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    Micro-Electron Column Having An Electron Emitter Improving The Density Of An Electron Beam Emitted From A Nano Structure Tip
    66.
    发明申请
    Micro-Electron Column Having An Electron Emitter Improving The Density Of An Electron Beam Emitted From A Nano Structure Tip 有权
    具有电子发射体的微电子柱改善了纳米结构尖端发射的电子束的密度

    公开(公告)号：US20160247658A1

    公开(公告)日：2016-08-25

    申请号：US15048650

    申请日：2016-02-19

    Applicant: Industry-University Cooperation Foundation Sunmoon

    Inventor： Ho Seob KIM ,  Tae Sik OH ,  Dae Wook KIM ,  Hyung Woo KIM ,  Seung Jun AHN

    IPC: H01J37/141 ,  H01J37/065

    CPC classification number: H01J37/065 ,  H01J37/073 ,  H01J2237/04924 ,  H01J2237/063 ,  H01J2237/06341 ,  H01J2237/0635 ,  H01J2237/083 ,  H01J2237/1205

    Abstract: Disclosed is a micro-electron column including nanostructure tips each of which has a tubular, columnar, or blocky structure ranging in size from several nanometers to dozens of nanometers. In the micro-electron column, the nanostructure tips can easily emit electrons because a high electric field is generated at the end of the nanostructure tips when a voltage is applied to the nanostructure tips, and an induction electrode is disposed between the electron emitter and a source lens so as to help electrons emitted from the electron emitter to enter an aperture of a first lens electrode layer of the source lens, thereby realizing improved performance of the micro-electron column. In the micro-electron column, the size of the nanostructure tips may be larger than that of the aperture of a source lens.

    Abstract translation: 公开了一种包括纳米结构尖端的微电子柱，每个微结构尖端具有尺寸从几纳米到几十纳米的管状，柱状或块状结构。 在微电子柱中，纳米结构尖端容易发射电子，因为当纳米结构尖端施加电压时，在纳米结构尖端的末端产生高电场，并且感应电极设置在电子发射体和 源透镜，以帮助从电子发射器发射的电子进入源透镜的第一透镜电极层的孔径，从而实现微电子柱的改进的性能。 在微电子柱中，纳米结构尖端的尺寸可以大于源透镜的孔径。

    ELECTRON GUN SUPPORTING MEMBER AND ELECTRON GUN APPARATUS
    67.
    发明申请
    ELECTRON GUN SUPPORTING MEMBER AND ELECTRON GUN APPARATUS 有权
    电子枪支持会员和电子枪设备

    公开(公告)号：US20160064174A1

    公开(公告)日：2016-03-03

    申请号：US14833447

    申请日：2015-08-24

    Applicant: NuFlare Technology, Inc.

    Inventor： Nobuo MIYAMOTO

    IPC: H01J29/02 ,  H01J29/48

    CPC classification number: H01J29/025 ,  H01J3/027 ,  H01J3/38 ,  H01J29/02 ,  H01J29/485 ,  H01J29/92 ,  H01J29/96 ,  H01J37/065 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/061 ,  H01J2237/31776

    Abstract: An electron gun supporting member includes an insulating supporting member configured such that its one end is connected to a predetermined member having a ground potential and other end is connected to a high-voltage electrode to which a high potential being a negative high potential for emitting electrons from an electron source is applied, so as to support the high-voltage electrode, and a metal film formed in a partial region, which contacts neither the high-voltage electrode nor the predetermined member, on the outer surface of the insulating supporting member.

    Abstract translation: 电子枪支撑构件包括绝缘支撑构件，其构造成使得其一端连接到具有接地电位的预定构件，并且另一端连接到高电压电极，高电位是用于发射电子的负高电位 施加电子源，以便在绝缘支撑构件的外表面上支撑高压电极和形成在部分区域中的金属膜，其也不与高压电极或预定构件接触。

    Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter
    68.
    发明授权
    Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter 有权
    电子束控制方法，电子束发生装置，使用该装置的装置和发射极

    公开(公告)号：US09257257B2

    公开(公告)日：2016-02-09

    申请号：US12306635

    申请日：2006-06-30

    Applicant: Shin Fujita ,  Mohamed El-Gomati ,  Torquil Wells

    Inventor： Shin Fujita ,  Mohamed El-Gomati ,  Torquil Wells

    IPC: G01N23/00 ,  H01J37/065 ,  H01J35/06

    CPC classification number: H01J37/065 ,  H01J35/06 ,  H01J2201/196 ,  H01J2237/06316 ,  H01J2237/3175

    Abstract: Provided is a Schottky emitter having the conical end with a radius of curvature of 2.0 μm on the emission side of an electron beam. Since a radius of curvature is 1 μm or more, a focal length of an electron gun can be longer than in a conventional practice wherein a radius of curvature is in the range of from 0.5 μm to not more than 0.6 μm. The focal length was found to be roughly proportional to the radius of the curvature. Since the angular current intensity (the beam current per unit solid angle) is proportional to square of the electron gun focal length, the former can be improved by an order of magnitude within a practicable increase in the emitter radius. A higher angular current intensity means a larger beam current available from the electron gun and the invention enables the Schottky emitters to be used in applications which require relatively high beam current of microampere regime such as microfocus X-ray tube, electron probe micro-analyzer, and electron beam lithography system.

    Abstract translation: 提供了一种在电子束的发射侧具有2.0μm的曲率半径的锥形端的肖特基发射体。 由于曲率半径为1μm以上，电子枪的焦距可以比曲率半径在0.5μm以上0.6μm以下的现有技术中长。 发现焦距与曲率半径成正比。 由于角电流强度（每单位立体角的射束电流）与电子枪焦距的平方成比例，所以前者可以在发射极半径的可行增加范围内提高一个数量级。 较高的角电流强度意味着可从电子枪获得的较大的束电流，并且本发明使肖特基发射体能够用于需要相对较高的微安电流束流的应用，如微焦X射线管，电子探针微量分析仪， 和电子束光刻系统。

    X-RAY SOURCE, HIGH-VOLTAGE GENERATOR, ELECTRON BEAM GUN, ROTARY TARGET ASSEMBLY, ROTARY TARGET, AND ROTARY VACUUM SEAL
    69.
    发明申请
    X-RAY SOURCE, HIGH-VOLTAGE GENERATOR, ELECTRON BEAM GUN, ROTARY TARGET ASSEMBLY, ROTARY TARGET, AND ROTARY VACUUM SEAL 审中-公开
    X射线源，高压发生器，电子束枪，旋转靶组件，旋转靶和旋转真空密封

    公开(公告)号：US20160020058A1

    公开(公告)日：2016-01-21

    申请号：US14774424

    申请日：2014-03-12

    Applicant: NIKON METROLOGY NV

    Inventor： Roger HADLAND

    IPC: H01J35/02 ,  H01J35/04 ,  H05G1/12 ,  F16C35/04 ,  H01J35/16 ,  F16J15/16 ,  F16C33/76 ,  H01J35/10 ,  H01J29/48

    CPC classification number: H01J35/025 ,  F16C33/768 ,  F16C35/042 ,  F16J15/16 ,  H01J29/48 ,  H01J35/04 ,  H01J35/06 ,  H01J35/101 ,  H01J35/106 ,  H01J35/108 ,  H01J35/16 ,  H01J37/065 ,  H01J2235/0236 ,  H01J2235/083 ,  H01J2235/086 ,  H01J2235/087 ,  H01J2235/1046 ,  H01J2235/1204 ,  H01J2235/1262 ,  H01J2235/20 ,  H01J2237/2482 ,  H02M1/32 ,  H02M7/106 ,  H05G1/12

    Abstract: Disclosed herein are a high-voltage generator (120) for an x-ray source, an x-ray gun, an electron beam apparatus, a rotary vacuum seal, a target assembly for an x-ray source, a rotary x-ray emission target (500), and an x-ray source. These various aspects may separately and/or together enable the construction of an x-ray source which can operate at energies of up to 500 kV and beyond, which is suitable for use in commercial and research x-ray applications such as computerised tomography. In particular, the high-voltage generator includes a shield electrode (123a, 123b) electrically connected intermediate of a first voltage multiplier (122a, 122b) and a second voltage multiplier (122b, 122c). The electron beam apparatus includes control photodetectors (202a, 202b—not shown) and photo emitters (201a, 202a) having a transparent conductive shield (203a and 203b, 203c—not shown) arranged therebetween. The rotary vacuum seal includes a pumpable chamber (302) at a position intermediate between high-pressure and low-pressure ends of a bore (301) for a rotating shaft (401). The rotary target assembly is configured such that when a torque between a bearing housing (403) and a vacuum housing exceeds a predetermined torque, the bearing housing rotates relative to the vacuum housing. The rotary x-ray emission target (500) has a plurality of target plates (560) supported on a hub, the plates being arranged on the hub to provide an annular target region about an axis rotation of the hub. The x-ray gun is provided with a shield electrode (123a) maintained at a potential difference relative to the x-ray target different to the electron beam emission cathode.

    Abstract translation: 本文公开了一种用于x射线源的高压发生器（120），x射线枪，电子束装置，旋转真空密封件，用于x射线源的靶组件，旋转x射线发射 目标（500）和x射线源。 这些各个方面可以单独地和/或一起实现能够在高达500kV及以上的能量下运行的x射线源，其适用于商业和研究的X射线应用如计算机断层摄影。 特别地，高电压发生器包括电连接第一电压倍增器（122a，122b）和第二电压倍增器（122b，122c）之间的屏蔽电极（123a，123b）。 电子束装置包括控制光电检测器（202a，202b，未示出）和具有布置在其间的透明导电屏蔽（203a和203b，203c-未示出）的光发射器（201a，202a）。 旋转式真空密封件包括位于用于旋转轴（401）的孔（301）的高压和低压端之间的位置的可泵送室（302）。 旋转目标组件被构造成使得当轴承壳体（403）和真空壳体之间的扭矩超过预定扭矩时，轴承壳体相对于真空壳体旋转。 旋转X射线发射目标（500）具有支撑在轮毂上的多个目标板（560），所述板布置在轮毂上以围绕轮毂的轴线旋转提供环形目标区域。 X射线枪设置有相对于与电子束发射阴极不同的x射线靶保持在电位差的屏蔽电极（123a）。

    INDIVIDUALLY SWITCHED FIELD EMISSION ARRAYS
    70.
    发明申请
    INDIVIDUALLY SWITCHED FIELD EMISSION ARRAYS 有权
    个别开关场排放阵列

    公开(公告)号：US20150371810A1

    公开(公告)日：2015-12-24

    申请号：US14765759

    申请日：2014-02-05

    Applicant: Massachusetts Institute of Technology

    Inventor： Stephen Angelo Guerrera ,  Akintunde I. Akinwande

    IPC: H01J37/073 ,  H01J37/317 ,  H01J37/30

    CPC classification number: H01J37/073 ,  H01J37/065 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0473 ,  H01J2237/063 ,  H01J2237/3175 ,  H01J2237/31781 ,  H01L21/00

    Abstract: An electron beam apparatus is disclosed that includes a plurality of current source elements disposed in at least one field emitter array. Each current source element can be a gated vertical transistor, an ungated vertical transistor, or a current controlled channel that is proximate to an optically-modulated current source. The electron beam apparatus includes a plurality of field emitter tips, each field emitter tip of the plurality of field emitter tips being coupled to a current source element of the plurality of current source elements. The electron beam apparatus is configured to allow selective activation of one or more of the current source elements.

    Abstract translation: 公开了一种电子束装置，其包括设置在至少一个场发射器阵列中的多个电流源元件。 每个电流源元件可以是门控垂直晶体管，非门控垂直晶体管或接近光调制电流源的电流控制通道。 电子束装置包括多个场发射器尖端，多个场发射器尖端中的每个场发射极尖端耦合到多个电流源元件的电流源元件。 电子束装置被配置为允许选择性地激活一个或多个电流源元件。

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