公开(公告)号：US20240242919A1

公开(公告)日：2024-07-18

申请号：US18474329

申请日：2023-09-26

Applicant: NuFlare Technology, Inc.

Inventor： Hirofumi MORITA

IPC: H01J37/141 ,  G03F7/00 ,  G03F7/20 ,  H01J37/04 ,  H01J37/145 ,  H01J37/317

CPC classification number: H01J37/141 ,  G03F7/2059 ,  G03F7/70191 ,  H01J37/045 ,  H01J37/145 ,  H01J37/3177

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus a multi charged particle beam on a substrate, which has passed through a limiting aperture member, and three or more correction lenses correcting an imaging state of the multi charged particle beam on the substrate. The three or more correction lenses are comprised of a first magnetic correction lens, and two or more correction lenses, the two or more correction lenses are placed inside a lens magnetic field of one of the two or more-stage objective lenses, and one or no electrostatic correction lens is placed inside a magnetic field of each of the two or more-stage objective lenses.

公开(公告)号：US12002656B2

公开(公告)日：2024-06-04

申请号：US18230722

申请日：2023-08-07

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schmaunz

IPC: H01J37/32 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304

CPC classification number: H01J37/32449 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/006 ,  H01J2237/2065

Abstract: Operating a gas feed device for a particle beam apparatus includes predetermining a flow rate of a precursor through an outlet of a precursor reservoir containing the precursor to be fed onto an object, loading a temperature of the precursor reservoir, the temperature being associated with the predetermined flow rate, from a database into a control unit, setting a temperature of the precursor reservoir to the temperature loaded from the database using a temperature setting unit, and determining at least one functional parameter of the precursor reservoir depending on the flow rate and the temperature, loaded from the database, using the control unit and informing a user of the gas feed device about the determined functional parameter. Informing the user of the gas feed device about the functional parameter may include displaying the functional parameter on a display unit, outputting an optical signal, or outputting an acoustic signal.

公开(公告)号：US20240145214A1

公开(公告)日：2024-05-02

申请号：US18504089

申请日：2023-11-07

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhong-wei CHEN ,  Martinus Gerardus Johannes Maria MAASSEN

IPC: H01J37/317 ,  H01J37/145 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0453

Abstract: Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.

公开(公告)号：US20240079200A1

公开(公告)日：2024-03-07

申请号：US18505216

申请日：2023-11-09

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiko INOUE ,  Atsushi ANDO ,  Munehiro OGASAWARA

IPC: H01J37/145 ,  H01J37/244

CPC classification number: H01J37/145 ,  H01J37/244 ,  H01J2237/1508 ,  H01J2237/1516

Abstract: A multi-electron beam image acquiring apparatus includes a stage configured to mount thereon a substrate, an illumination optical system configured to apply multiple primary electron beams to the substrate, a plurality of multipole lenses including at least two stages of multipole lenses, arranged at positions common to a trajectory of the multiple primary electron beams and a trajectory of multiple secondary electron beams which are emitted because the substrate is irradiated with the multiple primary electron beams and each configured to include at least four electrodes and at least four magnetic poles, and a multi-detector configured to detect the multiple secondary electron beams separated from the trajectory of the multiple primary electron beams, wherein one of the plurality of multipole lenses separates the multiple secondary electron beams from the trajectory of the multiple primary electron beams.

公开(公告)号：US11854765B2

公开(公告)日：2023-12-26

申请号：US16885872

申请日：2020-05-28

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen ,  Martinus Gerardus Johannes Maria Maassen

IPC: H01J37/317 ,  H01J37/145 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0453

Abstract: Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.

公开(公告)号：US11804357B2

公开(公告)日：2023-10-31

申请号：US17490522

申请日：2021-09-30

Applicant: FEI Company

Inventor： Ali Mohammadi-Gheidari ,  Peter Christiaan Tiemeijer ,  Alexander Henstra ,  Tomas Radlicka

IPC: H01J37/153 ,  H01J37/145 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/145 ,  H01J37/1471 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1532 ,  H01J2237/1534

Abstract: An electron optical module for providing an off-axial electron beam with a tunable coma, according to the present disclosure includes a structure positioned downstream of an electron source and an electron lens assembly positioned between the structure and the electron source. The structure generates a decelerating electric field, and is positioned to prevent the passage of electrons along the optical axis of the electron lens assembly. The electron optical module further includes a micro-lens that is not positioned on the optical axis of the electron lens assembly and is configured to apply a lensing effect to an off-axial election beam. Aberrations applied to the off-axial electron beam by the micro-lens and the electron lens assembly combine so that a coma of the off-axial beam has a desired value in a downstream plane.

公开(公告)号：US20230326707A1

公开(公告)日：2023-10-12

申请号：US18333699

申请日：2023-06-13

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schertel ,  Andreas Schmaunz ,  Endre Majorovits ,  Bernd Stenke ,  Stephan Hiller ,  Matthias Karl

IPC: H01J37/16 ,  H01J37/20 ,  H01J37/145 ,  H01J37/147 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/16 ,  H01J37/20 ,  H01J37/145 ,  H01J37/1475 ,  H01J2237/2007 ,  H01J37/244 ,  H01J2237/002 ,  H01J2237/2001 ,  H01J37/28

Abstract: An object receiving container may receive an object which is examinable, analyzable and/or processable at cryo-temperatures. An object holding system may comprise an object receiving container. A beam apparatus or an apparatus for processing an object may comprise an object receiving container or an object holding system. An object may be examined, analyzed and/or processed using an object receiving container or an object holding system. The object receiving container may comprise a first container unit, a cavity for receiving the object, a second container unit, which is able to be brought into a first position and/or into a second position relative to the first container unit, and at least one fastening device which is arranged at the first container unit or at the second container unit for arranging the object receiving container at a holding device.

公开(公告)号：US20230154723A1

公开(公告)日：2023-05-18

申请号：US17359365

申请日：2019-12-06

Applicant: ASML Netherlands B.V.

Inventor： Yan REN ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/147 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  G01N23/2251

CPC classification number: H01J37/1478 ,  H01J37/1474 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  G01N23/2251 ,  H01J2237/0455 ,  H01J2237/2611 ,  H01J2237/151 ,  H01J2237/226 ,  H01J2237/04926 ,  H01J2237/103 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/507

Abstract: Embodiments consistent with the disclosure herein include methods and a multi-beam apparatus configured to emit charged-particle beams for imaging a top and side of a structure of a sample, including: a deflector array including a first deflector and configured to receive a first charged-particle beam and a second charged-particle beam; a blocking plate configured to block one of the first charged-particle beam and the second charged-particle beam; and a controller having circuitry and configured to change the configuration of the apparatus to transition between a first mode and a second mode. In the first mode, the deflector array directs the second charged-particle beam to the top of the structure, and the blocking plate blocks the first charged-particle beam. And in the second mode, the first deflector deflects the first charged-particle beam to the side of the structure, and the blocking plate blocks the second charged-particle beam.

公开(公告)号：US20180114670A1

公开(公告)日：2018-04-26

申请号：US15559967

申请日：2016-02-08

Applicant: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY

Inventor： Tadahiro KAWASAKI ,  Takayoshi TANJI ,  Takashi IKUTA

IPC: H01J37/153

CPC classification number: H01J37/153 ,  H01J37/145

Abstract: An electromagnetic lens for charged particle beam exhibits positive spherical aberration. A complicated combination of electromagnetic lenses had been necessary for correcting this spherical aberration. One of a circular aperture or a ring-shaped aperture is provided on an incident plate arranged on an incident side of charged particle beam, another of the circular aperture or the ring-shaped aperture is provided on a plate arranged on an emission side thereof, and a voltage is applied between the incident plate and the emission plate. By so doing, an electric field generated in the ring-shaped aperture emanates, which resolves the positive spherical aberration. The spherical aberration can be corrected by an extremely simple and easily implemented structure.

公开(公告)号：US09953805B2

公开(公告)日：2018-04-24

申请号：US15364060

申请日：2016-11-29

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mhH

Inventor： Matthias Firnkes ,  Stefan Lanio ,  Dieter Winkler

IPC: H01J37/244 ,  H01J37/26 ,  H01J37/22 ,  H01J37/09 ,  H01J37/12 ,  H01J37/145

CPC classification number: H01J37/244 ,  G01N2223/418 ,  G01N2223/6116 ,  H01J37/09 ,  H01J37/12 ,  H01J37/145 ,  H01J37/222 ,  H01J37/26 ,  H01J2237/0453 ,  H01J2237/1202 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/24592

Abstract: A secondary charged particle imaging system for imaging a secondary charged particle beam emanating from a sample by impingement of a primary charged particle beam is provided. The system includes a detector arrangement, and an adaptive secondary charged particle optics. The detector arrangement comprises a first detection element for detecting a first secondary charged particle sub-beam of the secondary charged particle beam, and a second detection element for detecting a second secondary charged particle sub-beam of the secondary charged particle beam. The adaptive secondary charged particle optics comprises an aperture plate including a first opening for letting the first secondary charged particle sub-beam pass through and a second opening for letting the second secondary charged particle sub-beam pass through; a lens system for mapping the secondary charged particle beam onto the aperture plate, the lens system comprising a first lens and a second lens; and a controller for controlling the excitation of the first lens and the excitation of the second lens. The controller is configured to independently control the excitation of the first lens and of the second lens to map the secondary charged particle beam onto the aperture plate so that the first secondary charged particle sub-beam passes through the first opening and the second secondary charged particle sub-beam passes through the second opening independent of a variation of at least one first operating parameter selected from a group comprising: landing energy of the primary charged particle beam on the sample, extraction field strength for the secondary charged particle beam at the sample, magnetic field strength of an objective lens that focuses the primary charged particle beam onto the sample, and working distance of the objective lens from the sample.