Method and apparatus for in-situ probe tip replacement inside a charged particle beam microscope
    42.
    发明授权
    Method and apparatus for in-situ probe tip replacement inside a charged particle beam microscope 有权
    用于在带电粒子束显微镜内进行原位探针尖端置换的方法和装置

    公开(公告)号:US07381971B2

    公开(公告)日:2008-06-03

    申请号:US11186073

    申请日:2005-07-21

    Abstract: We disclose a gripper and associated apparatus and methods for delivering nano-manipulator probe tips inside a vacuum chamber. The gripper includes a tube; a compression cylinder inside of and coaxial with the tube; and at least one elastic ring adjacent to the compression cylinder. There is a vacuum seal coaxial with the compression cylinder for receiving and sealing against a probe tip. An actuator is connected to the compression cylinder for compressing the elastic ring and causing it to grip the probe tip. Thus the probe tip can be gripped, transferred to a different location in the vacuum chamber, and released there.Samples attached to the probe tips will be transferred to a TEM sample holder, shown in several embodiments, that includes a bar having opposed ends; an arm attached to each opposed end of the bar; one or more slots for receiving a probe tip; and, each slot having an inner part and an outer part, where the inner part is smaller than the outer part. The TEM sample holders just described are inserted into a carrier cassette. A cassette for transferring one or more TEM sample holders comprises a platform; at least one bar extending upwardly from the platform; the bar having a groove for receiving and holding a TEM sample holder. A rotatable magazine holds one or more probe tips and selectively releases the tips. The magazine includes a cartridge having a plurality of longitudinal openings for receiving probe tips and dispensing probe tips.

    Abstract translation: 我们公开了一种夹具和相关的装置和方法,用于在真空室内输送纳米机械手探针尖端。 夹具包括管; 压缩缸内部并与管同轴; 以及与压缩圆筒相邻的至少一个弹性环。 存在与压缩筒同轴的真空密封件,用于接收和密封探针尖端。 致动器连接到压缩气缸,用于压缩弹性环并使其夹持探针尖端。 因此,探针尖端可以被夹持,转移到真空室中的不同位置,并在那里释放。 附接到探针尖端的样品将转移到TEM样品保持器,如几个实施方案中所示,其包括具有相对端的棒; 连接到杆的每个相对端的臂; 用于接收探针尖端的一个或多个狭槽; 并且每个狭槽具有内部部分和外部部分,其中内部部分小于外部部分。 刚刚描述的TEM样品架被插入到载体盒中。 用于转移一个或多个TEM样品保持器的盒子包括平台; 从平台向上延伸的至少一个杆; 该棒具有用于容纳和保持TEM样品保持器的凹槽。 一个可旋转刀库可容纳一个或多个探针尖端并选择性地释放尖端。 该盒包括具有多个用于接收探针尖端并分配探针尖端的多个纵向开口的盒。

    MULTI-PIXEL ELECTRON MICROBEAM IRRADIATOR SYSTEMS AND METHODS FOR SELECTIVELY IRRADIATING PREDETERMINED LOCATIONS
    46.
    发明申请
    MULTI-PIXEL ELECTRON MICROBEAM IRRADIATOR SYSTEMS AND METHODS FOR SELECTIVELY IRRADIATING PREDETERMINED LOCATIONS 有权
    多像素电子微波辐射器系统和选择性预测位置的方法

    公开(公告)号:US20070114434A1

    公开(公告)日:2007-05-24

    申请号:US11320515

    申请日:2005-12-28

    Inventor: Sha Chang Otto Zhou

    Abstract: Multi-pixel electron microbeam irradiator systems and methods are provided with particular applicability for selectively irradiating predetermined cells or cell locations. A multi-pixel electron microbeam irradiator system can include a plurality of individually addressable electron field emitters sealed in a vacuum. The multi-pixel electron microbeam irradiator system can include an anode comprising one or more electron permeable portions corresponding to the plurality of electron field emitters. Further, the multi-pixel electron microbeam irradiator system can include a controller operable to individually control electron extraction from each of the electron field emitters for selectively irradiating predetermined locations such as cells or cell locations.

    Abstract translation: 提供了多像素电子微束照射器系统和方法,其特别适用于选择性地照射预定的细胞或细胞位置。 多像素电子微束照射器系统可以包括在真空中密封的多个可单独寻址的电子场发射器。 多像素电子微束照射器系统可以包括阳极,该阳极包括对应于多个电子场发射体的一个或多个电子透过部分。 此外,多像素电子微束照射器系统可以包括控制器,其可操作以单独地控制来自每个电子场发射器的电子提取,以选择性地照射诸如单元或单元位置的预定位置。

    Plasma resistant seal assembly with replaceable barrier shield
    47.
    发明申请
    Plasma resistant seal assembly with replaceable barrier shield 审中-公开
    等离子电阻密封组件,带可更换屏障

    公开(公告)号:US20060273277A1

    公开(公告)日:2006-12-07

    申请号:US11414848

    申请日:2006-05-01

    Abstract: The seal assemblies of this invention comprise a closure assembly having first and second grooves, with a rubber seal mounted in said first groove and a removably mounted, replaceable barrier strand in said second groove, said barrier located between the rubber seal and a plasma source, whereby said barrier shields the rubber seal from erosive effects of the plasma.

    Abstract translation: 本发明的密封组件包括具有第一和第二凹槽的封闭组件,其中安装在所述第一凹槽中的橡胶密封件和在所述第二凹槽中的可拆卸地安装的可更换的阻挡筋,所述屏障位于橡胶密封件和等离子体源之间, 由此所述屏障屏蔽橡胶密封件免受等离子体的侵蚀作用。

    Multi-directional scanning of movable member and ion beam monitoring arrangement therefor
    48.
    发明授权
    Multi-directional scanning of movable member and ion beam monitoring arrangement therefor 有权
    可移动构件的多方向扫描和离子束监测装置

    公开(公告)号:US06956223B2

    公开(公告)日:2005-10-18

    申请号:US10119290

    申请日:2002-04-10

    Abstract: Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm 60 of a substrate or wafer holder 180, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperture 55 in a vacuum chamber wall. The arm 60 is reciprocated by one or more linear motors 90A, 90B. The arm 60 is supported relative to a slide 100 using gimballed air bearings so as to provide cantilever support for the arm relative to the slide 100. A compliant feedthrough 130 into the vacuum chamber for the arm 60 then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday 450 is attached to the arm 60 adjacent the substrate holder 180 to allow beam profiling to be carried out both prior to and during implant. The Faraday 450 can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.

    Abstract translation: 公开了半导体处理装置,其提供基板或晶片保持器180的扫描臂60在至少两个大致正交的方向(所谓的X-Y扫描)上的移动。 沿着第一方向进行的扫描纵向地穿过真空室壁中的孔口55。 臂60由一个或多个线性电动机90A,90B往复运动。臂60相对于滑块100被支撑,使用支撑的空气轴承,以便相对于滑块100为臂提供悬臂支撑。 进入用于臂60的真空室中的柔性馈通件130然后用作真空密封和引导件,但本身不需要提供轴承支撑件。 法拉第450附接到靠近基板保持器180的臂60,以允许在植入之前和期间执行光束轮廓。 法拉第450可以替代地或附加地安装在靠近衬底保持器的后部或与其相邻的90°处,以允许在植入之前执行光束轮廓,其中衬底支撑件反向或水平并且离开光束线。

    Vacuum processing apparatus and method for controlling vacuum processing apparatus

    公开(公告)号:US12080523B2

    公开(公告)日:2024-09-03

    申请号:US17444680

    申请日:2021-08-09

    Inventor: Kiyoshi Mori

    Abstract: The present disclosure relates to a vacuum processing apparatus. The vacuum processing apparatus includes a processing container capable of maintaining an inside thereof in a vacuum atmosphere, a stage provided in the processing container and on which a substrate is placed, a support member passing through an opening formed at a bottom of the processing container to support the stage from below, a holder part located outside the processing container, a flange part arranged around the opening on the outside of the processing container, and a sealing part configured to be expandable and contractible and provided inside the spherical bearing along the circumferential direction of the opening so as to airtightly seal at least a space between the flange part and the holder part.

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