公开(公告)号：US20150053866A1

公开(公告)日：2015-02-26

申请号：US14466524

申请日：2014-08-22

Applicant: Hitachi High-Tech Science Corporation

Inventor： Fumio Aramaki ,  Anto Yasaka ,  Osamu Matsuda ,  Yasuhiko Sugiyama ,  Hiroshi Oba ,  Tomokazu Kozakai ,  Kazuo Aita

IPC: G21K5/04 ,  G21K1/14 ,  H01J37/305

CPC classification number: G21K5/04 ,  G21K1/14 ,  H01J37/08 ,  H01J37/3053 ,  H01J2237/0807 ,  H01J2237/202 ,  H01J2237/31744

Abstract: There is provided a repair apparatus including a gas field ion source which includes an ion generation section including a sharpened tip, a cooling unit which cools the tip, an ion beam column which forms a focused ion beam by focusing ions of a gas generated in the gas field ion source, a sample stage which moves while a sample to be irradiated with the focused ion beam is placed thereon, a sample chamber which accommodates at least the sample stage therein, and a control unit which repairs a mask or a mold for nano-imprint lithography, which is the sample, with the focused ion beam formed by the ion beam column. The gas field ion source generates nitrogen ions as the ions, and the tip is constituted by an iridium single crystal capable of generating the ions.

Abstract translation: 提供了一种包括气体离子源的修复装置，其包括具有尖锐尖端的离子产生部分，冷却尖端的冷却单元，通过聚焦离子束的离子聚焦而形成聚焦离子束的离子束柱 气体离子源，将待聚焦离子束照射的样品放置在其上的样品台，容纳至少其中的样品台的样品室和用于修复掩模或模具的控制单元，用于纳米 作为样品的压印光刻，由离子束柱形成的聚焦离子束。 气体离子源产生氮离子作为离子，并且尖端由能够产生离子的铱单晶构成。

公开(公告)号：US20150008341A1

公开(公告)日：2015-01-08

申请号：US14314219

申请日：2014-06-25

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  Alexander Groholski ,  Robert Conners ,  Mark D. DiManna ,  Raymond Hill

IPC: H01J37/08 ,  H01J37/18

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a charged particle beam system, comprising a noble gas field ion beam source, a charged particle beam column, and a housing defining a first vacuum region and a second vacuum region. A noble gas field ion beam source is arranged within the first vacuum region. A first mechanical vacuum pump is functionally attached to the first vacuum region, an ion getter pump is attached to the charged particle beam column, and a gas supply is attached to the first vacuum region configured to supply a noble gas to the noble gas field ion beam source.

Abstract translation: 本发明涉及带电粒子束系统，其包括惰性气体场离子束源，带电粒子束柱和限定第一真空区域和第二真空区域的壳体。 惰性气体场离子束源设置在第一真空区域内。 第一机械真空泵功能地附接到第一真空区域，离子吸气剂泵连接到带电粒子束柱，并且气体供应附着到构造成向惰性气体场离子供应惰性气体的第一真空区域 光束源。

公开(公告)号：US20150008334A1

公开(公告)日：2015-01-08

申请号：US14314289

申请日：2014-06-25

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  FHM-Faridur Rahman ,  Weijie Huang ,  Shawn McVey

IPC: H01J27/26 ,  G21K5/04

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10−5 per incident neon ion.

Abstract translation: 本公开涉及一种气体离子源，其包括壳体，布置在壳体内的导电尖端，用于向壳体供应一种或多种气体的气体源，其中所述一种或多种气体包括氖或具有原子的惰性气体 具有大于氖的质量，以及具有孔的提取器电极，其允许在尖端附近产生的离子穿过孔。 提取器电极的面向尖端的表面可以由每个入射氖离子具有小于10-5的负次级离子溅射速率的材料制成。

公开(公告)号：US20140326897A1

公开(公告)日：2014-11-06

申请号：US14332923

申请日：2014-07-16

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yoshimi KAWANAMI ,  Tohru ISHITANI

IPC: H01J37/08

CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J37/3056 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/0807

Abstract: Provided is a gas field ionization ion source capable of emitting heavy ions with high brightness which are suitable for processing a sample. The gas field ionization ion source according to the present invention includes a temperature controller individually controlling the temperature of the tip end of an emitter electrode (1) and the temperature of a gas injection port part (3) of a gas supply unit.

Abstract translation: 提供能够发出适合于处理样品的高亮度的重离子的气体电离离子源。 根据本发明的气体电离离子源包括温度控制器，其分别控制发射极电极（1）的末端的温度和气体供给单元的气体注入口部分（3）的温度。

公开(公告)号：US08822945B2

公开(公告)日：2014-09-02

申请号：US13065698

申请日：2011-03-28

Applicant: Kenichi Nishinaka ,  Takashi Ogawa ,  Yoshihiro Koyama

Inventor： Kenichi Nishinaka ,  Takashi Ogawa ,  Yoshihiro Koyama

IPC: G01N23/225 ,  H01J49/42 ,  H01J3/26

CPC classification number: H01J37/08 ,  H01J37/265 ,  H01J2237/006 ,  H01J2237/0807 ,  H01J2237/0827

Abstract: A focused ion beam apparatus includes a gas field ion gun unit having an emitter, an ion source gas supply unit for supplying different ion source gases to the emitter, a heater for heating the emitter, and an extraction electrode. A storage section stores, for each gas of a plurality of different types, set values of emitter temperature, gas pressure, extraction voltage to be applied to an extraction electrode, image contrast and image brightness. An input section selects and inputs one of the gas types. A control section reads, from the storage section, the set values of emitter temperature, gas pressure, extraction voltage, image contrast and image brightness, which correspond to the input gas type, and sets a heater, a gas control section, a voltage control section, and an adjustment section for the contrast and brightness of the image.

Abstract translation: 聚焦离子束装置包括具有发射极的气体场离子枪单元，用于向发射极供给不同离子源气体的离子源气体供给单元，用于加热发射极的加热器和提取电极。 对于多种不同类型的每种气体，存储部分存储要施加到提取电极的发射体温度，气体压力，提取电压的设定值，图像对比度和图像亮度。 输入部分选择并输入气体类型之一。 控制部从存储部读取与输入气体类型相对应的发射极温度，气体压力，提取电压，图像对比度和图像亮度的设定值，并且设定加热器，气体控制部，电压控制 部分和用于图像的对比度和亮度的调整部分。

公开(公告)号：US20140224987A1

公开(公告)日：2014-08-14

申请号：US14257048

申请日：2014-04-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Min-Kook KIM ,  Woo-Seok Ko ,  Yu-Sin Yang ,  Sang-Kil Lee ,  Chang-Hoon Choi

IPC: H01J37/26 ,  H01J37/08

CPC classification number: H01J37/265 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/0807

Abstract: Microelectronic substrate inspection equipment includes a gas container which contains helium gas, a helium ion generator which is disposed in the gas container and converts the helium gas into helium ions and a wafer stage which is disposed under the gas container and on which a substrate to be inspected is placed. The equipment further includes a secondary electron detector which is disposed above the wafer stage and detects electrons generated from the substrate, a compressor which receives first gaseous nitrogen from a continuous nitrogen supply device and compresses the received first gaseous nitrogen into liquid nitrogen, a liquid nitrogen dewar which is connected to the compressor and stores the liquid nitrogen, and a cooling device that is coupled to the helium ion generator. The cooling device is disposed on the gas container, and cools the helium ion generator by vaporizing the liquid nitrogen received from the liquid nitrogen dewar into second gaseous nitrogen. Related methods are also disclosed.

Abstract translation: 微电子基板检查设备包括含有氦气的气体容器，设置在气体容器中并将氦气转换为氦离子的氦离子发生器和设置在气体容器下方的晶片载台， 检查被放置。 该设备还包括二次电子检测器，其设置在晶片台上方并检测从基板产生的电子;压缩机，其接收来自连续氮供应装置的第一气态氮并将接收到的第一气态氮压缩成液态氮;液氮 连接到压缩机并储存液氮的杜瓦瓶，以及耦合到氦离子发生器的冷却装置。 冷却装置设置在气体容器上，并且通过将从液氮氮气中接收的液氮蒸发成第二气态氮来冷却氦离子发生器。 还公开了相关方法。

公开(公告)号：US08779380B2

公开(公告)日：2014-07-15

申请号：US12995700

申请日：2009-03-30

Applicant: Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Masahiro Yamaoka ,  Noriaki Arai

Inventor： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Masahiro Yamaoka ,  Noriaki Arai

IPC: H01J27/00

CPC classification number: H01J27/26 ,  H01J27/022 ,  H01J37/023 ,  H01J37/067 ,  H01J37/08 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/2803

Abstract: An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.

Abstract translation: 根据本发明的离子束装置包括气体离子源（1），其包括由发射极基座（64）支撑的发射极尖端（21），包括引出电极（24）的电离室（15） 构造成围绕发射器尖端（21），以及气体供应管（25）。 引出电极（24）的中心轴线与离​​子照射光系统的中心轴线（14A）重叠或平行，通过发射极尖端（21）和发射极基座 （64）相对于所述电离室（15）的中心轴线是可倾斜的。 因此，提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。

公开(公告)号：US20140191128A1

公开(公告)日：2014-07-10

申请号：US14238718

申请日：2012-06-20

Applicant: Yoshimi Kawanami ,  Hironori Moritani ,  Hiroyuki Muto

Inventor： Yoshimi Kawanami ,  Hironori Moritani ,  Hiroyuki Muto

IPC: H01J37/08 ,  H01J37/26

CPC classification number: H01J37/26 ,  H01J9/50 ,  H01J37/08 ,  H01J49/16 ,  H01J2237/0807 ,  Y02W30/828

Abstract: Provided is an ion source emitter that does not cause significant extraction voltage changes even when an apex portion of the emitter is repeatedly regenerated. The emitter has a shape of a triangular pyramid with the single atom at the apex. An apex portion of the emitter is substantially shaped like a hexagon when viewed from the apex side.

Abstract translation: 提供了即使当发射器的顶点部分被重复再生时也不会引起显着的提取电压变化的离子源发射体。 发射体具有三角锥形，顶点具有单个原子。 当从顶点观察时，发射体的顶点部分基本成形为六边形。

公开(公告)号：US20130175444A1

公开(公告)日：2013-07-11

申请号：US13783534

申请日：2013-03-04

Applicant: John A. Notte, IV ,  Sybren Sijbrandij

Inventor： John A. Notte, IV ,  Sybren Sijbrandij

IPC: H01J37/285 ,  H01J37/317

CPC classification number: H01J37/285 ,  G01N23/2255 ,  H01J37/08 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/0807 ,  H01J2237/2817

Abstract: Ion microscope methods and systems are disclosed. In general, the systems and methods involve relatively light isotopes, minority isotopes or both. In some embodiments, an isotope of Neon is used.

Abstract translation: 公开了离子显微镜的方法和系统。 通常，系统和方法涉及相对较轻的同位素，少数同位素或两者。 在一些实施方案中，使用氖的同位素。

公开(公告)号：US08481980B2

公开(公告)日：2013-07-09

申请号：US12108037

申请日：2008-04-23

Applicant: Hiroyasu Shichi ,  Satoshi Tomimatsu ,  Kaoru Umemura ,  Noriyuki Kaneoka ,  Koji Ishiguro

Inventor： Hiroyasu Shichi ,  Satoshi Tomimatsu ,  Kaoru Umemura ,  Noriyuki Kaneoka ,  Koji Ishiguro

IPC: G21K5/10

CPC classification number: C23C14/3442 ,  H01J27/10 ,  H01J37/08 ,  H01J37/28 ,  H01J37/3023 ,  H01J37/3056 ,  H01J2237/006 ,  H01J2237/057 ,  H01J2237/0807 ,  H01J2237/0825 ,  H01J2237/0827 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder a gas tube, a gas volume control valve, and a stop valve.

Abstract translation: 一种与电子部件的横截面观察技术有关的离子束加工和观察方法，通过使用离子束加工样品的电子部件和能够减少填充加工孔的时间的带电粒子束处理器 在填充区域具有高度的平整度。 观察装置能够切换用于用于观察样品的气体离子束的种类来加工样品的气体离子束的种类。 为了实现用于样品加工的气体离子束的种类和用于样品观察的气体离子束的种类之间的切换，使用至少两个气体导入系统，每个系统具有气瓶，气体管，气体 音量控制阀和截止阀。