公开(公告)号：US20230317408A1

公开(公告)日：2023-10-05

申请号：US17711785

申请日：2022-04-01

Applicant: Intel Corporation

Inventor： Xianghong Tong ,  Martin Von Haartman ,  Wen-Hsien Chuang ,  Zhiyong Ma ,  Hyuk Ju Ryu ,  Prasoon Joshi ,  May Ling Oh ,  Jennifer Huening ,  Shuai Zhao ,  Charles Peterson ,  Ira Jewell ,  Hasan Faraby

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/265 ,  H01J37/28 ,  H01J37/244 ,  H01J2237/2443 ,  H01J2237/2814 ,  H01J2237/2801 ,  H01J2237/221

Abstract: Pulsed beam prober systems, devices, and techniques are described herein related to providing a beam detection frequency that is less than a electrical test frequency. An electrical test signal at the electrical test frequency is provided to die under test. A pulsed beam is applied to the die such that the pulsed beam has packets of beam pulses or a frequency delta with respect to the electrical test frequency. The packets of beam pulses or the frequency delta elicits a detectable beam modulation in an imaging signal reflected from the die such that the imaging signal is modulated at a detection frequency less than the electrical test frequency.

公开(公告)号：US20230317404A1

公开(公告)日：2023-10-05

申请号：US17757133

申请日：2022-01-26

Applicant: FOCUS-EBEAM TECHNOLOGY (BEIJING) CO., LTD.

Inventor： Shuai LI

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/1474 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

Abstract: Provided is an electron beam system, including: an electron source, configured to generate an electron beam; a first beam guide, configured to accelerate the electron beam; a second beam guide, configured to accelerate the electron beam; a first control electrode arranged between the first beam guide and the second beam guide, configured to change movement directions of backscattered electrons and secondary electrons generated by the electron beam acting on a specimen to be tested; a first detector arranged between the first beam guide and the first control electrode, configured to receive the backscattered electrons generated by the electron beam acting on the specimen to be tested. The first control electrode according to the embodiments of the present disclosure changes the movement directions of the backscattered electrons and secondary electrons generated by the electron beam generated by the electron source acting on the specimen to be tested, so that the first detector arranged between the first beam guide and the first control electrode can receive pure backscattered electrons generated by the electron beam acting on the specimen to be tested.

公开(公告)号：US20230317400A1

公开(公告)日：2023-10-05

申请号：US18121931

申请日：2023-03-15

Applicant: JEOL Ltd.

Inventor： Kyouichi Kamino ,  Tomohisa Fukuda ,  Norikazu Arima ,  Yasuyuki Okano ,  Keiichi Yamamoto

IPC: H01J37/067 ,  H01J37/18 ,  H01J37/28

CPC classification number: H01J37/067 ,  H01J37/18 ,  H01J37/28

Abstract: Provided is a charged particle beam source having an emitter that can be replaced easily. The charged particle beam source includes an electron gun chamber; a first unit including both a supportive insulative member mechanically supporting a cable and a first set of terminals electrically connected to the cable; and a second unit including both the emitter that releases charged particles and a second set of terminals electrically connected to the emitter. The chamber has a side wall provided with a through-hole in which the first unit is secured. The second unit can be detachably mounted to the first unit. Within the chamber, the emitter is placed on an optical axis, so that the first and second sets of terminals are brought into contact with each other.

公开(公告)号：US20230313644A1

公开(公告)日：2023-10-05

申请号：US17708802

申请日：2022-03-30

Applicant: Saudi Arabian Oil Company

Inventor： Qiwei Wang ,  Tao Chen ,  Hameed H. Al-Badairy

IPC: E21B37/06 ,  C09K8/528 ,  E21B43/20 ,  G01N23/20091 ,  H01J37/28 ,  G01N33/18

CPC classification number: E21B37/06 ,  C09K8/528 ,  E21B43/20 ,  G01N23/20091 ,  H01J37/28 ,  G01N33/1853 ,  G01N1/4077

Abstract: A method and system of treatment with scale inhibitor, including adding scale inhibitor to source water to give injection water, conveying the injection water in a surface conduit to an injection well for injection into an oil reservoir in a subterranean formation, pumping the injection water through a wellbore of the injection well into the oil reservoir, obtaining a sample of the injection water (including suspended solids), and analyzing the suspended solids.

公开(公告)号：US11776786B2

公开(公告)日：2023-10-03

申请号：US16940856

申请日：2020-07-28

Applicant: JEOL Ltd.

Inventor： Kazunori Tsukamoto ,  Yuki Chiba

IPC: H01J37/21 ,  H01J37/14 ,  H01J37/28 ,  H01J37/22

CPC classification number: H01J37/21 ,  H01J37/14 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/216

Abstract: A focus adjustment method for a charged particle beam device having a magnetic field lens used for focus adjustment and an astigmatism corrector includes: acquiring a plurality of first images by varying an excitation current of the magnetic field lens within a focus search range, and determining a reference value of the excitation current; removing hysteresis from the magnetic field lens by setting the excitation current of the magnetic field lens outside the focus search range before and after varying the excitation current of the magnetic field lens within the focus search range; and acquiring a plurality of second images by varying the excitation current of the magnetic field lens using the reference value as a reference and varying a stigma correction value of the astigmatism corrector at each excitation current, and then determining optimum values of the excitation current and the stigma correction value.

公开(公告)号：US20230298854A1

公开(公告)日：2023-09-21

申请号：US18184366

申请日：2023-03-15

Applicant: IMEC VZW ,  Katholieke Universiteit Leuven

Inventor： Joren Severi ,  Gian Francesco Lorusso ,  Danilo De Simone

IPC: H01J37/28 ,  G06T7/00

CPC classification number: H01J37/28 ,  G06T7/001 ,  H01J2237/2817 ,  G06T2207/30148

Abstract: A method includes generating, by a SEM, sets of frames corresponding to regions of a microfabrication pattern, for each set of frames, estimating feature data representing edge positions, linewidths, or centerline positions of one or more features of each region of the pattern, and computing a preliminary estimate of a roughness parameter from the feature data. The roughness parameter is indicative of a line edge roughness, a linewidth roughness, or a pattern placement roughness of the one or more features. The method further includes fitting a model equation to the preliminary estimates of the roughness parameter using a model parameter dependent on the number of frames of each set of frames, the model equation relating the model parameter to the roughness parameter; and computing a final estimate of the roughness parameter as an asymptotic value of the fitted model equation.

公开(公告)号：US20230298852A1

公开(公告)日：2023-09-21

申请号：US18120278

申请日：2023-03-10

Applicant: ASML Netherlands B.V.

Inventor： Benoit Herve GAURY ,  Jasper Frans Mathijs VAN RENS

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/28

Abstract: A method of measuring a delay time of a propagation of a signal in a line in a circuit structure, the method comprises irradiating the line by pulses of a charged particle beam, wherein a pulse repetition frequency of the pulses of the charged particle beam is varied. The method further comprises measuring, for each of the pulse repetition frequencies, a secondary charged particle emission responsive to the irradiating the line by the pulses of the charged particle beam at the respective pulse repetition frequency, and deriving the delay time of the line based on the secondary charged particle emission responsive to the varying of the pulse repetition frequency.

公开(公告)号：US11764028B2

公开(公告)日：2023-09-19

申请号：US17056993

申请日：2018-05-22

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta Imai ,  Masahiro Sasajima ,  Yoshihiro Takahoko

IPC: H01J37/14 ,  H01J37/15 ,  H01J37/21 ,  H01J37/28 ,  H01J37/145 ,  H01J37/12 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/15 ,  H01J37/21 ,  H01J37/12 ,  H01J37/141 ,  H01J37/28

Abstract: A charged particle beam device is provided in which axis adjustment as a superimposing lens is facilitated by aligning an axis of an electrostatic lens resulting from a deceleration electric field with an axis of a magnetic field lens. The charged particle beam device includes: an electron source; an objective lens that focuses a probe electron beam from the electron source on a sample; a first beam tube and a second beam tube through each of which the probe electron beam passes; a deceleration electrode arranged between the first beam tube and a sample; a first voltage source that forms a deceleration electric field for the probe electron beam between the first beam tube and the deceleration electrode by applying a first potential to the first beam tube; and a first moving mechanism that moves a position of the first beam tube.

公开(公告)号：US11749497B2

公开(公告)日：2023-09-05

申请号：US17394925

申请日：2021-08-05

Applicant: Hitachi High-Tech Corporation

Inventor： Shunsuke Mizutani ,  Shahedul Hoque ,  Uki Ikeda ,  Makoto Suzuki

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/1474 ,  H01J37/244 ,  H01J2237/2443 ,  H01J2237/24475

Abstract: A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.

公开(公告)号：US11742177B2

公开(公告)日：2023-08-29

申请号：US17500627

申请日：2021-10-13

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana Muraki ,  Tatsuya Asahata ,  Atsushi Uemoto

IPC: H01J37/304 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/3045 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/30405

Abstract: Automated processing is provided. A charged particle beam apparatus includes: an image identity degree determination unit determining whether an identity degree is equal to or greater than a predetermined value, the identity degree indicating a degree of identity between a processing cross-section image that is an SEM image obtained through observation of a cross section of the sample by a scanning electron microscope, and a criterion image that is the processing cross-section image previously registered; and a post-determination processing unit performing a predetermined processing operation according to a result of the determination by the image identity degree determination unit.