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    Particle charger
    72.
    发明授权
    Particle charger 有权

    公开(公告)号：US09875873B2

    公开(公告)日：2018-01-23

    申请号：US15501935

    申请日：2014-08-08

    Applicant: SHIMADZU CORPORATION

    Inventor： Yoshihiro Ueno ,  Hiroshi Seki ,  Hiroshi Okuda

    IPC: H01J27/02 ,  H01J49/12 ,  G01N27/62 ,  H01J37/32

    CPC classification number: H01J27/024 ,  B03C7/02 ,  G01N15/0266 ,  G01N27/62 ,  G01N27/622 ,  G01N2015/0038 ,  H01J37/32009 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32532 ,  H01J49/10 ,  H01J49/12

    Abstract: A particle charger is provided with: a filter (28) partitioning the inside of a housing (20) into a first space (29) and second space (30); a particle introducer (22) for introducing a particle into the first space; a gas ion supplier (10) for supplying the first space with a gas ion; a potential gradient creator (26, 27, 31) for creating a potential difference within the housing so as to make the gas ion and a charged particle resulting from a contact of the aforementioned particle with the gas ion move toward the second space; an AC voltage supplier (32, 33) for applying AC voltages having a phase difference to the neighboring electrodes (28a, b) included in the filter; a controller (35) for performing a control for applying, to the plurality of electrodes, predetermined voltages so as to allow the charged particle to pass through a gap between the electrodes while trapping the gas ion by the electrodes; and a charged particle extractor (23, 25, 34) for extracting the charged particle admitted to the second space to the outside of the housing. By this configuration, the occurrence frequency of the multi-charging is suppressed.

    FREQUENCY TUINING OF A RF-GENERATOR WITHIN A PLASMA PROCESS
    75.
    发明申请
    FREQUENCY TUINING OF A RF-GENERATOR WITHIN A PLASMA PROCESS 审中-公开

    公开(公告)号：US20170345618A1

    公开(公告)日：2017-11-30

    申请号：US15532743

    申请日：2015-12-03

    Applicant: COMET AG

    Inventor： ROLAND SCHLIERF

    IPC: H01J37/32

    CPC classification number: H01J37/32165 ,  H01J37/32082 ,  H01J37/32155 ,  H01J37/32174 ,  H01J37/32183 ,  H01J37/32935 ,  H01J37/3299 ,  H01J2237/327

    Abstract: The invention describes a method of frequency tuning an electrical generator (100) for supplying electrical power to a plasma, wherein the method comprises a pulsed mode, the pulse mode comprising at least a high power pulse (314) comprising a high power level (304) and a low power pulse (312) comprising a low power level (302) different to zero power, the method comprising the steps of: —providing RF-power with a high power starting frequency set comprising at least one high power starting frequency (502, 504, 506) at the high power pulse (314) with a predefmed high power pulse shape; —providing RF-power with a low power starting frequency set comprising at least one low power starting frequency (512, 514) at the low power pulse (312) with a predefmed low power pulse shape; —determining a reflected high power at the high power starting frequency (502, 504, 506); —tuning the high power starting frequency (502, 504, 506) to a different first high power frequency if the reflected high power exceeds a high power threshold value such that the reflected high power decreases below the high power threshold value; —determining a reflected low power at the low power starting frequency (512, 514); —tuning the low power starting frequency (512, 514) to a different first low power frequency if the reflected low power exceeds a low power threshold value such that the reflected low power decreases below the low power threshold value. The invention further describes a corresponding electrical generator (100), plasma processing system and computer program product. The method, the electrical generator, the plasma processing system and the computer program product may have the advantage that the stability of the plasma with respect to repeated and essentially identical high and low power pulses is used to reduce the controlling effort and to check the stability of the plasma process.

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