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    Low surface distortion monochromator
    171.
    发明授权
    Low surface distortion monochromator 失效
    低表面失真单色器

    公开(公告)号：US5168924A

    公开(公告)日：1992-12-08

    申请号：US723081

    申请日：1991-06-28

    Applicant: William D. Taylor

    Inventor： William D. Taylor

    IPC: G02B7/18 ,  G21K1/06

    CPC classification number: G02B7/1815 ,  G21K1/06 ,  G21K2201/065

    Abstract: A monochromator 18 has a thin faceplate which reduces temperature-induced distortion in a strain-free region by placing it close to a two-level heat exchanger 46, 64. The heat exchanger has a first level 46 in juxtaposition with the faceplate 22 for efficient heat extraction, and a second level 64 which establishes a constant temperature plane along a neutral bending axis of the monochromator 18. The first level heat exchanger is operated at a temperature below the zero CTE point of the silicon faceplate so that the integrated CTE of the faceplate is approximately zero. Pumps 30 and 32 are disposed respectively at the coolant inlets 26 and outlets 28 for fine-tuning the coolant pressure so that a minimal pressure across the faceplate 22 may be established to minimize bending moments on the thin faceplate. The upper and lower heat exchangers 46, 64 are comprised of a plurality of micro-channels which are divided into groups, each group associated with a macro-channel 40, 60 and a return plenum 48, 68 which tapers down to an orifice 50, 72, which is connected to a return header 52, 74. The sizes of the orifices 50, 72 may be adjusted to control the amount of coolant flow through each macro channel so that the cooling provided may be matched to the heat absorbed by the faceplate.

    Mechanically actuated double crystal monochromater
    172.
    发明授权
    Mechanically actuated double crystal monochromater 失效
    机械致动双晶单色仪

    公开(公告)号：US5157702A

    公开(公告)日：1992-10-20

    申请号：US627844

    申请日：1990-12-14

    Applicant: Frederic H. Middleton ,  John W. Hicks

    Inventor： Frederic H. Middleton ,  John W. Hicks

    IPC: G21K1/06

    CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/065

    Abstract: A double-crystal X-ray monochromator includes entrance and exit crystal assemblies mounted on a support structure to provide full parallelism of the crystals while one crystal is rotated and the other rotated and translated with respect to the first, allowing selection of the wavelength of X-rays to be passed through the monochromator. The monochromator is mounted in an ultra-high vacuum chamber by supports which pass through the vacuum chamber to support the monochromator independently of the vacuum chamber. Bearings supporting the monochromator provide very low friction to linear movement and rotation to allow high precision to be obtained. To compensate for the heating of the entrance crystal due to impingement of high energy X-rays on the crystal, the entrance crystal is cooled using a radiation heat transfer system which provides no physical contact between the radiator connected to the entrance crystal assembly and the heat transfer structure on the vacuum chamber. The exit crystal may be heated so that its temperature can be matched to that of the entrance crystal to allow the precision alignment of the crystals to be maintained.

    Abstract translation: 双晶X射线单色仪包括安装在支撑结构上的入口和出射晶体组件，以提供晶体的完全平行度，而一个晶体旋转并且另一个晶体相对于第一晶体旋转和平移，允许选择X的波长 - 要通过单色仪的数据。 单色器通过支撑件安装在超高真空室中，支撑件通过真空室，以独立于真空室支撑单色器。 支撑单色仪的轴承为线性运动和旋转提供非常低的摩擦，以获得高精度。 为了补偿由于高能X射线在晶体上的撞击导致的入口晶体的加热，入射晶体使用辐射传热系统进行冷却，辐射传热系统在连接到入口晶体组件的散热器与热量之间不产生物理接触 在真空室上传输结构。 出口晶体可以被加热，使得它的温度可以与入口晶体的温度相匹配，以保持晶体的精确对准。

    Euv collector
    174.
    发明专利
    Euv collector 审中-公开
    EUV收藏家

    公开(公告)号：JP2012074697A

    公开(公告)日：2012-04-12

    申请号：JP2011203755

    申请日：2011-08-31

    Applicant: Carl Zeiss Smt Gmbh ,  カール・ツァイス・エスエムティー・ゲーエムベーハー

    Inventor： MICHAEL RIGHI ,  UDO DINGER

    IPC: H01L21/027 ,  G03F7/20 ,  H05G1/00

    CPC classification number: G21K1/06 ,  G03F7/70175 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

    Abstract: PROBLEM TO BE SOLVED: To provide a collector which improves quality of radiation to illuminate an object field to be transmitted.SOLUTION: An EUV collector (15) for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror (23) for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis (24). The EUV collector also includes a cooling device (26) for cooling the at least one collector mirror (23). The cooling device (26) has at least one cooling element (27), which has a course with respect to the collector mirror (23), so that, in each case, the projection of the course into a plane perpendicular to the central axis (24) has a main direction, which encloses an angle b of at most 20° with respect to a predetermined preferred direction (29).

    Abstract translation: 要解决的问题：提供一种提高辐射质量以照亮要传输的物场的收集器。 解决方案：用于收集和发射来自EUV辐射源的辐射的EUV收集器（15）包括至少一个收集器反射镜（23），用于反射EUV辐射源的发射，其相对于中心轴线旋转对称 （24）。 EUV收集器还包括用于冷却至少一个收集镜（23）的冷却装置（26）。 冷却装置（26）具有至少一个冷却元件（27），该冷却元件（27）相对于集光镜（23）具有一个过程，使得在每种情况下，该过程的投影到垂直于中心轴线的平面 （24）具有相对于预定的优选方向（29）包围至多20°的角度b的主方向。 版权所有（C）2012，JPO＆INPIT

    Source collector module with gic mirror and liquid xenon euv/lpp target system
    175.
    发明专利
    Source collector module with gic mirror and liquid xenon euv/lpp target system 有权
    源集电器模块与GIC镜和液体XENON EUV / LPP目标系统

    公开(公告)号：JP2012049526A

    公开(公告)日：2012-03-08

    申请号：JP2011170566

    申请日：2011-08-03

    Applicant: Media Lario Srl ,  メディア ラリオ ソシエタ ア レスポンサビリタ リミタータMedia Lario S.R.L.

    Inventor： LEVESQUE RICHARD ,  CEGLIO NATALE M ,  GIOVANNI NOCERINO ,  FABIO ZOCCHI

    IPC: H01L21/027

    CPC classification number: G21K1/067 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

    Abstract: PROBLEM TO BE SOLVED: To provide a source collector module which is inexpensive, simple and tough.SOLUTION: Grazing incidence collectors (GIC) mirrors M1, M2 are used in a source collector module for generating laser generating plasma (LPP) that emits EUV radiation. LPP is formed by using an LPP target system having a light source portion and a target portion. A pulse laser beam from the light source portion is applied to liquid xenon in the target portion. The GIC mirror is arranged relatively to LPP, receives EUV 30 at an incident end thereof and focuses the received EUV at an intermediate focus point IF adjacent to an emission end thereof. In order to increase the amount of EUV to be supplied to the intermediate focus point and further/or guided to an illuminator at the downstream side, a radiation collection enhancing device having at least one funnel portion is used.

    Abstract translation: 要解决的问题：提供廉价，简单和坚韧的源收集器模块。 解决方案：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极收集器模块中使用掠射入射收集器（GIC）反射镜M1，M2。 LPP通过使用具有光源部分和目标部分的LPP目标系统形成。 将来自光源部分的脉冲激光束施加到目标部分中的液体氙。 GIC反射镜相对于LPP布置，在其入射端接收EUV 30，并将接收的EUV聚焦在与其发射端相邻的中间焦点IF处。 为了增加提供给中间聚焦点的EUV的量并且进一步/或被引导到下游侧的照明器，使用具有至少一个漏斗部分的辐射收集增强装置。 版权所有（C）2012，JPO＆INPIT

    Lithography equipment and device manufacturing method
    179.
    发明专利
    Lithography equipment and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2005117048A

    公开(公告)日：2005-04-28

    申请号：JP2004294568

    申请日：2004-10-07

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： FRANKEN DOMINICUS JACOBUS PETR

    IPC: G02B7/00 ,  G02B7/182 ,  G02B7/198 ,  G03B27/52 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

    CPC classification number: G03F7/70891 ,  G21K1/06 ,  G21K2201/065

    Abstract: PROBLEM TO BE SOLVED: To restrain thermal deformation impact on the reflecting surface of a reflector assembly contained in a pattern providing means, which is caused by absorbed incidence radiation.
    SOLUTION: The lithography equipment of this invention comprises a substrate table that holds a substrate, radiation system that forms radiation projection means, pattern providing means for patternization of projection beams according to a desired pattern, and projection system that projects patterned beams to the target part of the substrate. This projection system and/or radiation system comprise a reflector assembly 100 having a reflector substrate 112 equipped with a reflecting surface 111 that reflects at least part of incidence radiation, and a heat system 120 that can transfer heat from at least part of the reflector substrate 112. The heat system 120 comprises at least one heat component 121 in a recess 113 of the reflector substrate 112, which is on the opposite side of the reflector 112 to the reflecting surface.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：抑制由吸收的入射辐射引起的包含在图案提供装置中的反射器组件的反射表面的热变形冲击。 解决方案：本发明的光刻设备包括保持基板的基板台，形成辐射投影装置的辐射系统，根据期望图案对投影光束进行图案化的图案提供装置，以及将图案化的光束投射到 基板的目标部分。 该投影系统和/或辐射系统包括反射器组件100，反射器组件100具有反射器基板112，反射器基板112配备有反射入射辐射的至少一部分的反射表面111，以及能够从反射器基板的至少一部分传递热量的热系统120 加热系统120包括在反射器基板112的凹部113中的至少一个热部件121，反射器基板112位于反射器112的与反射表面相反的一侧。 版权所有（C）2005，JPO＆NCIPI

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