公开(公告)号：US08748842B2

公开(公告)日：2014-06-10

申请号：US13915834

申请日：2013-06-12

Applicant: Canon Kabushiki Kaisha

Inventor： Yasuo Ohashi

IPC: G21K1/08

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/027 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205 ,  H01J2237/28

Abstract: Provided is an electrostatic lens array, including multiple substrates arranged with intervals, each of the multiple substrates having an aperture for passing a charged particle beam, in which: in a travelling direction of the charged particle beam, a peripheral contour line formed by any one of surfaces of the multiple substrates other than an upper surface of a most upstream substrate and a lower surface of a most downstream substrate has a protruding portion protruding from a peripheral contour line of one of the upper surface of the most upstream substrate and the lower surface of the most downstream substrate; and a position of the protruding portion is defined by a position regulating member, whereby parallelism is adjustable so that a surface including the protruding portion is parallel to a surface to be irradiated with the charged particle beam after passing through the aperture.

Abstract translation: 本发明提供一种静电透镜阵列，其包括间隔布置的多个基板，所述多个基板中的每一个具有用于使带电粒子束通过的孔，其中：在带电粒子束的行进方向上，由任何一个形成的周边轮廓线 多个基板的除了最上游基板的上表面和最下游基板的下表面以外的多个基板的表面具有从最上游基板的上表面和下游表面的上表面的周边轮廓线突出的突出部 的最下游底物; 并且突出部的位置由位置限制构件限定，由此平行度是可调节的，使得包括突出部分的表面平行于穿过孔之后被带电粒子束照射的表面。

公开(公告)号：US20130306878A1

公开(公告)日：2013-11-21

申请号：US13862728

申请日：2013-04-15

Applicant: CANON KABUSHIKI KAISHA

Inventor： Shuji Yamada

IPC: H01J1/02 ,  H01J37/317 ,  H01J9/02 ,  H01J3/18

CPC classification number: H01J1/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/46 ,  H01J3/027 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205

Abstract: An electrode to be used for an electrostatic lens, wherein the electrode at least includes: a first substrate having a first through-hole and a second substrate having a second through-hole; the first substrate having a thickness smaller than the second substrate; the first through-hole having a diameter smaller than the second through-hole; the second substrate having a specific resistance smaller than the first substrate, wherein the first substrate and the second substrate are superimposed so that the first through-hole and the second through-hole are aligned relative to each other. Notching taking place near any of the through-holes in a dry etching process can be reduced, and thus, the through-holes can be formed accurately.

Abstract translation: 一种用于静电透镜的电极，其中所述电极至少包括：具有第一通孔的第一基板和具有第二通孔的第二基板; 所述第一基板的厚度小于所述第二基板; 所述第一通孔的直径小于所述第二通孔; 所述第二基板具有小于所述第一基板的电阻率，其中所述第一基板和所述第二基板重叠，使得所述第一通孔和所述第二通孔相对于彼此对准。 可以减少在干蚀刻工艺中的任何通孔附近发生的凹陷，因此可以精确地形成通孔。

公开(公告)号：US08497476B2

公开(公告)日：2013-07-30

申请号：US13420731

申请日：2012-03-15

Applicant: Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: G01N23/225

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US20130134855A1

公开(公告)日：2013-05-30

申请号：US13307830

申请日：2011-11-30

Applicant: Sean Kellogg ,  Anthony Graupera ,  N. William Parker ,  Andrew B. Wells ,  Mark W. Utlaut ,  Walter Skoczylas ,  Gregory A. Schwind ,  Shouyin Zhang ,  Noel Smith

Inventor： Sean Kellogg ,  Anthony Graupera ,  N. William Parker ,  Andrew B. Wells ,  Mark W. Utlaut ,  Walter Skoczylas ,  Gregory A. Schwind ,  Shouyin Zhang ,  Noel Smith

IPC: H01J1/02 ,  H05H1/00

CPC classification number: H01J37/32605 ,  H01J9/02 ,  H01J27/16 ,  H01J37/04 ,  H01J37/08 ,  H01J2237/032

Abstract: An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

Abstract translation: 用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。 紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。 使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。

公开(公告)号：US20130087702A1

公开(公告)日：2013-04-11

申请号：US13612498

申请日：2012-09-12

Applicant: Pieter Kappelhof

Inventor： Pieter Kappelhof

IPC: A47B55/00 ,  G21K1/06

CPC classification number: A47B55/00 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/065 ,  H01J37/023 ,  H01J37/26 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/036

Abstract: The invention relates to an assembly, preferably for use in a lithography system or a microscopy system, for providing an accurately aligned stack of two or more modules in a stacking direction. Each of the two or more modules comprises three support members. The assembly comprises a frame comprising three planar alignment surfaces which extend in the stacking direction and which are angularly off-set with respect to each other. In addition each of the three support members of each one of the two or more modules, when arranged in said frame, abuts against a corresponding one of the three alignment surfaces. The frame is provided with an opening between two of the three planar alignment surfaces for inserting a module in the assembly, said two planar alignment surfaces on either side of the opening are arranged at least partially facing said opening.

Abstract translation: 本发明涉及一种组件，优选用于光刻系统或显微镜系统，用于在层叠方向上提供两个或多个模块的精确对准的堆叠。 两个或更多个模块中的每一个包括三个支撑构件。 组件包括框架，该框架包括在层叠方向上延伸并相对于彼此成角度偏移的三个平面对准表面。 此外，当布置在所述框架中时，两个或更多个模块中的每一个的三个支撑构件中的每一个抵靠三个对准表面中的对应的一个。 框架设置有三个平面对准表面中的两个之间的开口，用于将模块插入组件中，开口任一侧上的两个平面对准表面布置成至少部分地面对所述开口。

公开(公告)号：US07834326B2

公开(公告)日：2010-11-16

申请号：US12187635

申请日：2008-08-07

Applicant: Takeshi Kawasaki ,  Noboru Moriya ,  Tomonori Nakano ,  Kotoko Hirose

Inventor： Takeshi Kawasaki ,  Noboru Moriya ,  Tomonori Nakano ,  Kotoko Hirose

IPC: H01J1/50

CPC classification number: G01N23/20 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/032 ,  H01J2237/1534 ,  H01J2237/28

Abstract: The present invention provides an aberration corrector giving excellent assembly accuracy but having fewer parts and fewer adjustment locations in number. In order to achieve it, a multistage multipole is formed by arranging plural combinations of electrodes around an optical axis using alignment blocks, each combination of electrodes being made by brazing-integrating plural electrodes with a ceramic material interposed therebetween.

Abstract translation: 本发明提供一种像差校正器，其具有优异的组装精度，但具有较少的部件和较少的调节位置。 为了实现这一点，通过使用对准块布置围绕光轴的电极的多个组合来形成多级多极，电极的组合通过将陶瓷材料插入其间的多个电极进行钎焊积分而制成。

公开(公告)号：US20100038033A1

公开(公告)日：2010-02-18

申请号：US12409984

申请日：2009-03-24

Applicant: Randall Hardin ,  John Keihl ,  Duane Lytle

Inventor： Randall Hardin ,  John Keihl ,  Duane Lytle

IPC: C23F1/08 ,  C23C16/54

CPC classification number: H01J37/04 ,  C23C16/4401 ,  C23C16/45565 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32724 ,  H01J2237/032

Abstract: A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque receiving slots.

Abstract translation: 提供硅基喷头电极，其中后侧插入件位于沿着电极的背面形成的背面凹部中。 后侧插入件包括螺纹外径，螺纹内径和形成为螺纹内径的工具接合部分。 工具接合部分形成为使得后侧插入件还包括在工具接合部分和螺纹外径之间的一个或多个横向遮蔽部分，以防止与后侧插入件的工具接合部分接合的工具延伸超出螺纹外径 的插入。 此外，后侧插入件的工具接合部分包括围绕后侧插入件的旋转轴线布置的多个扭矩接收槽。 扭矩接收槽布置成避免背面插入件经由相对的扭矩接收槽对的轴向旋转。

公开(公告)号：US20090145228A1

公开(公告)日：2009-06-11

申请号：US11968527

申请日：2008-01-02

Applicant: Kasegn D. TEKLETSADIK ,  Russell J. LOW

Inventor： Kasegn D. TEKLETSADIK ,  Russell J. LOW

IPC: G01P15/08

CPC classification number: H01J37/3171 ,  H01J2237/0206 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756

Abstract: Techniques for reducing an electrical stress in a acceleration/deceleration system are disclosed. In one particular exemplary embodiment, the techniques may be realized as an acceleration/deceleration system. The acceleration/deceleration system may comprise an acceleration column including a plurality of electrodes having apertures through which a charged particle beam may pass. The acceleration/deceleration system may also comprise a plurality of voltage grading components respectively electrically coupled to the plurality of electrodes. The acceleration/deceleration system may further comprise a plurality of insulated conductors disposed proximate the plurality of voltage grading components to modify an electrical field about the plurality of voltage grading components.

Abstract translation: 公开了一种用于减小加速/减速系统中的电应力的技术。 在一个特定的示例性实施例中，这些技术可以被实现为加速/减速系统。 加速/减速系统可以包括加速度柱，其包括多个具有带孔粒子束可以穿过的孔的电极。 加速/减速系统还可以包括分别电耦合到多个电极的多个电压分级部件。 加速/减速系统还可以包括多个绝缘导体，其布置在多个电压分级部件附近，以修改围绕多个电压分级部件的电场。

公开(公告)号：US20090026384A1

公开(公告)日：2009-01-29

申请号：US12181171

申请日：2008-07-28

Applicant: Pavel ADAMEC ,  Carlo SALVESEN ,  Ivo LISKA

Inventor： Pavel ADAMEC ,  Carlo SALVESEN ,  Ivo LISKA

IPC: H01J3/18 ,  H01J3/20

CPC classification number: H01J37/12 ,  H01J37/145 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/121 ,  H01J2237/1405 ,  H01J2237/28

Abstract: A lens assembly having an electrostatic lens component for a charged particle beam system is provided. The assembly includes: a first electrode having a conically shaped portion, a second electrode having a conically shaped portion, and a first insulator having a conically shaped portion, wherein the first insulator comprises two extending portions towards each of its ends, and wherein the two extending portions are formed to generate a gap between the insulator and each of the adjacent electrodes.

Abstract translation: 提供一种具有用于带电粒子束系统的静电透镜部件的透镜组件。 组件包括：具有锥形部分的第一电极，具有锥形部分的第二电极和具有锥形部分的第一绝缘体，其中第一绝缘体包括朝向其每个端部的两个延伸部分，并且其中两个 形成延伸部分以在绝缘体和每个相邻电极之间产生间隙。

公开(公告)号：US20080135783A1

公开(公告)日：2008-06-12

申请号：US11567400

申请日：2006-12-06

Applicant: James P. Buonodono ,  Edward W. Bell ,  Piotr Lubicki

Inventor： James P. Buonodono ,  Edward W. Bell ,  Piotr Lubicki

IPC: G01N23/00

CPC classification number: H01J37/3171 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/04735

Abstract: An ion accelerating device includes a series of bushing units and a series of resistor circuit units. Each resistor circuit unit is coupled to one bushing unit. A bushing unit includes three integrated conductors to establish connections to the coupled resistor circuit unit and to an immediately adjacent bushing unit such that a voltage to the bushing unit may be degraded by the resistor circuit unit before reaching the lens and that two bushing units may contact one another directly.

Abstract translation: 离子加速装置包括一系列衬套单元和一系列电阻器电路单元。 每个电阻电路单元耦合到一个衬套单元。 衬套单元包括三个集成导体，以建立到耦合的电阻器电路单元和紧邻的衬套单元的连接，使得到达衬套单元的电压在到达透镜之前可能被电阻器电路单元降级，并且两个衬套单元可能接触 彼此直接