公开(公告)号：US20240212969A1

公开(公告)日：2024-06-27

申请号：US18288405

申请日：2022-04-19

Applicant: NIKON CORPORATION

Inventor： Takakuni GOTO ,  Motofusa ISHIKAWA ,  Baku OGASAWARA ,  Shunta KUSU ,  Yuta KOMATSU ,  Tomoya UCHIDA

IPC: H01J37/145 ,  H01J37/141 ,  H01J37/143 ,  H01J37/147

CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/143 ,  H01J37/1472

Abstract: A charged particle optical system includes a permanent magnetic lens disposed closer to an object than a central point between a charged particle beam source and the object in an optical axis direction of the charged particle optical system, an electromagnetic lens disposed such that a position of at least a part of the electromagnetic lens overlaps the permanent magnetic lens in the optical axis direction of the charged particle optical system, and an electrostatic lens disposed such that a position of at least a part of the electrostatic lens overlaps at least one of the permanent magnetic lens and the electromagnetic lens in the optical axis direction of the charged particle optical system.

公开(公告)号：US20240212968A1

公开(公告)日：2024-06-27

申请号：US18088222

申请日：2022-12-23

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Benjamin Cook ,  Pieter Kruit

IPC: H01J37/145 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/1413 ,  H01J37/28 ,  H01J2237/141

Abstract: A lens for a charged particle beam apparatus, the lens having lens components, is described. The lens includes a first magnetic lens having an upper pole piece and a middle pole piece; a second magnetic lens having the middle pole piece and a lower pole piece; a first coil arranged in the first magnetic lens and to provide a first magnetic field between the upper pole piece and the middle pole piece; a second coil arranged in the second magnetic lens and to provide a second magnetic field between the middle pole piece and the lower pole piece; and an electrostatic lens having an upper electrode and a lower electrode, wherein at least one of a first inner diameter defined by the upper pole piece and a second inner diameter defined by the middle pole piece is larger than a third inner diameter of the lower pole piece.

公开(公告)号：US20230377829A1

公开(公告)日：2023-11-23

申请号：US18363284

申请日：2023-08-01

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta IMAI ,  Masahiro SASAJIMA ,  Yoshihiro TAKAHOKO

IPC: H01J37/145 ,  H01J37/15 ,  H01J37/21

CPC classification number: H01J37/145 ,  H01J37/15 ,  H01J37/21 ,  H01J37/12

Abstract: A charged particle beam device is provided in which axis adjustment as a superimposing lens is facilitated by aligning an axis of an electrostatic lens resulting from a deceleration electric field with an axis of a magnetic field lens. The charged particle beam device includes: an electron source; an objective lens that focuses a probe electron beam from the electron source on a sample; a first beam tube and a second beam tube through each of which the probe electron beam passes; a deceleration electrode arranged between the first beam tube and a sample; a first voltage source that forms a deceleration electric field for the probe electron beam between the first beam tube and the deceleration electrode by applying a first potential to the first beam tube; and a first moving mechanism that moves a position of the first beam tube.

公开(公告)号：US20230260744A1

公开(公告)日：2023-08-17

申请号：US17974702

申请日：2022-10-27

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Heiko Stegmann

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/145 ,  H01J37/244 ,  H01J37/304 ,  G01N23/2251 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/226 ,  H01J37/145 ,  H01J37/244 ,  H01J37/304 ,  G01N23/2251 ,  H01J37/1475 ,  H01J37/1477 ,  H01J2237/1505

Abstract: The invention relates to a method for producing a sample on an object using a material processing device. The invention further relates to a computer program product and a material processing device for carrying out the method. The method comprises guiding a light beam over a surface of the object in a first direction along a first line, with material of the object being ablated when the light beam is guided over the surface of the object, changing the first direction into a second direction, guiding the light beam over the surface of the object in the second direction along a second line, with material of the object being ablated when the light beam is guided over the surface of the object along the second line, wherein the light beam is provided in pulsed fashion and is guided onto the surface of the object in such a way that the light beam ablates material from the object in a first operational state of the light beam device and that the light beam is not guided onto the object in a second operational state, and wherein the sample is produced in the first operational state by ablating material from the object.

公开(公告)号：US11705301B2

公开(公告)日：2023-07-18

申请号：US17152480

申请日：2021-01-19

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Benjamin John Cook

IPC: H01J37/14 ,  H01J37/145 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/145 ,  H01J37/1471 ,  H01J37/3174 ,  H01J2237/0453 ,  H01J2237/141 ,  H01J2237/1516

Abstract: It is provided a charged particle beam manipulation device for a plurality of charged particle beamlets, the charged particle beam manipulation device including a lens having a main optical axis, the lens including at least a first array of multipoles, each multipole of the first array of multipoles configured to compensate for a lens deflection force on a respective charged particle beamlet of the plurality of charged particle beamlets, the lens deflection force being a deflection force produced by the lens on the respective charged particle beamlet towards the main optical axis of the lens.

公开(公告)号：US11676793B2

公开(公告)日：2023-06-13

申请号：US16679023

申请日：2019-11-08

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen

IPC: H01J37/145 ,  H01J37/26 ,  H01J37/285

CPC classification number: H01J37/145 ,  H01J37/26 ,  H01J37/285

Abstract: An electromagnetic compound lens may be configured to focus a charged particle beam. The compound lens may include an electrostatic lens provided on a secondary optical axis and a magnetic lens also provided on the secondary optical axis. The magnetic lens may include a permanent magnet. A charged particle optical system may include a beam separator configured to separate a plurality of beamlets of a primary charged particle beam generated by a source along a primary optical axis from secondary beams of secondary charged particles. The system may include a secondary imaging system configured to focus the secondary beams onto a detector along the secondary optical axis. The secondary imaging system may include the compound lens.

公开(公告)号：US20230005706A1

公开(公告)日：2023-01-05

申请号：US17856722

申请日：2022-07-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus MANGNUS ,  Erwin SLOT

IPC: H01J37/244 ,  H01J37/145 ,  H01J37/28

Abstract: A detector for use in a charged particle device for an assessment tool to detect signal particles from a sample, the detector including a substrate, the substrate including: a semiconductor element configured to detect signal particles above a first energy threshold; and a charge-based element configured to detect signal particles below a second energy threshold.

公开(公告)号：US11527379B2

公开(公告)日：2022-12-13

申请号：US16845992

申请日：2020-04-10

Applicant: CARL ZEISS MICROSCOPY GMBH ,  APPLIED MATERIALS ISRAEL, LTD.

Inventor： Rainer Knippelmeyer ,  Stefan Schubert

IPC: H01J37/28 ,  H01J37/141 ,  H01J37/145 ,  H01J37/20 ,  H01J37/21 ,  H01J37/24

Abstract: An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.

公开(公告)号：US11456148B2

公开(公告)日：2022-09-27

申请号：US17053285

申请日：2019-05-28

Applicant: The Board of Trustees of the Leland Stanford Junior University

Inventor： Mark A. Kasevich ,  Stewart A. Koppell ,  Brannon Klopfer ,  Thomas Juffmann ,  Marian Mankos

IPC: H01J37/153 ,  H01J37/145 ,  H01J37/244 ,  H01J37/29

Abstract: Improved aberration correction in multipass electron microscopy is provided by having Fourier images of the sample (instead of real images) at the reflection planes of the resonator. The resulting −1 magnification of the sample reimaging can be compensated by appropriate sample placement or by adding compensating elements to the resonator. This enables simultaneous correction of lowest order chromatic and spherical aberration from the electron objective lenses. If real images of the sample are at the reflection planes of the resonator instead, only the lowest order chromatic aberration can be corrected.

公开(公告)号：US11342155B2

公开(公告)日：2022-05-24

申请号：US17056285

申请日：2018-05-22

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta Imai ,  Masahiro Sasajima ,  Yoshihiro Takahoko

IPC: H01J37/145 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

Abstract: In a charged particle beam device including a deceleration optical system, a change in a deceleration electric field and an axis shift due to a structure between an objective lens and a sample are prevented to reduce adverse effects on an irradiation system and detection system. The charged particle beam device includes an electron source, an objective lens configured to focus a probe electron beam from the electron source on the sample, an acceleration electrode configured to accelerate the probe electron beam, a first detector provided in the acceleration electrode, a deceleration electrode configured to form a deceleration electric field for the probe electron beam with the acceleration electrode, the probe electron beam being configured to pass through an opening of the deceleration electrode, and a second detector inserted between the deceleration electrode and the sample. The second detector includes an opening portion larger than the opening of the deceleration electrode, and a sensing surface is provided around the opening portion.