公开(公告)号：DE69911558D1

公开(公告)日：2003-10-30

申请号：DE69911558

申请日：1999-07-14

Applicant: BREWER SCIENCE INC ,  NISSAN CHEMICAL IND LTD

Inventor： SABNIS W ,  MAYO W ,  BREWER L ,  STRODER D ,  EMA KIYOMI ,  SONE YASUHISA ,  NIHIRA TAKAYASU ,  AOBA KAZUHIRO ,  YANAGIMOTO AKIRA

IPC: G03F7/004 ,  C08L33/04 ,  C08L101/00 ,  G02B5/20 ,  G02B5/22 ,  G02F1/1335 ,  G03F7/00 ,  G03F7/033 ,  G03F7/075 ,  G03F7/027

Abstract: A spin coatable, photosensitive black matrix coating having high surface resistivity and exhibiting an optical density greater than 3 at film thicknesses of

公开(公告)号：AU2003223582A1

公开(公告)日：2003-10-27

申请号：AU2003223582

申请日：2003-04-11

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM W ,  SHIH WU-SHENG

IPC: C23C14/12 ,  G02B1/11 ,  G03F7/09 ,  H01L21/027

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 mum or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

公开(公告)号：AU2002245460A1

公开(公告)日：2003-09-16

申请号：AU2002245460

申请日：2002-02-11

Applicant: BREWER SCIENCE INC

Inventor： ENOMOTO TOMOYUKI ,  MIZUSAWA KEN-ICHI ,  ARASE SHIN-YA ,  PULIGADDA RAMA

IPC: G03F7/11 ,  C08F220/22 ,  C08F220/28 ,  C09D133/16 ,  G03F7/038 ,  G03F7/09 ,  G03F7/40 ,  H01L21/027 ,  G03F7/004 ,  C08F220/12 ,  G03F7/26 ,  C08F18/00 ,  C08F18/16

Abstract: Anti-reflective coatings formed from polymers and having high etch rates are provided. Broadly, the coatings are formed from a polymer binder and a light attenuating compound. The polymer binder has halogen atoms bonded thereto, preferably to functional groups on the polymer binder rather than to the polymer backbone. Preferred polymer binders comprise acrylic polymers while it is preferred that the halogenated functional groups of the polymer binders be dihalogenated, and more preferably trihalogenated, with chlorine, fluorine, or bromine atoms.

公开(公告)号：AU7356800A

公开(公告)日：2001-11-07

申请号：AU7356800

申请日：2000-09-06

Applicant: BREWER SCIENCE INC

Inventor： PULIGADDA RAMA ,  HUANG RUNHUI

IPC: B05D1/40 ,  B05D7/24 ,  C08L61/28 ,  C09D5/32 ,  C09D101/00 ,  C09D133/02 ,  C09D167/00 ,  C09D179/06 ,  G02B1/11 ,  B05D3/02 ,  B05D5/06

Abstract: Improved anti-reflective coating compositions for use in integrated circuit manufacturing processes and methods of forming these compositions are provided. Broadly, the compositions are formed by heating a solution comprising a compound including specific compounds (e.g., alkoxy alkyl melamines, alkoxy alkyl benzoguanamines) under acidic conditions so as to polymerize the compounds and form polymers having an average molecular weight of at least about 1,000 Daltons. The monomers of the resulting polymers are joined to one another via linkage groups (e.g., -CH2-, -CH2-O-CH2-) which are bonded to nitrogen atoms on the respective monomers. The polymerized compound is mixed with a solvent and applied to a substrate surface after which it is baked to form an anti-reflective layer. The resulting layer has high k values, improved etch rates, and can be formulated for both conformal and planar applications.

公开(公告)号：AT195025T

公开(公告)日：2000-08-15

申请号：AT95944193

申请日：1995-12-14

Applicant: BREWER SCIENCE INC

Inventor： FLAIM TONY D ,  MEADOR JIM D ,  SHAO XIE ,  BREWER TERRY L

IPC: C08G59/14 ,  C08G59/16 ,  C08G59/40 ,  C08G59/68 ,  C08L63/00 ,  C09D163/00 ,  G03F7/09

Abstract: A thermosetting anti-reflective coating and method for making and using the same is disclosed for a broad range of exposure wavelengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 3.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast crosslinking agent, all present in a low-to-medium alcohol-containing solvent.

公开(公告)号：DE68928548D1

公开(公告)日：1998-02-19

申请号：DE68928548

申请日：1989-09-25

Applicant: BREWER SCIENCE INC

Inventor： LAMB JAMES ,  BREWER TERRY ,  MORI J

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/085 ,  G03F7/09 ,  H01L21/027

公开(公告)号：DE3788440T2

公开(公告)日：1994-05-11

申请号：DE3788440

申请日：1987-02-04

Applicant: BREWER SCIENCE INC

Inventor： HUNNINGHAKE JEFFREY ,  BREWER TERRY LOWELL ,  LATHAM WILLIAM JOSEPH

IPC: G03F1/00 ,  C08G73/06 ,  C09D5/00 ,  C09D5/32 ,  C09D179/08 ,  G02F1/1335 ,  G03F1/08 ,  G03F1/10 ,  G03F7/09 ,  G03F9/00 ,  H01L21/027 ,  G03F7/00 ,  G02B5/22 ,  G02F1/13

公开(公告)号：DE3788440D1

公开(公告)日：1994-01-27

申请号：DE3788440

申请日：1987-02-04

Applicant: BREWER SCIENCE INC

Inventor： HUNNINGHAKE JEFFREY ,  BREWER TERRY LOWELL ,  LATHAM WILLIAM JOSEPH

IPC: G03F1/00 ,  C08G73/06 ,  C09D5/00 ,  C09D5/32 ,  C09D179/08 ,  G02F1/1335 ,  G03F1/08 ,  G03F1/10 ,  G03F7/09 ,  G03F9/00 ,  H01L21/027 ,  G03F7/00 ,  G02B5/22 ,  G02F1/13

公开(公告)号：AT98789T

公开(公告)日：1994-01-15

申请号：AT87301002

申请日：1987-02-04

Applicant: BREWER SCIENCE INC

Inventor： HUNNINGHAKE JEFFREY ,  BREWER TERRY LOWELL ,  LATHAM WILLIAM JOSEPH

IPC: G03F9/00 ,  G03F7/00 ,  G02B5/22 ,  G02F1/13 ,  G03F1/00

公开(公告)号：AU4646189A

公开(公告)日：1990-05-28

申请号：AU4646189

申请日：1989-11-07

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY ,  MOSS MARY ,  CUZMAR RUTH ,  HAWLEY DAN ,  FLAIM TONY

IPC: G03F7/039 ,  H01L21/312 ,  H01L23/532 ,  H01L29/00 ,  G03C1/60 ,  G03F7/26

Abstract: Positive working polyamic acid photoresist compositions are disclosed having improved high resolution upon image development and exhibiting stable photosensitivity and superior dielectric performance. The compositions comprise polyamic acid condensation products of an aromatic dianhydride and an aromatic di-primary amine wherein a percentage of the diamine comprises special dissolution inhibiting monomers. The compositions may be further improved by the presence of particular supplemental additives.