bewick

IPC: H01J37/147 ,  H01J37/26

CPC classification number: H01J37/09 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0264 ,  H01J2237/028 ,  H01J2237/24415

Abstract: A charged particle filter comprises a magnetic deflector and an outer shield. The magnetic deflector has a bore along an axis thereof passing through the deflector from a specimen end to a detector end of the deflector and through which charged particles pass when in use. The deflector is formed from one or more magnets positioned around the bore in a Halbach configuration thereby generating a relatively high magnetic field strength within the bore and a relatively low magnetic field strength outside of the deflector. The deflector has a geometry defining an outer surface and an inner surface, wherein each of the outer and inner surfaces of the deflector taper towards the axis as a respective function of distance in the specimen direction along the axis. The outer shield is formed from a soft magnetic material surrounding the magnet deflector on an outer surface side of the deflector and having a projecting portion which extends in the specimen direction with respect to the magnetic deflector from the specimen end of the deflector.

Abstract translation: 带电粒子滤波器包括磁偏转器和外屏蔽件。 磁偏转器具有沿其轴线的孔，其穿过偏转器从试样端到偏转器的检测器端，并且当使用时带电粒子通过该孔。 偏转器由一个或多个以Halbach构型围绕孔定位的磁体形成，从而在孔内产生相当高的磁场强度，并在偏转器外部产生相对低的磁场强度。 偏转器具有限定外表面和内表面的几何形状，其中偏转器的外表面和内表面中的每一个作为沿着轴线的样本方向上的距离的相应函数朝向轴逐渐变细。 外护罩由围绕偏转器外侧表面侧的磁性偏转器的软磁性材料形成，并且具有突出部，该突出部从导流板的试样端部相对于导磁板在试样方向上延伸。

公开(公告)号：US08000080B2

公开(公告)日：2011-08-16

申请号：US12327888

申请日：2008-12-04

Applicant: Stephen E. Krause ,  Russell J. Low ,  Kasegn D. Tekletsadik

Inventor： Stephen E. Krause ,  Russell J. Low ,  Kasegn D. Tekletsadik

IPC: H01T23/00 ,  H01P1/10 ,  H01H47/00

CPC classification number: H01J37/3171 ,  H01J37/16 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/038

Abstract: An apparatus and method for trapping particles in a housing is disclosed. A high voltage terminal/structure is situated within a housing. A conductive material, having a plurality of holes, such as a mesh, is disposed a distance away from an interior surface of the housing, such as the floor of the housing, forming a particle trap. The conductive mesh is biased so that the electrical field within the trap is either non-existent or pushing toward the floor, so as to retain particles within the trap. Additionally, a particle mover, such as a fan or mechanical vibration device, can be used to urge particles into the openings in the mesh. Furthermore, a conditioning phase may be used prior to operating the high voltage terminal, whereby a voltage is applied to the conductive mesh so as to attract particles toward the particle trap.

Abstract translation: 公开了一种用于将颗粒捕获在壳体中的装置和方法。 高压端子/结构位于壳体内。 具有诸如网的多个孔的导电材料设置成远离壳体的内表面（例如壳体的地板）一定距离，形成颗粒捕集器。 导电网被偏置，使得陷阱内的电场不存在或者朝向地板推动，以便将颗粒保持在陷阱内。 此外，诸如风扇或机械振动装置的颗粒移动器可用于将颗粒推入网中的开口中。 此外，可以在操作高电压端子之前使用调节阶段，由此将电压施加到导电网，以将颗粒吸引到颗粒捕集器。