公开(公告)号：US20150325405A1

公开(公告)日：2015-11-12

申请号：US14275763

申请日：2014-05-12

Applicant: Ernest E. Allen ,  Jon Ballou ,  Kevin M. Daniels ,  James P. Buonodono ,  Joseph P. Dzengeleski

Inventor： Ernest E. Allen ,  Jon Ballou ,  Kevin M. Daniels ,  James P. Buonodono ,  Joseph P. Dzengeleski

IPC: H01J37/20 ,  H01J37/317 ,  H01J37/305 ,  G21K5/08 ,  H01J37/304

CPC classification number: H01J37/20 ,  G21K5/08 ,  H01J37/304 ,  H01J37/3053 ,  H01J37/3171 ,  H01J37/32412 ,  H01J2237/024 ,  H01J2237/061 ,  H01J2237/1503

Abstract: A processing apparatus including a process chamber, a plasma source disposed within the process chamber, wherein the plasma source is movable in a first direction and is configured to emit an ion beam along a second direction that is orthogonal to the first direction. The apparatus may further include a platen disposed within the process chamber for supporting a substrate, and an ion beam current sensor that is disposed adjacent to the platen.

Abstract translation: 一种处理装置，包括处理室，设置在处理室内的等离子体源，其中等离子体源可沿第一方向移动并且被配置为沿着与第一方向正交的第二方向发射离子束。 该设备还可以包括设置在处理室内的用于支撑衬底的压板和邻近压板设置的离子束电流传感器。

公开(公告)号：US09165742B1

公开(公告)日：2015-10-20

申请号：US14627940

申请日：2015-02-20

Applicant: KLA-Tencor Corporation

Inventor： Richard Simmons ,  Douglas Masnaghetti ,  Mark McCord ,  Fred E Stanke ,  Scott Young ,  Christopher Sears

IPC: H01J37/26 ,  H01J27/00 ,  H01J37/06 ,  H01J37/28

CPC classification number: H01J37/06 ,  H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/061

Abstract: Embodiments of the present disclosure are directed to an electron beam imaging/inspection apparatus having an electron source device to direct flood electrons on a sample immediately before image acquisition or inspection. The apparatus comprises a first device configured to charge a sample in a first mode, wherein the first device includes an electron source configured to provide a flood beam of charged particles to a first area of the sample. The apparatus also comprises a second device configured to generate a primary beam of electrons and characterize an interaction between the primary beam and a second area of the sample within the first area in a second mode. The apparatus is configured to switch from the first mode to the second mode less than 1 second.

Abstract translation: 本公开的实施例涉及一种具有电子源装置的电子束成像/检查装置，用于在图像采集或检查之前立即将样品引导到样品上。 该装置包括被配置为以第一模式对样本进行充电的第一装置，其中第一装置包括电子源，该电子源被配置为将带电粒子的泛光束提供到样品的第一区域。 该装置还包括被配置为产生主电子束的第二装置，并且在第二模式中表征主光束和第一区域内的样品的第二区域之间的相互作用。 该装置被配置为在第一模式下切换到第二模式小于1秒。

公开(公告)号：US09153406B2

公开(公告)日：2015-10-06

申请号：US14582696

申请日：2014-12-24

Applicant: SEN Corporation

Inventor： Masateru Sato

IPC: H01J27/02 ,  H01J27/08 ,  H01J37/08

CPC classification number: H01J27/08 ,  H01J27/022 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/061 ,  H01J2237/082

Abstract: An ion generator includes: an arc chamber; a repeller that includes a repeller plate provided within the arc chamber and a repeller extension portion inserted through a through hole communicating the inside and the outside of the arc chamber; and a supporting structure that is provided outside the arc chamber and that supports the repeller so that a gap is ensured between the repeller extension portion and an inner wall of the through hole. The supporting structure includes a cover member that forms, outside the arc chamber, a small chamber communicating with the gap, and an insulation member that electrically insulates the arc chamber and the repeller from each other.

Abstract translation: 离子发生器包括：电弧室; 包括设置在所述电弧室内的推斥板的推斥器和通过连通所述电弧室的内部和外部的通孔插入的推斥板延伸部; 以及支撑结构，其设置在电弧室外部并且支撑推斥板，使得在排斥器延伸部分和通孔的内壁之间保证间隙。 支撑结构包括在电弧室外形成与间隙连通的小室的盖构件和使电弧室和排斥体彼此电绝缘的绝缘构件。

公开(公告)号：US20150144808A1

公开(公告)日：2015-05-28

申请号：US14406012

申请日：2013-05-20

Applicant: The Welding Institute

Inventor： Colin Ribton ,  Allan Sanderson

IPC: H01J37/077 ,  H01J37/30

CPC classification number: H01J37/077 ,  H01J27/18 ,  H01J37/3002 ,  H01J2237/061 ,  H01J2237/063 ,  H01J2237/0817 ,  H01J2237/083 ,  H01J2237/31 ,  H01J2237/3104

Abstract: A plasma source apparatus for generating a beam of charged particles is disclosed. The apparatus comprises: a plasma chamber provided with an inlet for the ingress of gas and an aperture for the extraction of charged particles from the plasma chamber; a radio frequency (RF) plasma generation unit for generating a plasma inside the plasma chamber, the radio frequency plasma generation unit comprising first and second resonant circuits each tuned to resonate at substantially the same resonant frequency, the first resonant circuit comprising a first antenna and a first, RF power source adapted to drive the first resonant circuit at substantially its resonant frequency, and the second resonant circuit comprising a second antenna, whereby in use an RF signal is induced in the second antenna by the first resonant circuit due to resonant coupling, the second resonant circuit being configured to apply the induced RF signal to the plasma chamber to generate a plasma therein; and a particle accelerating unit for extracting charged particles from the plasma and accelerating the charged particles to form a beam, the particle accelerating unit comprising a second power source configured to apply potential between the plasma chamber and an accelerating electrode, the region between the plasma chamber and the accelerating electrode constituting an acceleration column. The second power source is adapted to output a high voltage relative to that output by the first, RF power source.

Abstract translation: 公开了一种用于产生带电粒子束的等离子体源装置。 该装置包括：等离子体室，其具有用于进入气体的入口和用于从等离子体室抽出带电粒子的孔; 用于在等离子体室内产生等离子体的射频（RF）等离子体产生单元，所述射频等离子体产生单元包括第一和第二谐振电路，每个谐振电路被调谐以基本相同的谐振频率谐振，所述第一谐振电路包括第一天线和 第一RF电源，其适于以基本上其谐振频率驱动第一谐振电路，并且第二谐振电路包括第二天线，由此在使用中由于谐振耦合由第一谐振电路在第二天线中感应RF信号 所述第二谐振电路被配置为将所述感应RF信号施加到所述等离子体室以在其中产生等离子体; 以及用于从等离子体中提取带电粒子并加速带电粒子以形成束的粒子加速单元，所述粒子加速单元包括构造成在等离子体室和加速电极之间施加电位的第二电源，等离子体室 加速电极构成加速柱。 第二电源适于通过第一RF电源输出相对于该输出的高电压。

公开(公告)号：US09018829B2

公开(公告)日：2015-04-28

申请号：US13955009

申请日：2013-07-31

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Bon-Woong Koo ,  Victor Benveniste ,  Christopher A. Rowland ,  Craig R. Chaney ,  Frank Sinclair ,  Neil J. Bassom

IPC: H01J27/02 ,  H01J27/08 ,  H01J37/08 ,  H01J37/317 ,  H01J37/32

CPC classification number: H01J27/022 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/32357 ,  H01J37/32412 ,  H01J37/32422 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0815 ,  H01J2237/24514

Abstract: An ion source includes an ion chamber housing defining an ion source chamber, the ion chamber housing having a side with a plurality of apertures. The ion source also includes an antechamber housing defining an antechamber. The antechamber housing shares the side with the plurality of apertures with the ion chamber housing. The antechamber housing has an opening to receive a gas from a gas source. The antechamber is configured to transform the gas into an altered state having excited neutrals that is provided through the plurality of apertures into the ion source chamber.

Abstract translation: 离子源包括限定离子源室的离子室壳体，离子室壳体具有带有多个孔的侧面。 离子源还包括限定前室的前室。 前室与离子室外壳共享具有多个孔的侧面。 前厅外壳有一个开口，可以接收来自气源的气体。 前室被配置成将气体转变成具有通过多个孔提供到离子源室中的具有激发中性粒子的改变状态。

公开(公告)号：US08987678B2

公开(公告)日：2015-03-24

申请号：US13437599

申请日：2012-04-02

Applicant: Sean Kellogg ,  N. William Parker ,  Mark W. Utlaut ,  Anthony Graupera

Inventor： Sean Kellogg ,  N. William Parker ,  Mark W. Utlaut ,  Anthony Graupera

IPC: G21K1/08 ,  H01J27/16 ,  H01J37/08 ,  H01J37/32 ,  H05H1/28 ,  H05H1/30 ,  H05H1/46

CPC classification number: H01J27/16 ,  H01J37/08 ,  H01J37/321 ,  H01J2237/002 ,  H01J2237/061 ,  H01J2237/0817 ,  H01J2237/31749 ,  H05H1/28 ,  H05H1/30 ,  H05H1/46 ,  H05H2001/4652 ,  H05H2001/4682

Abstract: An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.

Abstract translation: 用于聚焦带电粒子束系统的电感耦合等离子体源包括提供改进的电隔离和减小的电容RF耦合的导电屏蔽以及绝缘和冷却等离子体室的介电流体。 导电屏蔽可以封闭在固体电介质中。 电介质流体可以由泵循环或不被泵循环。 热管可用于冷却介电流体。

公开(公告)号：US08981322B2

公开(公告)日：2015-03-17

申请号：US12428945

申请日：2009-04-23

Applicant: Martin D. Tabat ,  Matthew C. Gwinn ,  Robert K. Becker ,  Avrum Freytsis ,  Michael Graf

Inventor： Martin D. Tabat ,  Matthew C. Gwinn ,  Robert K. Becker ,  Avrum Freytsis ,  Michael Graf

IPC: G21K5/04 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/317 ,  H01J2237/061 ,  H01J2237/0812 ,  H01J2237/0825 ,  H01J2237/0827

Abstract: Disclosed is a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system, and associated methods of operation to grow, modify, deposit, or dope a layer upon a substrate. The multiple nozzle and skimmer assembly includes at least two nozzles arranged in mutual close proximity to at least partially coalesce the gas cluster beams emitted therefrom into a single gas cluster beam and/or angled to converge each beam toward a single intersecting point to form a set of intersecting gas cluster beams, and to direct the single and/or intersecting gas cluster beam into a gas skimmer.

Abstract translation: 公开了一种用于在气体簇离子束（GCIB）系统中引入过程气体混合物或多种工艺气体混合物的多喷嘴和撇渣器组件，以及相关的操作方法，用于生长，修饰，沉积或掺杂层 底物。 多个喷嘴和撇浮器组件包括至少两个彼此非常接近地布置的喷嘴，其至少部分地将从其发射的气体束束至少部分地聚结成单个气体束束和/或成角度以将每个射束朝着单个交叉点收敛以形成一组 的交叉气体束束，并将单个和/或相交的气体束束引导到气体分离器中。

公开(公告)号：US20150028221A1

公开(公告)日：2015-01-29

申请号：US13948622

申请日：2013-07-23

Applicant: Hamilton Sundstrand Corporation

Inventor： Wai Tak Lee ,  Richard K. Chun

IPC: H01J37/08

CPC classification number: H01J49/10 ,  B33Y10/00 ,  B33Y80/00 ,  H01J27/02 ,  H01J37/065 ,  H01J37/08 ,  H01J2237/061

Abstract: A method of ion source fabrication for a mass spectrometer includes simultaneously forming aligned component portions of an ion source using direct metal laser fusing of sequential layers. The method can further include forming the component portions on a base plate made from a ceramic material by applying fused powder to the base plate to build the component portions thereon.

Abstract translation: 用于质谱仪的离子源制造方法包括使用连续层的直接金属激光熔合同时形成离子源的对准的部件。 该方法还可以包括在由陶瓷材料制成的基板上形成组分部分，通过将熔融粉末施加到基板上以在其上构建部件部分。

公开(公告)号：US08785849B2

公开(公告)日：2014-07-22

申请号：US12133298

申请日：2008-06-04

Applicant: Juergen Frosien ,  Dieter Winkler ,  Udo Weigel ,  Stefan Grimm

Inventor： Juergen Frosien ,  Dieter Winkler ,  Udo Weigel ,  Stefan Grimm

IPC: G21K5/04

CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/244 ,  H01J2237/24514 ,  H01J2237/24535 ,  H01J2237/24564 ,  H01J2237/24578 ,  H01J2237/2594 ,  H01J2237/2623 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: A focused ion beam device is described comprising a gas field ion source with an analyzer for analyzing and classifying the structure of a specimen, a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip, the emitter tip has a base tip comprising a first material and a supertip comprising a material different from the first material, wherein the supertip is a single atom tip and the base tip is a single crystal base tip. Furthermore, the focused ion beam device has a probe current control and a sample charge control. A method of operating a focused ion beam device is provided comprising applying a voltage between a single emission center of the supertip and an electrode, supplying gas to the emitter tip, analyzing and classifying the structure of a specimen, and controlling the structure of the specimen.

Abstract translation: 描述了一种聚焦离子束装置，其包括气体离子源，其具有用于分析和分类样品结构的分析器，用于根据分析仪的分析来控制和/或改变样品的结构的控制器，发射器尖端 发射极尖端具有包括第一材料和超高压头的基座尖端，所述第一材料和第一材料包括不同于所述第一材料的材料，其中所述超高压是单个原子尖端，并且所述基座尖端是单晶基底尖端。 此外，聚焦离子束装置具有探针电流控制和样品充电控制。 提供了一种操作聚焦离子束装置的方法，包括在超高压的单个发射中心和电极之间施加电压，向发射极尖端供应气体，分析和分类样品的结构，以及控制样品的结构 。

公开(公告)号：US08536546B2

公开(公告)日：2013-09-17

申请号：US12962559

申请日：2010-12-07

Applicant: Cattien V. Nguyen ,  Bryan P. Ribaya

Inventor： Cattien V. Nguyen ,  Bryan P. Ribaya

IPC: H01J9/12

CPC classification number: H01J37/073 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/065 ,  H01J37/3174 ,  H01J2201/30469 ,  H01J2237/061 ,  H01J2237/0635 ,  H01J2237/26 ,  Y10S977/742

Abstract: An electron gun, an electron source for an electron gun, an extractor for an electron gun, and a respective method for producing the electron gun, the electron source and the extractor are disclosed. Embodiments provide an electron source utilizing a carbon nanotube (CNT) bonded to a substrate for increased stability, reliability, and durability. An extractor with an aperture in a conductive material is used to extract electrons from the electron source, where the aperture may substantially align with the CNT of the electron source when the extractor and electron source are mated to form the electron gun. The electron source and extractor may have alignment features for aligning the electron source and the extractor, thereby bringing the aperture and CNT into substantial alignment when assembled. The alignment features may provide and maintain this alignment during operation to improve the field emission characteristics and overall system stability of the electron gun.

Abstract translation: 公开了一种电子枪，电子枪用电子源，电子枪提取器，电子枪，电子源和提取器的制造方法。 实施例提供了利用结合到基板上的碳纳米管（CNT）的电子源，以提高稳定性，可靠性和耐久性。 使用具有导电材料中的孔的提取器从电子源提取电子，其中当提取器和电子源配合形成电子枪时，孔可以基本上与电子源的CNT对准。 电子源和提取器可以具有用于对准电子源和提取器的对准特征，从而在组装时使孔和CNT基本对准。 对准特征可以在操作期间提供并保持该对准，以改善电子枪的场发射特性和整体系统稳定性。