-
41.发明申请公开(公告)号：US20180166247A1
公开(公告)日：2018-06-14
申请号：US15836390
申请日：2017-12-08
Applicant: Waviks, Inc.
Inventor： Thomas M. Moore , Gregory A. Magel
CPC classification number: H01J37/023 , H01J37/02 , H01J37/06 , H01J37/20 , H01J37/22 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/024 , H01J2237/063 , H01J2237/202
Abstract: Apparatus and methods for the alignment of a charged-particle beam with an optical beam within a charged-particle beam microscope, and to the focusing of the optical beam are disclosed. An embodiment includes a charged-particle beam microscope having one or more charged-particle beams, such as an electron beam, and one or more optical beams provided by an optical-beam accessory that is mounted in or on the charged-particle beam microscope. This accessory is integrated into a nanomanipulator system, allowing its focus location to be moved within the microscope. The apparatus includes a two-dimensional pixelated beam locator such as a CCD or CMOS imaging array sensor. The image formed by this sensor can then be used to manually, or automatically in an open or closed loop configuration, adjust the positioning of one or more charged-particle beams or optical beams to achieve coincidence of such beams or focus of one or more such beams.
-
公开(公告)号：US09728375B2
公开(公告)日：2017-08-08
申请号：US15004143
申请日：2016-01-22
Applicant: FEI Company
Inventor： Jorgen Rasmussen , Kevin C. Malinak
CPC classification number: H01J37/3002 , B05B1/005 , B05B1/30 , F16K11/0716 , H01J37/02 , H01J37/023 , H01J37/16 , H01J2237/006 , H01J2237/317
Abstract: A multi-positional valve is used to control the destination of gas flows from multiple gas sources. In one valve position the gases flow to an isolated vacuum system where the flow rate and mixture can be adjusted prior to introduction into a sample vacuum chamber. In another valve position the pre-mixed gases flow from the isolated vacuum chamber and through a needle into the sample vacuum chamber.
-
公开(公告)号：US09703213B2
公开(公告)日：2017-07-11
申请号：US14342542
申请日：2012-09-12
CPC classification number: G03F7/70891 , B82Y10/00 , B82Y40/00 , G03F7/709 , H01J37/02 , H01J37/3177 , H01J2237/002 , H01J2237/0216 , H01J2237/28
Abstract: The invention relates to a substrate processing apparatus (10) comprising a support frame (60), a radiation projection system (20) for projecting radiation onto a substrate to be processed, a substrate support structure (30) for supporting the substrate, and a fluid transfer system (150). The radiation projection system comprises a cooling arrangement (130) and is supported by and vibrationally decoupled from the support frame such that vibrations of the support frame above a predetermined maximum frequency are substantially decoupled from the radiation projection system. The fluid transfer system comprises at least one tube (140) fixed at two points (151,152), and comprises a flexible portion. A substantial part of the flexible portion extends over a plane substantially parallel to the substrate support structure surface. The stiffness of the flexible portion is adapted to substantially decouple vibrations at the second fixed point which are above the predetermined maximum frequency from the first fixed point.
-
公开(公告)号：US09396902B2
公开(公告)日：2016-07-19
申请号：US13477253
申请日：2012-05-22
Applicant: Costel Biloiu , Craig R. Chaney , Neil J. Bassom , Benjamin Colombeau , Dennis P. Rodier
Inventor： Costel Biloiu , Craig R. Chaney , Neil J. Bassom , Benjamin Colombeau , Dennis P. Rodier
Abstract: In one embodiment, a method for generating an ion beam having gallium ions includes providing at least a portion of a gallium compound target in a plasma chamber, the gallium compound target comprising gallium and at least one additional element. The method also includes initiating a plasma in the plasma chamber using at least one gaseous species and providing a source of gaseous etchant species to react with the gallium compound target to form a volatile gallium species.
Abstract translation: 在一个实施方案中，用于产生具有镓离子的离子束的方法包括在等离子体室中提供镓化合物靶的至少一部分，所述镓化合物靶包含镓和至少一个附加元素。 该方法还包括使用至少一种气态物质在等离子体室中引发等离子体，并提供气态蚀刻剂物质源以与镓化合物靶反应以形成挥发性镓物质。
-
公开(公告)号：US09375748B2
公开(公告)日：2016-06-28
申请号：US13943198
申请日：2013-07-16
Applicant: Masahiko Harumoto , Tadashi Miyagi , Yukihiko Inagaki , Koji Kaneyama
Inventor： Masahiko Harumoto , Tadashi Miyagi , Yukihiko Inagaki , Koji Kaneyama
CPC classification number: C23C16/56 , B05C11/00 , C23C16/0227 , G03F7/0002 , G03F7/162 , G03F7/20 , G03F7/3021 , G03F7/32 , H01J37/02 , H01L21/0335 , H01L21/0337 , H01L21/0338 , H01L21/67115 , H01L21/67126 , H01L21/6715 , H01L21/67178
Abstract: An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed.
Abstract translation: 形成底层以覆盖基板的上表面，并且在底层上形成引导图案。 在未形成引导图案的底层上的区域中形成由两种类型的聚合物构成的DSA膜。 在向基板上的DSA膜供给溶剂的同时进行热处理。 因此，发生DSA膜的微相分离。 结果，形成由一种聚合物制成的图案和由另一种聚合物制成的图案。 在微相分离之后，在DSA膜上依次进行曝光处理和显影处理，从而除去由另一种聚合物制成的图案。
-
Patent Agency Ranking
公开(公告)号：US20160155607A1
公开(公告)日：2016-06-02
申请号：US15004143
申请日：2016-01-22
Applicant: FEI Company
Inventor： Jorgen Rasmussen , Kevin C. Malinak
CPC classification number: H01J37/3002 , B05B1/005 , B05B1/30 , F16K11/0716 , H01J37/02 , H01J37/023 , H01J37/16 , H01J2237/006 , H01J2237/317
Abstract: A multi-positional valve is used to control the destination of gas flows from multiple gas sources. In one valve position the gases flow to an isolated vacuum system where the flow rate and mixture can be adjusted prior to introduction into a sample vacuum chamber. In another valve position the pre-mixed gases flow from the isolated vacuum chamber and through a needle into the sample vacuum chamber.
Abstract translation: 多位置阀用于控制来自多个气源的气流的目的地。 在一个阀位置，气体流到隔离的真空系统，其中可以在引入样品真空室之前调节流速和混合物。 在另一个阀门位置，预混合气体从隔离的真空室流出并通过针头进入样品真空室。
-
公开(公告)号：US20160133437A1
公开(公告)日：2016-05-12
申请号：US14938689
申请日：2015-11-11
Applicant: FEI Company
Inventor： Marco Hugo Petrus Moers , Albert Visscher
IPC: H01J37/26
CPC classification number: H01J37/265 , H01J37/02 , H01J2237/0216 , H01J2237/16
Abstract: A method of mitigating the effects of environmental pressure variation while using a charged particle microscope is described. The charged particle microscope equipped with a barometric pressure sensor and an automatic controller configured to use the signal from the barometric sensor as an input to a control procedure to compensate for a relative positional error between the charged particle beam and the specimen holder.
Abstract translation: 描述了在使用带电粒子显微镜时减轻环境压力变化的影响的方法。 装有大气压力传感器和自动控制器的带电粒子显微镜被配置为使用来自气压传感器的信号作为控制过程的输入，以补偿带电粒子束和样品架之间的相对位置误差。
-
公开(公告)号：US09327324B2
公开(公告)日：2016-05-03
申请号：US13777044
申请日：2013-02-26
Applicant: Applied Materials Israel Ltd.
Inventor： Lior Segev , Irit Ruach Nir , Guy Eitan
CPC classification number: B08B7/00 , H01J37/02 , H01J37/20 , H01J37/32862 , H01J2237/006 , H01J2237/022
Abstract: A system and method are described, for use in cleaning of a vacuum chamber. The method comprising connecting a vacuum chamber to a plasma generating unit via a plasma connection port and connecting the vacuum chamber to a high vacuum pumping unit via a pumping port. A flow conductance through the plasma connection port to the vacuum chamber is controlled to limit passage of charged particles and cleaning substances produced in the plasma generating unit, to thereby maintain a working pressure inside the vacuum chamber while cleaning the vacuum chamber by said cleaning substances.
Abstract translation: 描述了用于清洁真空室的系统和方法。 该方法包括通过等离子体连接端口将真空室连接到等离子体产生单元，并通过泵送端口将真空室连接到高真空泵送单元。 控制通过等离子体连接端口到真空室的流动传导，以限制带电粒子和等离子体发生单元中产生的清洁物质的通过，从而在通过所述清洁物质清洁真空室的同时保持真空室内的工作压力。
-
公开(公告)号：US09279752B2
公开(公告)日：2016-03-08
申请号：US14514199
申请日：2014-10-14
Applicant: FEI Company
Inventor： Michael Moriarty , Stacey Stone , Jeffrey Blackwood
CPC classification number: G01N1/32 , G01N1/286 , G01N2001/2886 , H01J37/02 , H01J37/3056 , H01J2237/20 , H01J2237/2802 , H01J2237/31745 , H01L21/02318
Abstract: A method and apparatus for preparing thin TEM samples in a manner that reduces or prevents bending and curtaining is realized. Embodiments of the present invention deposit material onto the face of a TEM sample during the process of preparing the sample. In some embodiments, the material can be deposited on a sample face that has already been thinned before the opposite face is thinned, which can serve to reinforce the structural integrity of the sample and refill areas that have been over-thinned due to a curtaining phenomena. In other embodiments, material can also be deposited onto the face being milled, which can serve to reduce or eliminate curtaining on the sample face.
Abstract translation: 实现了以减少或防止弯曲和卷曲的方式制备薄TEM样品的方法和装置。 在制备样品的过程中，本发明的实施方案将材料沉积在TEM样品的表面上。 在一些实施例中，材料可以沉积在样品面上，该样品表面在相对面变薄之前已经变薄，这可以用于增强样品的结构完整性并且由于存在现象而已经被过度稀释的区域 。 在其他实施例中，材料也可以沉积到被研磨的面上，这可以用于减少或消除样品面上的绘制。
-
公开(公告)号：US09097625B2
公开(公告)日：2015-08-04
申请号：US13864362
申请日：2013-04-17
Applicant: Omniprobe, Inc.
Inventor： Rocky Kruger , Aaron Smith , Cheryl Hartfield
CPC classification number: H01J37/08 , C23C16/448 , C23C16/48 , C23C16/52 , C23C16/56 , G01N1/28 , H01J37/02 , H01J2237/006 , H01J2237/317 , Y10T137/0329 , Y10T137/0352
Abstract: A gas injection system for an energetic-beam instrument having a vacuum chamber. The system has a cartridge containing a chemical serving as a source for an output gas to be delivered into the vacuum chamber. The cartridge has a reservoir containing the chemical, which rises to a fill line having a level defined by an amount of the chemical present in the reservoir at a given time. An outlet from the reservoir is coupled to an output passage through an outlet valve and configured so that when the system is tilted the outlet remains above the level of the fill line. Embodiments include isolation valves allowing the cartridge to be disconnected without destroying system vacuum.
Abstract translation: 一种用于具有真空室的能量束仪器的气体注入系统。 该系统具有一个包含化学物质的药筒，作为输出气体的来源，被输送到真空室中。 药筒具有容纳化学物质的储存器，其在给定时间上升到具有由储存器中存在的化学物质量限定的水平的填充管线。 储存器的出口通过出口阀联接到输出通道，并且构造成使得当系统倾斜时，出口保持在填充线的水平面上方。 实施例包括隔离阀，允许筒被断开而不破坏系统真空。
-
-
-
-
-
-
-
-
-
Search Results
226
records
(took 0.023 seconds)
