Abstract:
A pattern measurement apparatus includes: an irradiation unit for irradiating a sample with an electron beam; an electron detection unit for detecting the amount of electrons generated from the sample on which a pattern is formed; an image processor for generating an SEM image of the pattern based on the amount of electrons; and a controller for acquiring a rectangular measurement specification region of the SEM image and calculating a loss ratio of a corner portion of the pattern from areas of the measurement specification region and the corner portion of the pattern. The controller detects edge positions in a predetermined range including a position where a corner of the measurement specification region intersects with a side of the SEM image, and adjusts the measurement specification region in accordance with the edge positions.
Abstract:
An apparatus for processing a defect candidate image, including: an imager for taking an enlarged image of a specimen; an image processor for processing the image taken by the imager to detect defect candidates existing on the specimen and classify the detected defect candidates into one of plural defect classes; a memory for storing information of the defect candidates including the images of the defect candidates and the classified defect class data outputted from the image processor; and a display unit having a display screen for displaying information stored in the memory, wherein the display unit displays an image of the defect candidates together with the defect class data stored in the memory and the displayed defect class data is changeable on the display screen, and the memory changes the stored defect class data of the displayed defect candidate to the changed defect class data.
Abstract:
The invention provides a probe and a method of obtaining a three-dimensional compositional map of one or more targets in a biological sample, or a portion thereof, comprising: (a) milling a surface layer of a biological sample with a focused ion beam, thereby creating a newly exposed surface layer of the biological sample; (b) imaging the newly exposed surface layer of the biological sample; (c) identifying the chemical composition of the newly exposed surface layer of the biological sample, or a portion thereof, with a mass spectrometer; and (d) repeating (a) to (c) until a three-dimensional compositional map of one or more targets in the biological sample, or portion thereof, is obtained. Uses of the three-dimensional map obtained from the inventive method are further provided.
Abstract:
A lens assembly having an electrostatic lens component for a charged particle beam system is provided. The assembly includes: a first electrode having a conically shaped portion, a second electrode having a conically shaped portion, and a first insulator having a conically shaped portion, wherein the first insulator comprises two extending portions towards each of its ends, and wherein the two extending portions are formed to generate a gap between the insulator and each of the adjacent electrodes.
Abstract:
The invention relates to a motorized manipulator for positioning a TEM specimen holder with sub-micron resolution parallel to a y-z plane and rotating the specimen holder in the y-z plane, the manipulator comprising a base (2), and attachment means (30) for attaching the specimen holder to the manipulator, characterized in that the manipulator further comprises at least three nano-actuators (3a, 3b, 3c) mounted on the base, each nano-actuator showing a tip (4a, 4b, 4c), the at least three tips defining the y-z plane, each tip capable of moving with respect to the base in the y-z plane; a platform (5) in contact with the tips of the nano-actuators; and clamping means (6) for pressing the platform against the tips of the nano-actuators; as a result of which the nano-actuators can rotate the platform with respect to the base in the y-z plane and translate the platform parallel to the y-z plane.
Abstract:
A charged-particle beam system has a demagnifying lens for reducing the dimensions of an electron beam produced from an electron beam source, an objective lens for focusing the demagnified beam onto the surface of a target, a first deflector located before the demagnifying lens, a second deflector placed such that the deflection field produced by it is totally or partially superimposed on the objective lens field, and a third deflector located in a stage following the second deflector. An image of the light source is created by the demagnifying lens. An image of the light source image is formed on the target by the objective lens.
Abstract:
Provided is an electron source which outputs a stable electron beam even when vibration is applied from the external to an apparatus which uses the electron source. The electron source is provided with an insulator (5); two conductive terminals (4) arranged at an interval on the insulator (5); a long filament (3) stretched between the conductive terminals (4); and a needle-like cathode (1) having an electron emitting section attached to the filament (3). The vertical cross-section shape of the filament (3) in the axis direction has a long direction and a short direction, and the maximum length in the long direction is 1.5 times or more but not more than 5 times the maximum length in the short direction.
Abstract:
The present invention relates to an electron emitter having a nanostructure tip and an electron column using the same, and, more particularly, to an electron emitter which includes a nanostructure tip which can easily emit electrons, composed of carbon nanotube (CNT), zinc oxide nanotube (ZnO nanotube), zinc oxide nanorod, zinc oxide nanopillar, zinc oxide nanowire, zinc oxide nanoparticle or the like, and an electron column using the same.
Abstract:
An ion beam processing apparatus includes an ion beam irradiation optical system that irradiate a rectangular ion beam to a sample held on a first sample stage, an electron beam irradiation optical system that irradiates an electron beam to the sample, and a second sample stage on which a test piece, extracted from the sample by a probe, is mounted. An angle of irradiation of the ion beam can be tilted by rotating the second sample stage about a tilting axis. A controller controls the width of skew of an intensity profile representing an edge of the rectangular ion beam in a direction perpendicular to a first direction in which the tilting axis of the second sample stage is projected on the second sample stage surface so that the width will be smaller than the width of skew of an intensity profile representing another edge of the ion beam in a direction parallel to the first direction.
Abstract:
When conditions for an electron gun mainly represented by extraction voltage V1 and accelerating voltage V0 are changed, a charged particle beam is once focused on a fixed position by means of a condenser lens and a virtual cathode position is calculated from a lens excitation of the condenser lens at that time and the mechanical positional relation of the electron gun to set an optical condition. For more accurate setting of the optical condition, a deflecting electrode device is provided at a crossover position of the condenser lens and a voltage is applied to the deflecting electrode device at a constant period so as to control the lens excitation of the condenser lens such that the amount of movement of an image is minimized on an image display unit such as CRT.