公开(公告)号：US08314401B2

公开(公告)日：2012-11-20

申请号：US12896110

申请日：2010-10-01

Applicant: Xu Zhang ,  Zhong-Wei Chen

Inventor： Xu Zhang ,  Zhong-Wei Chen

IPC: H01J1/50

CPC classification number: H01J37/141 ,  H01J37/063 ,  H01J2237/065 ,  H01J2237/083 ,  H01J2237/1035 ,  H01J2237/1405

Abstract: An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.

Abstract translation: 电子枪包括电子发射器，围绕电子发射体的电极，引出电极和双重聚光透镜组件，双重聚光透镜组件包括磁性浸入式预聚光透镜和聚光透镜。 与形成物镜的探针组合，如在电子束应用中所希望的那样，电子枪装置可以提供独立可调的探针尺寸和探针电流的电子束。 将电子发射器浸入由磁式预聚光透镜产生的磁场中。 当激活时，由于几何放大和其透镜作用的像差，预聚焦透镜有效地准直光束以增加其角度强度，同时与非浸没情况相比放大虚拟光源。 预聚光透镜之后是聚光透镜。 如果聚光透镜是磁性的，则其峰值磁场足够远，因此其作用不会显着影响虚拟源的尺寸。 透镜的独立调整结合适当选择最终探针形成物镜孔径的尺寸允许在足以满足大多数电子束应用的范围内获得最终探针尺寸和探针电流的各种组合。

公开(公告)号：US08278813B2

公开(公告)日：2012-10-02

申请号：US12481995

申请日：2009-06-10

Applicant: Yong Woon Park ,  Hyotcherl Ihee ,  Chang Bum Kim ,  In Soo Ko

Inventor： Yong Woon Park ,  Hyotcherl Ihee ,  Chang Bum Kim ,  In Soo Ko

IPC: H01J29/46

CPC classification number: H01J37/045 ,  H01J3/18 ,  H01J37/063 ,  H01J37/073 ,  H01J37/295 ,  H01J2237/0432 ,  H01J2237/06333

Abstract: An apparatus and method for generating femtosecond electron beam are disclosed. The apparatus for generating electron beam by discharging an electron generated via a cathode to an anode includes a transmission window provided at one side of the cathode to allow incident laser to pass therethrough, a pinhole formed on the anode such that the pinhole corresponds to the position of the electron generated from the transmission window, and a focusing unit provided at one side of the cathode and generating an electric field to accelerate and at the same time concentrate the electron to the pinhole. Electrons are simultaneously concentrated and accelerated to the pinhole by an electric field generated by the focusing unit positioned at the cathode to generate femtosecond electron beam.

Abstract translation: 公开了一种用于产生飞秒电子束的装置和方法。 通过将通过阴极发射的电子放电到阳极来产生电子束的装置包括设置在阴极的一侧以允许入射激光通过的透射窗口，形成在阳极上的针孔，使得针孔对应于位置 的发射窗产生的电子，以及设置在阴极一侧的聚焦单元，产生电场以加速并同时将电子集中到针孔。 通过由位于阴极处的聚焦单元产生的电场，电子同时集中并加速到针孔，以产生飞秒电子束。

公开(公告)号：US20110294071A1

公开(公告)日：2011-12-01

申请号：US13113667

申请日：2011-05-23

Applicant: Nobuo Imaoka

Inventor： Nobuo Imaoka

IPC: G03F7/20 ,  G21K5/00 ,  H01J29/04

CPC classification number: H01J37/063 ,  H01J1/02 ,  H01J37/065 ,  H01J2237/06308 ,  H01J2237/06316

Abstract: An electron gun includes a cathode, a bias electrode, and an anode disposed along a common axis in order thereof. In the electron gun, an electron emitting surface of the cathode has such a shape that brightness of a crossover is more uniform than that in a case that both a first region including a point on the axis and a second region located outside the first region have a first radius of curvature.

Abstract translation: 电子枪包括依次沿共同轴设置的阴极，偏置电极和阳极。 在电子枪中，阴极的电子发射表面具有这样的形状，使得交叉的亮度比在包括轴上的点的第一区域和位于第一区域之外的第二区域的第一区域都具有更均匀的形状 第一曲率半径。

公开(公告)号：US20090026912A1

公开(公告)日：2009-01-29

申请号：US11829034

申请日：2007-07-26

Applicant: Vincenzo Lordi ,  Kirkwood Rough ,  Xuefeng Liu ,  Shem-Tov Levi

Inventor： Vincenzo Lordi ,  Kirkwood Rough ,  Xuefeng Liu ,  Shem-Tov Levi

IPC: H01J37/302 ,  H01J29/51 ,  H01J37/30

CPC classification number: H01J37/063 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/073 ,  H01J37/075 ,  H01J37/3174 ,  H01J2237/0432

Abstract: Method and apparatus for achieving an intensity modulated electron blanker are disclosed. An apparatus includes a cathode exposed to an activation source to generate an electron beam. Cathode control circuitry adjusts a cathode control amplifier to regulate cathode voltage and the potential of the electron beam. In some approaches the electron beam potential is used to control the blanking frequency, switching speeds, and duty cycle. In another approach electron generating beams directed on to the cathode are modulated to control the electron beam.

Abstract translation: 公开了用于实现强度调制的电子消除器的方法和装置。 一种装置包括暴露于激活源的阴极以产生电子束。 阴极控制电路调节阴极控制放大器以调节阴极电压和电子束的电位。 在一些方法中，电子束电位用于控制消隐频率，开关速度和占空比。 在另一种方法中，调节指向阴极的电子产生光束以控制电子束。

公开(公告)号：US20080153376A1

公开(公告)日：2008-06-26

申请号：US11860178

申请日：2007-09-24

Applicant: Nobuo MIYAMOTO

Inventor： Nobuo MIYAMOTO

IPC: H01J9/50

CPC classification number: H01J37/063 ,  B82Y10/00 ,  B82Y40/00 ,  H01J9/445 ,  H01J37/3174 ,  H01J2237/022 ,  H01J2237/30411

Abstract: Discharge factors existing on a surface of an electrode or an insulator forming an electron gun are removed efficiently and effectively, thus simply and easily enhancing the withstand voltage property of the electron gun. A conditioning processing device of an electron gun is provided with a voltage supply section, a voltage adjusting section for adjusting the output voltage of the voltage supply section, and a current detection section for detecting a leakage current flowing between the electrodes of the electron gun. Further, there are attached a vacuum exhaust section for adjusting the inside of the electron gun in a reduced pressure condition and a pressure detection section. Further, it is arranged that a personal computer (PC), for example, performs data processing based on the leakage current detected by the current detection section or comparison with a reference value thereof to control the voltage, which is applied between the electrodes from the voltage supply section via a connection section, via the voltage adjustment section.

Abstract translation: 有效且有效地除去存在于形成电子枪的电极或绝缘体的表面上的放电系数，从而简单且容易地提高电子枪的耐电压性。 电子枪的调理处理装置设置有电压供给部，用于调整电压供给部的输出电压的电压调整部，以及用于检测在电子枪的电极之间流动的漏电流的电流检测部。 此外，附着有用于在减压条件下调节电子枪内部的真空排气部和压力检测部。 此外，例如，个人计算机（PC）例如基于由当前检测部分检测到的泄漏电流进行数据处理或与其参考值进行比较以控制施加在电极之间的电压 电压供应部分经由连接部分，经由电压调节部分。

公开(公告)号：US07348567B1

公开(公告)日：2008-03-25

申请号：US11545975

申请日：2006-10-10

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: H01J37/04

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

公开(公告)号：US20070029509A1

公开(公告)日：2007-02-08

申请号：US11545976

申请日：2006-10-10

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: G21K5/10

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

公开(公告)号：US20070018112A1

公开(公告)日：2007-01-25

申请号：US11527206

申请日：2006-09-25

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: H01J3/14 ,  G21K1/08

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

公开(公告)号：US20060097200A1

公开(公告)日：2006-05-11

申请号：US11304680

申请日：2005-12-16

Applicant: Mamoru Nakasuji ,  Takao Kato ,  Nobuharu Noji ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe

Inventor： Mamoru Nakasuji ,  Takao Kato ,  Nobuharu Noji ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe

IPC: G21G4/00

CPC classification number: H01J3/10 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J3/021 ,  H01J37/063 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/3174 ,  H01J2237/06316 ,  H01J2237/2817

Abstract: An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.

公开(公告)号：US20040084628A1

公开(公告)日：2004-05-06

申请号：US10287431

申请日：2002-11-04

Applicant: JEOL Ltd.

Inventor： Masaaki Mita

IPC: H01J037/04

CPC classification number: H01J37/04 ,  H01J37/063 ,  H01J37/073 ,  H01J37/256 ,  H01J2237/04924

Abstract: An electron beam apparatus is offered which is capable of being used optimally over a wide range of electron beam currents. A method of controlling this apparatus is also offered. The apparatus has an electron emitter for producing an electron beam. The beam is collimated or slightly converged (made a real-image mode beam) by the first condenser lens. As a result, the amount of the electron beam limited by the anode electrode can be reduced to a minimum. The excitation of the first condenser lens is fixed to parallel beam conditions and so movement of the virtual electron source is prevented. This can enhance the axial accuracy.

Abstract translation: 提供了能够在宽范围的电子束电流下被最佳地使用的电子束装置。 还提供了一种控制该装置的方法。 该装置具有用于产生电子束的电子发射器。 光束被第一聚光透镜准直或略微收敛（制成实像模式光束）。 结果，可以将由阳极电极限制的电子束的量减少到最小。 第一聚光透镜的激发被固定为平行光束条件，从而防止虚拟电子源的移动。 这可以提高轴向精度。