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91.发明专利Particle optical device for observing sample simultaneously using particle and photon 审中-公开用于观察样品同时使用颗粒和光子的颗粒光学设备
公开(公告)号：JP2008192617A
公开(公告)日：2008-08-21
申请号：JP2008023537
申请日：2008-02-04
Applicant: Fei Co , エフ イー アイ カンパニFei Company
Inventor： KNOWLES WILLIAM RALPH
CPC classification number: H01J37/228 , H01J37/244 , H01J37/256 , H01J37/28 , H01J2237/188 , H01J2237/2608 , H01J2237/2808
Abstract: PROBLEM TO BE SOLVED: To provide a particle optical device, such as an ESEM(R), for observing samples simultaneously using particles and photons and reducing the scattering of particle beams at high pressure.
SOLUTION: A pressure limiting aperture (PLA) is placed in a diaphragm between an objective lens in the ESEM (R) and a sample position. The distance between the sample position and the aperture is sufficiently small to allow a large collection angle of the photons through this aperture. A mirror is provided between the diaphragm and the objective lens. Due to the large collection angle for photons, a large NA is achieved. The small distance between the sample position and aperture also results in less scattering of electrons than occurs in the ESEM(R) where a mirror is placed between the aperture and sample position since the electrons have to travel through only a limited length in a high pressure area. Embodiments also include combinations where, for example, an immersion lens is used.
COPYRIGHT: (C)2008,JPO&INPITAbstract translation: 要解决的问题：提供诸如ESEM的粒子光学装置，用于使用粒子和光子同时观察样品并减少高压下的粒子束的散射。 解决方案：将压力限制孔（PLA）放置在ESEM（R）中的物镜和样品位置之间的隔膜中。 样品位置和孔径之间的距离足够小，以允许光子通过该孔的大的收集角。 在隔膜和物镜之间设置一个镜子。 由于光子的收集角度大，所以实现了大的NA。 样品位置和孔径之间的小距离也导致比在ESEM（R）中发生更少的电子散射，其中反射镜被放置在孔径和样品位置之间，因为电子必须仅在有限长度的高压下行进 区。 实施例还包括例如使用浸没透镜的组合。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2008032715A
公开(公告)日：2008-02-14
申请号：JP2007193155
申请日：2007-07-25
Applicant: Fei Co , エフ イー アイ カンパニFei Company
Inventor： VAN GAASBEEK ERIK P , DONA PLEUN , BARENDS PAUL J L , VAN HEES IAN JOHANNES BERNARDU , VAN DE WATER GERBERT JEROEN , VAN DEN OETELAAR JOHANNES A M
CPC classification number: H01J37/20
Abstract: PROBLEM TO BE SOLVED: To provide a transfer mechanism for transferring a specimen (2) from a first position in a first holder 40 to a second position in a second holder 10 and/or vice versa.
SOLUTION: Respective holders 10, 40 are installed to detachably hold the specimen, and the transfer of the specimen between the holders takes place in a transfer position different from a second position. When the sample is conveyed between the holders 10, 40, a mechanical guidance mechanism positions the holders with a mutual precision higher than the mutual precision in the second position, and the mechanical guidance mechanism does not position at least one of the holders 10, 40 when the specimen is in the second position. The mechanical guidance mechanism may comprise extra parts 50. At least one of the holders 40 may be installed to hold a number of specimens.
COPYRIGHT: (C)2008,JPO&INPITAbstract translation: 要解决的问题：提供一种用于将样品（2）从第一保持器40中的第一位置转移到第二保持器10中的第二位置的转移机构和/或反之亦然。
解决方案：各个保持器10,40被安装以可拆卸地保持试样，并且在保持器之间的试样的转移发生在不同于第二位置的转移位置。 当样本在保持器10和40之间传送时，机械引导机构将保持器定位在相对精度高于第二位置的相互精度，并且机械引导机构不将至少一个保持件10,40 当样品处于第二位置时。 机械引导机构可以包括额外的部件50.可以安装至少一个保持件40以容纳多个试样。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2007207758A
公开(公告)日：2007-08-16
申请号：JP2007021561
申请日：2007-01-31
Applicant: Fei Co , エフ イー アイ カンパニFei Company
Inventor： HENDRIK NICOLAAS SLINGERLAND , KNOWLES WILLIAM RALPH
CPC classification number: H01J37/18 , H01J37/301 , H01J37/3056 , H01J2237/182 , H01J2237/2608 , H01J2237/28
Abstract: PROBLEM TO BE SOLVED: To provide a particle optical device having a predetermined final vacuum pressure. SOLUTION: A pressure chamber of this device is connected to a volume where steam or gas is present at known pressure through a first throttle valve, and connected to a vacuum pump through a second throttle valve. By converting a ratio of two conductance values related to the throttle valves to a calibrated ratio, the final pressure of a vacuum chamber is set at predetermined final pressure. Thereby, for instance, the need of a vacuum gage and a control system is obviated, whereby such a device can be designed in a small size. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供具有预定最终真空压力的粒子光学装置。 解决方案：该装置的压力室通过第一节流阀连接到已知压力下存在蒸汽或气体的体积，并通过第二节流阀连接到真空泵。 通过将与节流阀相关的两个电导值的比率转换成校正的比例，将真空室的最终压力设定在预定的最终压力。 因此，例如，避免了对真空计和控制系统的需要，由此可以将这种装置设计成小尺寸。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2006019280A
公开(公告)日：2006-01-19
申请号：JP2005188439
申请日：2005-06-28
Applicant: Fei Co , エフ イー アイ カンパニFei Company
Inventor： BUIJSSE B , MEUWESE M T , WELY-DIELEMAN M , MENTINK S A M , BISSCHOPS T H J
CPC classification number: H01J37/18 , H01J37/20 , H01J2237/2003 , H01J2237/2605
Abstract: PROBLEM TO BE SOLVED: To provide a sample evacuation device.
SOLUTION: On the sample evacuating device, the sample 4 is put on a cavity 3 on a sheet 1 having a smooth surface 2. An independent plate 5 is located on the smooth surface 2, and forms a vacuum sealing together with the smooth surface 2. The independent plate 5, having a vacuum column 6 mounted thereon, can slide around on the smooth surface 2. The cavity 3 is evacuated through several steps while the independent plate 5 slides on the smooth surface 2. In this embodiment, the vacuum column is formed into an ESEM (environment control type scanning electron microscope). The evacuated sample 4 can be inspected by the ESEM.
COPYRIGHT: (C)2006,JPO&NCIPIAbstract translation: 要解决的问题：提供抽样抽出装置。 解决方案：在样品排空装置上，将样品4放在具有光滑表面2的片材1上的空腔3上。独立板5位于光滑表面2上，并与 具有安装在其上的真空柱6的独立板5可以在光滑表面2上滑动。当独立板5在光滑表面2上滑动时，腔3被抽空几个台阶。在该实施例中， 将真空塔形成为ESEM（环境控制型扫描电子显微镜）。 抽真空样品4可以通过ESEM进行检查。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2006017728A
公开(公告)日：2006-01-19
申请号：JP2005192742
申请日：2005-06-30
Applicant: Fei Co , エフ イー アイ カンパニFei Company
Inventor： GEZINUS TAPPEL HENK
CPC classification number: H01J37/3056 , G01N1/32 , H01J2237/2007 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
Abstract: PROBLEM TO BE SOLVED: To provide a time savable alternative method for taking out a microscopic sample from a substrate.
SOLUTION: The method for taking out the microscopic sample 1 from the substrate 2 comprises a step of performing a cutting process where the substrate 2 is irradiated with a beam 4 so as to cut out the sample from the substrate, and a step of performing an adhering process where the sample 1 is adhered to a probe 3. The cutting process and the adhering process temporarily overlap mutually. The simultaneous performing of the cutting process and adhering process can realize time saving comparing with the continuous performing of the cutting process and adhering process.
COPYRIGHT: (C)2006,JPO&NCIPIAbstract translation: 要解决的问题：提供从基板取出微观样品的时间可选替代方法。 解决方案：从基板2取出微观样品1的方法包括执行切割过程的步骤，其中基板2被光束4照射以从基板切出样品，并且步骤 进行将样品1粘附到探针3上的粘附过程。切割过程和粘附过程相互暂时重叠。 与连续执行切割过程和粘附过程相比，同时执行切割工艺和粘合工艺可实现节省时间。 版权所有（C）2006，JPO＆NCIPI
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Patent Agency Ranking96.发明专利
公开(公告)号：JP2005235767A
公开(公告)日：2005-09-02
申请号：JP2005039607
申请日：2005-02-16
Applicant: Fei Co , エフ イー アイ カンパニFei Company
Inventor： HENSTRA ALEXANDER , CHMELIK JAROSLAV
CPC classification number: H01J37/05 , H01J37/09 , H01J37/153 , H01J37/26
Abstract: PROBLEM TO BE SOLVED: To provide a particle source having selectable beam currents and expansions of energy.
SOLUTION: The particle source causes a selection of the energy. The selection is caused by decentering beams from charged particles 13 through a lens 6 to direct it. As a result, diffusion of the energy is caused at an image 15 formed by the lens 6. It is possible to allow only particles at sections with the energy spectrum limited thereat to be passed through by projecting the image 15 onto an aperture 7. As a result, the passed beams 16 have expansions of reduced energies. With addition of a deflection unit 10, the beams 16 of the particles can be deflected toward a light axis 2. It is also possible to select to deflect a beam 12 which passes through the center of the lens 6 toward the light axis 2 and has a larger current.
COPYRIGHT: (C)2005,JPO&NCIPIAbstract translation: 要解决的问题：提供具有可选择的束流和能量扩展的粒子源。
解决方案：粒子源引起能量的选择。 该选择是由带电粒子13通过透镜6的偏心光引起的。 结果，在由透镜6形成的图像15处引起能量的扩散。可以仅允许通过将图像15投影到孔7上而限制能量谱的部分上的颗粒通过。作为 结果，通过的光束16具有减小的能量的扩展。 通过添加偏转单元10，颗粒的光束16可以朝向光轴2偏转。还可以选择将通过透镜6的中心的光束12偏转到光轴2并且具有 较大的电流。 版权所有（C）2005，JPO＆NCIPI
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97.发明专利
公开(公告)号：JP2004228076A
公开(公告)日：2004-08-12
申请号：JP2004005560
申请日：2004-01-13
Applicant: Fei Co , エフ イー アイ カンパニFei Company
CPC classification number: H01J37/20 , G01N1/04 , G01N1/286 , H01J2237/208 , H01J2237/31745 , H01J2237/31749
Abstract: PROBLEM TO BE SOLVED: To provide a method concerning manufacturing of a sample and concerning transmissive irradiation.
SOLUTION: This method comprises steps of (A) providing a particle optical system having an inner low pressure chamber and being suitable for generating an electron beam and an intersection ion beam inside the chamber; (B) providing a test piece transported by a manipulator; (C) irradiating the test piece by the ion beam so as to cut out the sample from the test piece; (D) relatively moving the cut-out sample to a sample holder so as to be manipulatable; (E) attaching the sample to the sample holder; and (F) using the electron beam so as to perform the transmissive irradiation onto the sample attached to the sample holder. This method is characterized in that the step (F) is performed in the chamber of the particle optical system according to the step (A).
COPYRIGHT: (C)2004,JPO&NCIPI-
公开(公告)号：JP2021168292A
公开(公告)日：2021-10-21
申请号：JP2021065348
申请日：2021-04-07
Applicant: エフ イー アイ カンパニ , FEI COMPANY
Inventor： バルト ヨーゼフ ヤンセン , エドウィン ヴァーシューレン , エリク フランケン
Abstract: 【課題】再構成品質の良い断層撮影画像の取得方法を提供する。 【解決手段】サンプルホルダ130はサンプルSを保持し、サンプルが荷電粒子ビーム(CPB)または他の放射線源に露光されている間、サンプルを単一方向に連続的に回転させることができる。通常、CPBはストロボ発光されて、ランダムなまたは任意の回転角で一連のCPB画像を生成する。サンプルホルダは、サンプルが2回以上完全に一周するよう回転させることができる。CPB画像は、断層撮影再構成において使用され、場合によっては、相対回転角度は、絶対回転角度の入力を伴わずに再構成において使用される。 【選択図】図1A
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公开(公告)号：JP2021153051A
公开(公告)日：2021-09-30
申请号：JP2021048709
申请日：2021-03-23
Applicant: エフ イー アイ カンパニ , FEI COMPANY
Inventor： クン リウ , スティーブン ジェイ.ランドルフ
Abstract: 【課題】重大な劣化なしに、かつ構造の他の要素によって加えられる圧縮力でエミッタを所定の位置にクランプまたは保持する必要なしに、ビーム生成エミッタと荷電粒子ビーム(CPB)システムの光軸との改善された位置合わせ、ならびに高温での長期の安定した信頼性のある動作をする荷電粒子ビーム(CPB)源の提供。 【解決手段】荷電粒子ビーム源は、ベースに連結された導電性支持部材208と、支持部材208に連結されボアを画定する取り付け部材216と、ボア内に受容されたエミッタ部材224であって、エミッタ部材224はボア内のエミッタ部材224の周りに流される固定材料層242によって保持される。 【選択図】図3
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公开(公告)号：JP2021096471A
公开(公告)日：2021-06-24
申请号：JP2020205623
申请日：2020-12-11
Applicant: エフ イー アイ カンパニ , FEI COMPANY
Inventor： アラン,バーム
IPC: G03H1/02
Abstract: 【課題】再構築の構造的および分子情報を改善するための比較ホログラフィックイメージングのための装置および方法を提供する。 【解決手段】サンプルの複数のホログラムを取得することであって、複数のホログラムの各ホログラムが、異なる電子ビームエネルギーで取得されると、複数のホログラムのうちの少なくとも2つのホログラムの比較に基づいて、サンプルの原子的および構造的情報を決定する。 【選択図】図1
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