公开(公告)号：US20150129772A1

公开(公告)日：2015-05-14

申请号：US14517420

申请日：2014-10-17

Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA

Inventor： Robert N. Candler ,  Jere Harrison ,  Oscar M. Stafsudd ,  Pietro Musumeci ,  Abhijeet Joshi

IPC: H01J37/141

CPC classification number: H01J37/141 ,  G21K1/093 ,  H01J2237/141 ,  H01J2237/1415 ,  H05H7/04 ,  H05H9/005

Abstract: A structure includes multiple electromagnets with sub-100 micrometer feature size. Each electromagnet includes a substrate defining multiple filled trenches with conductive fillers, a first isolation layer disposed over the conductive fillers such that a portion of each conductive filler is exposed by the first isolation layer, a core disposed over the first isolation layer, and a second isolation layer covering the core. The second isolation layer has a top surface, and winding interconnects extend from a plane defined by the top surface of the second isolation layer to the conductive fillers such that each winding interconnect contacts one of the conductive fillers on a portion exposed by the first isolation layer. A conductive layer includes upper connectors to electrically connect winding interconnects positioned on opposite sides of the core. The trenches, winding interconnects, and upper connectors are electrically connected to form windings around the core.

Abstract translation: 一种结构包括具有亚100微米特征尺寸的多个电磁体。 每个电磁体包括限定具有导电填料的多个填充沟槽的衬底，设置在导电填料上方的第一隔离层，使得每个导电填料的一部分被第一隔离层暴露，设置在第一隔离层上的芯和第二隔离层 隔离层覆盖核心。 第二隔离层具有顶表面，并且绕组互连从由第二隔离层的顶表面限定的平面延伸到导电填料，使得每个绕组互连件在由第一隔离层暴露的部分上接触一个导电填料 。 导电层包括用于电连接位于芯的相对侧上的绕组互连件的上连接器。 沟槽，绕组互连和上连接器电连接以形成围绕芯的绕组。

公开(公告)号：US20140166893A1

公开(公告)日：2014-06-19

申请号：US14090943

申请日：2013-11-26

Applicant: ADVANTEST CORPORATION

Inventor： Akio Yamada

IPC: H01J37/141

CPC classification number: H01J37/141 ,  H01J2237/1405 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/31774

Abstract: There is provided an electromagnetic lens which includes an electromagnetic coil wound to be rotationally symmetrical about an optical axis of an electron beam, and a pole piece covering the electromagnetic coil, in which: a gap is integrally formed in either one of an inner wall formed at an inner circumference side of the pole piece and a lower end wall formed in an end portion at an emission side of the electron beam, or a boundary portion between the two walls; the inner wall is formed to be thinnest at a portion close to the gap and to gradually become thicker as a distance from the gap increases; and the electromagnetic lens is formed such that a width in a radial direction thereof is more increased as being closer to the gap along with the change of the thickness of the inner wall.

Abstract translation: 提供了一种电磁透镜，其包括卷绕成围绕电子束的光轴旋转对称的电磁线圈和覆盖电磁线圈的极片，其中：在形成的内壁中的任一个中一体形成间隙 在极片的内周侧和形成在电子束的发射侧的端部中的下端壁或两个壁之间的边界部分; 内壁形成为在靠近间隙的部分处最薄，并且随着与间隙的距离增加而逐渐变厚; 并且电磁透镜形成为使得随着内壁的厚度的变化，其径向方向上的宽度更靠近间隙而增加。

公开(公告)号：US08481958B2

公开(公告)日：2013-07-09

申请号：US12856152

申请日：2010-08-13

Applicant: Stefan Lanio

Inventor： Stefan Lanio

IPC: G21K5/04

CPC classification number: H01J37/141 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/141

Abstract: A lens system for a plurality of charged particle beams comprises a lens body with a first pole piece, a second pole piece and a plurality of lens openings for the respective charged particle beams; a common excitation coil arranged around the plurality of lens openings for providing a respective first magnetic flux to the lens openings; and a compensation coil arranged between the lens openings for providing a respective second magnetic flux to at least some of the lens openings so as to compensate for an asymmetry of the first magnetic flux.

Abstract translation: 用于多个带电粒子束的透镜系统包括具有第一极靴，第二极靴和用于各个带电粒子束的多个透镜开口的透镜体; 布置在所述多个透镜开口周围的公共激励线圈，用于向所述透镜开口提供相应的第一磁通量; 以及补偿线圈，布置在透镜开口之间，用于向至少一些透镜开口提供相应的第二磁通量，以便补偿第一磁通量的不对称性。

公开(公告)号：US07619219B2

公开(公告)日：2009-11-17

申请号：US11953496

申请日：2007-12-10

Applicant: Naomasa Suzuki ,  Hiroyuki Ito ,  Ichiro Tachibana

Inventor： Naomasa Suzuki ,  Hiroyuki Ito ,  Ichiro Tachibana

IPC: H01J37/28 ,  H01J37/256

CPC classification number: H01J37/141 ,  H01J37/28 ,  H01J2237/1405 ,  H01J2237/141 ,  H01J2237/244

Abstract: The present invention was made in view of a problem of an electron microscope in which a reduction in detection efficiency of electrons detected by a detector should be prevented by eliminating any influence of a leakage magnetic field through a gap in an objective lens onto the electrons emitted from a specimen. To solve the problem, the present invention provides an electron microscope having a configuration with: a pole piece electrode for accelerating primary electrons emitted at an electrons source; and an objective lens including the pole piece electrode. In the objective lens, an electrically and magnetically insulated gap is formed between the pole piece electrode and other pole piece, and an auxiliary coil is concentrically disposed with the objective lens at a middle position between the gap and a detection surface of the electron detector, with an electric current flowing through the auxiliary coil in the opposite direction from that of an electric current flowing through the objective lens coil.

Abstract translation: 本发明考虑到电子显微镜的问题，其中通过消除通过物镜中的间隙的泄漏磁场对发射的电子的任何影响来防止检测器检测到的电子的检测效率的降低 从标本。 为了解决该问题，本发明提供一种具有以下结构的电子显微镜：具有用于加速在电子源发射的一次电子的极片电极; 以及包括极片电极的物镜。 在物镜中，在极片电极和其它极片之间形成电磁绝缘的间隙，并且辅助线圈与物镜同心地设置在间隙和电子检测器的检测表面之间的中间位置， 电流以与流过物镜线圈的电流相反的方向流过辅助线圈。

公开(公告)号：US20090159810A1

公开(公告)日：2009-06-25

申请号：US12095198

申请日：2006-11-28

Applicant: Rainer Knippelmeyer ,  Stefan Schubert

Inventor： Rainer Knippelmeyer ,  Stefan Schubert

IPC: H01J1/50

CPC classification number: H01J37/141 ,  H01J37/145 ,  H01J37/20 ,  H01J37/21 ,  H01J37/24 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/04922 ,  H01J2237/04926 ,  H01J2237/12 ,  H01J2237/1215 ,  H01J2237/14 ,  H01J2237/1405 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2817

Abstract: An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.

Abstract translation: 物镜配置包括第一，第二和第三极片，每个极片基本上是旋转对称的。 第一，第二和第三极片设置在物平面的同一侧。 第一极靴的端部与第二极靴的端部分离以形成第一间隙，并且第三极靴的端部与第二极靴的端部分离以形成第二间隙。 第一激励线圈在第一间隙中产生聚焦磁场，第二激励线圈在第二间隙中产生补偿磁场。 第一和第二电源分别向第一和第二励磁线圈提供电流。 在第二极靴中产生的磁通量在与第二极靴中产生的磁通量相同的方向上定向。

公开(公告)号：US07019308B2

公开(公告)日：2006-03-28

申请号：US10932340

申请日：2004-09-01

Applicant: Andrew Dean

Inventor： Andrew Dean

IPC: H01J37/147 ,  H01J37/141 ,  G03F7/20 ,  H01L21/027

CPC classification number: H01J37/1475 ,  H01J37/141 ,  H01J2237/141 ,  H01J2237/152 ,  H01J2237/153

Abstract: A device for influencing an electron beam, for example a beam deflecting device in an electron beam lithography machine, comprises a beam influencing coil (13) operable to influence an electron beam (EB) in the vicinity of the device by way of a magnetic field and a heat dissipation compensating coil (14) operable to provide a heat output so compensating for any change in heat dissipation of the device due to operation of the beam influencing coil (13)—particularly variable operation to vary the field intensity or to create and remove a field—as to reduce the amount of change, preferably to maintain the net heat dissipation at a constant value. The compensating coil (13) can be controlled, for example, by measurement (19) of the heat dissipation of the device and calculating (18) current supply (16) to the coil (13) in dependence on the measured dissipation.

Abstract translation: 用于影响电子束的装置，例如电子束光刻机中的光束偏转装置，包括可影响线束（13）的光束（13），其可操作以通过磁场影响装置附近的电子束（EB） 以及散热补偿线圈（14），其可操作以提供热输出，从而补偿由于所述光束影响线圈（13）的操作而导致的所述装置的热耗散的任何变化 - 特别可变的操作以改变所述场强度或者产生和 去除一个场，以减少变化量，最好将净散热维持在恒定的值。 补偿线圈（13）可以例如通过装置的散热的测量（19）来控制，并且根据测量的耗散计算（18）到线圈（13）的电流供应（16）。

公开(公告)号：US20060043311A1

公开(公告)日：2006-03-02

申请号：US10932340

申请日：2004-09-01

Applicant: Andrew Dean

Inventor： Andrew Dean

IPC: H01J3/32 ,  H01J37/147

CPC classification number: H01J37/1475 ,  H01J37/141 ,  H01J2237/141 ,  H01J2237/152 ,  H01J2237/153

Abstract: A device for influencing an electron beam, for example a beam deflecting device in an electron beam lithography machine, comprises a beam influencing coil (13) operable to influence an electron beam (EB) in the vicinity of the device by way of a magnetic field and a heat dissipation compensating coil (14) operable to provide a heat output so compensating for any change in heat dissipation of the device due to operation of the beam influencing coil (13)—particularly variable operation to vary the field intensity or to create and remove a field—as to reduce the amount of change, preferably to maintain the net heat dissipation at a constant value. The compensating coil (13) can be controlled, for example, by measurement (19) of the heat dissipation of the device and calculating (18) current supply (16) to the coil (13) in dependence on the measured dissipation.

Abstract translation: 用于影响电子束的装置，例如电子束光刻机中的光束偏转装置，包括可影响线束（13）的光束（13），其可操作以通过磁场影响装置附近的电子束（EB） 以及散热补偿线圈（14），其可操作以提供热输出，从而补偿由于所述光束影响线圈（13）的操作而导致的所述装置的热耗散的任何变化 - 特别可变的操作以改变所述场强度或者产生和 去除一个场，以减少变化量，最好将净散热维持在恒定的值。 补偿线圈（13）可以例如通过装置的散热的测量（19）来控制，并且根据测量的耗散计算（18）到线圈（13）的电流供应（16）。

公开(公告)号：US06933507B2

公开(公告)日：2005-08-23

申请号：US10619702

申请日：2003-07-15

Applicant: Kenneth H. Purser ,  Harald A. Enge ,  Norman L. Turner

Inventor： Kenneth H. Purser ,  Harald A. Enge ,  Norman L. Turner

IPC: H01J37/141 ,  H01J37/08 ,  H01J37/14 ,  H01J37/147 ,  H01J37/315 ,  H01J37/317 ,  H01L21/425

CPC classification number: H01J37/141 ,  H01J37/14 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/315 ,  H01J37/3171 ,  H01J2237/141 ,  H01J2237/1534 ,  H01J2237/31703

Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

Abstract translation: 一种满足日益增长的要求的方法和装置，用于提高冲击半导体晶片的注入离子入射角的精度以及当离子束通过时晶片的均匀掺杂的带状离子束的精度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合。 光学元件的设计成为可能：（1）宽幅调节工件上的带状光束的宽度; （2）纠正带状横梁宽度的强度分布不准确; （3）关于X轴和Y轴的独立转向; （4）工件入射角校正; 和（5）空间费用引起的光束膨胀效应的近似补偿。 在实际情况下，这些元件的组合允许源和工件之间的带状光束膨胀到350毫米，具有良好的均匀性和角度精度。 此外，该方法和装置可用于沿着光束线引入四极场。

公开(公告)号：US20040097058A1

公开(公告)日：2004-05-20

申请号：US10619702

申请日：2003-07-15

Inventor： Kenneth H. Purser ,  Harald A. Enge ,  Norman L. Turner

IPC: H01L021/425

CPC classification number: H01J37/141 ,  H01J37/14 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/315 ,  H01J37/3171 ,  H01J2237/141 ,  H01J2237/1534 ,  H01J2237/31703

Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

Abstract translation: 一种满足日益增长的要求的方法和装置，用于提高冲击半导体晶片的注入离子入射角的精度以及当离子束通过时晶片的均匀掺杂的带状离子束的精度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合。 光学元件的设计成为可能：（1）宽幅调节工件上的带状光束的宽度; （2）纠正带状横梁宽度的强度分布不准确; （3）关于X轴和Y轴的独立转向; （4）工件入射角校正; 和（5）空间费用引起的光束膨胀效应的近似补偿。 在实际情况下，这些元件的组合允许源和工件之间的带状光束膨胀到350毫米，具有良好的均匀性和角度精度。 此外，该方法和装置可用于沿着光束线引入四极场。

公开(公告)号：US20240212968A1

公开(公告)日：2024-06-27

申请号：US18088222

申请日：2022-12-23

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Benjamin Cook ,  Pieter Kruit

IPC: H01J37/145 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/1413 ,  H01J37/28 ,  H01J2237/141

Abstract: A lens for a charged particle beam apparatus, the lens having lens components, is described. The lens includes a first magnetic lens having an upper pole piece and a middle pole piece; a second magnetic lens having the middle pole piece and a lower pole piece; a first coil arranged in the first magnetic lens and to provide a first magnetic field between the upper pole piece and the middle pole piece; a second coil arranged in the second magnetic lens and to provide a second magnetic field between the middle pole piece and the lower pole piece; and an electrostatic lens having an upper electrode and a lower electrode, wherein at least one of a first inner diameter defined by the upper pole piece and a second inner diameter defined by the middle pole piece is larger than a third inner diameter of the lower pole piece.