公开(公告)号：US07381971B2

公开(公告)日：2008-06-03

申请号：US11186073

申请日：2005-07-21

Applicant: Thomas M. Moore ,  Lyudmilla Zaykova-Feldman

Inventor： Thomas M. Moore ,  Lyudmilla Zaykova-Feldman

IPC: G21K7/00

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J2237/2005 ,  H01J2237/2006 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/26 ,  H01J2237/262 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: We disclose a gripper and associated apparatus and methods for delivering nano-manipulator probe tips inside a vacuum chamber. The gripper includes a tube; a compression cylinder inside of and coaxial with the tube; and at least one elastic ring adjacent to the compression cylinder. There is a vacuum seal coaxial with the compression cylinder for receiving and sealing against a probe tip. An actuator is connected to the compression cylinder for compressing the elastic ring and causing it to grip the probe tip. Thus the probe tip can be gripped, transferred to a different location in the vacuum chamber, and released there.Samples attached to the probe tips will be transferred to a TEM sample holder, shown in several embodiments, that includes a bar having opposed ends; an arm attached to each opposed end of the bar; one or more slots for receiving a probe tip; and, each slot having an inner part and an outer part, where the inner part is smaller than the outer part. The TEM sample holders just described are inserted into a carrier cassette. A cassette for transferring one or more TEM sample holders comprises a platform; at least one bar extending upwardly from the platform; the bar having a groove for receiving and holding a TEM sample holder. A rotatable magazine holds one or more probe tips and selectively releases the tips. The magazine includes a cartridge having a plurality of longitudinal openings for receiving probe tips and dispensing probe tips.

Abstract translation: 我们公开了一种夹具和相关的装置和方法，用于在真空室内输送纳米机械手探针尖端。 夹具包括管; 压缩缸内部并与管同轴; 以及与压缩圆筒相邻的至少一个弹性环。 存在与压缩筒同轴的真空密封件，用于接收和密封探针尖端。 致动器连接到压缩气缸，用于压缩弹性环并使其夹持探针尖端。 因此，探针尖端可以被夹持，转移到真空室中的不同位置，并在那里释放。 附接到探针尖端的样品将转移到TEM样品保持器，如几个实施方案中所示，其包括具有相对端的棒; 连接到杆的每个相对端的臂; 用于接收探针尖端的一个或多个狭槽; 并且每个狭槽具有内部部分和外部部分，其中内部部分小于外部部分。 刚刚描述的TEM样品架被插入到载体盒中。 用于转移一个或多个TEM样品保持器的盒子包括平台; 从平台向上延伸的至少一个杆; 该棒具有用于容纳和保持TEM样品保持器的凹槽。 一个可旋转刀库可容纳一个或多个探针尖端并选择性地释放尖端。 该盒包括具有多个用于接收探针尖端并分配探针尖端的多个纵向开口的盒。

公开(公告)号：US20080042060A1

公开(公告)日：2008-02-21

申请号：US11907097

申请日：2007-10-09

Applicant: Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima ,  Toru Takagi

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima ,  Toru Takagi

IPC: G21K5/02

CPC classification number: G03F7/70616 ,  G01N23/225 ,  H01J37/05 ,  H01J37/06 ,  H01J37/073 ,  H01J37/075 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/057 ,  H01J2237/06316 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/248 ,  H01J2237/2482 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.

Abstract translation: 检查装置及使用该检查装置的半导体装置的制造方法。 检查装置用于诸如晶片的样品的缺陷检查，线宽测量，表面电位测量等。 在检查装置中，多个带电粒子从初级光学系统传送到样品，从样品发射的二次带电粒子与主光学系统分离，并通过二次光学系统引入到检测器。 在移动样品的同时进行带电粒子的照射。 带电粒子的照射点沿着样品的移动方向排列成N行，沿着与其垂直的方向排列成M列。 带电粒子的每一列照射点在垂直于样品的移动方向的方向上连续移动预定量。

公开(公告)号：US20070221844A1

公开(公告)日：2007-09-27

申请号：US11687002

申请日：2007-03-16

Applicant: Hiromasa Yamanashi ,  Muneyuki Fukuda ,  Sayaka Tanimoto ,  Yasunari Sohda

Inventor： Hiromasa Yamanashi ,  Muneyuki Fukuda ,  Sayaka Tanimoto ,  Yasunari Sohda

IPC: G21K7/00 ,  G01N23/00

CPC classification number: G01N23/2258 ,  H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/0047 ,  H01J2237/204 ,  H01J2237/221 ,  H01J2237/2817 ,  H01L21/67207 ,  H01L21/67253

Abstract: The present invention provides a pattern inspection technique that enables measurement and inspection of a fine pattern by a charged particle beam to be performed with high throughput. A metrology system of fine pattern according to the pattern inspection technique has: a the column that includes a charged particle source, an electron optics for scanning a desired observation area on a sample with a charged particle beam emitted from the charged particle source, and a detector for detecting charged particles generated secondarily from the sample scanned by the charged particle beam; information processing means for measuring information about geometry of a pattern formed on the sample based on information on the intensity of the charged particles obtained by the detector; and a sample introduction unit for introducing the sample into the inside of the column; wherein a charge neutralizer unit for generating ions and charge neutralizing the sample with the ions and surface potential measuring means for measuring a surface potential of the sample surface are provided on a path that is inside the sample introduction unit and transports the sample to the column.

Abstract translation: 本发明提供一种图案检查技术，其能够通过以高产量进行的带电粒子束来测量和检查精细图案。 根据图案检查技术的精细图案的计量系统具有：包括带电粒子源的列，用于从带电粒子源发射的带电粒子束扫描样品上的期望观察区域的电子光学器件，以及 检测器，用于检测由带电粒子束扫描的样品二次产生的带电粒子; 信息处理装置，用于根据关于由检测器获得的带电粒子的强度的信息来测量关于样品上形成的图案的几何形状的信息; 以及用于将样品引入柱内的样品引入单元; 其中，用于产生离子的电荷中和装置，用于测量样品表面电位的表面电位测量装置的离子和表面电位测量装置，并在样品引入单元内部的路径上传送样品至柱。

公开(公告)号：US20070023698A1

公开(公告)日：2007-02-01

申请号：US11457775

申请日：2006-07-14

Applicant: Geum-Sik PARK

Inventor： Geum-Sik PARK

IPC: H01J37/08

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/2002 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/31701

Abstract: An ion implanting apparatus and method are provided. The apparatus includes a plurality of dummy wafers and a plurality of dummy wafer cassettes. The dummy wafers are separately used for respective kinds of ions, and the plurality of dummy wafer cassettes separately store the dummy wafers separately used for the respective kinds of ions. The plurality of dummy wafer cassettes are installed in order to store the plurality of dummy wafers for the respective kinds of ions and use the dummy wafers for an ion implanting process.

Abstract translation: 提供了离子注入装置和方法。 该装置包括多个虚拟晶片和多个虚拟晶片盒。 虚拟晶片分别用于各种离子，并且多个虚设晶片盒分别存储分别用于各种离子的虚拟晶片。 安装多个虚拟晶片盒以便存储用于各种离子的多个虚拟晶片，并使用虚拟晶片进行离子注入工艺。

公开(公告)号：US07109483B2

公开(公告)日：2006-09-19

申请号：US09985331

申请日：2001-11-02

Applicant: Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

IPC: H01J37/06

CPC classification number: G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate. The substrate inspection apparatus comprises: an electron beam apparatus including a charged particle beam source for emitting a charged particle beam, a primary optical system for irradiating the charged particle beam onto the substrate, a secondary optical system into which a secondary charged particle beam is introduced, the secondary charged particle beam being emitted from the substrate by an irradiation of the charged particle beam, a detection system for detecting the secondary charged particle beam introduced into said secondary optical system and outputting as an electric signal, and a process control system for processing and evaluating the electric signal; a stage unit for holding the substrate and moving the substrate relatively to said electron beam apparatus; a working chamber capable of shielding at least an upper region of the stage unit form outside to control under desired atmosphere; and a substrate load-unload mechanism for transferring the substrate into or out of the stage.

公开(公告)号：US20060091325A1

公开(公告)日：2006-05-04

申请号：US11265934

申请日：2005-11-03

Applicant: Thomas Moore ,  Lyudmila Zaykova-Feldman

Inventor： Thomas Moore ,  Lyudmila Zaykova-Feldman

IPC: H01J37/08

CPC classification number: H01J37/302 ,  B82Y15/00 ,  G01N1/32 ,  H01J37/20 ,  H01J37/22 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/206 ,  H01J2237/208 ,  H01J2237/2482 ,  H01J2237/28 ,  H01J2237/30411 ,  H01J2237/30472 ,  H01J2237/31745

Abstract: An apparatus for performing automated in-situ lift-out of a sample from a specimen includes a computer having a memory with computer-readable instructions, a stage for a specimen and a nano-manipulator. The stage and the nano-manipulator are controlled by motion controllers connected to the computer. The nano-manipulator has a probe tip for attachment to samples excised from the specimen. The computer-readable instructions include instructions to cause the stage motion controllers and the nano-manipulator motion controllers, as well as an ion-beam source, to automatically perform in-situ lift-out of a sample from the specimen.

Abstract translation: 用于从样本进行样品的自动原位提取的装置包括具有具有计算机可读指令的存储器的计算机，用于样本的台和纳米操纵器。 舞台和纳米操纵器由连接到计算机的运动控制器控制。 纳米操纵器具有用于附着到从样品切除的样品的探针尖端。 计算机可读指令包括使载物台运动控制器和纳米操纵器运动控制器以及离子束源自动执行样品从样本的原位提取的指令。

公开(公告)号：US06965112B2

公开(公告)日：2005-11-15

申请号：US10843696

申请日：2004-05-11

Applicant: Koji Moriya

Inventor： Koji Moriya

IPC: G01N23/04 ,  G01N1/28 ,  G01Q10/00 ,  G21K7/00 ,  H01J37/20 ,  H01J37/26 ,  G21K5/08

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J2237/20214 ,  H01J2237/204

Abstract: There is disclosed a method of efficiently rotating a specimen without hindrance to observation of the specimen. A specimen holder having a holder body and a specimen-holding member is used. The holder body has a hole in which a step surface is formed. The specimen-holding member is supported from the step surface in the hole of the holder body and positioned within the hole. Arc-shaped slots are formed in the step surface. The specimen-holding member has an opening that accommodates the specimen. The specimen-holding member also has a surrounding portion through which rod-like members extend. The rod-like members have lower-end portions inserted in the slots formed in the step surface. The rod-like members also have upper-end portions. The specimen-holding member holding the specimen is rotated by rotating the upper-end portions of the rod-like members.

Abstract translation: 公开了一种有效地旋转试样而不妨碍观察样品的方法。 使用具有保持器主体和检体保持部件的检体保持器。 保持体具有形成台阶面的孔。 试样保持构件从保持器主体的孔中的台阶表面支撑并定位在孔内。 弧形槽形成在台阶表面。 试样保持构件具有容纳试样的开口。 试样保持部件也具有棒状部件延伸的周围部。 杆状构件具有插入在台阶表面中形成的槽中的下端部分。 棒状构件也具有上端部。 通过旋转杆状构件的上端部来旋转保持试样的试样保持构件。

公开(公告)号：US20020148975A1

公开(公告)日：2002-10-17

申请号：US09985324

申请日：2001-11-02

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: G21G005/00

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate nullSnull to be inspected into an inspection chamber 23-1 maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

Abstract translation: 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到在检查室中保持真空的检查室23-1中; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US06444982B1

公开(公告)日：2002-09-03

申请号：US09599325

申请日：2000-06-22

Applicant: James A. Mitchell ,  Philip J. Palermo

Inventor： James A. Mitchell ,  Philip J. Palermo

IPC: H01J3700

CPC classification number: G01N23/2204 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2005 ,  H01J2237/204 ,  H01J2237/206 ,  H01J2237/2605

Abstract: A system is provided for imaging, in an ESE microscope or other variable pressure microscope, a single sample at various time intervals during dissolution of the sample in a liquid. The system includes a sample chamber having a sample well. The sample well includes an first fluid port and a second fluid port for forming a dissolution bath in the sample well. In accordance with the system according to the present invention, the sample chamber is placed into the specimen chamber of the ESE microscope and a sample is deposited into the sample well of the sample chamber. The sample is immersed in a liquid which flows through the sample well via the first and second fluid ports during a dissolution cycle. The liquid is then drained from the sample well via one of the first and second fluid ports during a draining cycle, and then, during an imaging cycle, the sample is imaged by the ESE microscope. The dissolution cycle, the draining cycle, and the imaging cycle all occur while the sample well is inside the specimen chamber of the ESE microscope.

Abstract translation: 提供了一种系统，用于在ESE显微镜或其它可变压力显微镜下，将样品溶解在液体中，以不同的时间间隔对单个样品进行成像。 该系统包括具有样品阱的样品室。 样品阱包括用于在样品阱中形成溶解浴的第一流体端口和第二流体端口。 根据本发明的系统，将样品室放置在ESE显微镜的样品室中，并将样品沉积到样品室的样品孔中。 在溶解循环期间，将样品浸入通过第一和第二流体端口流经样品的液体中。 然后在排液循环期间，通过第一和第二流体端口之一从样品阱中排出液体，然后在成像周期期间，通过ESE显微镜对样品进行成像。 当样品孔在ESE显微镜的样品室内时，溶解循环，排水循环和成像循环都会发生。

公开(公告)号：US5811823A

公开(公告)日：1998-09-22

申请号：US757726

申请日：1996-11-26

Applicant: Julian G. Blake ,  Piero Sferlazzo ,  Peter H. Rose ,  Adam A. Brailove

Inventor： Julian G. Blake ,  Piero Sferlazzo ,  Peter H. Rose ,  Adam A. Brailove

IPC: H01J37/04 ,  C23C14/48 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317 ,  H01L21/00 ,  H01L21/265 ,  H01L21/677 ,  H01L21/683

CPC classification number: H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01L21/67069 ,  H01L21/67739 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion source, an electrode assembly, a platform mounting a workpiece, and a ion beam measuring structure. The ion source in conjunction with the electrode assembly forms an ion beam in the shape of a ribbon beam. The ion beam is formed and directed such that a first portion of the ion beam treats the workpiece while a second portion of the ion beam is contemporaneously measured by the beam measuring structure. A controller obtains data from the beam measuring structure on the ion beam's parameters, and then generates control signals to the ion implantation system in response to the data.

Abstract translation: 快速有效地处理大量平板显示器的高通量离子注入系统。 离子注入系统具有离子源，电极组件，安装工件的平台和离子束测量结构。 与电极组件结合的离子源形成带状束形状的离子束。 离子束的形成和定向使得离子束的第一部分处理工件，而离子束的第二部分由束测量结构同时测量。 控制器从离子束参数获取束测量结构的数据，然后根据数据产生离子注入系统的控制信号。