公开(公告)号：WO2015044182A2

公开(公告)日：2015-04-02

申请号：PCT/EP2014/070335

申请日：2014-09-24

Applicant: ASML NETHERLANDS B.V.

Inventor： BANINE, Vadim ,  BARTRAIJ, Petrus ,  VAN GORKOM, Ramon ,  AMENT, Lucas ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  DONKER, Rilpho ,  ENGELEN, Wouter ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  NIENHUYS, Han-Kwang ,  NIKIPELOV, Andrey ,  RENKENS, Michael ,  JANSSEN, Franciscus ,  KRUIZINGA, Borgert

IPC: G03F7/20

CPC classification number: G21K1/067 ,  G01N2021/95676 ,  G02B5/1814 ,  G02B5/1823 ,  G02B5/1838 ,  G02B5/1861 ,  G02B27/0025 ,  G02B27/0938 ,  G02B27/10 ,  G02B27/1086 ,  G02B27/12 ,  G02B27/14 ,  G02B27/142 ,  G02B27/146 ,  G02B27/4272 ,  G03F1/84 ,  G03F7/70025 ,  G03F7/70208 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70991 ,  G21K2201/065 ,  H01S3/0903 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Abstract translation:

在光刻系统内使用的传送系统。 该光束输送系统包括光学元件，该光学元件被布置成接收来自辐射源的辐射束并沿一个或多个方向反射辐射的部分以形成一个或多个分支辐射束以提供给一个或多个工具。

公开(公告)号：EP3049870A2

公开(公告)日：2016-08-03

申请号：EP14777038.2

申请日：2014-09-24

Applicant: ASML Netherlands B.V.

Inventor： BANINE, Vadim ,  BARTRAIJ, Petrus ,  VAN GORKOM, Ramon ,  AMENT, Lucas ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  DONKER, Rilpho ,  ENGELEN, Wouter ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  NIENHUYS, Han-Kwang ,  NIKIPELOV, Andrey ,  RENKENS, Michael ,  JANSSEN, Franciscus ,  KRUIZINGA, Borgert

IPC: G03F7/20 ,  G03F1/84 ,  G02B27/00 ,  G02B5/18 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  H01S3/09 ,  H05H7/04 ,  G01N21/956 ,  G02B27/09 ,  G21K1/06

CPC classification number: G21K1/067 ,  G01N2021/95676 ,  G02B5/1814 ,  G02B5/1823 ,  G02B5/1838 ,  G02B5/1861 ,  G02B27/0025 ,  G02B27/0938 ,  G02B27/10 ,  G02B27/1086 ,  G02B27/12 ,  G02B27/14 ,  G02B27/142 ,  G02B27/146 ,  G02B27/4272 ,  G03F1/84 ,  G03F7/70025 ,  G03F7/70208 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70991 ,  G21K2201/065 ,  H01S3/0903 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：EP3049870B1

公开(公告)日：2019-05-15

申请号：EP14777038.2

申请日：2014-09-24

Applicant: ASML Netherlands B.V.

Inventor： BANINE, Vadim ,  BARTRAIJ, Petrus ,  VAN GORKOM, Ramon ,  AMENT, Lucas ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  DONKER, Rilpho ,  ENGELEN, Wouter ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  NIENHUYS, Han-Kwang ,  NIKIPELOV, Andrey ,  RENKENS, Michael ,  JANSSEN, Franciscus ,  KRUIZINGA, Borgert

IPC: G03F7/20 ,  G03F1/84 ,  G02B27/00 ,  G02B5/18 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  H01S3/09 ,  H05H7/04 ,  G01N21/956 ,  G02B27/09 ,  G21K1/06