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    Circuit tracing using a focused ion beam
    3.
    发明授权
    Circuit tracing using a focused ion beam 有权
    使用聚焦离子束的电路跟踪

    公开(公告)号：US09529040B2

    公开(公告)日：2016-12-27

    申请号：US14811549

    申请日：2015-07-28

    Applicant: TECHINSIGHTS INC.

    Inventor： Christopher Pawlowicz ,  Alexander Sorkin ,  Alexander Krechmer

    IPC: G21G5/00 ,  G01R31/303 ,  G01R31/28 ,  G01N23/225 ,  H01L21/66

    CPC classification number: G01R31/303 ,  G01N23/2255 ,  G01R31/2896 ,  H01J2237/24564 ,  H01J2237/24585 ,  H01J2237/2803 ,  H01J2237/2809 ,  H01J2237/31749 ,  H01L22/12

    Abstract: Described are various embodiments of methods and systems for tracing circuitry on integrated circuits using focused ion beam based imaging techniques. In one such embodiment, a method is provide for identifying functional componentry associated with a switchable power interface on an integrated circuit, wherein the switchable power interface comprises a source and a drain with a control switch therebetween, said control switch being controllable by a control signal during operation of the integrated circuit. The method comprises connecting, with deposited conductive material, the source and the drain; applying an external voltage bias to a power input of the switchable power interface via one of the source and the drain; exposing the integrated circuit to a focused ion beam; and gathering an image of the integrated circuit during exposure to determine areas of high contrast indicating functional componentry in operative connection with the switchable power interface.

    Abstract translation: 描述了使用基于聚焦离子束的成像技术在集成电路上跟踪电路的方法和系统的各种实施例。 在一个这样的实施例中，提供了一种用于识别与集成电路上的可切换电力接口相关联的功能组件的方法，其中所述可切换电力接口包括其间具有控制开关的源极和漏极，所述控制开关由控制信号 在集成电路运行期间。 该方法包括用沉积的导电材料连接源极和漏极; 通过源极和漏极中的一个将外部电压施加到可切换电力接口的功率输入; 将集成电路暴露于聚焦离子束; 以及在曝光期间收集集成电路的图像，以确定与可切换电源接口可操作连接的功能组件的高对比度区域。

    Ion beam chamber fluid delivery apparatus and method and ion beam etcher using same
    4.
    发明授权
    Ion beam chamber fluid delivery apparatus and method and ion beam etcher using same 有权

    公开(公告)号：US12176177B2

    公开(公告)日：2024-12-24

    申请号：US17805663

    申请日：2022-06-06

    Applicant: TECHINSIGHTS INC.

    Inventor： Christopher Pawlowicz ,  Alexander Sorkin ,  Trevor Jason French ,  Ian Jones ,  Paul Gagnon

    IPC: H01J37/08 ,  H01J37/32

    Abstract: Described are various embodiments of an ion beam chamber fluid delivery system and method for delivering a fluid onto a substrate in an ion beam system during operation. In one embodiment, the system comprises: a chamber comprising an ion beam gun oriented so as to cause ions to impinge the substrate, said chamber having a fluid delivery conduit therein for delivering the fluid into the chamber; a transferable substrate stage for holding the substrate, the transferable stage further configured to move between an operating position and a payload position during non-operation, said payload position for receiving and removing said substrate; and a fluid delivery nozzle being in a fixed location relative to the transferable stage, at least during operation, with an outlet position that is configured to deliver a fluid to a predetermined location on said transferable stage.

    Circuit tracing using a focused ion beam
    6.
    发明授权
    Circuit tracing using a focused ion beam 有权
    使用聚焦离子束的电路跟踪

    公开(公告)号：US09383327B2

    公开(公告)日：2016-07-05

    申请号：US14309674

    申请日：2014-06-19

    Applicant: TECHINSIGHTS, INC.

    Inventor： Chris Pawlowicz ,  Alexander Sorkin ,  Michael W. Phaneuf ,  Alexander Krechmer ,  Ken G. Lagarec

    IPC: G21G5/00 ,  G01N23/225 ,  H01J37/22 ,  H01L21/66 ,  G01R31/303

    CPC classification number: G01N23/2255 ,  G01R31/303 ,  H01J37/222 ,  H01J2237/24564 ,  H01J2237/24585 ,  H01J2237/2803 ,  H01J2237/2809 ,  H01J2237/31749 ,  H01L22/12

    Abstract: Methods and systems for tracing circuitry on integrated circuits using focused ion beam based imaging techniques. A first component or node on an integrated circuit is coupled to a second component or node on the same integrated circuit. After an external bias is applied to the first component or node, a focused ion beam is applied to the integrated circuit and an image is taken using an electron detector. The features or components on the integrated circuit which are coupled to the second component or node will show up in high contrast on the resulting image. The method may also involve applying a bias to a node or component and then using focused ion beam imaging techniques (through an electron detector) to arrive at an image of the integrated circuit. Components coupled to the node will appear in high contrast in the resulting image.

    Abstract translation: 使用聚焦离子束成像技术在集成电路上跟踪电路的方法和系统。 集成电路上的第一组件或节点耦合到同一集成电路上的第二组件或节点。 在将外部偏压施加到第一部件或节点之后，将聚焦离子束施加到集成电路，并且使用电子检测器拍摄图像。 耦合到第二组件或节点的集成电路上的特征或组件将在所得到的图像上呈现高对比度。 该方法还可以包括向节点或部件施加偏压，然后使用聚焦离子束成像技术（通过电子检测器）来获得集成电路的图像。 耦合到节点的组件将在所得到的图像中以高对比度出现。

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