公开(公告)号：US5744810A

公开(公告)日：1998-04-28

申请号：US709815

申请日：1996-09-10

Applicant: Takamasa Satoh

Inventor： Takamasa Satoh

IPC: G03F7/20 ,  H01J37/302 ,  H01L21/027

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J2237/151 ,  H01J2237/3175

Abstract: A cyclic wave v1 of a cycle T/m, such as a sine wave or a pulse wave, is generated, where T is one exposure period and m is a natural number. For each i=1 to 3, cyclic waves v2 to v4 are generated by delaying the cyclic wave v1 by i(T/4m), amplified and supplied to the electrodes of electrostatic deflectors 40, 50 and 60 in such a way that the electric fields formed at the deflectors 40 and 50 have opposite phases each other. For each electrostatic deflector, the phase difference between the voltage waveforms supplied to adjacent electrodes is T/4m and m may be set freely.

Abstract translation: 产生循环T / m的循环波v1，例如正弦波或脉冲波，其中T是一个曝光周期，m是自然数。 对于每个i = 1至3，通过将循环波v1延迟i（T / 4m）来产生循环波v2至v4，被放大并提供给静电偏转器40,50和60的电极，使得电 在偏转器40和50处形成的场彼此具有相反的相位。 对于每个静电偏转器，提供给相邻电极的电压波形之间的相位差为T / 4m，m可以自由设定。

公开(公告)号：US4683366A

公开(公告)日：1987-07-28

申请号：US749789

申请日：1985-06-28

Applicant: Kenneth J. Harte ,  Guenther O. Langner

Inventor： Kenneth J. Harte ,  Guenther O. Langner

IPC: H01J37/30 ,  H01J37/317 ,  B23K15/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/1207 ,  H01J2237/151 ,  H01J2237/31776

Abstract: An all-electrostatic variable spot charged particle (electron) beam shaping sub-system which is compact and of much smaller size than known similar systems designed for the same purpose and operating with magnetic lenses. The improved electrostatic variable spot-shaping sub-system does not require mechanical rotation of the spot-shaping apertures for maintaining alignment or orientation. The improved sub-system includes both beam steering and beam blanking requiring less than 3 volts for operation of the blanking controls to turn the beam on and off. The novel system easily accomodates a variety of different beam-shaping apertures for use as the second beam shaping aperture in the sub-system including rectilinear triangles of different orientation to provide smooth 45 degree pattern delineation, rectangles, squares, and even different diameter circles where such configurations are required by a particular pattern to be written in the target plane.

Abstract translation: 全静电可变点带电粒子（电子）束整形子系统，紧凑且尺寸小于为同一目的而设计并与磁性镜头一起操作的已知类似系统。 改进的静电可变光斑整形子系统不需要用于保持对准或取向的光点成形孔的机械旋转。 改进的子系统包括波束转向和波束消隐，其需要小于3伏特用于操作消隐控制以使光束打开和关闭。 该新颖系统容易地容纳各种不同的光束成形孔，用作子系统中的第二光束整形孔，包括不同取向的直线三角形，以提供平滑的45度图案描绘，矩形，正方形以及甚至不同直径的圆，其中 通过将特定图案写入目标平面来要求这样的配置。

公开(公告)号：US20240170249A1

公开(公告)日：2024-05-23

申请号：US17991168

申请日：2022-11-21

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Pieter Kruit ,  John Breuer

IPC: H01J37/153 ,  G01N23/2251 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/153 ,  G01N23/2251 ,  H01J37/1472 ,  H01J37/28 ,  G01N2223/079 ,  G01N2223/418 ,  G01N2223/507 ,  H01J2237/151 ,  H01J2237/1534

Abstract: A corrector for correcting aberrations of a charged particle beam in a charged particle beam device is described. The corrector includes a plurality of wires configured to be in a plane perpendicular to a beam axis. The wires forming two or more openings for passing of the charged particle beam through the two or more openings. The plurality of wires includes at least a first wire having a first connector configured to provide a first voltage to the first wire and a second wire having a second connector configured to provide a second voltage to the second wire. The second voltage being different than the first voltage.

公开(公告)号：US11942303B2

公开(公告)日：2024-03-26

申请号：US17359365

申请日：2019-12-06

Applicant: ASML Netherlands B.V.

Inventor： Yan Ren ,  Albertus Victor Gerardus Mangnus

IPC: H01J37/147 ,  G01N23/2251 ,  H01J37/09 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/1478 ,  G01N23/2251 ,  H01J37/09 ,  H01J37/145 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/28 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/507 ,  H01J2237/0455 ,  H01J2237/04926 ,  H01J2237/103 ,  H01J2237/151 ,  H01J2237/226 ,  H01J2237/2611

Abstract: Embodiments consistent with the disclosure herein include methods and a multi-beam apparatus configured to emit charged-particle beams for imaging a top and side of a structure of a sample, including: a deflector array including a first deflector and configured to receive a first charged-particle beam and a second charged-particle beam; a blocking plate configured to block one of the first charged-particle beam and the second charged-particle beam; and a controller having circuitry and configured to change the configuration of the apparatus to transition between a first mode and a second mode. In the first mode, the deflector array directs the second charged-particle beam to the top of the structure, and the blocking plate blocks the first charged-particle beam. And in the second mode, the first deflector deflects the first charged-particle beam to the side of the structure, and the blocking plate blocks the second charged-particle beam.

公开(公告)号：US09960013B2

公开(公告)日：2018-05-01

申请号：US14994347

申请日：2016-01-13

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Shih-Ming Chang

IPC: H01J37/317 ,  H01L21/027 ,  G03F7/20

CPC classification number: H01J37/3174 ,  G03F7/2059 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/151 ,  H01J2237/31764 ,  H01L21/0274 ,  H01L21/0277 ,  H01L21/0279

Abstract: The present disclosure provides one embodiment of a method that includes slicing a first sub-polygon out of the pattern layout and writing the first sub-polygon onto the substrate using a beam with a first beam setting that is associated with the first sub-polygon. The method additional includes slicing a second sub-polygon out of the remaining pattern layout that does not include the first sub-polygon. The second sub-polygon interfaces with the first sub-polygon on at least one edge. Also, the method includes, without turning off the beam after writing the first sub-polygon onto the substrate, writing the second sub-polygon onto the substrate with a second beam setting that is associated with the second sub-polygon.

公开(公告)号：US20160240347A1

公开(公告)日：2016-08-18

申请号：US15044510

申请日：2016-02-16

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Matthias Firnkes ,  Stefan Lanio

IPC: H01J37/147 ,  H01J37/12

CPC classification number: H01J37/1472 ,  H01J2237/151 ,  H01J2237/28

Abstract: A signal charged particle deflection device for a charged particle beam device is provided. The signal charged particle deflection device includes a beam bender configured for deflecting the signal charged particle beam, wherein the beam bender includes a first electrode and a second electrode providing an optical path for the signal charged particle beam therebetween, wherein the first electrode has a first cross section in a plane perpendicular to the optical path, and the second electrode has a second cross section in the plane perpendicular to the optical path, and wherein a first part of the first cross section and a second part of the second cross section provide the optical path therebetween, and wherein the first part and the second part are different in shape.

Abstract translation: 提供一种用于带电粒子束装置的信号带电粒子偏转装置。 信号带电粒子偏转装置包括被配置为偏转信号带电粒子束的光束弯曲器，其中光束弯曲器包括第一电极和第二电极，该第一电极和第二电极为它们之间的信号带电粒子束提供光路，其中第一电极具有第一 在垂直于光路的平面中的横截面，并且第二电极在垂直于光路的平面中具有第二横截面，并且其中第一横截面的第一部分和第二横截面的第二部分提供 光路之间，其中第一部分和第二部分的形状不同。

公开(公告)号：US09373479B2

公开(公告)日：2016-06-21

申请号：US14851692

申请日：2015-09-11

Applicant: Lawrence Livermore National Security, LLC

Inventor： Bryan W. Reed ,  William J. Dehope ,  Glenn Huete ,  Thomas B. LaGrange ,  Richard M. Shuttlesworth

IPC: H01J37/075 ,  H01J37/26 ,  H01J37/22 ,  H01J37/244 ,  H01J37/147

CPC classification number: H01J37/075 ,  H01J37/1472 ,  H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/0432 ,  H01J2237/06333 ,  H01J2237/15 ,  H01J2237/151 ,  H01J2237/24455 ,  H01J2237/2447 ,  H01J2237/2449 ,  H01J2237/24495

Abstract: An electron microscope is disclosed which has a laser-driven photocathode and an arbitrary waveform generator (AWG) laser system (“laser”). The laser produces a train of temporally-shaped laser pulses of a predefined pulse duration and waveform, and directs the laser pulses to the laser-driven photocathode to produce a train of electron pulses. An image sensor is used along with a deflector subsystem. The deflector subsystem is arranged downstream of the target but upstream of the image sensor, and has two pairs of plates arranged perpendicular to one another. A control system controls the laser and a plurality of switching components synchronized with the laser, to independently control excitation of each one of the deflector plates. This allows each electron pulse to be directed to a different portion of the image sensor, as well as to be provided with an independently set duration and independently set inter-pulse spacings.

公开(公告)号：US20140110596A1

公开(公告)日：2014-04-24

申请号：US13658990

申请日：2012-10-24

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

Inventor： Shengwu Chang

IPC: H01J3/18

CPC classification number: H01J37/12 ,  H01J37/1474 ,  H01J37/3171 ,  H01J2237/121 ,  H01J2237/151

Abstract: An ion beam scanning assembly includes a set of scanning electrodes defining a gap to accept an ion beam and scan the ion beam in a first plane, and a multipole electrostatic lens system comprising a plurality of electrodes arranged along a portion of a path of travel of the ion beam bounded by the pair of scanning electrodes, the multipole electrostatic lens system configured to shape the ion beam in a direction perpendicular to the first plane.

Abstract translation: 离子束扫描组件包括一组扫描电极，其限定了间隙以接受离子束并在第一平面中扫描离子束;以及多极静电透镜系统，其包括多个电极，其沿着 所述离子束由所述一对扫描电极限定，所述多极静电透镜系统构造成在垂直于所述第一平面的方向上对所述离子束进行成形。

公开(公告)号：US08309936B2

公开(公告)日：2012-11-13

申请号：US12708886

申请日：2010-02-19

Applicant: Holger Kreckel ,  Hjalmar Bruhns ,  Daniel Wolf Savin

Inventor： Holger Kreckel ,  Hjalmar Bruhns ,  Daniel Wolf Savin

IPC: H01J3/34

CPC classification number: H01J37/1472 ,  H01J2237/151 ,  H01J2237/153

Abstract: An ion deflector, for deflecting a beam of charged particles along an arc in a deflection plane, includes a pair of non-spherical deflection electrodes adapted for being charged with different voltages. The pair of deflection electrodes are configured to control, in both the deflection plane and in a direction perpendicular to the deflection plane, a cross sectional spread of charged particles in a deflected beam that exits the ion deflector. In some embodiments, a first electrode has a first height perpendicular to the deflection plane and a second electrode has a different second height.

Abstract translation: 用于沿着偏转平面中的电弧偏转带电粒子束的离子偏转器包括一对适于用不同电压充电的非球面偏转电极。 一对偏转电极被配置为在偏转平面和垂直于偏转平面的方向上控制带电粒子在离开离子偏转器的偏转光束中的横截面扩展。 在一些实施例中，第一电极具有垂直于偏转平面的第一高度，而第二电极具有不同的第二高度。

公开(公告)号：US07928404B2

公开(公告)日：2011-04-19

申请号：US12120174

申请日：2008-05-13

Applicant: N. William Parker

Inventor： N. William Parker

IPC: H01J37/28

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/045 ,  H01J2237/0492 ,  H01J2237/151 ,  H01J2237/244

Abstract: The invention provides methods for conjugate blanking of a charged particle beam within a charged particle column using a beam blanker. The beam blanker comprises a first deflector, a second deflector and a blanking aperture, the first deflector being positioned between a gun lens and a main lens, the second deflector being positioned between the first deflector and the main lens, the blanking aperture being positioned between the second deflector and the main lens, and the first deflector, the second deflector and the blanking aperture being aligned on the optical axis of the column. A method according to the invention comprises the steps of: configuring electron optical elements of said charged particle column to form a beam in the column either with or without a crossover; configuring the main lens to focus the beam formed by the gun lens onto a substrate plane; deflecting the beam with a first deflector in a first direction; and deflecting the beam with a second deflector in a second direction onto the blanking aperture, wherein the first direction is parallel or anti-parallel to the second direction; and wherein the image at the substrate plane does not move during blanking.

Abstract translation: 本发明提供了使用光束消除器对带电粒子束内的带电粒子束进行共轭消隐的方法。 光束消除器包括第一偏转器，第二偏转器和消隐孔，第一偏转器位于枪式透镜和主透镜之间，第二偏转器位于第一偏转器和主透镜之间，消隐孔位于 第二偏转器和主透镜，以及第一偏转器，第二偏转器和冲裁孔在柱的光轴上对准。 根据本发明的方法包括以下步骤：配置所述带电粒子的电子光学元件以在所述色谱柱中形成具有或不具有交叉的光束; 配置主透镜以将由枪形透镜形成的光束聚焦到衬底平面上; 在第一方向上用第一偏转器偏转光束; 以及将具有第二导向器的所述梁在第二方向上偏转到所述消隐孔上，其中所述第一方向平行或反平行于所述第二方向; 并且其中衬底平面处的图像在消隐期间不移动。