公开(公告)号：US3134021A

公开(公告)日：1964-05-19

申请号：US4494760

申请日：1960-07-25

Applicant: ZEISS IKON AG

Inventor： MARTIN PLOKE

IPC: G01J1/04 ,  G01J1/06 ,  G01J1/42

CPC classification number: G01J1/04 ,  G01J1/0477 ,  G01J1/06 ,  G01J1/4214

公开(公告)号：US11953420B2

公开(公告)日：2024-04-09

申请号：US17201738

申请日：2021-03-15

Applicant: Becton, Dickinson and Company

Inventor： Jizuo Zou ,  Matthew Bahr ,  Eric D. Diebold

IPC: G01N15/1434 ,  G01J1/04 ,  G01J1/42 ,  G01N21/47 ,  G01N21/53

CPC classification number: G01N15/1436 ,  G01J1/0477 ,  G01J1/4228 ,  G01N15/1434 ,  G01N21/532 ,  G01N2021/4707

Abstract: Light detection systems for measuring light (e.g., in a flow stream) are described. Light detection systems according to embodiments include a light scatter detector, a brightfield photodetector and an optical adjustment component configured to convey light to the light scatter detector and to the brightfield photodetector. Systems and methods for measuring light emitted by a sample (e.g., in a flow stream) and kits having a light scatter detector, a brightfield photodetector and a beam splitter component are also provided.

公开(公告)号：US20240102855A1

公开(公告)日：2024-03-28

申请号：US18257422

申请日：2021-12-14

Applicant: Primes GmbH Messtechnik für die Produktion mit Laserstrahlung

Inventor： Reinhard Kramer ,  Otto Märten ,  Stefan Wolf ,  Johannes Roßnagel ,  Marc Hänsel ,  Roman Niedrig

IPC: G01J1/42 ,  B23K26/06 ,  B23K26/067 ,  B23K26/70 ,  G01J1/04

CPC classification number: G01J1/4257 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0676 ,  B23K26/705 ,  G01J1/0411 ,  G01J1/0414 ,  G01J1/0477

Abstract: The invention relates to a beam analysis device (10) for determining the axial position of the focal point (71) of an energy beam or a sample beam (70) decoupled from an energy beam, comprising a beam-shaping device (12), a detector (40), and an analysis device (45). The beam-shaping device (12) is designed to release two sub-beams (72, 73) from the sample beam (70) on a plane of the sub-beam release process (19). The cross-sections of the two sub-beams (72, 73) are defined by sub-apertures (32, 33) which are delimited from each other and which are arranged at a distance k to each other in a first lateral direction (31). The beam-shaping device (12) is designed to image the two sub-beams (72, 73) in order to form two beam spots (92, 93) on the detector and deflect at least one of the two sub-beams (72, 73) in a second lateral direction (37) which is oriented transversely to the first lateral direction (31) in order to form a distance w in the second lateral direction (37) between the two beam spots (92, 93). The analysis device (45) is designed to determine the distance a along the first lateral direction (31) between positions of the two beam spots (92, 93) on the detector (40) and to determine the axial position of the beam focus (71) on the basis of the distance a and/or to determine a change in the axial position of the beam focus (71) on the basis of a change in the distance a. The invention also relates to a corresponding method for determining the axial position of a beam focus (71).

公开(公告)号：US11892620B2

公开(公告)日：2024-02-06

申请号：US17355967

申请日：2021-06-23

Applicant: INSTITUT NATIONAL D'OPTIQUE

Inventor： Alex Paquet ,  François Berthiaume

IPC: G02B26/08 ,  G01J1/04 ,  G01N21/3581 ,  G01N21/552

CPC classification number: G02B26/0883 ,  G01J1/0437 ,  G01J1/0448 ,  G01J1/0477 ,  G01N21/3581 ,  G01N21/552

Abstract: Target devices for characterizing terahertz imaging systems are provided. The target devices include a terahertz resolution pattern having spatially distributed resolution features and one or more prism assemblies configured to provide a variable contrast level within the resolution features when used with terahertz radiation. Each prism assembly includes first and second prisms arranged in a Frustrated Total Internal Reflection (FTIR) configuration.

公开(公告)号：US09909992B2

公开(公告)日：2018-03-06

申请号：US15119055

申请日：2015-02-28

Applicant: IMEC VZW

Inventor： Pol Van Dorpe ,  Peter Peumans

IPC: G01J3/30 ,  G01N21/65 ,  A61B5/00 ,  A61B5/145 ,  A61B5/1455 ,  G01J3/02 ,  G01J3/36 ,  G01J3/44 ,  G01J3/26 ,  G01N33/49 ,  G01J3/12

CPC classification number: G01N21/65 ,  A61B5/0066 ,  A61B5/14532 ,  A61B5/1455 ,  A61B5/443 ,  A61B2562/0233 ,  A61B2562/0238 ,  G01J1/0204 ,  G01J1/0425 ,  G01J1/0477 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/0227 ,  G01J3/0256 ,  G01J3/0264 ,  G01J3/0291 ,  G01J3/1895 ,  G01J3/26 ,  G01J3/36 ,  G01J3/44 ,  G01J2003/1213 ,  G01N33/49 ,  G01N2201/06113 ,  G01N2201/0633 ,  G01N2201/0636 ,  G02B6/0026 ,  G02B6/0031 ,  G02B6/0038 ,  G02B6/0048

Abstract: The present disclosure relates to systems, methods, and sensors configured to characterize a radiation beam. At least one embodiment relates to an optical system. The optical system includes an optical radiation guiding system. The optical radiation guiding system includes a collimator configured to collimate the radiation beam into a collimated radiation beam. The optical radiation guiding system also includes a beam shaper configured to distribute power of the collimated radiation beam over a discrete number of line shaped fields. A spectrum of the collimated radiation beam entering the beam shaper is delivered to each of the discrete number of line shaped fields. The optical system further includes a spectrometer chip. The spectrometer chip is configured to process the spectrum of the collimated radiation beam in each of the discrete number of line shaped fields coming from the beam shaper.

公开(公告)号：US09835495B2

公开(公告)日：2017-12-05

申请号：US14947335

申请日：2015-11-20

Applicant: Gigaphoton Inc.

Inventor： Masato Moriya ,  Osamu Wakabayashi ,  Yoshinobu Watabe

IPC: G01J11/00 ,  H01S3/134 ,  H01S3/00 ,  G01J1/42 ,  G01J1/04 ,  G01J4/04 ,  G02B5/30 ,  G02B27/14 ,  H01S3/23

CPC classification number: G01J11/00 ,  G01J1/0414 ,  G01J1/0429 ,  G01J1/0477 ,  G01J1/4257 ,  G01J4/04 ,  G01J2001/4261 ,  G02B5/3066 ,  G02B27/148 ,  H01S3/0014 ,  H01S3/134 ,  H01S3/2366

Abstract: A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF2.

公开(公告)号：US09595554B2

公开(公告)日：2017-03-14

申请号：US14272680

申请日：2014-05-08

Applicant: MAZeT GmbH

Inventor： Gunter Siess ,  Marcus Roeppischer ,  Wilfried Krueger

IPC: H01L31/0232 ,  H01L27/146 ,  G01J1/04 ,  G01J1/42 ,  G01J3/50 ,  H01L31/0216 ,  H01L27/144

CPC classification number: H01L27/14625 ,  G01J1/0418 ,  G01J1/0477 ,  G01J1/42 ,  G01J3/50 ,  H01L27/1446 ,  H01L31/02165

Abstract: A sensor arrangement with a silicon-based optical sensor, particularly color sensors for colorimetric applications is disclosed. The invention aims to find a novel possibility for suppressing interference ripples occurring in optical sensors when adding substrates with optically functional coatings which permits a simple production without complicated adaptation layers. The sensor passivation is composed of a combination of thin SiO2 layer in the range of 5 to 10 nm and an antireflection-matched Si3N4 layer and a substrate which carries at least one optical filter is arranged over the sensor passivation and connected to the sensor by means of an adhesive and forms an intermediate space between sensor surface and optical filter which is filled with an optical medium having a low refractive index (n2) and a height variation (Δh) over the associated sensor surface.

Abstract translation: 公开了一种具有硅基光学传感器的传感器装置，特别是用于比色应用的彩色传感器。 本发明旨在找到一种新颖的可能性，用于在添加具有光学功能涂层的基底时抑制在光学传感器中发生的干扰波纹，这允许在没有复杂的适应层的情况下进行简单的生产。 传感器钝化由5至10nm范围内的薄SiO 2层和抗反射匹配Si 3 N 4层的组合以及承载至少一个滤光器的衬底组合在传感器钝化上并通过装置连接到传感器 并且在传感器表面和滤光器之间形成中间空间，该中间空间填充有在相关联的传感器表面上具有低折射率（n2）和高度变化（Δh）的光学介质。

公开(公告)号：US20160356720A1

公开(公告)日：2016-12-08

申请号：US15119055

申请日：2015-02-28

Applicant: Imec VZW

Inventor： Pol VAN DORPE ,  Peter PEUMANS

IPC: G01N21/65 ,  A61B5/00 ,  A61B5/1455 ,  G01N33/49 ,  A61B5/145

CPC classification number: G01N21/65 ,  A61B5/0066 ,  A61B5/14532 ,  A61B5/1455 ,  A61B5/443 ,  A61B2562/0233 ,  A61B2562/0238 ,  G01J1/0204 ,  G01J1/0425 ,  G01J1/0477 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/0227 ,  G01J3/0256 ,  G01J3/0264 ,  G01J3/0291 ,  G01J3/1895 ,  G01J3/26 ,  G01J3/36 ,  G01J3/44 ,  G01J2003/1213 ,  G01N33/49 ,  G01N2201/06113 ,  G01N2201/0633 ,  G01N2201/0636 ,  G02B6/0026 ,  G02B6/0031 ,  G02B6/0038 ,  G02B6/0048

Abstract: The present disclosure relates to systems, methods, and sensors configured to characterize a radiation beam. At least one embodiment relates to an optical system. The optical system includes an optical radiation guiding system. The optical radiation guiding system includes a collimator configured to collimate the radiation beam into a collimated radiation beam. The optical radiation guiding system also includes a beam shaper configured to distribute power of the collimated radiation beam over a discrete number of line shaped fields. A spectrum of the collimated radiation beam entering the beam shaper is delivered to each of the discrete number of line shaped fields. The optical system further includes a spectrometer chip. The spectrometer chip is configured to process the spectrum of the collimated radiation beam in each of the discrete number of line shaped fields coming from the beam shaper.

Abstract translation: 本公开涉及被配置为表征辐射束的系统，方法和传感器。 至少一个实施例涉及光学系统。 光学系统包括光学辐射引导系统。 光辐射引导系统包括准直器，其被配置成将辐射束准直成准直的辐射束。 光学辐射引导系统还包括光束整形器，其被配置为分布在离散数量的线状场上的准直辐射束的功率。 进入光束整形器的准直辐射束的光谱被传送到离散数量的线状场中的每一个。 光学系统还包括光谱仪芯片。 光谱仪芯片被配置为处理来自光束整形器的离散数量的线状场中的每一个中的准直辐射束的光谱。

公开(公告)号：US09442006B2

公开(公告)日：2016-09-13

申请号：US14751259

申请日：2015-06-26

Applicant: Berliner Glas KGaA Herbert Kubatz GmbH & Co.

Inventor： Thomas Oberdoerster

IPC: G01J1/00 ,  G01J1/42 ,  G01J1/04

CPC classification number: G01J1/4257 ,  G01J1/0477 ,  G01J9/00 ,  G01J2009/002

Abstract: Method for measuring shape of wavefront of optical radiation field generated by radiation source, includes: (a) setting diaphragm positions in pinhole diaphragm having diaphragm opening movable transversely to radiation source's optical axis, wherein a partial beam from radiation field passes through diaphragm opening at each diaphragm position and is imaged on optical sensor by imaging optics device; (b) recording lateral positions of partial beam relative to optical axis of imaging optics device, wherein lateral positions each with one of the diaphragm positions of pinhole diaphragm are recorded by optical sensor, and determining the shape of wavefront from recorded lateral positions of partial beam, wherein beam incidence range of the partial beam which is invariable for all diaphragm positions is set on imaging optics device with a pentaprism arrangement including at least first pentaprism and positioned between pinhole diaphragm and imaging optics device. A wavefront shape measuring device is also described.

Abstract translation: 用于测量由辐射源产生的光辐射场的波前形状的方法，包括：（a）在具有可横向于辐射源的光轴可移动的光阑开口的针孔光阑中设置光阑位置，其中来自辐射场的部分光束通过每个 通过成像光学装置在光学传感器上成像; （b）记录部分光束相对于成像光学装置的光轴的横向位置，其中每个具有针孔光阑的一个光阑位置的横向位置由光学传感器记录，并且从部分光束的记录横向位置确定波前的形状 其中对于所有光阑位置不变的部分光束的光束入射范围被设置在具有至少第一五棱镜并且定位在针孔光阑和成像光学器件之间的五棱镜布置的成像光学器件上。 还描述了一种波前形状测量装置。

公开(公告)号：US20150318663A1

公开(公告)日：2015-11-05

申请号：US14269132

申请日：2014-05-03

Applicant: Lecc Technology Co., Ltd.

Inventor： HSIN-CHIH TUNG

IPC: H01S3/13 ,  G01J1/44

CPC classification number: G01J1/4257 ,  G01J1/0477 ,  G01J2001/446 ,  H01S3/1305 ,  H01S5/0683

Abstract: Disclosure is related to a sensing module and a Laser device using the sensing module. The sensing module is adapted to a Laser module. The sensing module essentially includes a beam splitter and a photo sensor. This beam splitter is disposed at an optical-axis path of laser beam. The splitter is used to split the laser beam into a transmissive beam and a reflective beam. The photo sensor however is disposed apart from the optical-axis path of the original laser beam. The photo sensor converts the sensed photo signals into electrical signals which are as feedback signals to the laser module.

Abstract translation: 公开涉及使用感测模块的感测模块和激光设备。 传感模块适用于激光模块。 感测模块​​基本上包括分束器和光电传感器。 该分束器设置在激光束的光轴路径处。 分离器用于将激光束分成透射光束和反射光束。 然而，光传感器与原始激光束的光轴路径隔开。 光传感器将感测到的光信号转换为作为反馈信号的激光模块的电信号。