公开(公告)号：US10014157B2

公开(公告)日：2018-07-03

申请号：US15279055

申请日：2016-09-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tomokazu Kozakai ,  Fumio Aramaki ,  Osamu Matsuda ,  Kensuke Shiina ,  Kazuo Aita ,  Anto Yasaka

IPC: A61N5/00 ,  H01J37/22 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/20 ,  H01J2237/202 ,  H01J2237/2067 ,  H01J2237/226 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A method for acquiring an image, in which an image of an image acquiring region is acquired by radiating an ion beam to a sample having a conducting part with a linear edge on a dielectric substrate, includes performing an equal-width scan of the ion beam in a first direction that obliquely intersects the linear edge and sweep in a second direction intersecting the first direction. The ion beam is sequentially scanned in different patterns on different scan regions of parallelogram shape, each of which includes the image acquiring region. Secondary charged particles are detected to generate image data of all the scan regions, and image data of the scan regions are calculated to generate image data of the image acquiring region. The image data of the image acquiring region are synthesized to display the image data of the image acquiring region.

公开(公告)号：US09773634B2

公开(公告)日：2017-09-26

申请号：US15416686

申请日：2017-01-26

Applicant: Hitachi High-Tech Science Corporation

Inventor： Tomokazu Kozakai ,  Osamu Matsuda ,  Yasuhiko Sugiyama ,  Kazuo Aita ,  Fumio Aramaki ,  Anto Yasaka ,  Hiroshi Oba

IPC: H01J37/304 ,  G01Q60/10 ,  H01J37/08 ,  H01J1/304 ,  H01J37/073 ,  H01J37/21 ,  H01J37/28 ,  G01Q60/16 ,  G01Q70/08 ,  H01J37/30

CPC classification number: H01J1/3044 ,  G01Q60/10 ,  G01Q60/16 ,  G01Q60/24 ,  G01Q70/08 ,  G01Q70/16 ,  H01J1/3048 ,  H01J37/073 ,  H01J37/08 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3002 ,  H01J2201/30415 ,  H01J2201/30496 ,  H01J2237/002 ,  H01J2237/006

Abstract: There is provided an iridium tip including a pyramid structure having one {100} crystal plane as one of a plurality of pyramid surfaces in a sharpened apex portion of a single crystal with orientation. The iridium tip is applied to a gas field ion source or an electron source. The gas field ion source and/or the electron source is applied to a focused ion beam apparatus, an electron microscope, an electron beam applied analysis apparatus, an ion-electron multi-beam apparatus, a scanning probe microscope or a mask repair apparatus.

公开(公告)号：US09640361B2

公开(公告)日：2017-05-02

申请号：US14830106

申请日：2015-08-19

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Anto Yasaka ,  Yasuhiko Sugiyama ,  Hiroshi Oba

IPC: G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J1/15 ,  H01J27/02 ,  H01J1/18 ,  H01J3/04

CPC classification number: H01J27/26 ,  H01J1/15 ,  H01J1/18 ,  H01J3/04 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/06316

Abstract: A focused ion beam system includes a gas ion source and an emitter structure. The emitter structure includes a pair of conductive pins fixed to a base member, a filament connected between the pair of conductive pins, and an emitter which has a tip end with one atom or three atoms and which is connected to the filament. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

公开(公告)号：US10529531B2

公开(公告)日：2020-01-07

申请号：US16203078

申请日：2018-11-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Chuhei Oshima ,  Masahiko Tomitori ,  Anto Yasaka ,  Tatsuya Shimoda

IPC: H01J37/00 ,  H01J37/08 ,  H01J37/28 ,  H01J37/305 ,  H01J37/30 ,  H01J37/21 ,  H01J37/252

Abstract: Provided is a tip capable of repeatedly regenerating a single-atom termination structure in which a distal end is formed of only one atom. A tip (1) having a single-atom termination structure includes: a thin line member (2) made of a first metal material; a protruding portion (4) made of a second metal material, which is formed at least in a distal end portion (2a) of the thin line member (2), and has a distal end terminated with only one atom; and a supply portion (5) made of the second metal material to be supplied to the protruding portion (4), which is formed in the vicinity of the distal end portion (2a) of the thin line member (2).

公开(公告)号：US09336979B2

公开(公告)日：2016-05-10

申请号：US14591843

申请日：2015-01-07

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Anto Yasaka ,  Fumio Aramaki ,  Yasuhiko Sugiyama ,  Tomokazu Kozakai ,  Osamu Matsuda

IPC: H01J27/02 ,  H01J37/08 ,  H01J37/305 ,  H01J27/26

CPC classification number: H01J27/024 ,  H01J27/26 ,  H01J37/08 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/182

Abstract: A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. The surface of the emitter is formed of a precious metal, such as platinum, palladium, iridium, rhodium or gold. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter. An extracting electrode is spaced from the emitter, and a voltage is applied to the extracting electrode to ionize the adsorbed nitrogen gas and extract nitrogen ions in the form of an ion beam. A temperature control unit controls the temperature of the emitter.

Abstract translation: 聚焦离子束装置具有离子源室，其中设置有用于发射离子的发射极。 发射体的表面由贵金属形成，例如铂，钯，铱，铑或金。 气体供给单元向离子源室供给氮气，使得氮气吸附在发射体的表面。 提取电极与发射极间隔开，并向提取电极施加电压，使吸附的氮气离子化，并以离子束形式提取氮离子。 温度控制单元控制发射器的温度。

公开(公告)号：US08999178B2

公开(公告)日：2015-04-07

申请号：US14278760

申请日：2014-05-15

Applicant: Hitachi High-Tech Science Corporation

Inventor： Yasuhiko Sugiyama ,  Kazuo Aita ,  Fumio Aramaki ,  Tomokazu Kozakai ,  Osamu Matsuda ,  Anto Yasaka

IPC: C25F3/00 ,  H01J27/02 ,  H01J9/02 ,  H01J1/15 ,  H01J1/304 ,  H01J9/04 ,  H01J37/08 ,  H01J37/305 ,  H01J37/26

CPC classification number: H01J27/02 ,  H01J1/15 ,  H01J1/3044 ,  H01J9/02 ,  H01J9/025 ,  H01J9/04 ,  H01J37/08 ,  H01J37/26 ,  H01J37/3056 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: A method for fabricating a sharpened needle-like emitter, the method including: electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward a tip portion thereof; performing a first etching in which the electrolytically polished part of the emitter material is irradiated with a charged-particle beam to form a pyramid-like sharpened part having a vertex including the tip portion; performing a second etching in which the tip portion is further sharpened through field-assisted gas etching, while observing a crystal structure at the tip portion by a field ion microscope and keeping the number of atoms at a leading edge of the tip portion at a predetermined number or less; and heating the emitter material to arrange the atoms at the leading edge of the tip portion of the sharpened part in a pyramid shape.

Abstract translation: 一种用于制造尖锐的针状发射体的方法，该方法包括：电解抛光导电发射体材料的端部，使其朝其尖端部分逐渐变细; 进行第一蚀刻，其中用电荷粒子束照射发射体材料的电解抛光部分以形成具有包括尖端部分的顶点的棱锥状的锐化部分; 进行第二蚀刻，其中尖端部分通过场辅助气体蚀刻进一步锐化，同时通过场离子显微镜观察尖端部分处的晶体结构，并将尖端部分的前缘处的原子数保持在预定的 数量以下 并且加热发射体材料以将原子布置在尖锐部分的尖端部分的金字塔形状。

公开(公告)号：US20170148603A1

公开(公告)日：2017-05-25

申请号：US15416686

申请日：2017-01-26

Applicant: Hitachi High-Tech Science Corporation

Inventor： Tomokazu Kozakai ,  Osamu Matsuda ,  Yasuhiko Sugiyama ,  Kazuo Aita ,  Fumio Aramaki ,  Anto Yasaka ,  Hiroshi Oba

IPC: H01J1/304 ,  H01J37/08 ,  H01J37/30 ,  H01J37/28 ,  G01Q60/16 ,  G01Q70/08 ,  H01J37/073 ,  H01J37/21

CPC classification number: H01J1/3044 ,  G01Q60/10 ,  G01Q60/16 ,  G01Q60/24 ,  G01Q70/08 ,  G01Q70/16 ,  H01J1/3048 ,  H01J37/073 ,  H01J37/08 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3002 ,  H01J2201/30415 ,  H01J2201/30496 ,  H01J2237/002 ,  H01J2237/006

Abstract: There is provided an iridium tip including a pyramid structure having one {100} crystal plane as one of a plurality of pyramid surfaces in a sharpened apex portion of a single crystal with orientation. The iridium tip is applied to a gas field ion source or an electron source. The gas field ion source and/or the electron source is applied to a focused ion beam apparatus, an electron microscope, an electron beam applied analysis apparatus, an ion-electron multi-beam apparatus, a scanning probe microscope or a mask repair apparatus.

公开(公告)号：US09129771B2

公开(公告)日：2015-09-08

申请号：US14224149

申请日：2014-03-25

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Anto Yasaka ,  Yasuhiko Sugiyama ,  Hiroshi Oba

IPC: G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J1/15 ,  H01J1/18 ,  H01J3/04

CPC classification number: H01J27/26 ,  H01J1/15 ,  H01J1/18 ,  H01J3/04 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/06316

Abstract: There is provided an emitter structure, a gas ion source including the emitter structure, and a focused ion beam system including the gas ion source. The emitter structure includes a pair of conductive pins which are fixed to a base member, a filament which is connected between the pair of conductive pins, and an emitter which is connected to the filament and has a sharp tip. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

Abstract translation: 提供了发射极结构，包括发射极结构的气体离子源和包括气体离子源的聚焦离子束系统。 发射极结构包括固定到基底构件的一对导电引脚，连接在一对导电引脚之间的细丝和连接到灯丝并具有尖锐尖端的发射极。 支撑构件固定在基材上，发射体与支撑构件连接。

公开(公告)号：US10276343B2

公开(公告)日：2019-04-30

申请号：US15982175

申请日：2018-05-17

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tomokazu Kozakai ,  Fumio Aramaki ,  Osamu Matsuda ,  Kensuke Shiina ,  Kazuo Aita ,  Anto Yasaka

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/28 ,  H01J37/147

Abstract: A method of acquiring an image of an image acquiring region of a sample comprises a first step of irradiating and scanning an ion beam in a first scan pattern on a first scan region of a sample, the scan region including therein the image acquiring region, and a second step of detecting secondary charged particles generated by irradiating and scanning the ion beam on the first scan region of the sample and generating first image data of the image acquiring region. The first and second steps are repeated a plurality of times using different scan patterns on different scan regions that differ from the first scan and the first scan region and from one another, each of the different scan regions including therein the image acquiring region, to generate a plurality of image data of the image acquiring region. Image data of the image acquiring region are generated by synthesizing all the image data generated by scanning the different scan region, and the synthesized image data of the image acquiring region are displayed on a display unit.

公开(公告)号：US09583299B2

公开(公告)日：2017-02-28

申请号：US14455338

申请日：2014-08-08

Applicant: Hitachi High-Tech Science Corporation

Inventor： Tomokazu Kozakai ,  Osamu Matsuda ,  Yasuhiko Sugiyama ,  Kazuo Aita ,  Fumio Aramaki ,  Anto Yasaka ,  Hiroshi Oba

IPC: H01J1/304 ,  H01J37/073 ,  H01J37/08 ,  G01Q60/10 ,  G01Q60/24 ,  G01Q70/16 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J1/3044 ,  G01Q60/10 ,  G01Q60/16 ,  G01Q60/24 ,  G01Q70/08 ,  G01Q70/16 ,  H01J1/3048 ,  H01J37/073 ,  H01J37/08 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3002 ,  H01J2201/30415 ,  H01J2201/30496 ,  H01J2237/002 ,  H01J2237/006

Abstract: There is provided an iridium tip including a pyramid structure having one {100} crystal plane as one of a plurality of pyramid surfaces in a sharpened apex portion of a single crystal with orientation. The iridium tip is applied to a gas field ion source or an electron source. The gas field ion source and/or the electron source is applied to a focused ion beam apparatus, an electron microscope, an electron beam applied analysis apparatus, an ion-electron multi-beam apparatus, a scanning probe microscope or a mask repair apparatus.

Abstract translation: 提供了一种铱尖端，其包括在具有<210>取向的单晶的锐化顶点部分中具有一个{100}晶面作为多个棱锥表面之一的金字塔结构。 将铱尖端施加到气体场离子源或电子源。 将气体离子源和/或电子源施加到聚焦离子束装置，电子显微镜，电子束施加分析装置，离子电子多光束装置，扫描探针显微镜或掩模修复装置。