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    METHOD AND SYSTEM FOR MONITORING THE INTEGRITY OF AN ARTICLE, AND EUV OPTICAL APPARATUS INCORPORATING THE SAME
    1.
    发明申请
    METHOD AND SYSTEM FOR MONITORING THE INTEGRITY OF AN ARTICLE, AND EUV OPTICAL APPARATUS INCORPORATING THE SAME 审中-公开
    用于监测物品的完整性的方法和系统，以及同时包含的EUV光学装置

    公开(公告)号：WO2012084363A1

    公开(公告)日：2012-06-28

    申请号：PCT/EP2011/070406

    申请日：2011-11-17

    Applicant: ASML Netherlands B.V. ,  CHERNYSHOV, Maksym ,  JANSSEN, Franciscus ,  DE VRIES, Gosse ,  VAN GESTEL, Maarten

    Inventor： CHERNYSHOV, Maksym ,  JANSSEN, Franciscus ,  DE VRIES, Gosse ,  VAN GESTEL, Maarten

    IPC: G03F7/20 ,  G03F1/86 ,  H01J37/30

    CPC classification number: G03F7/7085 ,  G03F7/70008 ,  G03F7/708 ,  G21K1/10 ,  H01J2237/24592

    Abstract: A method and a system are described for monitoring integrity and/or a contamination particle of an article (120), which may be, for example, a spectral purity filter in an EUV lithographic apparatus. To monitor integrity of an article operating in a low pressure environment, a beam of electrons is directed toward the article within the environment. The article when intact is configured to stop at least a proportion of the electrons in the beam, and a signal is generated to indicate integrity status of the article by identifying when at least a part of the article is not stopping the expected proportion of electrons in the beam. The electrons can be detected in the article itself, or in a screen or other detection device behind the article. EUV optical apparatus incorporating the method and the system are also described.

    Abstract translation: 描述了用于监测制品（120）的完整性和/或污染颗粒的方法和系统，其可以是EUV光刻设备中的例如光谱纯度滤光片。 为了监测在低压环境中工作的物品的完整性，电子束指向环境内的物品。 当完整的制品被配置为停止梁中的至少一部分电子，并且产生信号以指示物品的完整性状态，通过识别物品的至少一部分何时不会阻止电子的预期比例 梁。 电子可以在物品本身中或在物品后面的屏幕或其他检测装置中检测。 还描述了结合该方法和系统的EUV光学装置。

    PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS
    3.
    发明申请
    PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
    投影系统和平面设备

    公开(公告)号：WO2010037575A1

    公开(公告)日：2010-04-08

    申请号：PCT/EP2009/059222

    申请日：2009-07-17

    Applicant: ASML Netherlands B.V. ,  LOOPSTRA, Erik ,  DE BOEIJ, Wilhelmus ,  BUTLER, Hans ,  DE JONGH, Robertus ,  VAN SCHOOT, Jan ,  SENGERS, Timotheus ,  WIJCKMANS, Maurice ,  JANSSEN, Franciscus

    Inventor： LOOPSTRA, Erik ,  DE BOEIJ, Wilhelmus ,  BUTLER, Hans ,  DE JONGH, Robertus ,  VAN SCHOOT, Jan ,  SENGERS, Timotheus ,  WIJCKMANS, Maurice ,  JANSSEN, Franciscus

    IPC: G03F7/20

    CPC classification number: G03F7/70891 ,  G03F7/70258 ,  G03F7/70825

    Abstract: A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

    Abstract translation: 提供了一种投影系统（PS），在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架（200）上。 使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。 第二测量系统（920）用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常，框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地，可以提供温度控制系统（780,790），以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

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