公开(公告)号：US08405026B2

公开(公告)日：2013-03-26

申请号：US12554275

申请日：2009-09-04

Applicant: Tomoyasu Shojo ,  Muneyuki Fukuda ,  Naomasa Suzuki ,  Noritsugu Takahashi

Inventor： Tomoyasu Shojo ,  Muneyuki Fukuda ,  Naomasa Suzuki ,  Noritsugu Takahashi

IPC: H01J3/14 ,  G01N23/00

CPC classification number: H01J37/153 ,  H01J37/04 ,  H01J37/28

Abstract: Disclosed herewith is a charged particle beam apparatus capable of controlling each of the probe current and the objective divergence angle to obtain a desired probe current and a desired objective divergence angle in accordance with the diameter of the subject objective aperture. The apparatus is configured to include an objective aperture between first and second condenser lenses to calculate and set a control value of a first condenser lens in accordance with the diameter of the hole of the objective aperture so as to obtain a desired probe current and calculate a control value of a second condenser lens setting device in accordance with the diameter of the hole of the objective divergence angle and the control value of the second condenser lens setting device, thereby setting the calculated control value for the second condenser lens setting device to control the objective divergence angle.

Abstract translation: 本文公开了一种带电粒子束装置，其能够根据目标物镜孔径来控制探针电流和物镜发散角度，以获得所需的探针电流和期望的物体发散角。 该装置被配置为在第一和第二聚光透镜之间包括物镜孔，以根据物镜孔的直径来计算和设置第一聚光透镜的控制值，以获得所需的探针电流，并计算 根据目标发散角的孔的直径和第二聚光透镜设定装置的控制值的第二聚光透镜设定装置的控制值，由此设定计算出的第二聚光透镜设定装置的控制值， 客观发散角。

公开(公告)号：US20120153146A1

公开(公告)日：2012-06-21

申请号：US13404492

申请日：2012-02-24

Applicant: Kotoko HIROSE ,  Takeshi KAWASAKI ,  Tomonori NAKANO

Inventor： Kotoko HIROSE ,  Takeshi KAWASAKI ,  Tomonori NAKANO

IPC: H01J37/26

CPC classification number: H01J37/28 ,  H01J37/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/216

Abstract: A focused charged particle beam apparatus including an aberration corrector, capable of finding the absolute value of the aberration coefficient at high speed, and capable of making high-accuracy adjustments at high speed. A deflection coil tilts the input beam relative to the object point, and measures the defocus data and aberration quantity at high speed while the beam is tilted from one image, and perform least squares fitting on these results to find the absolute value of the aberration coefficient prior to tilting the beam, and to adjust the aberration corrector.

Abstract translation: 一种聚焦带电粒子束装置，包括像差校正器，能够在高速下找到像差系数的绝对值，并能够高精度地进行高精度的调整。 偏转线圈相对于物点倾斜输入光束，并且当光束从一个图像倾斜时测量散焦数据和高速的像差量，并对这些结果进行最小二乘拟合以找到像差系数的绝对值 在倾斜光束之前，并调整像差校正器。

公开(公告)号：US08183539B2

公开(公告)日：2012-05-22

申请号：US12658679

申请日：2010-02-12

Applicant: Yongzhang Huang ,  Xinping Hu

Inventor： Yongzhang Huang ,  Xinping Hu

IPC: H01J3/20 ,  H01J37/14 ,  H01J49/20

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/153 ,  H01J2237/057 ,  H01J2237/08

Abstract: The present invention provides a mass analyzing magnet which can bend a very wide charged particle ribbon beams through angles between 90 to 200 degrees. The shorter dimension of the ribbon beam is aligned with the magnetic field. The magnet can focus the longer dimension of the ribbon beam through a resolving slot inside the magnet for mass or momentum analysis. The magnet pole is shaped to increase the mass resolving power and to provide the focusing force in the direction of the shorter dimension of the ribbon beam. This magnet can achieve high mass resolving power with very small system aberrations for very wide ribbon beam. This feature is of significant value, for example, in the ion implantation industry. The ribbon beam width can be 300 mm, 450 mm and even 1000 mm. Integrated with the present invention, the ion implanter systems can be built to provide mass analyzed ribbon beams for various applications. The system will have much lower cost and much better ribbon beam quality than the ion implanters which are using conventional mass analyzing magnet.

Abstract translation: 本发明提供一种质量分析磁体，其能够使非常宽的带电粒子束弯曲角度在90至200度之间。 带状束的较短尺寸与磁场对准。 磁体可以将带状光束的较长尺寸聚焦在磁体内的分辨槽以进行质量或动量分析。 磁极被成形为增加质量分辨能力并且提供在带状束的较短尺寸方向上的聚焦力。 该磁体可以实现高质量分辨率功率，对于非常宽的带状束具有非常小的系统像差。 这个特征具有重要价值，例如在离子注入工业中。 带束宽度可以是300mm，450mm甚至1000mm。 与本发明相结合，可以构建离子注入机系统以提供用于各种应用的质量分析的带状束。 与使用常规质量分析磁体的离子注入机相比，该系统将具有更低的成本和更好的带束质量。

公开(公告)号：US08168951B2

公开(公告)日：2012-05-01

申请号：US12410174

申请日：2009-03-24

Applicant: Takeshi Kawasaki ,  Tomonori Nakano

Inventor： Takeshi Kawasaki ,  Tomonori Nakano

IPC: G01N23/00

CPC classification number: H01J37/153 ,  H01J37/28 ,  H01J2237/1532

Abstract: A charged particle beam apparatus having an aberration correction capability at high acceleration voltages. The charged particle beam apparatus comprises a charged particle beam source; an extraction electrode to extract charged particles from the charged particle beam source; a charged particle beam gun including a means for converging a charged particle beam; an acceleration means for accelerating a charged particle beam emitted from the charged particle beam gun; and an aberration correction means disposed between the charged particle beam gun and the acceleration means, in which an aberration enough to cancel out an aberration of a charged particle beam on the specimen surface is provided to an extraction electrical potential or an equivalent beam at the initial acceleration stage.

Abstract translation: 一种在高加速电压下具有像差校正能力的带电粒子束装置。 带电粒子束装置包括带电粒子束源; 提取电极，用于从带电粒子束源提取带电粒子; 带电粒子束枪，包括用于会聚带电粒子束的装置; 用于加速从带电粒子束枪发射的带电粒子束的加速装置; 以及设置在带电粒子束枪和加速装置之间的像差校正装置，其中足够抵消样品表面上的带电粒子束的像差的像差被提供给初始时的提取电位或等效光束 加速阶段。

公开(公告)号：US08134135B2

公开(公告)日：2012-03-13

申请号：US11880872

申请日：2007-07-23

Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/302 ,  H01J37/04

CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

Abstract translation: 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

公开(公告)号：US08089044B2

公开(公告)日：2012-01-03

申请号：US12638311

申请日：2009-12-15

Applicant: Olivier Renault ,  Maylis Lavayssiere ,  Denis Mariolle

Inventor： Olivier Renault ,  Maylis Lavayssiere ,  Denis Mariolle

IPC: H01J37/00 ,  H01J37/153

CPC classification number: H01J37/153 ,  H01J37/26

Abstract: A method for correcting astigmatism of an electronic optical column of an electron emission spectromicroscope, comprising the steps of: forming a reference structure on a surface of a sample comprising a structure of interest to be imaged, imaging the reference structure by the spectromicroscope with secondary electrons and with core level photoelectrons, eliminating astigmatism defects appearing during the imaging of the reference structure with secondary electrons and with core level photoelectrons, a material of the reference structure being chosen such that, during core level photoelectron imaging, the contrast C between the average intensity Ia of the material of the reference structure and the average intensity Ib of the material of the sample is such that: C = I a - I b I a + I b ≥ 0.2 .

Abstract translation: 一种用于校正电子发射光谱显微镜的电子光学柱的散光的方法，包括以下步骤：在包含要成像的感兴趣结构的样品的表面上形成参考结构，用二次电子通过显微镜对参考结构进行成像 并且使用核心级光电子，消除在二次电子和核心级光电子参考结构成像期间出现的散光缺陷，参考结构的材料被选择为使得在核心级光电子成像期间，对比度C在平均强度 参考结构的材料1a和样品材料的平均强度Ib为：C = I a -I b I a + I b≥0.2。

公开(公告)号：US08067733B2

公开(公告)日：2011-11-29

申请号：US12604923

申请日：2009-10-23

Applicant: Wataru Mori ,  Makoto Ezumi ,  Yoichi Ose

Inventor： Wataru Mori ,  Makoto Ezumi ,  Yoichi Ose

IPC: G01N23/225

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/153 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/216

Abstract: A scanning electron microscope having a monochromator that can automatically adjust an electron beam entering the monochromator and operating conditions of the monochromator. The scanning electron microscope having a monochromator is equipped with, between an electron source and the monochromator, a first focusing lens for adjusting focusing of the electron beam entering the monochromator and a first astigmatism correcting lens for correcting astigmatism of the electron beam entering the monochromator. The microscope further includes a means of obtaining an image of an electron-beam adjustment sample disposed where the electron beam in the monochromator is focused, and based on the obtained image, driving the first focusing lens and the first astigmatism correcting lens so that the focusing and astigmatism of the electron beam entering the monochromator are adjusted.

Abstract translation: 具有可自动调节进入单色仪的电子束和单色仪的操作条件的单色仪的扫描电子显微镜。 具有单色仪的扫描电子显微镜在电子源和单色仪之间配备有用于调节进入单色仪的电子束的聚焦的第一聚焦透镜和用于校正进入单色仪的电子束的像散的第一散光校正透镜。 显微镜还包括获得设置在单色仪中的电子束被聚焦的电子束调节样本的图像的装置，并且基于获得的图像，驱动第一聚焦透镜和第一散光校正透镜，使得聚焦 并且调节进入单色仪的电子束的散光。

公开(公告)号：US20110272577A1

公开(公告)日：2011-11-10

申请号：US12776980

申请日：2010-05-10

Applicant: Stefan LANIO ,  Gerald SCHOENECKER

Inventor： Stefan LANIO ,  Gerald SCHOENECKER

IPC: H01J37/147 ,  H01J3/26 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/1471 ,  H01J37/153 ,  H01J2237/1523 ,  H01J2237/1534 ,  H01J2237/244

Abstract: An electron beam device comprises: a beam emitter for emitting a primary electron beam; an objective electron lens for focusing the primary electron beam onto a specimen, the objective lens defining an optical axis; a beam separator having a first dispersion for separating a signal electron beam from the primary electron beam; and a dispersion compensation element. The dispersion compensation element has a second dispersion, the dispersion compensation element being adapted for adjusting the second dispersion independently of an inclination angle of the primary beam downstream of the dispersion compensation element, such that the second dispersion substantially compensates the first dispersion. The dispersion compensation element is arranged upstream, along the primary electron beam, of the beam separator.

Abstract translation: 电子束装置包括：用于发射一次电子束的射束发射器; 用于将一次电子束聚焦到样本上的目标电子透镜，物镜限定光轴; 具有用于从一次电子束分离信号电子束的第一色散的光束分离器; 和色散补偿元件。 色散补偿元件具有第二色散，色散补偿元件适用于独立于色散补偿元件下游的主光束的倾斜角而调节第二色散，使得第二色散基本上补偿第一色散。 色散补偿元件沿着一级电子束布置在分束器的上游。

公开(公告)号：US08035087B2

公开(公告)日：2011-10-11

申请号：US12584384

申请日：2009-09-04

Applicant: Nicholas R. White

Inventor： Nicholas R. White

IPC: H01J1/50 ,  H01J37/08 ,  G21K5/10

CPC classification number: H01J37/3171 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/152 ,  H01J2237/1534

Abstract: The present invention is an electromagnetic controller assembly for use in ion implantation apparatus, and provides a structural construct and methodology which can be employed for three recognizably separate and distinct functions: (i) To adjust the trajectory of charged particles carried within any type of traveling ion beam which is targeted at a plane of implantation or a work surface for the placement of charged ions into a prepared workpiece (such as a silicon wafer or flat glass panel); (ii) concurrently, to alter and change the degree of parallelism of the ions in the traveling beam; and (iii) concurrently, to control the uniformity of the current density along the transverse direction of traveling ion beams, regardless of whether the beams are high-aspect, continuous ribbon ion beams or alternatively are scanned ribbon ion beams.

Abstract translation: 本发明是用于离子注入装置的电磁控制器组件，并且提供了可用于三个可识别的独立和不同功能的结构构造和方法：（i）调整任何类型的行进中携带的带电粒子的轨迹 离子束，其位于注入平面或工作表面，用于将带电离子放置到制备的工件（例如硅晶片或平板玻璃面板）中; （ii）同时改变和改变行进光束中离子的平行度; 和（iii）同时地，为了控制沿着行进离子束的横向的电流密度的均匀性，不管梁是高方位的，连续的带状离子束还是扫描的带状离子束。

公开(公告)号：US07989776B2

公开(公告)日：2011-08-02

申请号：US12096579

申请日：2005-12-06

Applicant: Heiko Müller ,  Harald Rose

Inventor： Heiko Müller ,  Harald Rose

IPC: H01J1/50

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1534

Abstract: A corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial chromatic aberration includes two correction pieces, which are arranged one behind the other in the direction of the optical axis, in which each correction piece has a plurality of quadrupole fields (QP) and at least one octupole field (OP.) Each correction piece is constructed such that it is symmetrical with respect to its central plane (S, S′) with each correction piece having an uneven number of at least five quadrupole fields (QP) and at least one octupole field (OP). Each correction piece is further constructed so that it is symmetrical with respect to its central plane. The central quadrupole field is arranged so that it is centered with respect to the central plane of the correction piece and is electromagnetic. The quadrupole fields of the two correction pieces are antisymmetrical and a transfer lens system is arranged such that it is symmetrical with respect to the central plane of the corrective between the correction pieces. The transfer lens system has two round lenses and the setting of the transfer lens system takes place so that the two round lenses image the central plane of the two correction pieces anamorphically onto one another, in which the enlargement in one main section is the reciprocal of the enlargement in the other main section and with an octupole field superimposed on the central quadrupole field.

Abstract translation: 用于消除三次孔径像差和一级一级轴向色差的校正方法包括两个校正片，其在光轴方向上一个接一个布置，其中每个校正片具有多个 四极场（QP）和至少一个八极场（OP）。每个校正片被构造成使得它相对于其中心平面（S，S'）是对称的，每个校正片具有不均匀数量的至少五个 四极场（QP）和至少一个八极场（OP）。 每个校正件进一步构造成使得它相对于其中心平面是对称的。 中心四极场被布置为使得其相对于校正件的中心平面居中并且是电磁的。 两个校正块的四极场是反对称的，并且转印透镜系统被布置成使得其相对于校正片之间的校正的中心平面对称。 转印透镜系统具有两个圆形透镜，并且传送透镜系统的设置发生，使得两个圆形透镜彼此变形地将两个校正片的中心平面成像，其中一个主要部分的放大是 另一个主要部分的放大和一个叠加在中心四极场上的八极场。