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公开(公告)号:US20240085357A1
公开(公告)日:2024-03-14
申请号:US17941394
申请日:2022-09-09
Applicant: JEOL Ltd.
Inventor: Hideyuki Takahashi , Takaomi Yokoyama
IPC: G01N23/2252 , G06T11/00 , H01J37/244 , H01J37/28
CPC classification number: G01N23/2252 , G06T11/00 , H01J37/244 , H01J37/28 , G01N2223/079 , G01N2223/418 , G01N2223/507 , H01J2237/2445
Abstract: An electron beam accelerated using a first acceleration voltage is applied to respective positions on a sample to obtain spectra A at the respective positions, and an electron beam accelerated using a second acceleration voltage different from the first acceleration voltage is applied to the respective positions on the sample to obtain spectra B at the respective positions. Then, a spectral ratio A/B of the spectra is calculated at each of the positions to generate a waveform representing the spectral ratio A/B. The value of a spectral ratio A/B in an energy region of interest is extracted from each of the waveforms. The extracted values are mapped onto points corresponding to the respective positions on the sample, whereby a spectral map is generated. The spectral map is displayed.
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公开(公告)号:US11929231B2
公开(公告)日:2024-03-12
申请号:US17725151
申请日:2022-04-20
Applicant: HITACHI HIGH-TECH CORPORATION
Inventor: Akito Tanokuchi , Seiichiro Kanno , Kei Shibayama
CPC classification number: H01J37/20 , H01J37/28 , H01J2237/2007 , H01J2237/202
Abstract: A charged particle beam device suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature different from the suctioning surface. The charged particle beam device includes the electrostatic chuck mechanism; a stage (200) which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam; an insulating body (203) which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck; a first support member (402) which supports the insulating body on the stage; a ring-shaped electrode (400) which encloses the surroundings of the sample and is installed on the insulating body in a contactless manner, and to which a predetermined voltage is applied; and a second support member (405) which supports the ring-shaped electrode.
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公开(公告)号:US20240071717A1
公开(公告)日:2024-02-29
申请号:US17823669
申请日:2022-08-31
Applicant: FEI Company
Inventor: Pavel Potocek , Maurice Peemen , Remco Schoenmakers
CPC classification number: H01J37/265 , H01J37/28 , H01J2237/31745
Abstract: Disclosed herein are scientific instrument support systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, an example method may comprise receiving, by a first device located at a premises and from a second device located external to the premises, and via a network, configuration data for a charged particle microscope located at the premises. The method may comprise updating, by the first device and based on the configuration data, one or more configuration settings associated with the charged particle microscope. The method may comprise causing, based on the updated one or more configuration settings, one or more operations associated with the charged particle microscope to be performed.
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公开(公告)号:US20240071710A1
公开(公告)日:2024-02-29
申请号:US18350643
申请日:2023-07-11
Applicant: FemtoMetrix, Inc.
Inventor: Timothy M. Wong
IPC: H01J37/02 , H01J37/22 , H01J37/244 , H01J37/28
CPC classification number: H01J37/026 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/0048
Abstract: A non-invasive semiconductor technique for measuring dielectric/semiconductor interface trap density can be performed by charging the dielectric by creating charges on the top surface of the dielectric layer over the wafer using Scanning Electron Microscope (SEM) charging. This charging can induce an accumulated, a depleted and/or an inverted semiconductor surface. The states of the semiconductor surface can subsequently be measured, identified, and/or quantified using Electric Field Induced Second Harmonic generation (EFISH). From the measured/acquired EFISH versus SEM charge curve, the interface state density (Dit) can be extracted. A large working distance provides the ability to create charge and measure the Second Harmonic Generation (SHG) at the same semiconductor surface spot without the needing to move the wafer.
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公开(公告)号:US11915908B2
公开(公告)日:2024-02-27
申请号:US17501238
申请日:2021-10-14
Applicant: Carl Zeiss SMT GmbH
Inventor: Eugen Foca , Amir Avishai , Dmitry Klochkov , Thomas Korb , Jens Timo Neumann , Keumsil Lee
Abstract: The present invention relates to a method for measuring a sample with a microscope, the method comprising the steps of: measuring a tilt of the sample, correcting an orientation of the sample based on the tilt, and scanning the sample.
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公开(公告)号:US11908656B2
公开(公告)日:2024-02-20
申请号:US17497761
申请日:2021-10-08
Applicant: ASML Netherlands B.V.
Inventor: Han Willem Hendrik Severt , Jan-Gerard Cornelis Van Der Toorn , Ronald Van Der Wilk , Allard Eelco Kooiker
CPC classification number: H01J37/20 , H01J37/261 , H01J37/28 , H01J2237/0206 , H01J2237/04756 , H01J2237/24592
Abstract: A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.
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公开(公告)号:US20240055220A1
公开(公告)日:2024-02-15
申请号:US18267502
申请日:2020-12-23
Applicant: Hitachi High-Tech Corporation
Inventor: Yuka II
IPC: H01J37/20 , H01J37/304 , H01J37/28 , H01J37/305
CPC classification number: H01J37/20 , H01J37/3045 , H01J37/28 , H01J37/3056 , H01J2237/208 , H01J2237/31749
Abstract: A charged particle beam device includes a sample stage on which a sample is mounted and moved, a charged particle beam irradiation optical system irradiating with a charged particle beam, a sample piece movement unit holding and conveying a sample piece extracted from the sample, a holder fixing table holding a sample piece holder to which the sample piece is transferred, and a computer. When allowing the sample piece movement unit to approach the sample piece, the computer selects a matching region for performing image matching between a reference image obtained in advance by irradiating the sample with the charged particle beam and a comparison image obtained by irradiating the sample, which is an extraction target for the sample piece, with the charged particle beam.
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公开(公告)号:US11887807B2
公开(公告)日:2024-01-30
申请号:US18158444
申请日:2023-01-23
Applicant: ASML Netherlands B.V.
Inventor: Weiming Ren , Xuedong Liu , Xuerang Hu , Zhongwei Chen
IPC: H01J37/147 , H01J37/06 , H01J37/10 , H01J37/28
CPC classification number: H01J37/1474 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/1478 , H01J37/28 , H01J2237/024 , H01J2237/0453 , H01J2237/0492 , H01J2237/103 , H01J2237/1205 , H01J2237/1516 , H01J2237/1534 , H01J2237/1536
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
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公开(公告)号:US20240014001A1
公开(公告)日:2024-01-11
申请号:US18257213
申请日:2021-01-29
Inventor: Hongmin Zhou , Shengquan Fu , Ming Li
CPC classification number: H01J37/20 , H01J37/28 , H01J2237/204
Abstract: A system of scanning electron microscope sample box and a method of opening the same are provided, including: a sample chamber (1); an exchange chamber (2) communicated with the sample chamber (1), a sample stage base (3) is disposed in the exchange chamber (2), the sample stage base (3) is subjected to an external force to be translated from the exchange chamber (2) to the sample chamber (1), and an inner wall of the exchange chamber (2) is provided with a pulling arm (4); and a sample box including a box body (5) and a box cover (6) sealing the box body (5), wherein the box body (5) is placed on the sample stage base (3) of the exchange chamber (2), and the box cover (6) is connected to the pulling arm (4), so that the box body (5) is separated from the box cover (6) when the sample stage base (3) is subjected to the external force to translate the box body (5) from the exchange chamber (2) to the sample chamber (1). The method of opening the scanning electron microscope sample box provided by the present disclosure is simple and is easy for implementation, reducing a difficulty and a cost of a process of manufacturing the sample box.
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公开(公告)号:US11869745B2
公开(公告)日:2024-01-09
申请号:US17435479
申请日:2019-03-27
Applicant: Hitachi High-Tech Corporation
Inventor: Minami Shouji , Natsuki Tsuno , Hiroya Ohta , Daisuke Bizen
IPC: H01J37/28 , H01J37/22 , H01J37/244 , H01J37/26
CPC classification number: H01J37/28 , H01J37/222 , H01J37/224 , H01J37/226 , H01J37/244 , H01J37/265 , H01J2237/2448 , H01J2237/2817
Abstract: An object of the invention is to provide a charged particle beam device capable of increasing the contrast of an observation image of a sample as much as possible in accordance with light absorption characteristics that change for each optical parameter. The charged particle beam device according to the invention changes an optical parameter such as a polarization plane of light emitted to the sample, and generates the observation image having a contrast corresponding to the changed optical parameter. An optical parameter that maximizes a light absorption coefficient of the sample is specified according to a feature amount of a shape pattern of the sample (refer to FIG. 5).
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